• 한국수소및신에너지학회논문집
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• 제28권4호
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• pp.331-337
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• 2017

Proton Exchange Membrane Water Electrolysis (PEMWE) is one of the most popular and widely used methods for hydrogen production. PEMWE contributes to eco-friendly system via its energy storage system application, hence making it environmentally friendly to use. However, its main drawback is contamination of proton exchange membrane during water electrolysis. Existing cation such as magnesium, calcium and the likes are the cause for membrane contamination. As a result, the cation contamination give rise to degradation of performance of electrolysis and the reverse electrolysis is effective method to remove cation.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1994년도 하계학술대회 논문집 C
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• pp.1599-1602
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• 1994

Recently, failure of COS(cut out switch) due to contamination has been increased. This paper is on the development of the contamination COS. 1 We designed a porcelain insulator of alternate shed for anti-contamination COS. 2 The COS was coated with HVIC(silicone) to improve resistivity to contamination. 3 The FOV characteristics of COS were examined to obtain dry FOV, wet FOV and contamination FOV.

• Radiation Oncology Journal
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• 제6권1호
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• pp.109-116
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• 1988

The Alcyon Co-60 gamma rays was studied for electron contamination. The surface dose, attributable almost entirely to contamination electrons, has a linear dependence on field width for square fields and an inverse square dependence on distance from the bottom of the fixed head assembly Build-up and surface dose measurements were taken with and without an acrylic blocking tray in place. Further measurements were made with a copper filter designed to reduce secondary electrons emitted by photon interactions with the acrylic tray. The results are discussed in relation to skin sparing effect for radiation therapy Patients. And to achieve the maximum skin sparing effect, the selection of the optimum SSD and TSD is needed.

• Environmental Analysis Health and Toxicology
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• 제31권
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• pp.6.1-6.10
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• 2016

Objectives This study examined the spatial distribution and the extent of soil contamination by heavy metals resulting from primitive, unconventional informal electronic waste recycling in the Agbogbloshie e-waste processing site (AEPS) in Ghana. Methods A total of 132 samples were collected at 100 m intervals, with a handheld global position system used in taking the location data of the soil sample points. Observing all procedural and quality assurance measures, the samples were analyzed for barium (Ba), cadmium (Cd), cobalt (Co), chromium (Cr), copper (Cu), mercury (Hg), nickel (Ni), lead (Pb), and zinc (Zn), using X-ray fluorescence. Using environmental risk indices of contamination factor and degree of contamination ($C_{deg}$), we analyzed the individual contribution of each heavy metal contamination and the overall $C_{deg}$. We further used geostatistical techniques of spatial autocorrelation and variability to examine spatial distribution and extent of heavy metal contamination. Results Results from soil analysis showed that heavy metal concentrations were significantly higher than the Canadian Environmental Protection Agency and Dutch environmental standards. In an increasing order, Pb>Cd>Hg>Cu>Zn>Cr>Co>Ba>Ni contributed significantly to the overall $C_{deg}$. Contamination was highest in the main working areas of burning and dismantling sites, indicating the influence of recycling activities. Geostatistical analysis also revealed that heavy metal contamination spreads beyond the main working areas to residential, recreational, farming, and commercial areas. Conclusions Our results show that the studied heavy metals are ubiquitous within AEPS and the significantly high concentration of these metals reflect the contamination factor and $C_{deg}$, indicating soil contamination in AEPS with the nine heavy metals studied.

• Toxicological Research
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• 제25권3호
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• pp.125-131
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• 2009

Korea is representative of a country that consumes herbal medicines; most of the herbal medicines circulating in South Korea have been imported from developing countries in Southeast Asia, such as China and Indonesia. Recently, domestic hygiene and safety are issues that have come to the forefront, because herbal medicines currently in circulation could possibly contain contaminants or residues. Furthermore, the appearance or discovery of harmful new species due to environmental and industrial developments is becoming a social problem. Therefore, it may be necessary to consider and investigate these matters on a continual basis. Recently, mycotoxin contaminations in such foods as cereals, nuts, and powdered red pepper have been reported. They have become a problematic issue; the possibility of contamination in herbal medicines has also been considered. Nevertheless, recognition of and research into mycotoxin contamination in herbal medicines has been scarce because herbal medicine is used in only a few nations. In this research, we identified contamination by aflatoxin which is known to be the most potent mutagenic, carcinogenic, and teratogenic mycotoxin in Thujae Semen, a herbal medicine. We also found co-contaminations involving other mycotoxins, including ochratoxin A and zeraleanone.

• Journal of Radiation Protection and Research
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• 제38권4호
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• pp.242-245
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• 2013

원전 방사선작업종사자의 내부선량평가를 위해 일반적으로 사용되고 있는 bed type 전신계측에 몬테카를로 방법을 적용하여 작업자에 대한 외부오염 계측특성을 평가하였다. 한국인 체형을 반영하는 voxel 모의 피폭체를 이용하여 내부오염시 측정 특성을 평가하였다. 외부오염 판별을 위해 BOMAB 모의 피폭체를 이용하여 신체 각 부위별 오염시 나타나는 측정 특성을 평가하였다. 가슴 부위 오염시 누운 자세와 엎드린 자세로 구분하여 외부오염시 계측 특성을 확인하였다. 정량적인 분석을 통해 bed type 전신계측기를 이용한 외부오염 판별이 가능함을 확인하였다.

