• Title/Summary/Keyword: Co-sputtering

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Improvement of Thermoelectric Properties of Bismuth Telluride Thin Films using Rapid Thermal Processing (Bismuth Telluride 박막의 열전특성 개선을 위한 급속 열처리효과)

  • Kim, Dong-Ho;Lee, Gun-Hwan
    • Korean Journal of Materials Research
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    • v.16 no.5
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    • pp.292-296
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    • 2006
  • Effects of rapid thermal annealing of bismuth telluride thin films on their thermoelectric properties were investigated. Films with four different compositions were elaborated by co-sputtering of Bi and Te targets. Rapid thermal treatments in range of $300{\sim}400^{\circ}C$ were carried out during 10 minutes under the reducing atmosphere (Ar with 10% $H_2$). As the temperature of thermal treatment increased, carrier concentrations of films decreased while their mobilities increased. These changes were clearly observed for the films close to the stoichiometric composition. Rapid thermal treatment was found to be effective in improving the thermoelectric properties of $Bi_2Te_3$ films. Recrystallization of $Bi_2Te_3$ phase has caused the enhancement of thermoelectric properties, along with the decrease of the carrier concentration. Maximum values of Seebeck coefficient and power factor were obtained for the films treated at $400^{\circ}C$ (about $-128{\mu}V/K$ and $9{\times}10^{-4}\;W/K^2m$, respectively). With further higher temperature ($500^{\circ}C$), thermoelectric properties deteriorated due to the evaporation of Te element and subsequent disruption of film's structure.

Single Grained PZT Array Fabricated by Physical Etching of Pt Bottom Electrode

  • Park, Eung-Chul;Lee, Jang-Sik;Kim, Kwang-Ho;Park, Jung-Ho;Lee, Byung-Il
    • The Korean Journal of Ceramics
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    • v.6 no.1
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    • pp.74-77
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    • 2000
  • Ta-doped PZT thin films prepared by reactive co-sputtering method could be transformed into single grained perovskite structure utilizing physical etching of Pt bottom electrode. It is found that PZT perovskite phase on damaged (111) Pt electrode by IMD was more easily crystallized than random oriented Pt electrode and less crystallized than (111) Pt electrode. This shows that amorphized Pt electrode surface by IMD process has an effect on crystallization of PZT perovskite phase. 40$\mu\textrm{m}\times40\mu\textrm{m}$ square shape single grain PZT array could be obtained utilizing the difference of incubation time for nucleation of rosettes between ion damaged Pt and (111) oriented Pt electrode. Single grained PZT thin films show low leakage current density of $1\times10^{-7}$ A/$\textrm{cm}^2$ and high break down field of 440kV/cm. The loss of remanent polarization after $10^{11}$ cycles was less than 15% of initial value.

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Comparison of Photoelectrode Properties Between $TiO_2$ Thin films Doped with Tantalum and Dispersed with Nanosize Gold (탄탈륨 도핑 및 나노사이즈의 금입자분산된 $TiO_2$ 박막에서의 광전극 특성 비교)

  • Yoon, Jong-Won;Jung, Kyung-Han;Koshizaki, Naoto;Kwon, Young-Soo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.861-864
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    • 2004
  • 본 연구에서는 Ta이 도핑된 $TiO_2$$Au/TiO_2$ nanocomposite 박막을 co-sputtering법으로 제작하였다. Ta-doped $TiO_2$ 박막은 금흥석(rutile)에서 아나타제 상으로 변하는 구조를 유도하는 고용체를 형성했다. $Au/TiO_2$ nanocomposite film의 경우에는, 지름이 약 15 nm인 Au particles들이 $TiO_2$ matrix에 균질하게 분포되었다. Ta가 도핑된 $TiO_2$ 전극과 $Au/TiO_2$ 나노 콤포사이트 전극의 anodic photocurrents가 UV뿐만 아니라 가시광선 영역에서도 관찰되었다. Ta이 도핑된 $TiO_2$ 전극과 $Au/TiO_2$ 나노 콤포사이트 사이의 가시광선 영역에서 photoresponse는 계면 상태로 부터의 bandgap의 감소와 전자의 photoexcitation 때문이다.

