• 한국표면공학회지
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• 제46권6호
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• pp.258-263
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• 2013

4 mol% Yttria-stabilized zirconia (4YSZ) coatings are fabricated by Air Plasma Spray (APS) and Electron Beam Physical Vapor Deposition (EB-PVD) with top coating of thermal barrier coating (TBC). NiCrAlY based bond coat is prepared as 150 ${\mu}m$ thickness by conventional APS (Air Plasma Spray) method on the NiCrCoAl alloy substrate before deposition of top coating. Each 4YSZ top coating shows different tribological behaviors based on the inherent layer structures. 4YSZ by APS which has splat-stacked structure shows lower friction coefficient but higher wear rate than 4YSZ by EB-PVD which has columnar structure. For 4YSZ by APS, such results are expected due to the sliding wear accompanied with local delamination of splats.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.1038-1041
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• 2003

In the paper, we investigated silicon surface microstructures formed by reactive ion etching in hollow cathode system. Wet anisotropic chemical etching technique use to form random pyramidal structure on <100> silicon wafers usually is not effective in texturing of low-cost multicrystalline silicon wafers because of random orientation nature, but High density hollow cathode plasma system illustrates high deposition rate, better film crystal structure, improved etching characteristics. The etched silicon surface is covered by columnar microstructures with diameters form 50 to 100nm and depth of about 500nm. We used $SF_{6}$ and $O_{2}$ gases in HCP dry etch process. This paper demonstrates very high plasma density of $2{\times}10^{12}$ $cm^{-3}$ at a discharge current of 20 mA. Silicon etch rate of 1.3 ${\mu}s/min$. was achieved with $SF_{6}/O_{2}$ plasma conditions of total gas pressure=50 mTorr, gas flow rate=40 sccm, and rf power=200 W. Our experimental results can be used in various display systems such as thin film growth and etching for TFT-LCDs, emitter tip formations for FEDs, and bright plasma discharge for PDP applications. In this paper we directed our study to the silicon etching properties such as high etching rate, large area uniformity, low power with the high density plasma.

• 한국전기전자재료학회논문지
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• 제25권9호
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• pp.717-722
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• 2012

In this work, we study on the effects of the oxygen pressure on the structural and crystalline of MgZnO thin films. MgZnO thin films were deposited on p-Si (111) substrates by using pulsed laser deposition. The X-ray diffraction analysis and energy-dispersive X-ray results revealed that as the oxygen pressure increased and Mg content in the MgZnO films decreased. Also Crystal structure was changed from cubic rock salt to hexagonal wurtzite. Alpha step and atomic force microscopy results showed that the thickness of the films are about 100 nm, and it has been found that the MgZnO (002) preferred orientation were deposited with increasing the oxygen pressure. Therefore, the effect of the preferred orientation, the crystallization grew in the form of the columnar; Grain size and RMS of the films were increased with increasing oxygen pressure.

• 한국패류학회지
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• 제4권1호
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• pp.1-16
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• 1988

The authors observed histochemical and ultrastructural characters on the osphradium of Rapana venosa Valenciennes using light microscope, scanning and transmission electron microscpes. The results were as follows:1)The basic structure of osphradium was bipectinated shape, which consisted of a septum situating in the center of osphradium and numerous osphradial leaflets. On the other hand, Epidermis of ospradial leaflets formed the structure of pseudostratified ciliated columnar epithelium which was composed of an epithelial cell layer, a basal cel layer and a neuropile. 2) Ciliated dpithelial cells:A large number of these cells were observed on the lateral and ventral regions but a small number of them were observed on the dorsal region. These cells had cylindrical microvilli, slender mitochondria and serve fibers.3) Supporting cells: These cells had cylindrical microvilli, spongy layer, electron dense granules, mitochondria and nerve fibers4) Four types secretory epothelial cells: Four distinct types of secretory epithelial cells were recognized and were arbitrily designated as Type I, Type II, Type III and Type IV.cell type I: These cells contained electron denwe granules(diameter, 0.94-1.56${\mu}{\textrm}{m}$), well developed Golgi apparatus and rough endoplasmic reticula, cell type II: These cills contained two types of granules of the different electron density. One was high electron density granules which were 0.4-1.0${\mu}{\textrm}{m}$ in diameter, The other was low electron density granules which were 0.75-1.2${\mu}{\textrm}{m}$ in diameter.cell type III:These cells had fibrous secretory materials and exhibited strongly positive reaction with Toluidine blue.cell type IV:A large number of this type of cells were observed on the ventral region of ospgradial leaflets and positively reacted with periodic acid Schiff reagent. 5)Dark cells contained several electron dense cillaty rootlets and unmerous granules but cellular organelles were not observed.6) Four types basal cells: Four distinci types of basal cells were recognized and arbitrarily designated as Type I, Type II, Type III and Type IV.Cell type I(light cell): These cells exhibited low electuon density and contained short smooth endoplasmic reticula, several vacuoles and granules.

