• 제목/요약/키워드: Cubic Si

검색결과 179건 처리시간 0.026초

금속복합재료의 열잔류 응력과 강화재의 불규칙 분산 상태를 고려한 3차원 유한 요소 해석 (Three Dimensional Finite Element Analysis of Particle Reinforced Metal Matirx Composites Considering the Thermal Residual Stress and the Non-uniform Distribution of Reinforcements)

  • 강충길;오진건
    • 한국정밀공학회지
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    • 제17권6호
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    • pp.199-209
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    • 2000
  • Particles reinforced MMCs have higher specific modulus, higher specific strength, better properties at elevated temperatures and better wear resistance than monolithic metals. But the coefficient of thermal expansion(CTE) of Al6061 is 5 times larger than that of SiCp. The discrepancy of CTE makes some residual stresses inside of MMCs. This work investigates Si$C_p$/Al6061 composites at high temperatures in the microscopic view by three-dimensional elasto-plastic finite element analyses and compares the analytical results with the experimental ones. The theoretical model is not able to consider the nonuniform shape of particle. So the shape of particle is assumed to be perfect global shape. And also particle distribution is not homogeneous in experimental specimen. It is assumed to be homogeneous in simulation model. The type of particle distribution is face-centered cubic array(FCC array). Furthermore, non-homogeneous distribution is modeled by combination of several volume fractions.

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Thermal treatment effect of $CaF_2$ films for TFT gate insulator applications

  • Kim, Do-Young;Park, Suk-Won;Junsin Yi
    • 한국결정성장학회:학술대회논문집
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    • 한국결정성장학회 1998년도 PROCEEDINGS OF THE 14TH KACG TECHNICAL MEETING AND THE 5TH KOREA-JAPAN EMGS (ELECTRONIC MATERIALS GROWTH SYMPOSIUM)
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    • pp.145-148
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    • 1998
  • Fluoride({{{{ { CaF}_{2 } }}}}) films exhibited a cubic structure with similar lattice constant to that of Si and have sufficient breakdown electric field as gate dielectric material. Therefore, {{{{ { CaF}_{2 } }}}} are expected to replace conventional insulator such {{{{ { SiO}_{ 2},{Ta}_{2}{O}_{ 2} and{Al}_{2}{O}_{5}. However, {CaF}_{2}}}}} films showed hystereisis properties due to mobile charges in the film. To solve this problem we performed thermal treatment and achieves field. C-v results indicate a reduced hystereisis window of {{{{ }}}}ΔV =0.2v, LOW INTERFACE STATE {{{{{D}_{it}=2.0 TIMES {10}^{11}{cm}^{-1}{eV}^{-1}}}}} in midgap, and good WIS diode properties. We observed a preferential crystallization of(200) plane from XRD analysis. RTA treatment effects on various material properties of {{{{{CaF}_{2}}}}} are presented in this paper.

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전기용량법에 의한 자기이방성 측정장치 (A Measurement System for Magnetic Anisotropy with Capacitance Method)

  • 이용호;이연숙;신용돌;문기원;노태환;김희중;강일구
    • 한국자기학회지
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    • 제1권1호
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    • pp.30-36
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    • 1991
  • 전기용량법에 의한 자기이방성 측정장치를 설계 제작하였다. 균이자기장 속에서 원판 또는 구형의 시료가 자기이방성에 의해 받는 토오크를 평행판 축전기의 미소용량 변화로 변환하여, 그것을 변압기 부리지 로 검출하였다. 3% Si-Fe 단결정의(100)면에 대한 입방 이방성 $K_{1}$$3.3{\times}10^{4}\;J/m^{3}$가 얻어졌으며, 교정에는 Ni선의 형상이방성을 이용하였다. 기타 수종의 시료에 대한 결과도 기존치와 좋은 일치를 보였다.

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USE OF SINGLE PRECURORS FOR THE PREP ARATION OF SILICON CARBIDE FILMS

  • Lee, Kyunf-Won;Yu, Kyu-Sang;Kim, Yun-Soo
    • 한국표면공학회지
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    • 제29권5호
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    • pp.467-473
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    • 1996
  • Heteroepitaxial growth of cubic silicon carbide films on Si(001) and Si(111) substrates at temperatures 900-$1000^{\circ}C$ has been achieved by high vacuum chemical vapor deposition using the single precursor 1, 3-disilabutane without carrying out the carbonization process of the substrate surfaces. The deposition temperature range is much lowered compared with conventiontional chemical vapor deposition where separate sources for silicon and carbon are employed. The deposition procedure is quite simple and safe. The qualities of the films were found to be very good judging from the results obtained by various characterization techniques including reflection high energy electron diffraction, X-ray diffraction, X-ray pole figure analysis, Rutherford backscattering spectrometry, Auger depth profiling, and transmission electron diffraction.

