• 한국환경보건학회지
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• 제43권2호
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• pp.143-156
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• 2017

The purpose of this study was to investigate water quality through a field survey at six floor fountain sites. The floor fountain facilities were designed and operated in such a way that tap water was stored in a water tank and recycled repeatedly. The water tank was cleaned once or twice per week in the summer. The number of facility users was low during the day due to sweltering heat, but up to 40 people, mainly children, were using them around 8 pm. Since the operation time was as short as 30 minutes, it is considered necessary to extend it for at least one hour for the number of users. As a result of the water quality test of the reservoir tank prior to operation after cleaning, it was measured to be within drinking water quality standards at the six facilities. As a result of the water quality test after use, ammonia nitrogen was measured to be 1.45 mg/L at Site IV. This exceeded the drinking water quality standard of 0.5 mg/L. In the case of turbidity, two cases exceed at 7.38 and 4.52 NTU when applying 4 NTU as the water quality standard for waterscape facilities. Twenty-eight cases exceed the standard of drinking water quality. The result of microbiological tests, at five sites excepting Site I, where disinfectant was injected, was that the maximum total colony count was 180,000 CFU/mL, total coliforms was 2,100,000 CFU/100 mL, fecal coliforms was 4,600 CFU/100 mL, Escherichia coli was 170 MPN/100 mL and Enterococcus was 100 CFU/100 mL. This exceeded the water quality standards of drinking water. Children are very likely to inhale because the water spews from below and falls from above, so it is necessary to apply water quality standards for ammonia nitrogen, turbidity and microbes. Current floor fountain facilities are highly susceptible to disease caused by microbial contamination because of water cycling and reuse, so it is necessary to change the water every day, clean the water tank, and perform chlorination. Therefore, it is necessary to inject calcium hypochlorite according to the free chlorine water quality standard of swimming pools with a different water tank capacity. In addition, facilities should be improved to prevent the reuse of water by installing the water tank at a separate location.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 1999년도 추계학술발표회 초록집
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• pp.15-15
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• 1999

In chip plating, several parameters must be taken into consideration. Current density, solution concentration, pH, solution temperature, components volume, chip and media ratio, barrel geometrical shape were most likely found to have an effect to the process yields. The 3 types of barrels utilized in chip plating industry are the conventional rotating barrel. vibrational barrel (vibarrel), and the centrifugal type. Conventional rotating barrel is a close type and is commonly used. The components inside the barrel are circulated by the barrel's rotation at a horizontal axis. Process yield has known to have higher thickness deviation. The vibrational barrel is an open type which offers a wide exposure to electrolyte resulting to a stable thickness deviation. It rotates in a vertical axis coupled with multi-vibration action to facilitate mixed up and easy transportation of components, The centrifugal barrel has its plated work centrifugally compacted against the cathode ring for superior electrical contact with simultaneous rotary motion. This experiment has determined the effect of barrel vibration intensity to the plating thickness distribution. The procedures carried out in the experiment involved the overall plating process., cleaning, rinse, Nickel plating, Tin-Lead plating. Plating time was adjusted to meet the required specification. All other parameters were maintained constant. Two trials were performed to confirm the consistency of the result. The thickness data of the experiment conducted showed that the average mean value obtained from higher vibrational intensity is nearer to the standard mean. The distribution curve shown has a narrower specification limits and it has a reduced variation around the target value, Generally, intensity control in vi-barrel facilitates mixed up and easy transportation of components, However, it is desirable to maintain an optimum vibration intensity to prevent solution intrusion into the chips' internal electrode. A cathodic reaction can occur in the interface of the external and internal electrode. $2HD{\;}+{\;}e{\;}{\rightarrow}20H{\;}+{\;}H_2$ Hydrogen can penetrate into the body and create pressure which can cause cracks. At high intensity, the chip's motion becomes stronger, its contact between each other is delayed and so plating action is being controlled. However, the strong impact created by its collision can damage the external electrode's structure thereby resulting to bad plating condition. 1 lot of chip was divided into two equal partion. Each portion was loaded to the same barrel one after the other. Nickel plating and tin-lead plating was performed in the same station. Portion A maintained the normal barrel vibration intensity and portion B vibration intensity was increased two steps higher. All other parameters, current, solution condition were maintained constant. Generally, plating method find procedures were carried out in a best way to maintained the best plating condition. After plating, samples were taken out from each portion. molded and polished. Plating thickness was investigated for both. To check consistency of results. 2nd trial was done now using different lot of another characteristics.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.204-205
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• 2011

