• Title/Summary/Keyword: Co-contamination

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Analysis of Trace Impurities in The Bulk $H_2$ and He Gases by a Cold Concentration Method (저온 농축법에 의한 수소와 헬륨 중의 미량가스 분석)

  • Lee, Taeck Hong;Park, Doo Seon;Son, Moo Ryong
    • Journal of the Korean Chemical Society
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    • v.42 no.5
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    • pp.526-530
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    • 1998
  • Analysis of trace impurities in the gases has been very important with the development of semi-conductor related industry. Particularly, the contamination of the gas handling systems in a semi-conductor plant by the air has been a trouble to the manufacturers. Thus, the analysis of the air components in the system has been a task to the analysts. In this study, we report the analysis data with a expanded uncertainty for the trace impurities of nitrogen and argon in the bulk helium and hydrogen. All data show a good correspondence, exhibiting reliable statistical error ranges.

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Infection Risks Faced by Public Health Laboratory Services Teams When Handling Specimens Associated With Coronavirus Disease 2019 (COVID-19)

  • Wong, Chun-Kwan;Tsang, Dominic N.C.;Chan, Rickjason C.W.;Lam, Edman T.K.;Jong, Kwok-Kwan
    • Safety and Health at Work
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    • v.11 no.3
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    • pp.372-377
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    • 2020
  • Infection risks of handling specimens associated with severe acute respiratory syndrome coronavirus 2 (SARS-CoV-2) by public health laboratory services teams were assessed to scrutinize the potential hazards arising from the work procedures. Through risk assessments of all work sequences, laboratory equipment, and workplace environments, no aerosol-generating procedures could be identified except the procedures (mixing and transfer steps) inside biological safety cabinets. Appropriate personal protective equipment (PPE) such as surgical masks, protective gowns, face shields/safety goggles, and disposable gloves, together with pertinent safety training, was provided for laboratory work. Proper disinfection and good hand hygiene practices could minimize the probability of SARS-CoV-2 infection at work. All residual risk levels of the potential hazards identified were within the acceptable level. Contamination by gloved hands was considered as a major exposure route for SARS-CoV-2 when compared with eye protection equipment. Competence in proper donning and doffing of PPE accompanied by hand washing techniques was of utmost importance for infection control.

First-principles Study of MoS2 Nanostructures with Various Adsorbates

  • Cha, Janghwan;Sung, Dongchul;Hong, Suklyun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.210.2-210.2
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    • 2014
  • Recently, molybdenum disulfide (MoS2) nanostructures have been investigated for applications of lithium-ion batteries, solar cell, and gas sensors. In this regard, we have studied atomic and electronic properties of MoS2 nanostructures with adsorbed atoms and molecules using density functional theory calculations. Our calculations reveal that the several atoms such as H, C, N, and F are chemically bound to several sites on the two-dimensional (2D) MoS2 surface. On the other hand, various contamination molecules such as CO, CO2, NO, NO2, and NH3 do not bind to the surface. Next, adsorption of various molecules on the one-dimensional (1D) armchair MoS2 nanoribbon is investigated. Contrary to the case of 2D MoS2 monolayer surface, some molecules (CO and NO) are bound well to the edge of the MoS2 nanoribbon. We find that the molecular states due to adsorption are located near the Fermi level, which makes the band gap narrower. Therefore, we suggest that monolayer MoS2 nanoribbons be used as the gas sensors or detectors.

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Chucking Method of Substrate Using Alternating Chuck Mechanism (반도체 기판 교차 파지 방법)

  • Ahn, Young-Ki;Choi, Jung-Bong;Koo, Kyo-Woog;Cho, Jung-Keun;Kim, Tae-Sung
    • Journal of the Semiconductor & Display Technology
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    • v.8 no.1
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    • pp.1-5
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    • 2009
  • Typically, single-wafer wet etching is done by dispensing chemical onto the front and back side of spin wafer. The wafer is fixed by a number of chuck pins, which obstruct the chemical flow and would result in the incomplete removal of the remaining film, which can become a source of contamination in the next process. In this paper, we introduce a novel design of wafer chuck, in which chuck pins are groupped into two and each group of pins fixes the substrate alternatively. Two groups of chuck pins fix the high-speed spin substrate with non contact method using a magnetic material. The actual process has been executed to observe the effectiveness of this new wafer chuck. It was found that the new wafer chuck performed better than the conventional wafer chuck for removing the remaining film from the bevel and edge side of substrate.

