• Title/Summary/Keyword: Cr-N films

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Heterostructures of SnO2-Decorated Cr2O3 Nanorods for Highly Sensitive H2S Detection (고감도 H2S 감지를 위한 SnO2 장식된 Cr2O3 nanorods 이종구조)

  • Jae Han Chung;Yun-Haeng Cho;Junho Hwang;Su hyeong Lee;Seunggi Lee;See-Hyung Park;Sungwoo Sohn;Donghwi Cho;Kwangjae Lee;Young-Seok Shim
    • Journal of Sensor Science and Technology
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    • v.33 no.1
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    • pp.40-47
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    • 2024
  • The creation of vertically aligned one-dimensional (1D) nanostructures through the decoration of n-type tin oxide (SnO2) on p-type chromium oxide (Cr2O3) constitutes an effective strategy for enhancing gas sensing performance. These heterostructures are deposited in multiple stages using a glancing angle deposition technique with an electron beam evaporator, resulting in a reduction in the surface porosity of the nanorods as SnO2 is incorporated. In comparison to Cr2O3 films, the bare Cr2O3 nanorods exhibits a response 3.3 times greater to 50 ppm H2S at 300℃, while the SnO2-decorated Cr2O3 nanorods demonstrate an eleven-fold increase in response. Furthermore, when subjected to various gases (CH4, H2S, CO2, H2), a notable selectivity toward H2S is observed. This study paves the way for the development of p-type semiconductor sensors with heightened selectivity and sensitivity towards H2S, thus advancing the prospects of gas sensor technology.

The Low Resistivity Gate Metals Formation of Thin Film Transistors by Selective CVD

  • Park, S.J.;Bae, N.J.;Kim, S.H.;Shin, H.K.;Choi, J.S.;Yee, J.G.;Choi, S.Y.
    • Journal of the Korean Vacuum Society
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    • v.4 no.S1
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    • pp.108-112
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    • 1995
  • Copper and aluminum selective deposition using (hfac)Cu(VTMS) and DMEAA precursors were performed in a warm-wall low pressure chemical vapour deposition reactor. The films of Cu and AI deposited on Corning 7059 glass and quartz with pattern of Cr seed metal. Selective deposition can be achieved at a pressure range of from 10-1 to 10 torr and substrate temperature range of 150-25$0^{\circ}C$. Selective deposition of Cu and AI by CVD is one of candidate for gate material formation fo larger area and high resolution plat panel displays.

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Industrial application of WC-TiAlN nanocomposite films synthesized by cathodic arc ion plating system on PCB drill

  • Lee, Ho. Y.;Kyung. H. Nam;Joo. S. Yoon;Jeon. G. Han;Young. H. Jun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2001.06a
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    • pp.3-3
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    • 2001
  • Recently TiN, TiAlN, CrN hardcoatings have adapted many industrial application such as die, mold and cutting tools because of good wear resistant and thermal stability. However, in terms of high speed process, general hard coatings have been limited by oxidation and thermal hardness drop. Especially in the case of PCB drill, high speed cutting and without lubricant process condition have not adapted these coatings until now. Therefore more recently, superhard nanocomposite coating which have superhard and good thermal stability have developed. In previous works, WC-TiAlN new nanocomposite film was investigated by cathodic arc ion plating system. Control of AI concentration, WC-TiAlN multi layer composite coating with controlled microstructure was carried out and provides additional enhancement of mechanical properties as well as oxidation resistance at elevated temperature. It is noted that microhardness ofWC-TiA1N multi layer composite coating increased up to 50 Gpa and got thermal stability about $900^{\circ}C$. In this study WC-TiAlN nanocomposite coating was deposited on PCB drill for enhancement of life time. The parameter was A1 concentration and plasma cleaning time for edge sharpness maintaining. The characteristic of WC-TiAlN film formation and wear behaviors are discussed with data from AlES, XRD, EDS and SEM analysis. Through field test, enhancement of life time for PCB drill was measured.