In thin film silicon solar cells, p-i-n structure is adopted instead of p/n junction structure as in wafer-based Si solar cells. PECVD is a most widely used thin film deposition process for a-Si:H or ${\mu}c$-Si:H solar cells. For best performance of thin film silicon solar cell, the dopant profiles at p/i and i/n interfaces need to be as sharp as possible. The sharpness of dopant profiles can easily achieved when using multi-chamber PECVD equipment, in which each layer is deposited in separate chamber. However, in a single-chamber PECVD system, doped and intrinsic layers are deposited in one plasma chamber, which inevitably impedes sharp dopant profiles at the interfaces due to the contamination from previous deposition process. The cross-contamination between layers is a serious drawback of a single-chamber PECVD system in spite of the advantage of lower initial investment cost for the equipment. In order to resolve the cross-contamination problem in single-chamber PECVD systems, flushing method of the chamber with NH3 gas or water vapor after doped layer deposition process has been used. In this study, a new plasma process to solve the cross-contamination problem in a single-chamber PECVD system was suggested. A single-chamber VHF-PECVD system was used for superstrate type p-i-n a-Si:H solar cell manufacturing on Asahi-type U FTO glass. A 80 MHz and 20 watts of pulsed RF power was applied to the parallel plate RF cathode at the frequency of 10 kHz and 80% duty ratio. A mixture gas of Ar, H2 and SiH4 was used for i-layer deposition and the deposition pressure was 0.4 Torr. For p and n layer deposition, B2H6 and PH3 was used as doping gas, respectively. The deposition temperature was $250^{\circ}C$ and the total p-i-n layer thickness was about $3500{\AA}$. In order to remove the deposited B inside of the vacuum chamber during p-layer deposition, a high pulsed RF power of about 80 W was applied right after p-layer deposition without SiH4 gas, which is followed by i-layer and n-layer deposition. Finally, Ag was deposited as top electrode. The best initial solar cell efficiency of 9.5 % for test cell area of 0.2 $cm^2$ could be achieved by applying the in-situ plasma cleaning method. The dependence on RF power and treatment time was investigated along with the SIMS analysis of the p-i interface for boron profiles.

• 한국에너지공학회:학술대회논문집
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• 한국에너지공학회 1996년도 춘계학술발표회 초록집
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• pp.57-64
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• 1996

석탄중에는 미량원소(trace elements)가 포함되어 있으며 이들의 농도는 석탄의 종류나 산지에 따라 크게 다르다. 석탄중의 미량원소를 제거하는 것은 그동안 크게 문제가 되지 않았으나 최근 환경문제가 점차 고조되면서 이에 대한 관심이 높아지고 있다. 일반적으로 사람의 건강 및 환경에 유해한 원소중에서 화석연료 사용과 관련이 있는 원소는 비소(As), 카드늄(Cd), 납(Pb), 구리(Cu), 수은(Hg), 니켈(Ni), 셀레니움(Se) 및 아연(Zn) 등 8개 원소이다. 그러나 그외에도 배출규제의 대상이 되는 원소는 코발트(Co), 염소(Cl), 안티모니(Sb), 베릴리움(Be), 크롬(Cr)과 망간(Mn)이며 이중 망간은 석탄사용과 직접적인 관련이 있다. 따라서 Mn을 포함한 9개 원소가 석탄의 사용에 따른 중금속 방출과 관련이 있는 것으로 간주되고 있다. 본 연구에서는 발전용 석탄에 대한 물리적 전처리 공정을 적용하여 석탄중의 광물질등을 미리 제거하므로서 연소 후 배출되는 배기가스중의 중금속 저감 가능성을 관찰하였다. 본 연구결과 전처리 공정의 석탄중의 Trace elements양을 감소시키므로서 연소 후 중금속의 배출량을 크게 줄일 수 있음을 확인하였다. 발전소에 적용하고 있는 ESP가 배출가스중 As, Cu, Zn, Mn등의 중금속을 제거하는데 효율적이기는 하나 가스상으로 존재하는 Hg, Se등을 제거하는데는 효율적이지 못하다. 전처리공정 전후 회분중에 함유된 미량원소를 분석한 결과, 국내 무연탄이나 해외 유연탄 모두 중금속 제거에 있어서 유사한 경향을 보여주었으며, Pb, Zn, Mn 등은 50∼70%, 특히 Hg 배출량은 80% 이상 저감이 가능하였다. 전반적으로 년간 총 중금속 배출량도 50∼60%가 감소하여 전처리 공정이 석탄중의 중금속을 줄이는데 크게 기여함을 확인하였다.을 선택할 수 있는 메뉴 그리고 계산 결과를 파일로 혹은 프린트로 출력할 것을 선택할 수 있는 메뉴가 있다. 사용자는 해당되는 데이타를 입력한후 마우스로 원하는 작업의 메뉴를 선택하면 된다. 방법을 타액과 혈청내 testosterone 농도 측정에 응용하여 RIA의 결과와 비교하여 본 바 상관관계가 타액에서 r=0.969, 혈청에서 r=0.990으로 두 결과가 잘 일치하였다. 본 실험에서 측정된 한국인 여성의 타액내 testosterone농도는 107.7$\pm$12.0 pmol／l이었고, 남성의 타액내 농도는 274.2$\pm$22.1 pmol／l이었다. 이상의 결과로 보아 본 연구에서 정립된 EIA 방법은 RIA를 대신하여 소규모의 실험실에서도 활용할 수 있을 것으로 사려된다.또한 상실기 이후 배아에서 합성되며, 발생시기에 따라 그 영향이 다르고 팽창과 부화에 관여하는 것으로 사료된다. 더욱이, 조선의 ${\ulcorner}$구성교육${\lrcorner}$이 조선총독부의 관리하에서 실행되었다는 것을, 당시의 사범학교를 중심으로 한 교육조직을 기술한 문헌에 의해 규명시켰다.nd of letter design which represents -natural objects and was popular at the time of Yukjo Dynasty, and there are some documents of that period left both in Japan and Korea. "Hyojedo" in Korea is supposed to have been influenced by the letter design. Asite- is also considered to have been "Japanese Letter Jobcheso.