• 한국지형학회지
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• 제24권3호
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• pp.27-45
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• 2017

At the upper part of terrace deposits at Jeongdongjin area, there is a structure in which reddish brown and grayish white layers laying horizontally. Previous studies have reported the existence of these structures within the deposits and suggested the theoretical background related to the formation process. However, the analysis of physical properties and chemical composition such as particle size, classification, etc. of the materials constituting the reddish brown and grayish white layers is scarcely done. In this study, the physico - chemical properties of gray - white and reddish brown beds are investigated. The mean grain size of the particles was less than $4{\varphi}$ in both layers and the reddish brown layer was more coarse. The results shows that the sorting of the grayish white layer is better. The chemical composition of both layers shows that the average concentration of $SiO_2$, $Al_2O_3$ and $K_2O$ of the grayish white layer was higher than those of the reddish brown layer. The concentration of $Fe_2O_3$ of reddish brown lyaer was 3 times higher than those of the grayish white layer. The degree of chemical weathering (CIA) is 90 or so in both the reddish brown and grayish white layers, indicating a significant level of chemical weathering. In conclusion, reddish brown layers had been formed by the processes related to the migration of iron and the migration of water that induced aggregation after the formation of sediments (psudo-gleization). In this study area, a vertical layer of grayish white which cuts off horizontal reddish brown and grayish white color was found. The vertical layer or wedge similar to a ice-wedge or columnar structure that in a cold environment, and there is a difference in shape and size. The vertical layer appears to have occurred three or more cycles. The vertical layers begin to form at a certain height within the outcrop and descend downwards, which of course is difficult to see as directing certain times.

• Applied Microscopy
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• 제33권3호
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• pp.223-231
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• 2003

광학현미경과 투과전자현미경을 이용하여 꼬막, Tegillarca granosa 아가미의 미세구조를 기재하였다. 꼬막의 아가미는 전형적인 사새형 아가미 구조를 가진다. 새엽은 다수의 측면섬모대와 정단섬모대를 가지며, 혈림프동을 둘러싸고 있는 새엽 상피층은 단층으로 상피세포, 섬모세포 그리고 분비세포들로 이루어져 있다. 상피세포들은 대부분 미세융모를 가진 편평형이다. 섬모세포는 원주형으로 두 종류(A와 B)로 구분되는데, A형 섬모세포는 B형 섬모세포에 비해 분포 비율이 높으며, 세포질의 전체적인 전자밀도는 낮다. 횡단면 표본에서 섬모 축사는 전형적인 "9+2" 구조를 나타냈으며, 기저 중심립은 "$2{\times}9$"의 구조를 보였다. 분비세포들은 새엽의 정단부에서 주로 관찰되며, 분비과립의 특징에 따라 세 종류 (A, B, C)로 구분할 수 있다. A형 분비세포는 다른 분비세포들에 비해 분포정도가 높고, 전자밀도가 낮은 분비과립을 함유한다. B형 분비세포는 막으로 싸여진 전자밀도가 높은 분비과립을 가지며, C형 분비세포들의 분비과립은 타원형으로 중심부의 균질한 물질을 과립상의 물질들이 싸고 있는 형태이다.

• 대한치과기공학회지
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• 제30권1호
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• pp.25-31
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• 2008

