• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.81-81
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• 2010

Growth of TiO2 films prepared by atomic layer deposition (ALD) was studied on C fiber. Moreover, adsorption and photocatalytic decomposition of methylene blue on TiO2 thin films were studied. Preferential growth of TiO2 on steps of C surfaces could be identified by scanning electron microscopy (SEM). X-ray Photoelectron Spectroscopy (XPS) showed thickness-dependent positive core level shift of Ti, which can be interpreted in terms of enhanced final state charging for thicker films. Adsorption and photocatalytic behaviors of TiO2 thin films will be discussed in this poster.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.57-57
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• 2010

Self assembled $Zn_{x-1}Cd_xS$ nanowires, synthesized on a Indium tin oxide coated glass substrate with low composition of Cd as x=0.09, were fabricated non-precursor via a co-evaporation method using of solid sources of CdS and ZnS. We studies that ZnCdS nanowires are dislocation-free and the single crystalline hexagonal wurtzite structure showed by transmission electron microscopy and selected area electron diffraction pattern. Cathode luminescence spectra showed an near band edge peak at 383nm originated from nanowires at 80K and 300K. Core level spectra of the Cd 3d, Zn 2p and S 2p in the ZnCdS nanorods were obtained by x-ray photoelectron spectroscopy. Prepared ZnCdS nanorods showed different shape with increase of substrate temperature at the growth.

• 한국진공학회지
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• 제6권2호
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• pp.159-164
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• 1997

X-선 광전자 분광법 (x-ray photoelectron spectroscopy: SPS)과 반사 고에너지 전 자 회절법(reflection high energy electron diffraction: RHEED)을 이용하여 상온과 고온(약 300~$500^{\circ}C$)에서 알칼리금속(AM)/Si(111)7$\times$7표면에 1 monolayer(ML)의 AM을 흡착시키면 Si(111)7$\times$7표면에 비해 산소의 초기 부착 계수(initial sticking coefficient)와 산소의 포화량 은 증가하지 않았다. Si(111)7$\times$7-AM표면에 산소의 주입량을 증가시키면서 측정한 O ls 스 펙트럼으로부터 AM이 흡착된 Si(111)7$\times$7표면에 흡착되는 산소원자는 Si-O, AM-O 두 종 류의 결합형태를 가지는 것으로 생각되며 이중에서 AM-O 결합의 산화과정상에서의 역할 에 대하여 논의하였다. 상온과는 달리 고온에서는, Si(111)3$\times$1-AM표면으로 구조가 변화하 면서 산소의 흡착이 급격히 떨어지는 것을 관측할 수 있었다. 이때 3$\times$1-AM표면을 형성시 키는 AM종류의 산화에 대한 의존성을 살펴보았다.

• 한국진공학회지
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• 제17권3호
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• pp.183-188
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• 2008

내각준위 X선 광전자 분광법을 이용하여 Pt(111) 표면 위에 증착된 Fe 초박막의 산소 흡착에 대한 연구를 수행하였다. 6개 단층 이하의 두께를 갖는 Fe 초박막을 상온에서 산소에 노출시켜 산소 원자가 화학흡착된 것을 확인하고, 후열처리 과정에 따른 탈착 및 Fe층의 변화를 살펴보았다. 흡착된 산소 원자는 $600{\sim}700K$에서 부분적으로 탈착되고, 700 K 이상에서 Fe 원자들이 Pt 기판 안으로 섞여 들어감을 내각준위 스펙트럼 세기들로부터 알 수 있었다. Fe 원자들과 Pt 원자들 간의 섞임은 산소가 흡착되지 않은 경우와 거의 동일한 경향을 보였으며, 섞임에 의한 Fe-Pt 합금의 형성은 Fe $2p_{3/2}$ 광전자 스펙트럼의 속박에너지의 변화로부터 확인할 수 있었다. 탈착되지 않고 남은 산소의 양은 전체의 1/2로서 속박에너지가 $600{\sim}700K$ 사이에서 탈착된 산소보다 약 1.3 eV 커서 Fe층 위에 흡착된 산소들과는 다른 상임을 알 수 있었다. 이들 산소 원자는 1000 K에서야 탈착되었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.204.2-204.2
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• 2014

Among various metal oxides, ZrO2 is of particular interests and has received widespread attention thanks to its ideal mechanical and chemical stability. As a cheap metal, Ag nanoparticles are also widely used as catalysts in ethylene epoxidation and methanol oxidation. However, the nature of Ag-ZrO2 interfaces is still unknown. In this work, the growth, interfacial interaction and thermal stability of Ag nanoparticles on ZrO2(111) film surfaces were studied by low-energy electron diffraction (LEED), synchrotron radiation photoemission spectroscopy (SRPES), and X-ray photoelectron spectroscopy (XPS). The ZrO2(111) films were epitaxially grown on Pt(111). Three-dimensional (3D) growth model of Ag on the ZrO2(111) surface at 300 K was observed with a density of ${\sim}2.0{\times}1012particles/cm2$. The binding energy of Ag 3d shifts to low BE from very low to high Ag coverages by 0.5 eV. The Auger parameters shows the primary contribution to the Ag core level BE shift is final state effect, indicating a very weak interaction between Ag clusters and ZrO2(111) film. Thermal stability experiments demonstrate that Ag particles underwent serious sintering before they desorb from the zirconia film surface. In addition, large Ag particles have stronger ability of inhibiting sintering.