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LTCC 기판을 이용한 PZT 압력 센서의 제작 및 특성 연구

  • Heo, Won-Yeong;Hwang, Hyeon-Seok;Lee, Tae-Yong;Lee, Gyeong-Cheon;Song, Jun-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.03b
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    • pp.13-13
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    • 2010
  • Piezoelectric sensors are extensively used to measure force because of their high sensitivity and low cost. however, the development of device with reduced size but with improved sensitivity is highly important. Low-temperature co-fired ceramic (LTCC) is one of promising materials for this application than a silicon substrate because it has very good electrical and mechanical properties as well as possibility of making various three dimensional (3D) structures. In this work, piezoelectric pressure sensors based on hybrid LTCC technology were presented. The LTCC diaphragms with thickness of $400\;{\mu}m$ were fabricated by laminating 12 green tapes which consist of alumina and glass particle in an organic binder. The piezoelectric sensing layer consists of PZT thin film deposited by RF magnetron sputtering method on between top and bottom Au electrodes. The PZT films deposited on LTCC diaphragms were successfully grown and were analyzed by using X-ray diffraction method (XRD) and field emission scanning electron microscope (FESEM).

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Phase Change Characteristics of Au-added $Ge_2Sb_2T2_5$ Thin Films for PRAM (PRAM을 위한 Au 첨가 $Ge_2Sb_2T2_5$ 박막의 상변환 특성)

  • Shin, Jae-Ho;Lee, Seong-Gap;Lee, Hyun-Yong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.52-52
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    • 2010
  • 상변화 재료로 가장 널리 이용되고 있는 $Ge^2Sb^2Te^5$ 박막에 전기전도성이 높은 Au를 첨가하여 상변환 특성을 연구하였다. ($Au)_x(Ge^2Sb^2Te^5)_{1-x}$ (X = 0, 0.05, 0.1) 박막은 Si 와 Glass 위에 Au 타켓과 $Ge^2Sb^2Te^5$ 타겟을 Co Sputtering 하여 만들었다. 증착된 박막은 Nanopulse Scanner 를 사용하여 결정화 속도를 측정하였다. 또한 $100^{\circ}C{\sim}400^{\circ}C$까지 $25^{\circ}C$간격으로 열처리 후 4 point prove를 이용하여 열처리 온도에 따른 저항의 차이를 측정하였으며 비정질 - 결정질 천이의 구조를 확인하기 위하여 XRD를 측정하였다. UV-VIS/IR 장비를 사용하여 비정질 박막과 결정화된 박막의 물성과 전기적 특성을 분석하였다.

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A Study on the Phase Change Characteristics of Si-doped Ge2Sb2Te5 Thin Films for PRAM (PRAM을 위한 Si-doped Ge2Sb2Te5 박막의 상변화 특성 연구)

  • Baek, Seung-Cheol;Song, Ki-Ho;Lee, Hyun-Yong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.4
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    • pp.261-266
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    • 2010
  • In this paper, we report the changes of electrical, structural and optical characteristics in $Ge_2Sb_2Te_5$ thin films according to an increase of Si content. The Si-doped $Ge_2Sb_2Te_5$ thin films were prepared by rf-magnetron co-sputtering method. Isothermal annealing was carried out at $N_2$ atmosphere. The crystallization speed (v) of amorphous thin films was evaluated by detecting the reflection response signals using a nano-pulse scanner (wavelength = 658 nm) with illumination power of 1~17 mW and pulse duration of 10~460 ns. Structural phase changes were evaluated by XRD, and the optical transmittance was measured in the wavelength range of 300~3000 nm using UV-vis-NIR spectrophotometer. The sheet resistance (RS) of the thin films was measured using 4 point probe. Conclusivlely, the v-value decreased with an increase of Si content, while the RS-values of both crystalline and amorphous phases were increased. In particular, fcc-to-hexagonal transition was suppressed by the added Si atoms.