• 대한치과보철학회지
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• 제44권3호
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• pp.284-294
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• 2006

Statement of problem. Proliferation of Candida albicans is primarily within the plaque on the fitting surface of the denture rather than on the inflamed mucosa. Consequently, the treatment of the denture is equally important as treatment of the tissue. Cleansing and disinfection should be efficiently carried-out as the organisms can penetrate into the voids of the acrylic resin and grow in them, from which they can continue to infect and reinfect bearing tissues. Purpose. The purpose of this study was to evaluate the applicability of photocatalytic reaction to eliminate Candida albicans from acrylic resin denture base, and to investigate the anti-fungal effect with various UVA illumination time. Materials and Methods. The specimens were cured by the conventional method following the manufacturer's instruction using thermal polymerized denture base resin (Vertex RS: Dentimex, Netherlands). $TiO_2$ photocatalyst sol(LT), which is able to be coated at normal temperature, was made from the Ti-alkoxide progenitor. The XRD patterns, TEM images and nitrogen absorption ability of the $TiO_2$ photocatalyst sol(LT) were compared with the commercial $TiO_2$ photocatalyst P-25. The experimental specimens were coated with the mixture of the $TiO_2$ photocatalyst sol(LT) and binder material (silane) using dip-coater, and uncoated resin plates were used as the control group. Crystallinity of $TiO_2$ of the specimen was tested by the XRD. Size, shape and chemical compositions were also analyzed using the FE-SEM/ EDS. The angle and methylene blue degradation efsciency were measured for evaluating the photocatalytic activity of the $TiO_2$ film. Finally, the antifungal activity of the specimen was tested. Candida albicans KCTC 7629(1 ml, initial concentration $10^5$ cells/ ml) were applied to the experiment and control group specimens and subsequently two UVA light source with 10W, 353 nm peak emission were illuminated to the specimens from 15cm above. The extracted $2{\mu}l$ of sample was plated on nutrient agar plate ($Bacto^{TM}$ Brain Heart Infusion; BD, USA) with 10 minute intervals for 120 minute, respectively. It was incubated for 24 hours at $37^{\circ}C$ and the colony forming units (CFUs) were then counted. Results. Compared the characteristics of LT photocatalyst with commercial P-25 photocatalyst, LT were shown higher activity than P-25. The LT coated experimental specimen surface had anatase crystal form, less than 20 nm of particle size and wide specific surface area. To evaluate the photocatalytic activity of specimens, methylene blue degradation reaction were used and about 5% of degradation rate were measured after 2 hours. The average contact angle was less than $20^{\circ}$ indicating that the LT photocatalyst had hydrophilicity. In the antifungal activity test for Candida albicans, 0% survival rate were measured within 30 minute after irradiation of UVA light. Conclusion. From the results reported above, it is concluded that the UVA-LT photocatalytic reaction have an antifungal effect on the denture surface Candida albicans, and so that could be applicable to the clinical use as a cleaning method.