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A Roentgenographic Study on the Development of Roots of Mandibular Permanent Posterior Teeth (하악영구구치 치근발육에 관한 방사선학적 연구)

  • 고명연;정성창
    • Journal of Oral Medicine and Pain
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    • v.6 no.1
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    • pp.23-34
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    • 1981
  • In order to evaluate the correlation of age with development stage on permanent lower posterior teeth. the author exmined the roentgeregrams in standard films taken by intraoral technic and analysed the development phases of 1358 teeth of 500 males ranging from 9 to 15 years. The development was divided into 7 phases : Crown complete (Cr. C.). Root length 1/4(R. 1/4) Root length /2 (R. 1/2) Apical closure complete (A.C) The obtained results were as follows : 1. The formation of roots in full length on posterior teeth was complete as follow : a. Roots of 1st premolar : 12.72 years b. Roots of 2nd premolar : 12.94 years c. Meral Roots of 2nd molar : 13.38 years d. Distal Roots of 2nd molar : 13.46 years 2. The formation of apical forman of premolar was closured as follows : a. Apical foramen of root of 1st premolar : 13.64 years b. Apical foramen of root of 2nd premolar : 13.93 years 3. As a general rule. the mesial roots of second molar were developed earlier than distal roots of second molar. 4. In the correlation of age with the development stage, the regression equations. the correlation coefficents. and the sample numbers were “Y = 0.8370x + 10.2160, r = 0.71(p<0.01), n = 318”on lower first premolar, “Y = 0.6984x + 10.2148, r = 0.71(p<0.01), n = 385”on lower second premolar, “Y = 0.8810x + 10.2040, r = 0.65(p<0.01), n = 344”on mesial Root of lower second molar, and “Y = 0.7310x + 10.7940, r = 0.66(p<0.01), n = 311”on Distal Root of lower second molar respectively.

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Control of a- and c-plane Preferential Orientations of p-type CuCrO2 Thin Films

  • Kim, Se-Yun;Seong, Sang-Yun;Jo, Gwang-Min;Hong, Hyo-Gi;Kim, Jeong-Ju;Lee, Jun-Hyeong;Heo, Yeong-U
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.119-120
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    • 2011
  • Kawazoe는 1997년 p-type TOS를 만들기 위해서는 3가지가 충족되어야 한다고 언급한바 있다. 첫 번째, 가시광영역에서 투명하기 위해서 cation의 d10s0이 가득 차야 한다. 가득 차지 않은 d10 shell은 광 흡수가 가능하여 투과도를 떨어뜨린다. N-type을 예로 들어 ZnO, TiO, In2O3가 각각 Zn2+, Ti4+, In3+가 되어 d shell을 가득 차게 만드는 것을 볼 수 있다. 두 번째, cation d10s0 shell은 산소의 2p shell과 overlap 되어야 한다. 이 valence band는 홀 전도를 더욱 좋게 한다. 예를 들어 Cu1+(3d), Ag1+(4d)가 해당한다. 세 번째로, 양이온과 산소간의 공유결합을 강하게 하기 위해서 결정학적 구조는 매우 중요하다. Delafossite 구조는 산소가 pseudo-tetrahedral 구조로서 공유결합에 유리하다. 이러한 환경은 O2- (2p6)을 형성하고 홀의 이동도를 증가시킨다. 예를 들어 Cu2O의 경우 앞의 2가지를 만족시키지만 광학적 특성에서 좋지 않다. 그 이유가 3번째 언급한 결정학적인 요인에 있다. 결정 계의 환경은 Cu2O를 따라가면서 3차원적인 연결을 2차원적으로 변형된 delafossite 구조에서는 quantum well이 형성되어 band gap이 커진다. 본 연구에서는 전기적 이방성을 가지고 있는 delafossite CuCrO2 상에서 우선배향을 일으키는 인자 중 기판을 변화시켜 실험을 진행하였다. 결과적으로 기판변화를 통해 우선배향조절이 가능하였으며 CuCrO2 박막을 시켰으며, 결정방향에 따른 전기적 물성의 이방성에 관한 연구는 계속 진행 중에 있다. c-plane sapphire 기판위에는 [00l]로 성장하는 반면, c-plane STO 기판 위에는 [015] 방향으로 성장하는 것을 확인하였다. 이러한 원인은 기판과 증착되는 박막간의 mismatch를 최소화 하여 strain을 줄이고, 계면에서의 Broken boning 수를 줄여 계면에너지를 낮추는 방법이기 때문일 것으로 예상된다. C-plane sapphire 기판위에 증착될 경우 증착온도가 증가함에 따라 c-축으로의 성장이 온전해지며 이에 따라 캐리어농도의 감소와 모빌리티의 증가가 급격하게 변하는 것을 확인할 수 있다. 반면 c-plane STO 기판에서는 증착온도에 따른 박막의 배향변화가 없으며 전기적 물성 변화 또한 비교적 작은 것을 간접적으로 확인하였다.