• 한국재료학회지
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• 제30권3호
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• pp.117-122
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• 2020

The effects of fast neutron irradiation on the electrical and optical properties of Li (3 at%) doped ZnSnO (ZTO) thin films fabricated using a sol-gel process are investigated. From the results of Li-ZTO TFT characteristics according to change of neutron irradiation time, the saturation mobility is found to increase and threshold voltage values shift to a negative direction from 1,000 s neutron irradiation time. X-ray photoelectron spectroscopy analysis of the O 1s core level shows that the relative area of oxygen vacancies is almost unchanged with different irradiation times. From the results of band alignment, it is confirmed that, due to the increase of electron carrier concentration, the Fermi level (E_F) of the sample irradiated for 1,000 s is located at the position closest to the conduction band minimum. The increase in electron concentration is considered by looking at the shallow band edge state under the conduction band edge formed by fast neutron irradiation of more than 1,000 s.

• E2M - 전기 전자와 첨단 소재
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• 제9권3호
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• pp.291-297
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• 1996

The surface properties of AI(Si, Cu) alloy film after plasma etching using the chemistries of chlorinated and fluorinated gases with varying the etching time have been investigated using X-ray Photoelectron Spectroscopy. Impurities of C, Cl, F and O etc are observed on the etched AI(Si, Cu) films. After 95% etching, aluminum and silicon show metallic states and oxidized (partially chlorinated) states, copper shows Cu metallic states and Cu-Cl$_{x}$(x$_{x}$ (x$_{x}$ (1

• 마이크로전자및패키징학회지
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• 제21권1호
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• pp.13-17
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• 2014

The direct-patternable $SnO_2$ thin film was successfully fabricated by photochemical metal-organic deposition. The composition and chemical bonding state of $SnO_2$ thin film were analyzed by using X-ray photoelectron spectroscopy (XPS) from the surface to the interface with Si substrate. XPS depth profiling analysis allowed the determination of the atomic composition in $SnO_2$ film as a function of depth through the evolution of four elements of C 1s, Si 2p, Sn 3d, and O 1s core level peaks. At the top surface, nearly stoichiometric $SnO_2$ composition (O/Sn ratio is 1.92.) was observed due to surface oxidation but deficiency of oxygen was increased to the interface of patterned $SnO_2/Si$ substrate where the O/Sn ratio was about 1.73~1.75 at the films. This O deficient state of the film may act as an n-type semiconductor and allow $SnO_2$ to be applied as a transparent electrode in optoelectronic applications.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1995년도 추계학술대회 논문집 학회본부
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• pp.338-341
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• 1995

The surface properties after plasma etching of Al(Si, Cu) solutions using the chemistries of chlorinated and fluorinated gases with varying the etching time have been investigated using X-ray Photoelectron Spectroscopy. Impurities of C, Cl, F and O etc are observed on the etched Al(Si, Cu) films. After 95% etching, aluminum and silicon show metallic states and oxized (partially chlorinated) states, copper shows Cu metallic states and Cu-Clx(x$CuCl_x$ (x$CuCl_x$ (1

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.54-54
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• 2011

The demand for low-friction, wear and corrosion resistant components, which operate under severe conditions, has directed attentions to advanced surface engineering technologies. The Filtered Vacuum Arc Cathode Deposition (FVACD) process has demonstrated atomically smooth surface at relatively high deposition rates over large surface areas. Preparation of Ti-Si-C-N nanocomposite coatings on (100) Si and stainless steel substrates with tetramethylsilane (TMS) gas pressures to optimize the film preparation conditions. Ti-S-C-N coatings were characterized using X-ray diffraction, X-ray photoelectron spectroscopy, transmission electron microscopy, nanoindentation, Rockwell C indentation and ball-on-disk wear tests. The XRD results have confirmed phase formation information of TiSiCN coatings, which shows mixing of TiN and TiC structure, corresponding to (111), (200) and (220) planes of TiCN. The chemical composition of the film was investigated by XPS core level spectra. The binding energy of the elements present in the films was estimated using XPS measurements and it shows present of elemental information corresponding to Ti2p, N1s, Si 2p and C1. Film hardness and elastic modulus were measured with a nano-indenter, and film hardness reached 40 GPa. Tribological behaviors of the films were evaluated using a ball-on-disk tribometer, and the films demonstrated properties of low-friction and good wear resistance.