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Evaluation of Contaminant Concentrations in Wet and Dry Seasons during Pump-and-Treat Pilot Tests

  • Jeon, Woo-Hyun;Lee, Jin-Yong;Kwon, Hyung-Pyo;Jun, Seong-Chun;Cheon, Jeong-Yong
    • Journal of Soil and Groundwater Environment
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    • v.18 no.6
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    • pp.18-31
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    • 2013
  • This study was performed to examine use of the pump-and-treat method for remediation of TCE, CF and CT in groundwater contaminated by DNAPL. The Woosan industrial complex is located in Wonju, about 120 km east of Seoul, Korea. Two pumping wells (KDPW7 and KDPW8) and five monitoring wells (KDMW7, KDMW8, KDMW9, KDMW10, and SKW2) were installed for the test. An asphalt laboratory is a main source of the extensive subsurface contamination at this site. To evaluate change in the concentrations of TCE, CF, and CT in groundwater in the study area, three rounds of pump-and-treat pilot tests were performed (6 July to 6 August, 22 August to 6 September, and 19 September to 2 December in 2011). The groundwater levels and the concentrations of TCE, CF, and CT exhibited negative correlations in the wet season but positive correlations in the dry season, which suggests that the TCE concentrations were mainly controlled by dilution through rainfall during the wet season and by residual TCE, CF, and CT in the unsaturated zone during the dry season. These possibilities should be considered in the full-scale remediation plan.

Study on Surface Scratch Characteristics of Hard Disk by Ramp Loading Method Using a Scratch Tester (스크래치 테스터의 Ramp Loading 방법을 이용한 하드디스크의 표면 스크래치 특성에 관한 연구)

  • Lee R.J.;Kim D.E.;Kang T.S.;Cho Y.B.;Cho K.Y.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.484-487
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    • 2005
  • In order to get the surface characteristics of the HDI of HDD, the surface damage mechanisms must be totally understood. Particle contamination in hard disk drives is a big concern in today's magnetic recording industry since they are major sources of reliability problems. Namely upon contact with the slider or a contaminant particle, the disk may be scratched or the particles may be embedded into the disk surface. In this work, comparison of scratches was made between those found on actual hard disks and those created using a scratch tester. It was found that ramp loading method is an effective way to make similar scratches as the actual ones. From the ramp loading condition, the relationship between the pressure and the scratch track width could be identified.

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Performance testing of a FastScan whole body counter using an artificial neural network

  • Cho, Moonhyung;Weon, Yuho;Jung, Taekmin
    • Nuclear Engineering and Technology
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    • v.54 no.8
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    • pp.3043-3050
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    • 2022
  • In Korea, all nuclear power plants (NPPs) participate in annual performance tests including in vivo measurements using the FastScan, a stand type whole body counter (WBC), manufactured by Canberra. In 2018, all Korean NPPs satisfied the testing criterion, the root mean square error (RMSE) ≤ 0.25, for the whole body configuration, but three NPPs which participated in an additional lung configuration test in the fission and activation product category did not meet the criterion. Due to the low resolution of the FastScan NaI(Tl) detectors, the conventional peak analysis (PA) method of the FastScan did not show sufficient performance to meet the criterion in the presence of interfering radioisotopes (RIs), 134Cs and 137Cs. In this study, we developed an artificial neural network (ANN) to improve the performance of the FastScan in the lung configuration. All of the RMSE values derived by the ANN satisfied the criterion, even though the photopeaks of 134Cs and 137Cs interfered with those of the analytes or the analyte photopeaks were located in a low-energy region below 300 keV. Since the ANN performed better than the PA method, it would be expected to be a promising approach to improve the accuracy and precision of in vivo FastScan measurement for the lung configuration.