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Some French and German Movies for the Multi-cultural Education at Schools (학교에서의 다문화교육을 위한 프랑스와 독일의 영화)

  • HAN, Yong-taek
    • Cross-Cultural Studies
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    • v.19
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    • pp.205-232
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    • 2010
  • The purpose of this paper is to examine the possibility of application of some French and German movies to teaching of multi-culture in elementary, middle and high schools. Three different films are selected. (2005), a French animation film directed by B?n?dicte Galup and Michel Ocelot, is appropriate for the education of understanding cultural relativity and improving multi-cultural sensitivity in elementary school. is a French short film directed by Walter Salles and Daniela Thomaso and included in omnibus style film (2006). This short film relating a story of an immigrated woman who leaves her baby in a cr?che and travels through Paris to work for a bourgeois mother can be used for developing a bond of sympathy between natives and immigrants. It is recommended for the class of junior high school. Finally (2007), a German film directed by Fatih Akin, provide a learning model for the education of multi-culture in high school classrooms. The cinematographic aesthetic of this film is focused on a process of reconciliation with others over the cultural, racial, national and generational differences. Analyzing the structure of the film and being guided by teachers the students can understand better in improving abilities to understand others.

Photocurrent study on the splitting of the valence band and growth of $ZnIn_{2}Se_{4}$ single crystal thin film by hot wall epitaxy (Hot wall epitaxy(HWE)법에 의한 $ZnIn_{2}Se_{4}$ 단결정 박막 성장과 가전자대 갈라짐에 대한 광전류 연구)

  • Hong, Kwang-Joon
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.18 no.5
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    • pp.217-224
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    • 2008
  • A stoichiometric mixture of evaporating materials for $ZnIn_2Se_4$ single crystal thin films was prepared from horizontal electric furnace. To obtain the single crystal thin films, $ZnIn_2Se_4$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperatures were $630^{\circ}C$ and $400^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of $ZnIn_2Se_4$ single crystal thin films measured from Hall effect by van der Pauw method are $9.41\times10^{16}cm^{-3}$ and $292cm^2/v{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the $ZnIn_2Se_4$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=1.8622eV-(5.23\times10^{-4}eV/K)T^2/(T+775.5K)$. The crystal field and the spin-orbit splitting energies for the valence band of the $ZnIn_2Se_4$ have been estimated to be 182.7 meV and 42.6 meV, respectively, by means of the photocurrent spectra and the Hopfield quasicubic model. These results indicate that the splitting of the ${\Delta}so$ definitely exists in the ${\Gamma}_5$ states of the valence band of the $ZnIn_2Se_4/GaAs$ epilayer. The three photo current peaks observed at 10 K are ascribed to the $A_{1}-$, $B_{1}-exciton$ for n = 1 and $C_{27}-exciton$ peaks for n = 27.

A Study on Bismuth tri-iodide for X-ray direct and digital imagers (직접방식 엑스선 검출기를 위한 $BiI_3$ 특성 연구)

