• 제목/요약/키워드: Crystallization of amorphous phase

검색결과 224건 처리시간 0.029초

Mg-Cu-Y합금의 벌크 비정질화 및 상분해 거동 (Bulk Amophisation and Decomposition Behavior of Mg-Cu-Y Alloys)

  • 김상혁;김도향;이종수;박찬경
    • Applied Microscopy
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    • 제26권2호
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    • pp.235-241
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    • 1996
  • Amophization and decomposition behaviour in $Mg_{62}Cu_{26}Y_{12}$ alloy prepared by melt spinning method and wedge type metal mold casting method have been investigated by a detailed transmission electron microscopy. Amorphous phase has formed in melt-spun ribbon. In the case of the wedge type specimen, however, the amorphous phase has formed only around the tip area within about 2 mm thickness. The remaining part of the wedge type specimen consists of crystalline phases, $Mg_{2}Cu\;and\;Cu_{2}Y$. The supercooling for crystallization behaviour of the amorphous $Mg_{62}Cu_{26}Y_{12}$ alloy, ${\Delta}T_x$ has been measured to be about 60 K. Such a large undercooling of the crystallization bahaviour enables formation of the amorphous phase in the $Mg_{62}Cu_{26}Y_{12}$ alloy under the cooling rate of $10^{2}K/s$. The amorphous $Mg_{62}Cu_{26}Y_{12}$ has decomposed into crystalline phases, $Mg_{2}Cu\;and\;Cu_{2}Y$ after heat treatment at $170^{\circ}C\;and\;250^{\circ}C$.

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(InTe)x(GeTe) 박막의 비정질-결정질 상변화 (Amorphous-to-Crystalline Phase Transition of (InTe)x(GeTe) Thin Films)

  • 송기호;백승철;이현용
    • 한국전기전자재료학회논문지
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    • 제23권3호
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    • pp.199-205
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    • 2010
  • The crystallization speed (v) of amorphous (InTe)$_x$(GeTe) (x = 0.1, 0.3 and 0.5) films and their thermal, optical and electrical behaviors have been investigated using nano-pulse scanner (wavelength = 658 nm, laser beam diameter < 2 ${\mu}m$), X-ray diffraction (XRD), 4-point probe and UV-vis-IR spectrophotometer. These results were compared with those of $Ge_2Sb_2Te_5$ (GST) film, comprehensively utilized for phase-change random access memory (PRAM). Both v-value and thermal stability of (InTe)$_{0.1}$(GeTe) and (InTe)$_{0.3}$(GeTe) films could be enhanced in comparison with those of the GST. Contrarily, the v-value in the (InTe)$_{0.5}$(GeTe) film was so drastically deteriorated that we could not quantitatively evaluate it. This deterioration is thought because amorphous (InTe)$_{0.5}$(GeTe) film has relatively high reflectance, resulting in too low absorption to cause the crystallization. Conclusively, it could be thought that a proper compositional (InTe)$_x$(GeTe) films (e.g., x < 0.3) may be good candidates with both high crystallization speed and thermal stability for PRAM application.

Deformation of Amorphous GeSe2 Film under Uniaxial Pressure Applied at Elevated Temperatures

  • Jin, Byeong Kyou;Lee, Jun Ho;Yi, Jeong Han;Lee, Woo Hyung;Shin, Sang Yeol;Choi, Yong Gyu
    • 한국세라믹학회지
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    • 제52권2호
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    • pp.108-113
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    • 2015
  • In an effort to evaluate the practicability of an imprinting technique for amorphous chalcogenide film in Ge-based compositions, we investigate the deformation behavior of the surface of amorphous $GeSe_2$ film deposited via a thermal evaporation route according to varying static loads applied at elevated temperatures. We observe that, under these static loading conditions, crystallization tends to occur on its surface relatively more easily than in As-based $As_2Se_3$ films. As for the present $GeSe_2$ film, higher processing temperatures are required in order to make its surface reflect the given stamp patterns well; however, in this case, its surface becomes partially crystallized in the monoclinic $GeSe_2$ phase. The increased vulnerability of this amorphous $GeSe_2$ film toward surface crystallization under static loading, when compared with the $As_2Se_3$ counterpart, is explained in terms of the topological aspects of its amorphous structure.

스퍼터링 및 저압화학기상증착 비정질 실리곤 박막의 고상 결정화 특성 (Characterization of Solid Phase Crystallization in Sputtered and LFCVD Amorphous Silicon Thin Film)

  • 김형택
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1995년도 추계학술대회 논문집
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    • pp.89-93
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    • 1995
  • Effects of hydrogenation in amorphous silicon rile growths on Solid Phase Crystallization (SPC) was investigated using x-ray diffractometry, energy dispersive Spectroscopy, and Raman spectrum. Interdiffusion of barium(Ba) and aluminum(Al) compounds of corning substrate was observed in both of rf sputtering and LFCVD films under the low temperature(580$^{\circ}C$) annealing. Low degree of crystallinity resulted from the interdiffusion was obtained. Highly applicable degree of crystallinity was obtained through the mechanical damage induced surface activation on amorphous silicon films. X-ray diffraction intensity of (111) orientation was used to characterize the degree of crystallinity of SPC. Nucleation and growth rate in SPC could be controllable through the employed surface treatment. IIydrogenated LPCVD films showed the superior crystallinity to non-hydrogenated sputtering films. Insignificant effects of activation treatment in sputtered film was of activation treatment in sputtered film was observed on SPC.