Electrochemical Characteristics of AIZr Thin Film for TFT-LCD Bus Line (TFT-LCD 버스선을 위한 AIZr 합금 박막의 전기 .화학적 특성에 관한 연구)

  • 김장권;김동식;이종호;정관수
    • Proceedings of the IEEK Conference
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    • 2001.06b
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    • pp.49-52
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    • 2001
  • The electrochemical characteristics of Alalloy thin film with low impurity concentrations AIZr deposited by using do magnetron co-sputtering deposition are investigated for the applications as gate bus line in the TFT-LCD panel. AlZr thin films were deposited various atomic percent of Zr. For increasing Zr atomic percent the hillock density was decreased and the resistivity was increased. The deposited thin films show the decrease of resistivity and the increase of grain size after the RTA at 300 $^{\circ}C$for 20 min.. Moreover, the resistivity of AIZr does not show appreciable grain size dependence after RTA. It is concluded that the decrease of resistivity after RTA is due to the increase of grain size. The annealed AIZr(at.0.9%) is found to be hillock free. The electrode potentials of AIZr were less than ITO's (-1.4V) and the etching rate of AIZr(at.0.9%) was 3.8587ng/sec. in KOH(10%) solution. Caculation results reveal that the AIZr(at.0.9%) thin film can be applicable to gate line of 25" UXGA class TFT-LCD panels and can not be applicable to data line.line.

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Doping Effects to the Thermoelectric Power Factor of Bi2Te3 Thin Films (Bi2Te3계 열전박막의 열전 출력인자에 미치는 첨가제의 영향)

  • Bae, Sang Hyun;Choi, Soon-Mok
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.33 no.2
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    • pp.141-146
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    • 2020
  • Thermoelectric Bi2Te3 thin films were synthesized by a co-sputtering method at 300℃. A Fe dopant was considered to enhance the thermoelectric properties of the system. The Seebeck coefficient of the Fe-doped films increased whereas the electrical conductivity decreased. As a result, the power factor of the system increased owing to the enhanced Seebeck coefficient. Grain growth inhibition was detected in the Fe-doped system, which produced more grain boundaries in the Fe-doped films than in the undoped system. The increased grain boundary scattering was deemed to be effective for a reduced thermal conductivity. This is advantageous for the preparation of high-performance thermoelectric films.

Soft Lithographic Patterning Method for Flexible Graphene-based Chemical Sensors with Heaters

  • Kang, Min-a;Jung, Min Wook;Myung, Sung;Song, Wooseok;Lee, Sun Suk;Lim, Jongsun;Park, Chong-Yun;An, Ki-Seok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.176.2-176.2
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    • 2014
  • In this work, we demonstrated that the fabrication of flexible graphene-based chemical sensor with heaters by soft lithographic patterning method [1]. First, monolayer and multilayer graphene were prepared by thermal chemical vapor deposition transferred onto SiO2 / Si substrate in order to fabrication of patterned-sensor and -heater. Second, patterned-monolayer and multilayer graphene were detached through soft lithography process, which was transferred on top and bottom sides of PET film. Third, Au / Ti (Thickness : 100/30 nm) electrodes were deposited end of the patterned-graphene line by sputtering system. Finally, we measured sensor properties through injection of NO2 and CO2 gas on different temperature with voltage change of graphene heater.

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Structural, Optical properties of layer thickness dependence for silicon quantum dots in SiC matrix superlattice (실리콘 양자점 초격자 박막의 두께에 따른 구조적, 광학적 특성 분석)

  • Kim, Hyun-Jong;Moon, Ji-Hyun;Park, Sang-Hyun;Cho, Jun-Sik;Yoon, Kyung-Hoon;Song, Jin-Soo;O, Byung-Sung;Lee, Jeong-Chul
    • 한국신재생에너지학회:학술대회논문집
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    • 2009.11a
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    • pp.398-398
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    • 2009
  • 텐덤 구조의 양자점 태양전지에서 양자점의 크기에 따라 에너지 밴드갭이 달라 넓은 대역의 태양광을 이용할 수 있다. 이러한 양자점의 크기는 증착 두께의 제어로 조절이 가능하다. Si과 C target을 이용한 RF Co-sputtering 법으로 각각 증착시간을 다르게 하여, SiC/$Si_{1-x}C_x$(x~0.20)인 실리콘 양자점 초격자 박막을 제조하고, $1000^{\circ}C$에서 20분간 질소 분위기에서 열처리를 하였다. Grazing incident X-ray diffraction(GIXRD)를 통해서 Si(111)과 $\beta$-SiC (111)이 생성되었음을 확인하였고, High resolution transmission electron microscopy(HRTEM) 사진으로 양자점의 크기와 분포 밀도를 확인할 수 있었다. Photoluminescence(PL)에서 1.4, 1.5, 1.7, 1.9eV의 Peak이 확인되었다.

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