  • Lee, S.H.;Kim, Y.S.;Kim, Y.B.;Jung, S.H.;Park, J.K.;Jung, W.B.;Jang, M.Y.;Mun, C.W.;Nam, S.H.
    • Journal of the Korean Society of Radiology
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    • v.3 no.2
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    • pp.27-31
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    • 2009
  • Now a days, the Medical X-ray equipments has become digitalized from analog type such as film, cassette to CR, DR. And many scientists are still researching and developing the Medical X-ray equipment. In this study, we used the Bismuth tri-iodide to conversion material for digital X-ray equipments and we couldn't get the satisfying result than previous study, but it opened new possibility to cover the disadvantage of a-Se is high voltage aplly and difficultness of make. In this paper, we use $BiI_3$ powder(99.99%) as x-ray conversion material and make films that have thickness of 200um and the film size is $3cm{\times}3cm$. Also, we deposited an ITO(Indium Tin Oxide) electrode as top electrode and bottom electrode using a Magnetron Sputtering System. To evaluate a characteristics of the produced films, an electrical and structural properties are performed. Through a SEM analysis, we confirmed a surface and component part. And to analyze the electrical properties, darkcurrent, sensitivity and SNR(Signal to Noise Ratio) are measured. Darkcurrent is $1.6nA/cm^2$ and sensitivity is $0.629nC/cm^2$ and this study shows that the electrical properties of x-ray conversion material that made by screen printing method are similar to PVD method or better than that. This results suggest that $BiI_3$ is suitable for a replacement of a-Se because of the reduced manufacture processing and improved yield.

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Growth and Photocurrent Properties of CdIn2S4/GaAs Single Crystal Thin Film by Hot Wall Epitaxy (Hot Wall Epitaxy 법에 의한 CdIn2S4 단결정 박막의 성장과 광전류 특성)

  • Lee, Sang-Youl;Hong, Kwang-Joon;Park, Jin-Sung
    • Journal of Sensor Science and Technology
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    • v.11 no.5
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    • pp.309-318
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    • 2002
  • A stoichiometric mixture of evaporating materials for $CdIn_2S_4$ single crystal thin films was prepared from horizontal electric furnace. To obtain the single crystal thin films, $CdIn_2S_4$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperatures were $630^{\circ}C$ and $420^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of $CdIn_2S_4$ single crystal thin films measured with Hall effect by van der Pauw method are $9.01{\times}10^{16}\;cm^{-3}$ and $219\;cm^2/V{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the $CdIn_2S_4$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=2.7116\;eV-(7.74{\times}10^{-4}\;eV)T^2/(T+434)$. The crystal field and the spin-orbit splitting energies for the valence band of the $CdIn_2S_4$ have been estimated to be 0.1291 eV and 0.0248 eV, respectively, by means of the photocurrent spectra and the Hopfield quasi cubic model. These results indicate that the splitting of the ${\Delta}so$ definitely exists in the ${\Gamma}5$ states of the valence band of the $AgInS_2$/GaAs epilayer. The three photocurrent peaks observed at 10K areascribed to the $A_1$-, $B_1$-, and C1-exciton peaks for n = 1.

Photocurrent study on the splitting of the valence band and growth of MgGa2Se4 single crystal thin film by hot wall epitaxy (Hot Wall Epitaxy(HWE)법에 의한 MgGa2Se4 단결정 박막 성장과 가전자대 갈라짐에 대한 광전류 연구)

  • Kim, Hyejeong;Park, Hwangseuk;Bang, Jinju;Kang, Jongwuk;Hong, Kwangjoon
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.23 no.6
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    • pp.283-290
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    • 2013
  • A stoichiometric mixture of evaporating materials for $MgGa_2Se_4$ single crystal thin films was prepared from horizontal electric furnace. To obtain the single crystal thin films, $MgGa_2Se_4$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperatures were $610^{\circ}C$ and $400^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by double crystal X-ray diffraction (DCXD). The temperature dependence of the energy band gap of the $MgGa_2Se_4$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=2.34 eV-(8.81{\times}10^{-4}eV/K)T^2/(T+251K)$. The crystal field and the spin-orbit splitting energies for the valence band of the $MgGa_2Se_4$ have been estimated to be 190.6 meV and 118.8 meV, respectively, by means of the photocurrent spectra and the Hopfield quasicubic model. These results indicate that the splitting of the ${\Delta}so$ definitely exists in the ${\Gamma}_5$ states of the valence band of the $MgGa_2Se_4$/GaAs epilayer. The three photocurrent peaks observed at 10 K are ascribed to the $A_{1^-}$, $B_{1^-}$exciton for n = 1 and $C_{27}-exciton$ peaks for n = 27.