• Title/Summary/Keyword: Cu-alloy

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A Study on Cu(B)/Ti/SiO2/Si Structure for Application to Advanced Manufacturing Process (차세대 공정에 적용 가능한 Cu(B)/Ti/SiO2/Si 구조 연구)

  • Lee Seob;Lee Jaegab
    • Korean Journal of Materials Research
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    • v.14 no.4
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    • pp.246-250
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    • 2004
  • We have investigated the effects of boron added to Cu film on the Cu-Ti reaction and microstructural evolution of Cu(B) alloy film during annealing of Cu(B)/Ti/$SiO_2$/Si structure. The result were compared with those of Cu(B)/$SiO_2$ structure to identify the effects of Ti glue layers on the Boron behavior and the result grain growth of Cu(B) alloy. The vacuum annealing of Cu(B)/Ti/$SiO_2$ multilayer structure allowed the diffusion of B to the Ti surface and forming $TiB_2$ compounds at the interface. The formed $TiB_2$ can act as a excellent diffusion barrier against Cu-Ti interdiffusion up to $800^{\circ}C$. Also, the resistivity was decreased to $2.3\mu$$\Omega$-cm after annealing at $800^{\circ}C$. In addition, the presence of Ti underlayer promoted the growth Cu(l11)-oriented grains and allowed for normal growth of Cu(B) film. This is in contrast with abnormal growth of randomly oriented Cu grains occurring in Cu(B)/$SiO_2$ upon annealing. The Cu(B)/Ti/$SiO_2$ structure can be implemented as an advanced metallization because it exhibits the low resistivity, high thermal stability and excellent diffusion barrier property.

Effect of Ni or Cu content on Microstructure and Mechanical Properties of Solution Strengthened Ferritic Ductile Cast Iron (고용강화 페라이트계 구상흑연주철의 미세조직 및 기계적 성질에 미치는 Ni 및 Cu의 영향)

  • Bang, Hyeon-Sik;Kim, Sun-Joong;Song, Soo-Young;Kim, Min-Su
    • Journal of Korea Foundry Society
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    • v.41 no.5
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    • pp.411-418
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    • 2021
  • In order to experimentally investigate the effect of Ni or Cu addition on microstructure and mechanical properties of high Si Solution Strengthened Ferritic Ductile cast Iron (SSF DI), a series of lab-scale sand casting experiment were conducted by changing initial concentration of Ni up to 3.0wt% or Cu up to 0.9wt% in the alloy. It was found that increase in Ni or Cu content in the alloy leads to increase in strength properties and hardness as well as decrease in ductility. The higher Ni or Cu content the SSF DI has, the higher fraction of pearlite was observed. At similar levels of Ni or Cu contents in the alloy, higher pearlite area fraction was observed in the Cu-containing SSF DI than that in the Ni-containing SSF DI. When the effect of the microstructure on the mechanical properties of Ni-containing SSF DI was considered, Ni-containing SSF DI was found to have excellent strength and hardness as well as good elongation when the pearlite fraction was controlled less than 10%. As the pearlite fraction in the Ni-containing SSF DI exceeds 10%, however, it shows drastic decrease in elongation. Meanwhile, gradual increase in strength and hardness, and decrease in elongation with respect to increase in pearlite fraction were observed in Cu-containing SSF DI. The different microstructure-mechanical property relationships between Ni-containing and Cu-containing SSF DI were due to the combined effect of the relatively weak pearlite stabilizing effect of Ni compared to that of Cu in high Si SSF DI, and matrix strengthening effect caused by the different amounts of those alloying elements required for similar pearlite fraction.

DEVELOPMENT OF TITANIUM-BASED BRAZING FILLER METALS WITH LOW-MELTING-POING

  • Onzawa, Tadao;Tiyama, Takashi
    • Proceedings of the KWS Conference
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    • 2002.10a
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    • pp.539-544
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    • 2002
  • Titanium and titanium alloy are excellent in corrosion resistance and specific intensity, and also in the biocompatibility. On the other hand, the brazing is bonding method of which productivity and reliability are high, when the complicated and precise structure of the thin plate is constructed. However, though conventional titanium-based brazing filler metal was excellent in bond strength and corrosion resistance, it was disadvantageous that metal structure and mechanical property of the base metal deteriorated, since the brazing temperature (about 1000 C) is considerably high. Authors developed new brazing filler metal which added Zr to Ti-Cu (-Ni) alloy which can be brazed at 900 C or less about 15 years ago. In this paper, the development of more low-melting-point brazing filler metal was tried by the addition of the fourth elements such as Ni, Co, Cr for the Ti-Zr-Cu alloy. As a method for finding the low-melting-point composition, eutectic composition exploration method was used in order to reduce the experiment point. As the result, several kinds of new brazing filler metal such as 37.5Ti-37.5-Zr-25Cu alloy (melting point 825 C) and 30Ti-43Zr-25Cu-2Cr alloy (melting point: 825 C) was developed. Then, the brazing joint showed the characteristics which were almost equal to the base metal from the result of obtaining metallic structure and strength of joint of brazing joint. However, the brazing filler metal composition of the melting point of 820 C or less could not be found. Consequentially, it was clarified that the brazing filler metal developed in this study could be practically sufficiently used from results such as metal structure of brazing joint and tensile test of the joint.