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RF 스퍼터링법에 의한 SBT박막의 분극특성 (Polarization Properties of SBT Thin Film by RF Sputtering)

  • 김태원;조춘남;김진사;유영각;김충혁;박용필;이준웅
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.893-896
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    • 2000
  • The SrBi$_2$Ta$_2$O$\sub$9/(SBT) thin films are deposited on Pt-coated electrode(Pt/TiO$_2$/SiO$_2$/Si) using RF sputtering method. The SBT thin films deposited on substrate at 400-500[$^{\circ}C$]. SBT thin film deposited on Pt-coated electrodes have the cubic perovskite structure and polycrystalline state. With increasing annealing temperature from 600[$^{\circ}C$] to 850[$^{\circ}C$], flourite Phase was crystalized to 650[$^{\circ}C$] and Bi-layered perovskite phase was crystalized above 700[$^{\circ}C$]. The maximum remanent polarization is 11.73 ${\mu}$C/cm$^2$at 500[$^{\circ}C$] of substrate temperature and 750[$^{\circ}C$] annealing temperature for 30min.

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수렴성 빔 전자회절법을 이용한 $SiC_p/Al$ 복합재에서의 계면 생성물의 상분석 (Phase Identification of the Interfacial Reaction Product of $SiC_p/Al$ Composite Using Convergent Beam Electron Diffraction Technique)

  • 이정일;이재철;석현광;이호인
    • Applied Microscopy
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    • 제26권1호
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    • pp.95-104
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    • 1996
  • A comprehensive methodology to characterize the interfacial reaction products of $SiC_p/2024$ Al composites is introduced on the basis of the experimental results obtained using XRD, SEM and TEM. XRD performed on the electrochemically extracted $SiC_p$ and bulk $SiC_p/2024$ Al composite have shown that the interfacial reaction products consist of $Al_{4}C_3$ having hexagonal crystallographic structure, pure eutectic Si having diamond cubic crystallographic structure, and $CuAl_2$, having tetragonal crystalloraphic structure, respectively. According to the images observed by SEM, $Al_{4}C_3$, which has been reported to have needle shape, has a hexagonal platelet-shape and eutectic Si is found to have a dendritic shape. In addition eutectic $CuAl_2$, was observed to form near interface and/or along the grain boundaries. In order to confirm the results obtained by XRD, the primitive cell volume and reciprocal lattice height of such interfacial reaction products were calculated using the data obtained from convergent beam electron diffraction (CBED) patterns, and then compared with theoretical values.

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저압 화학 기상 증착 조건에서 Si$H_4$, W$F_6$ 환원 반응에 의한 텅스텐 박막의 성장 양식 (Growth Mode of Tungsten Thin Film by Using Si$H_4$ Reduction of W$F_6$ in LPCVD System)

  • 김성훈
    • 한국결정성장학회지
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    • 제3권2호
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    • pp.107-116
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    • 1993
  • LPCVD 조건하에서 Si 기판을 이용하여 W$F_6$를 환원시키거나 Si$H_4$를 이용하여 W$F_6$를 환원시켜 Si(100) 기판위에 텅스텐 박막을 증착하였다. 증착된 박막들의 표면 및 단면 형상과 특성들을 조사하였으며 박막들의 결정구조는 체심입방구조를 이루는${alpha}$-W임을 알수 있었다. 박막내의 텅스텐의 양과 grain들의 크기는 박막이 성장함에 따라 증가하였다. 실험적인 결과와 이론적인 고찰들로부터 텅스텐 박막은 Volmer-Weber 성장양식인 island growth를 이룸을 알 수 있었고 세부적인 박막 성장양식을 제시하였다. 또한 텅스텐 박막이 성장할수록 박막의 결정구조는 점점 단결정화 하여감을 알수 있었다.

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GeTe Thin Film의 상 변화가 저항과 Carrier Concentration에 미치는 영향