Hydrochemical Characteristics and Nitrate-Nitrogen Contamination in Shallow Groundwater in Two Agricultural areas in Korea

  • Sul-Min Yun;Hang-Tak Jeon;Ji-Min Hwang;MoonSu Kim;HyunKoo Kim;Se-Yeong Hamm
    • Journal of the Korean earth science society
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    • v.44 no.4
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    • pp.291-306
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    • 2023
  • Shallow groundwater in rural areas is primarily polluted by agricultural activities. Nitrate-nitrogen is an indicator of artificial pollution. In this study, the hydrochemical characteristics and nitrate-nitrogen pollution of shallow groundwater were examined in two agricultural villages (Hyogyo-ri and Sinan-ri) in Chungcheongnam-do Province, Korea. Physicochemical quality analysis of shallow groundwater and stream water in the field, and chemical analysis in the laboratory were conducted from July 2020 to October 2021. In Hygyo-ri and Sinan-ri villages, shallow groundwater mainly belonged to the Ca-Cl, Ca-H CO3, Na-HCO3, and Na-Cl types, whereas stream water predominantly belonged to the Ca-HCO3 type. The nitrate-nitrogen concentration in shallow groundwater varied depending on the season, displaying an increased concentration of nitrate-nitrogen in the dry season compared to the rainy season. Stream water may be influenced by runoff into villages from the surrounding area, although both shallow groundwater and stream water are affected by artificial pollution. In addition, the nitrate-nitrogen concentration in stream water was lower than that in shallow groundwater.

Oxidative Stress in Extrahepatic Tissues of Rats Co-Exposed to Aflatoxin B1 and Low Protein Diet

  • Rotimi, Oluwakemi A.;Rotimi, Solomon O.;Oluwafemi, Flora;Ademuyiwa, Oladipo;Balogun, Elizabeth A.
    • Toxicological Research
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    • v.34 no.3
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    • pp.211-220
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    • 2018
  • Early life exposure to aflatoxin B1 (AFB1) and low protein diet through complementary foods during weaning is common in parts of Africa and Asia. This study evaluated the effect of co-exposure to AFB1 and low protein diet on the extrahepatic tissues of rats. Twenty-four three-week old weanling male albino rats were used for this study and were randomly assigned into four groups: group 1 served as control and was fed normal protein diet (20% protein), group 2 was fed low protein diet (5% protein), group 3 was fed normal protein diet + 40 ppb AFB1 while group 4 received low protein diet + 40 ppb AFB1, all for eight weeks. Afterward, biomarkers of anemia (packed cell volume (PCV), hemoglobin) and kidney function (urea, uric acid, and creatinine) were determined in the blood while biomarkers of oxidative stress were determined in the tissues spectrophotometrically. Co-exposure to AFB1 and low protein diet significantly (p < 0.05) decreased body weight gain and PCV, increased biomarkers of kidney functions and induced oxidative stress in the tissues studied. There was significant (p < 0.05) reduction in glutathione concentration while TBARS was significantly increased in the tissues. Co-exposure to AFB1 and low protein diet had additive effects on decreasing the weight gain and potentiation effect of kidney dysfunction in the rats. The co-exposure also decreased antioxidant enzymes and increased oxidant status in the tissues. Our results demonstrate that this co-exposure has deleterious health effects on extrahepatic tissues and should be a public health concern especially in developing countries where AFB1 contamination is common.

The Removal of Si3N4 Particles from the Wafer Surface Using Supercritical Carbon Dioxide Cleaning (웨이퍼 표면의 Si3N4 파티클 제거를 위한 초임계 이산화탄소 세정)

  • Kim, Yong Hun;Choi, Hae Won;Kang, Ki Moon;Karakin, Anton;Lim, Kwon Teak
    • Clean Technology
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    • v.24 no.3
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    • pp.157-165
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    • 2018
  • In this study, the removal of $Si_3N_4$ particles from the surface of a silicon wafer was investigated by using supercritical carbon dioxide, the IPA co-solvent and cleaning additive chemicals. First, the solubility of several surfactants and binders in supercritical carbon dioxide solubility and particle dispersibility in the binders were evaluated in order to confirm their suitability for the supercritical cleaning process. Particle removal experiments were carried out with adjusting various process parameters and reaction conditions. The surfactants used in the experiment showed little particle removal effect, producing secondary contamination on the surface of wafers. On the other hand, 5 wt% (with respect to $scCO_2$) of the cleaning additive mixture of trimethyl phosphate, IPA, and trace HF resulted in 85% of particle removal efficiency after $scCO_2$ flowing for 4 minutes at $50^{\circ}C$, 2000 psi, and the flow rate of $15mL\;min^{-1}$.