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교번자속인가에 의한 비정질 실리콘 박막의 결정화거동에 대한 연구 (Solid Phase Crystallization of LPCVD Amorphous Silicon Thin Films by Alternating Magnetic Flux)

  • 송아론;박상진;박성계;남승의;김형준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 추계학술대회 논문집
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    • pp.459-462
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    • 2000
  • A new method for the fabrication of poly-Si films is reported using by alternating magnetic flux crystallization (AMFC) of LPCVD a-Si films. In this work we have studied the crystallization of LPCVD a-Si films by alternating magnetic flux. A-Si films were 1200$\AA$-thick deposited at 48$0^{\circ}C$ at a total pressure of 0.25Torr using Si$_2$H$_{6}$/H$_2$. After this step, these a-Si films were thermally annealed by Alternating Magnetic Flux at 43$0^{\circ}C$ for 1hours. The annealed films were characterized using X-ray diffraction (XRD), Raman Spectra, Atomic Force Microscopy(AFM). Both alternating magnetic flux crystallization and solid phase crystallization were investigated to compare enhanced crystallization a-Si. We have found that the low temperature crystallization method at 43$0^{\circ}C$ by alternating magnetic flux.x.

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질산납과 사염화티탄으로부터 제조된 공침물의 결정화 (Crystallization of Coprecipitates Prepared from Lead Nitrate and Titanium Tetrachloride)

  • 최병철;이문호
    • 한국재료학회지
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    • 제4권5호
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    • pp.541-549
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    • 1994
  • 공침법으로 제조된 비정질 $PbTiO_{3}$전구체의 결정화거동과 구조적 변화를 XRD, 라만스펙트럼, TEM, RDF등으로 조사하였다. 전구체는 이온안정제로 $H_2O_2$혹은 $NH_4NO_3$를 사용하여 제조된 질산납과 사염화티탄의 혼합수용액으로부터 $45^{\circ}C$, pH 9에서 제조되었다. 이온안정제로 $H_2O_2$를 사용한 경우보다 $NH_4NO_3$를 사용하여 제조된 공침물이 더 낮은 온도에서 결정화가 시작되며 결정화의 활성화에너지도 더 작은 값을 가진다. 비정질의 공침물은 transient phase를 거쳐 결정 $PbTiO_{3}$로 변태된다. 비정질 상태의 평균 원자거리는 열처리온도의 증가에 따라 감소한다.

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A Study on the Characteristics of Amorphous TiAl by P/M Processing

  • Han, Chang-Suk;Jeon, Seung-Jin
    • 열처리공학회지
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    • 제29권2호
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    • pp.51-55
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    • 2016
  • The P/M processing of titanium aluminide using amorphous TiAl is developed by which it is possible to overcome inherent fabricability problems and to obtain a fine microstructure. A high quality amorphous TiAl powder produced by reaction ball milling shows clear glass transition far below a temperature at the onset of crystallization in differential scanning calorimetry above a heating rate of 0.05 K/s. We obtained a fully dense compact of amorphous TiAl powders, encapsulated in a vacuumed can, via viscous flow by hot isostatic pressing (HIP). Isothermally annealing of HIP'ed amorphous compact under a pressure of 196 MPa shows a progressive growth of ${\gamma}-TiAl$ phase with ${\alpha}2$ ($Ti_3Al$), which is characterized by increasing sharpness of X-ray peaks with temperature. Fully dense HIP'ed compact of titanium aluminide TiAl shows a high hardness of 505 Hv, suggesting strengthening mechanisms by sub-micron sized grain of ${\gamma}-TiAl$ and particle-dispersion by second phase constituent, ${\alpha}2$.

W35Fe43C22 비정질 합금분말의 결정화 거동 (Crystallization behavior of W35Fe43C22 amorphous alloy powders)

  • 권영준;유정선;박수근;이근효;조기섭
    • 열처리공학회지
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    • 제31권4호
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    • pp.165-170
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    • 2018
  • W, Fe, and carbon powders were mechanical alloyed to produce $W_{35}Fe_{43}C_{22}$ ternary alloy powders containing nanocrystal W embedded within amorphous matrix. When the powder samples were heated to the primary crystallization temperature of $735^{\circ}C$, most parts of their amorphous region were fully crystallized to [W,Fe]-rich $M_6C$ carbides. Interestingly, a little portion of the carbides changes to stoichiometric line compounds ($M_{12}C$ and $W_6Fe_7$) and a solution phase (Fe-rich bcc), and remaining parts of the crystallites were amorphized again. The resulting microstructure was retained even by cyclic heating between room temperature of $1,200^{\circ}C$, and thus we found that the amorphous structure can be irreversibly formed at above glass transition temperature.