• 대한소아치과학회지
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• 제30권4호
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• pp.678-683
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• 2003

유아기 우식증의 새로운 정의와 진단기준을 적용하여, 익산시 3-5세 취학전 어린이 612명을 대상으로 중증 유아기 우식증의 유병률을 조사하고, 질문지 조사를 통하여 중증 유아기 우식증의 위험요인을 함께 조사하였다. 어린이들의 상악 유전치의 순면과 설면 및 인접면을 검사하고, 6개의 상악 유전치 중에서 한 개 이상의 우식와동이 있거나 우식으로 인해 상실되었거나 충전된 평활면이 있는 경우에 중증 유아기 우식증에 이환된 것으로 진단하였다. 중증 유아기 우식증의 유병률은 36-47개월이 20.8%, 48-59개월이 23.6%, 60-71개월이 30.8%이었고, 남아가 27.8%, 여아가 25.0%이었다. 재우기 위한 목적으로 수유한 경우의 유병률은 33.0%로서 그렇지 않은 경우의 23.0%보다 높았으며 유의한 상관성이 있었다(P<0.05). 잠든 후 수유를 즉시 중단한 경우의 유병률은 28.6%로서 그렇지 않은 경우의 66.7%보다 낮았으며, 유의한 상관성이 있었다(P<0.01). 어린이의 이를 닦기 시작한 시기에 따른 유병률은, 처음 이가 날 때가 21.5%, 앞니가 난 후가 25.2%, 어금니가 나는 중이 27.7%, 어금니가 난 후가 43.7%, 그 이후가 60.9%로서, 이를 닦기 시작한 나이가 늦어질수록 유병률이 증가하였으며, 유의한 상관성이 있었다(P<0.01). 주 보육자의 칫솔질 횟수가 규칙적인 경우의 유병률은 25.1%로서 불규칙한 경우의 34.0%보다 낮은 경향이 있었다(P<0.10). 주 보육자가 구강청결용품등을 사용하는 경우의 유병률은 21.8%로서 사용하지 않는 경우의 28.8%보다 낮은 경향이 있었다(P<0.10).

• 혜화의학회지
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• 제9권1호
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• pp.725-743
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• 2000

This study was intended to investigate the contents associated with the neuropsychosis in the medical books published in the times of Chinese dynasty of Jin and Yuan. As a result, the following findings were drawn. 1. As for palpitation from fright and severe palpitation, the medical schools in the times of Chinese Jin and Yuan dynasties viewed their causes as heart-fire, shuiqichengxin, blood vacuity, phlegm and so on and presented a prescription for each cause for them. 2. As for psychosis, medical books published in the times of Chinese Jin and Yuan dynasties accurately divided and discussed epilepsy and viewed their causes largely as Yangming heat, phlegm of chest and heart-fire. And a number of medical schools made use of such therapeutics as sweating, vomiting and diarrhea therapies. 3. As for headache, medical books published in the times of Chinese Jin and Yuan dynasties presented their causes as fire and heat, phlegm heat, phlegm and so on and classified the aspect of headache in detail. As for vacuity rexation and dysphoria, medical books at that time saw their causes as fire and heat, heart-fire, blood vacuity and so forth and presented a prescription for them accordingly. 4. Liu Wan Su was the Hanliang school. He viewed the etiological cause for psychopathy as fire and heat and prescribed largely the medication of cold nature for it. 5. Zhang Cong Zheng belonged to the Gongxia School. He viewed the etiological cause for psychopathy as fire, phlegm and so forth and made use of sweating, vomiting and diarrhea therapies. Especially, he used the 'Jingzhepingzhe' therapy as a method to treat the symptom of fright. 6. Li Gao did not any specific mention of psychopathy and divided headache due to internal injury and headache due to external contraction. 7. Zhu Zhen Heng viewed most of the etiological causes for psychopathy as phlegm, fire and deficiency of blood and attached importance to such its therapeutics as resolving phlegm, cleaning away fire and nourishing Yin. 8. Wang Hao Gu did not present the specifically common etiological cause and prescription for psychopathy but described the cause and prescription for headache, dysphoria, maniac speech, palpitation and so forth. Luo Tian Yi presented the process of psychosis due to abnormal therapy for cold demage and prescription of it. 9. Wang Lu made a detailed explanation about the therapeutics of five types of stagnated syndrome and said that stagnated syndrome became the major cause for them in the occurrence of such psychopathy. Wei Yi Lin presented the prescription and medication for comparatively diverse mental diseases such zhong-qi, severe palpitation, palpitation for fright, impaired memory, vacuity rexation, headache, psychosis.

