• 한국재료학회:학술대회논문집
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• 한국재료학회 2003년도 춘계학술발표강연 및 논문개요집
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• pp.206-206
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• 2003

현재, 메탈의 내부식성 코팅막 제조에 사용되고 있는 크로메이트 기반 코팅제는 유독성 물질에 대한 환경 규제에 따라 조만간 사용이 금지 될 예정이다. 본 연구에서는 이러한 유독성 금속 내부식성 코팅제를 대체할 새로운 코팅 재료로 부식 억제제가 결합된 수용성 졸을 제조하고 그 특성을 보고하고자 한다 부식 억제제가 결합된 수용성 졸은 부분 가수 분해된 GPS((3-glycidoxypropyltriethoxysilane)에 Zirconiumoxychlorideoctahydrate 혹은 cerium nitrate를 일정 양 첨가하고 이온 교환수에 희석하여 제조하였다. 이 코팅 졸을 아연 도금 강판에 딥 코팅법으로 코팅한 후 상온에서 건조하고, 80~15$0^{\circ}C$에서 열처리하여 염수 분무 시험으로 백청 발생 정도를 관찰하여 내 부식성을 조사하였다. 코팅막의 두께는 수직으로 절단한 면을 전자 현미경으로 관찰하여 측정하였으며, 표면의 경도는 연필 경도계로 조사하였다. 또한 코팅막의 부식 전위는 전기화학적인 방법으로 분석되어 부식억제제의 종류에 따른 효과도 정량적으로 비교되었다.

• 보존과학회지
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• 제5권2호
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• pp.35-44
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• 1996

We propose a new method to remove salts that have permeated into excavated metal objects. This method cleans the excavated metal objects by using high temperature, high pressure deoxvgenated water containing inhibitors for corrosion of metals. The method greatly reduces the washing time compared with previous methods. Waste water from the method does not need treatment, nor do chemicals need to be removed from the metal objects. Furthermore, this method is applicable to some kind of metals(for example iron objects, bronze objects). We measured quantitatively the soluble salts dissolved from actual metal objects and found that there was a large difference between soluble chloride ions and sulfate ions.

• 보존과학연구
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• 통권23호
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• pp.149-162
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• 2002

Gilt bronze locks(Treasure No. 1141) excavated from Hancheonsa temple are artifacts of Goryeo Dynasty. The locks underwent a conservation process from October 2001 to July 2002. The process included cleaning and the application of corrosion inhibitors, Benzotriazolesolution, as well as reinforcement treatment with Paraloid NAD-10 solution,an acrylic resin. Non-destructive XRF analysis unveil that the artifacts are made of an alloy of copper(Cu), tin(Sn) and lead(Pb), but the gilt layer is too thin to analyze the purity of the gold or the exact production method. Gilt bronze locks are important materials because they preserve all the structures of locks in Goryeo Dynasty to the smallest detail. The surface pattern is revealed through the conservation process and components of the alloy through material analysis.

• 상하수도학회지
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• 제36권2호
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• pp.107-119
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• 2022

The frequent detection and occurrence of micropollutants (MPs) in aquatic ecosystems has raised public health concerns worldwide. In this study, the behavior of 50 MPs was investigated in three different domestic wastewater treatment plants (WWTPs). Furthermore, the Kruskal-Wallis test was used to assess the geographical and seasonal variation of MPs in the WWTPs. The results showed that the concentrations of 43 MPs ranged from less than 0.1 to 237.6 ㎍ L^-1, while other seven MPs including 17-ethynylestradiol, 17-estradiol, sulfathiazole, sulfamethazine, clofibric acid, simvastatin, and lovastatin were not detected in all WWTPs. Among the detected MPs, the pharmaceuticals such as metformin, acetaminophen, naproxen, and caffeine were prominent with maximum concentrations of 133.4, 237.6, 71.5, and 107.7 ㎍ L^-1, respectively. Most perfluorinated compounds and nitrosamines were found at trace levels of 1.2 to 55.3 ng L^-1, while the concentration of corrosion inhibitors, preservatives (parabens), and endocrine disruptors ranged from less than 0.1 to 4310.8 ng L^-1. Regardless of the type of biological treatment process such as MLE, A2O, and MBR, the majority of pharmaceuticals (except lincomycin, diclofenac, iopromide, and carbamazepine), parabens (except Methyl paraben), and endocrine disruptors were removed by more than 80%. However, the removal efficiencies of certain MPs such as atrazine, DEET, perfluorinated compounds (except PFHxA), nitrosamines, and corrosion inhibitors were relatively low or their concentration even increased after treatment. The results of statistical analysis reveal that there is no significant geographical difference in the removal efficacy of MPs, but there are temporal seasonal variations in all WWTPs.

• JSTS:Journal of Semiconductor Technology and Science
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• 제17권3호
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• pp.319-325
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• 2017

Through silicon via (TSV) technology is extensively used in 3D IC integrations. The special structure of the TSV is realized by CMP (Chemically Mechanical Polishing) process with a high Cu removal rate and, low dishing, yielding fine topography without defects. In this study, we investigated the electrochemical behavior of copper slurries with various inhibitors in the Cu CMP process for advanced TSV applications. One of the slurries was carried out for the most promising process with a high removal rate (${\sim}18000{\AA}/Min$ @ 3 psi) and low dishing (${\sim}800{\AA}$), providing good microstructure. The effects of pH value and $H_2O_2$ concentration on the slurry corrosion potential and Cu static etching rate (SER) were also examined. The slurry formula with a pH of 6 and 2% $H_2O_2$, hadthe lowest SER (${\sim}75{\AA}/Min$) and was the best for TSV CMP. A novel Cu TSV CMP process was developed with two CMPs and an additional annealing step after some of the bulk Cu had been removed, effectively improving the condition of the TSV Cu surface and preventing the formation of crack defects by variations in wafer stress during TSV process integration.

• 한국전기전자재료학회논문지
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• 제19권10호
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• pp.889-893
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• 2006

Chemical mechanical polishing (CMP) achieves surface planrity through combined mechanical and chemical means. The role of slurry is very important in metal CMP. Slurry used in metal CMP normally consists of oxidizers, complexing agents, corrosion inhibitors and abrasives. This paper investigates the effects of citric acid as a complexing agent for Cu CMP with $H_2O_2$. In order to study chemical effects of citric acid, X-ray photoelectron spectroscopy (XPS) was peformed on Cu sample after etching test. XPS results reveal that CuO, $Cu(OH)_2$ layer decrease but $CU/CU_2O$ layer increase on Cu sample surface. To investigate nanomechanical properties of Cu sample surface, nanoindentation was performed on Cu sample. Results of nanoindentation indicate wear resistance of Cu surface decrease. According to decrease of wear resistance on Cu surface removal rate increases from $285\;{\AA}/min\;to\;8645\;{\AA}/min$ in Cu CMP.

• 한국응용과학기술학회지
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• 제17권2호
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• pp.105-112
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• 2000

Surface tension as a function of concentration and temperature was measured for aquous solution of sodium N-acyl sarcosinate, $RCON(CH_{3})CH_{2}$ COONa, From the intersection points in the (${\gamma}-logC$) curves, the critical micelle concentration (cmc) was determined at 20, 30, 40, and $50^{\circ}C$. Structural effects on the cmc maximum and the minimum area per molecule at the aquous solution/air interface were discussed. The free energy, enthalpy, and entropy of micellization and adsorption of surfactant solution also were investigated. Numberous investigators have dealt with sodium N-acyl sarcosinates and their applications as wettings, flooding and reducing agents and as corrosion inhibitors.