Cp-Ti and Ti-6Al-4V alloys commonly used dental implant materials, particularly for orthopaedic and osteosynthesis because of its suitable mechanical properties and excellent biocompatibility. This alloys have excellent corrosion behavior in the clinical environment. The first factor to decide the success of dental implantation is sufficient osseointegration and high corrosion resistance between on implant fixture and its surrounding bone tissue. In this study, in order to increase corrosion resistance and biocompatibility of Cp-Ti and Ti-6Al-4V alloy that surface of manufactured alloy was coated with TiN by RF-magnetron sputtering method. The electrochemical behavior of TiN coated Cp-Ti and Ti-6Al-4V alloy were investigated using potentiodynamic (EG&G Co, PARSTAT 2273. USA) and potentiostatic test (250mV) in 0.9% NaCl solution at 36.5 $\pm$ 1$^{\circ}C$. These results are as follows : 1. From the microstructure analysis, Cp-Ti showed the acicular structure of $\alpha$-phase and Ti-6Al-4V showed the micro-acicular structure of ${\alpha}+{\beta}$ phase. 2. From the potentiodynamic test, Ecorr value of Cp-Ti and Ti-6Al-4V alloys showed -702.48mV and -319.87mV, respectively. Ti-6Al-4V alloy value was higher than Cp-Ti alloy. 3. From the analysis of TiN and coated layer, TIN coated surface showed columnar structure with 800 nm thickness. 4. The corrosion resistance of TiN coated Cp-Ti and Ti-6Al-4V alloys were higher than those of the non-coated Ti alloys in 0.9% NaCl solution from potentiodynamic test, indicating better protective effect. 5. The passivation current density of TiN coated Cp-Ti and Ti-6Al-4V alloys were smaller than that of the noncoated implant fixture in 0.9% NaCl solution, indicating the good protective effect resulting from more compact and homogeneous layer formation.

• 한국재료학회지
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• 제22권2호
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• pp.97-102
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• 2012

The microstructure and tensile properties of Al-Mn/Al-Si hybrid aluminum alloys prepared by electromagnetic duocasting were investigated. Only the Al-Mn alloy showed the typical cast microstructure of columnar and equiaxed crystals. The primary dendrites and eutectic structure were clearly observed in the Al-Si alloy. There existed a macro-interface of Al-Mn/Al-Si alloys in the hybrid aluminum alloys. The macro-interface was well bonded, and the growth of primary dendrites in Al-Si alloy occurred from the macro-interface. The Al-Mn/Al-Si hybrid aluminum alloys with a well-bonded macro-interface showed excellent tensile strength and 0.2% proof stress, both of which are comparable to those values for binary Al-Mn alloy, indicating that the strength is preferentially dominated by the deformation of the Al-Mn alloy side. However, the degree of elongation was between that of binary Al-Mn and Al-Si alloys. The Al-Mn/Al-Si hybrid aluminum alloys were fractured on the Al-Mn alloy side. This was considered to have resulted from the limited deformation in the Al-Mn alloy side, which led to relatively low elongation compared to the binary Al-Mn alloy.

• 한국표면공학회지
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• 제38권1호
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• pp.21-27
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• 2005

Tensile properties and hardness of nickel electroform from chloride-free nickel sulfamate electrolyte at 50℃ and PH 4.5 were investigated. Current density varied from 20 to 60 mA/㎠. The deposit thicknesses were 360, 480 and 980 ㎛. It was found in 480 ㎛ thick electroform that highest tensile and yield strengths and hardness of 83.7 ksi, 53.6 ksi and 216 DPH, respectively were obtained at a current density of 40 mA/㎠ and they were slightly decreased at 20 and 60 mA/㎠. However the ductility was lowest of 7.9% at 40 mA/㎠. Such a high strength and low ductility at 40 mA/㎠ seems to be related to the narrower columnar structure than those of other current densities. All the deposits exhibited pronounced necking behavior. Tensile strength, yield strength and ductility increased as the nickel electroform thickens. Initial strong (200) texture developed on stainless steel mandrel decreased and (111) and (220) textures increased as deposit thickness increased, whereas (200) texture was preferred as the current density increased.

• 한국세라믹학회지
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• 제43권2호
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• pp.85-91
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• 2006

Electron Beam Physical Vapor Deposition (EB-PVD) was applied to fabricate a thin film YSZ electrolyte with large area on the porous NiO-YSZ anode substrate. Microstructural and thermal stability of the as-deposited electrolyte film was investigated via SEM and XRD analysis. In order to obtain an optimized YSZ film with high stability, both temperature and surface roughness of substrate were varied. A structurally homogeneous YSZ film with large area of $12\times12\;cm^2$ and high thermal stability up to $900^{\circ}C$ was fabricated at the substrate temperature of $T_s/T_m$ higher than 0.4. The smoother surface was proved to give the better film quality. Precise control of heating and cooling rate of the anode substrate was necessary to obtain a very dense YSZ electrolyte with high thermal stability, which affords to survive after post heat treatment for fabrication a cathode layer on it as well as after long time operation of solid oxide fuel cell at high temperature.