• 융합정보논문지
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• 제10권8호
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• pp.223-228
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• 2020

본 연구는 사용 중인 칫솔의 관리법과 구강내 세균의 산생성도에 따른 칫솔의 세균량을 측정하여 비교한 후 올바른 칫솔 관리를 위한 교육자료를 개발하는데 기초자료로 제시하고자 한다. 건강한 20대 성인 50명의 1개월이상 사용 중인 칫솔을 수거하여 칫솔의 세균수와 pH를 측정하였다. 하루 칫솔질의 횟수가 4회인 경우 pH는 4.97로 가장 높았고 세균수는 42.16(104×CFU/ml)으로 가장 낮게 나타났으며 칫솔의 사용 교체 시기가 1개월인 경우 pH가 5.35로 가장 높았고 세균수는 19.80(104 × CFU/ml)로 가장 낮게 나타났다. 욕실에 보관한 경우 pH는 4.78로 가장 낮았고 세균수는 149.46(104 × CFU/ml) 가장 높게 나타났으며 유의한 차이가 있었다(p<0.01). 연구결과 칫솔의 세균을 차단하기 위해서는 가정에서 오염된 칫솔을 간단하게 살균할 수 있는 방법을 연구하고 개발해야 할 것이다. 또한 칫솔질 교육을 할 때 올바른 칫솔 세척 방법과 보관법에 대하여 교육을 할 필요가 있다고 생각된다.

• 대한화학회지
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• 제47권1호
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• pp.13-18
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• 2003

요(urine) 시료 중의 칼륨 이론을 전위차법으로 분석하기 위한 전처리 방법을 개발하기 위하여 초음파의 분해 효과를 이용하였다. $NH_4{^+}$의 농도가 상대적으로 높은 요 시료 속에서 첨가한 $K^+$에 대한 검정 곡선을 구하기 위하여 $NH_4{^+}$에 대한 $K^+$의 선택성이 좋은 N-(4'-benzo-15-crown-5)-anthracene-9-imine을 이온선택성 전극 물질로 사용하였다. 1.0M $HNO_3$으로 산성화시킨 요 시료를 초음파로 100 s 동안 전처리시키려면 요 중의 단백질을 85.1%까지 제거시킬 수 있었다. 이렇게 전처리된 시료에서 얻은 막전극의 감응 전위에 대한 기울기는 log [$K^+$]=-5~-1의 직선범위(r=0.9997)에서 54.6(${\pm}0.2,\;n=5$) mV/decade였다. $HNO_3$으로 초음파처리한 요 시료에 산화제인 $H_2O_2$를 첨가하면 $HNO_3$만으로 전처리시켰을 때보다 단백질 제거율이 10% 증가하여 최대 95%까지 제거되었다. 요 시료에 첨가한 $K^+$에 대한 감응 전위의 기울기 또한 56.7(${\pm}0.1,\;n=3$) mV/dacade로 증가하였다. 검정 곡선을 연속적으로 얻었을 때, 막전극 표면을 초음파로 세척하여 20회까지 안정한 감응 기울기를 얻을 수 있었다. 이 결과들로부터 초음파를 이용한 전처리법은 간단하고, 짧은 시간 내에 요 중의 단백질을 약 95%까지 제거시켜서 막전극의 감응 특성을 증진시킨 방법이었다.

• 한국습지학회지
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• 제17권4호
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• pp.325-331
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• 2015

불투수면의 증가와 도시화 현상은 지하수량의 감소, 지표수의 고갈, 홍수의 증가 등과 같은 자연적인 물순환 시스템에 변화를 가져왔다. 또한, 인간이 사용할 수 있는 수량의 감소 또한 초래하게 되었다. 이에 빗물의 적절한 처리와 재활용은 최근 발생되는 수문학적 문제의 해결에 도움이 될 수 있을 것으로 예상되어왔다. 따라서 본 연구는 지붕빗물유출수를 침투 및 저류 기작으로 처리하여 자연적인 물순환의 회복을 이루고자 침투화분 기술을 개발하였다. 연구결과, 침투화분 기술은 평균 79% 정도의 강우유출유량 저감효과가 있는 것으로 분석되었다. 또한 유출유량 지연효과 및 첨두유량 지연효과도 발생하였는데, 약 3시간의 유출지연효과와 38%의 유량 저감효과가 발생하는 것으로 나타났다. 한편, 침투화분의 오염물질 처리효율은 TSS 97%, BOD 및 CODcr 94%, TN 86%, TP 96%, Total Cu, Total Zn, Total Pb의 중금속은 약 93% 처리되었으며, 처리수의 오염물질 농도는 TSS 13.3mg/L, BOD 3.6mg/L, TN 4.7mg/L 및 TP 0.1mg/L로 분석되어 도시재이용수, 조경용수, 공업용수로서 사용이 가능할 것으로 분석되었다.