• 한국진공학회지
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• 제6권1호
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• pp.1-8
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• 1997

SUS 316 합금의 노출 조건에 따른 오염 과정과 구조를 x-ray photoelectron spectroscopy실험을 통해 보았다. SUS표면에 부착된 오염 물질은 주로 metal-oxide, metal-H-oxide, CO, COH, 그리고 CxHy임을 보았다. 오염 물질의 층별 형성 구조는 $C_xH_y$/CO(COH)/metal-H-oxide/metal-oxide가 SUS합금 위에 있는 형태이다. 오염 과정은 주로 금속 구성물의 산화와 $C_xH_y$의 흡착과정 두 가지에 의해서 이루어지는 것을 볼 수 있 었다. 초고진공 환경에서는, 오염은 주로 산화층 형성에 의한 것으로 노출 시간이 증가함에 따라 산화층의 두께가 계속 증가하였다. 고진공 또는 높은 압력 환경에서는 노출 초기에 대 부분의 산화층이 형성되고, 노출 시간의 증가에 대해서는 주로 $C_xH_y$에 의한 오염이 계속 증 가하였다. 스테인레스 표면 안에 깊이 분포하고 있는 metal-oxide의 농도는 지수형으로 감 소하는 형태의 분포를 가지며 그 두께는 대기 노출된 시료의 경우 광전자의 평균자유행로 규모로 형성되는 것을 보았고, 특히 Fe-oside가 Cr-oxide를 덮고 있는 표면 편석 현상이 보 였다.

• 전자공학회논문지A
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• 제30A권11호
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• pp.99-104
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• 1993

We analyzed the D.I. water used in wet cleaning process of semiconductor device manufacturing both at the D.I. water plant and at the wafer cleaning bath to detect the impurity source of D.I. water contamination. This shows that the quantity of impurity is related to the resistivity of D.I. water, and we found that the cleanliness of the wafer surface processed in D.I. water bath was affected by the degree of the ionic impurity contamination. So we evaluated the cleaning effect as different method for Fe ion, having the best adsoptivity on wafer surface. Moreover the temperature effect of the D.I. water is investigated in case of anion in order to remove the chemical residue after wet process. In addition to the control of D.I. water resistivity, chemical analysis of impurity control in D.I. water should be included and a suitable cleaning an drinsing method needs to be investigated for a high yielding semiconductor device.

• 한국수소및신에너지학회논문집
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• 제19권4호
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• pp.291-298
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• 2008

Carbon monoxide(CO) is one of the contamination source in reformed hydrogen fuel with an influence on performance of polymer electrolyte membrane fuel cell(PEMFC). The studies of CO injection presented here give information about poisoning and recovery processes. The aim of this research is to investigate cell performance decline due to carbon monoxide impurity in hydrogen. Performance of PEM fuel cell was investigated using current vs. potential experiment, long time(10 hours) test, cyclic feeding test and electrochemical impedance spectra. The concentrations of carbon monoxide were changed up to 10 ppm. Performance degradation due to carbon monoxide contamination in anode fuel was observed at high concentration of carbon monoxide. The CO gas showed influence on the charge transfer reaction. The performance recovery was confirmed in long time test when pure hydrogen was provided for 1 hour after carbon monoxide had been supplied. The result of this study could be used as a basis of various reformation process design and fuel quality determination.

• 한국산업보건학회지
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• 제25권2호
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• pp.202-210
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• 2015

Objectives: The purpose of this study was to examine clean room(C/R) structure, air conditioning and contamination control systems and to provide basic information for identifying a correlation between the semiconductor work environment and workers' disease. Methods: This study was conducted at 200 mm and 300 mm semiconductor wafer fabrication facilities. The C/R structure and air conditioning method were investigated using basic engineering data from documentation for C/R construction. Furthermore, contamination parameters such as airborne particles, temperature, humidity, acids, ammonia, organic compounds, and vibration in the C/R were based on the International Technology Roadmap for Semiconductors(ITRS). The properties of contamination control systems and the current status of monitoring of various contaminants in the C/R were investigated. Results: 200 mm and 300 mm wafer fabrication facilities were divided into fab(C/R) and sub fab(Plenum), and fab, clean sub fab and facility sub fab, respectively. Fresh air(FA) is supplied in the plenum or clean sub fab by the outdoor air handling unit system which purifies outdoor air. FA supply or contaminated indoor air ventilation rates in the 200 mm and 300 mm wafer fabrication facilities are approximately 10-25%. Furthermore, semiconductor clean rooms strictly controlled airborne particles(${\leq}1,000{\sharp}/ft^3$), temperature($23{\pm}0.5^{\circ}C$), humidity($45{\pm}5%$), air velocity(0.4 m/s), air change(60-80 cycles/hr), vibration(${\leq}1cm/s^2$), and differential pressure(atmospheric pressure$+1.0-2.5mmH_2O$) through air handling and contamination control systems. In addition, acids, alkali and ozone are managed at less than internal criteria by chemical filters. Conclusions: Semiconductor clean rooms can be a pleasant environment for workers as well as semiconductor devices. However, based on the precautionary principle, it may be necessary to continuously improve semiconductor processes and the work environment.