  • 이강준;나희도;김종기;정진환;최두진;손현철
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.292-292
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    • 2011
  • TFT (Thin Film Transistor)에서 공정을 단순화 시키고, 가격을 하락시키기 위해서는 Poly-Si을 대체할 물질이 필요하다. 이 연구에서는 Chalcogenide Material의 하나인 GeTe 박막을 이용하여 TFT Channel으로 사용 가능한 물질인지 알아보기 위하여 Post-Annealing을 한 뒤, 상 변화에 따른 박막의 저항 변화, Carrier Concentration (cm-3)과 Mobility (cm2V-1s-1)의 변화를 알아보았다. Sputtering을 이용하여 증착한 GeTe 100 nm Thin Film 위에 Sputtering을 이용하여 SiO2 5 nm를 Capping Layer로 증착한 후, Post-Annealing을 200$^{\circ}C$, 300$^{\circ}C$, 400$^{\circ}C$, 500$^{\circ}C$로 온도를 변화 시키며 진행하였고, 이로 인하여 GeTe Thin Film에 외부의 영향을 최소화 하였다. 먼저 GeTe Thin Film의 Sheet Resistance를 측정한 결과는 300$^{\circ}C$ 까지 낮은 Sheet Resistance의 거동을 보이며 반면, 400$^{\circ}C$ 이상이 되면 높은 Sheet Resistance의 거동을 보인다. Hall Measurement를 통해, Carrier Concentration과 Mobility를 알아보았다. Carrier Concentration은 온도가 증가하면 1E+19에서 1E+21 까지 증가하며, Mobility는 감소하는 경향을 보인다. 500$^{\circ}C$ Post-Annealed GeTe Thin Film에서는 Resistivity가 상당히 높아 4 Point Probe (Range : 1 mohm/sq~2 Mohm/sq)로 측정이 불가능하다. XRD로 GeTe Thin Film을 분석한 결과 as-grown, 200$^{\circ}C$, 300$^{\circ}C$에서는 Cubic의 결정 구조를 보이며, Sheet Resistance가 급격히 증가한 400$^{\circ}C$, 500$^{\circ}C$에서는 Rhombohedral의 결정구조를 보인다. GeTe Thin Film은 400$^{\circ}C$ 이상의 Post-Annealing 온도에서 cubic 구조에서 Rhombohedral 구조로 상 변화가 일어난다. 위 결과를 통해, 결정 구조의 변화가 GeTe Thin Film의 저항, Carrier Concentration과 Mobility에 밀접한 영향이 미치는 것을 확인하였다.

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Preparation and Luminescence of Europium-doped Yttrium Oxide Thin Films

  • Chung, Myun Hwa;Kim, Joo Han
    • Applied Science and Convergence Technology
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    • 제26권2호
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    • pp.26-29
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    • 2017
  • Thin films of europium-doped yttrium oxide ($Y_2O_3$:Eu) were prepared on Si (100) substrates by using a radio frequency (RF) magnetron sputtering. After the deposition, the films were annealed at $1000^{\circ}C$ in an air ambient for 1 hour. X-ray diffraction analysis revealed that the $Y_2O_3$:Eu films had a polycrystalline cubic ${\alpha}-Y_2O_3$ structure. The as-deposited films showed no photoluminescence (PL), which was due to poor crystalline quality of the films. The crystallinity of the $Y_2O_3$:Eu films was significantly improved by annealing. The strong red PL emission was observed from the annealed $Y_2O_3$:Eu films and the highest intensity peak was centered at around 613 nm. This emission peak originated from the $^5D_0{\rightarrow}^7F_2$ transition of the trivalent Eu ions occupying the $C_2$ sites in the cubic ${\alpha}-Y_2O_3$ lattice. The broad PL excitation band was observed at wavelengths below 280 nm, which was attributed to the charge transfer transition of the trivalent Eu ion.

Cytotoxicity and biocompatibility of high mol% yttria containing zirconia

  • Gulsan Ara Sathi Kazi;Ryo Yamagiwa
    • Restorative Dentistry and Endodontics
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    • 제45권4호
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    • pp.52.1-52.11
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    • 2020
  • Objectives: Yttria-stabilized tetragonal phase zirconia has been used as a dental restorative material for over a decade. While it is still the strongest and toughest ceramic, its translucency remains as a significant drawback. To overcome this, stabilizing the translucency zirconia to a significant cubic crystalline phase by increasing the yttria content to more than 8 mol% (8YTZP). However, the biocompatibility of a high amount of yttria is still an important topic that needs to be investigated. Materials and Methods: Commercially available 8YTZP plates were used. To enhance cell adhesion, proliferation, and differentiation, the surface of the 8YTZP is sequentially polished with a SiC-coated abrasive paper and surface coating with type I collagen. Fibroblast-like cells L929 used for cell adherence and cell proliferation analysis, and mouse bone marrow-derived mesenchymal stem cells (BMSC) used for cell differentiation analysis. Results: The results revealed that all samples, regardless of the surface treatment, are hydrophilic and showed a strong affinity for water. Even the cell culture results indicate that simple surface polishing and coating can affect cellular behavior by enhancing cell adhesion and proliferation. Both L929 cells and BMSC were nicely adhered to and proliferated in all conditions. Conclusions: The results demonstrate the biocompatibility of the cubic phase zirconia with 8 mol% yttria and suggest that yttria with a higher zirconia content are not toxic to the cells, support a strong adhesion of cells on their surfaces, and promote cell proliferation and differentiation. All these confirm its potential use in tissue engineering.