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Development of Titanium-based Brazing Filler Metals with Low-melting-point

  • Onzawa, T.;Iiyama, T.
    • International Journal of Korean Welding Society
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    • v.2 no.2
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    • pp.14-18
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    • 2002
  • Titanium and titanium alloy are excellent in corrosion resistance and specific intensity, and also in the biocompatibility. On the other hand, the brazing is bonding method of which productivity and reliability are high, when the complicated and precise structure of the thin plate is constructed. However, though conventional titanium-based brazing filler metal was excellent in bond strength and corrosion resistance, it was disadvantageous that metal structure and mechanical property of the base metal deteriorated, since the brazing temperature ( about $1000^{\circ}C$ ) is considerably high. Authors developed new brazing filler metal which added Zr to Ti-Cu (-Ni) alloy which can be brazed at $900^{\circ}C$ or less about 15 years ago. In this paper, the development of more low-melting-point brazing filler metal was tried by the addition of the fourth elements such as Ni, Co, Cr for the Ti-Zr-Cu alloy. As a method for finding the low-melting-point composition, eutectic composition exploration method was used in order to reduce the experiment point. As the result, several kinds of new brazing filler metal such as 37.5Ti-37.5-Zr-25Cu alloy (melting point: $825^{\circ}C$) and 30Ti-43Zr-25Cu-2Cr alloy (melting point: $825^{\circ}C$) was developed. Then, the brazing joint showed the characteristics which were almost equal to the base metal from the result of obtaining metallic structure and strength of joint of brazing joint. However, the brazing filler metal composition of the melting point of $820^{\circ}C$ or less could not be found. Consequentially, it was clarified that the brazing filler metal developed in this study could be practically sufficiently used from results such as metal structure of brazing joint and tensile test of the joint.

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Influence of Ag Addition on the Mechanical Properties and Electrical Conductivity of Cu-Mg-P Alloys (Cu-Mg-P 합금의 기계적 성질과 전기전도도에 미치는 Ag첨가의 영향)

  • Kim, Jeong-Min;Park, Joon-Sik;Kim, Ki-Tae
    • Journal of the Korean Society for Heat Treatment
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    • v.23 no.1
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    • pp.10-16
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    • 2010
  • The microstructure of Cu-Mg-P alloy sheet consisted of Cu matrix and very fine MgP precipitate, and it has been observed that the microstructure remains virtually unchanged by Ag additions up to 2%. Ag solutes were dissolved into the matrix and hardly found in the precipitates. The hardness increased with increase of the Ag content, while the conductivity slightly decreased. Strain hardening through cold rolling was found to be effective in improving the hardness, especially in high-Ag alloys. Aging treatment was conducted either before the first cold rolling or between the first and the final cold rolling, and the conductivity was significantly higher at the former case, regardless of the Ag content. Softening of Cu-Mg-P alloy sheet was remarkable above $400^{\circ}C$ and the Ag content did not show any significant effect on it.

The Influence of Alloying Elements Addition on the Electrical and Mechanical Properties of Cu-Ni-Si-P Alloy (Cu-Ni-Si-P 합금의 기계적 및 전기적 성질에 미치는 첨가원소의 영향)

  • Kim, Seung-Ho;Yum, Young-Jin;Park, Dong-Hwan
    • Journal of the Korean Society for Heat Treatment
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    • v.27 no.1
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    • pp.1-9
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    • 2014
  • For connector material applications, the influence alloying elements of Mn, Cr, Fe, and Ti and cold rolling reduction on the mechanical property, electrical conductivity and bendiability of Cu-Ni-Si-P alloy was investigated. The hot rolled plates were solution treated at $980^{\circ}C$ for 1.5 h, quenched into water, cold rolled by 10% and 30% reduction in thickness, and then aged at $440{\sim}500^{\circ}C$ for 3, 4, 5 times. respectively. Cu-Ni-Si-P-x alloys cold rolled by 10 reduction before heat treatment have a good bendability compare to cold rolled by 30 reduction. Cu-3.4Ni-0.8Si-0.03P-0.1Ti shows the peak strength value of 759 MPa, an electrical conductivity of 39%IACS, an elongation of 10% and a hardness of 256 Hv aged at $440^{\circ}C$ for 6 hrs. Thus it is suitable for lead frame and connector.

Adhesion Improvement for Copper Process in TFT-LCD

  • Tu, Kuo-Yuan;Tsai, Wen-Chin;Lai, Che-Yung;Gan, Feng-Yuan;Liau, Wei-Lung
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.1640-1644
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    • 2006
  • The first issue that should be overcome in copper process is its poor adhesive strength between pure copper film and glass substrate. In this study, defining the adhesive strength of pure copper film on various substrates and clarifying the key deposition parameters are presented for the investigation of copper process. First, using different kinds of surface plasma treatments were studied and the results showed that the adhesive strength was not improved even though the roughness of glass substrate surface was increased. Second, adding an adhesive layer between glass substrate and pure copper film was used to enhance the adhesion. Based on the data in the present paper, adopting copper alloy film as an adhesive layer can have capability preventing peeling problem in copper process. Besides, Cu/Cu alloy structure could be etched with the same etchant with better taper angle than the one with single layer of Cu. Unlike Cu/Mo structure, there is no residual problem for Cu/Cu alloy structure during etching process. Finally, this structure was examined in electrical test without significant difference in comparison with the conventional metal process.

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