• 제목/요약/키워드: Cleaning Device

검색결과 164건 처리시간 0.034초

회전반사판을 이용한 건물 외벽청소로봇 개발방향 연구 (Fundamental Study of the Building Exterior wall cleaning Robot using a spinning device)

  • 박수열;김균태
    • 한국건축시공학회:학술대회논문집
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    • 한국건축시공학회 2013년도 추계 학술논문 발표대회
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    • pp.224-225
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    • 2013
  • Most of the building exterior wall cleaning robots use a water jet device for spraying water. However this method is sprayed excessive water usage than water quantity required for cleaning. And setting weight of the water pump cleaning device increase the weight of the building exterior wall cleaning robot. Therefor, this paper suggest that the mechanisms scatter minimal cleaning water using a spinning device of the building exterior wall cleaning robot.

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가이드레일형 유리창 청소 장치 개발의 타당성 분석 (Feasibility Study of the Development of Guiderail-type Window Cleaning Equipment)

  • 김균태;전영훈;신은영
    • 한국건축시공학회:학술대회논문집
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    • 한국건축시공학회 2016년도 춘계 학술논문 발표대회
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    • pp.85-86
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    • 2016
  • Recently, needs for the window cleaning for 2~5 stories in a building has been increased but existing window cleaning work by workers is not easy to clean the windows. Therefore a demand for development of alternative techniques have been raised. The purpose of this study is to analyze feasibility of development of the guide rail-type cleaning device for cleaning window for the lower stories. For this, we analyze the status of the job, such as risk, limitations of by workers and examine the potential producer needs through interviewing field experts of the cleaning work. Futhermore, we define the required features of the window cleaning device and proposed the validity of the relised device development of the function.

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Effect of Brush Treatment and Brush Contact Sequence on Cross Contaminated Defects during CMP in-situ Cleaning

  • Kim, Hong Jin
    • Tribology and Lubricants
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    • 제31권6호
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    • pp.239-244
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    • 2015
  • Chemical mechanical polishing (CMP) is one of the most important processes for enabling sub-14 nm semiconductor manufacturing. Moreover, post-CMP defect control is a key process parameter for the purpose of yield enhancement and device reliability. Due to the complexity of device with sub-14 nm node structure, CMP-induced defects need to be fixed in the CMP in-situ cleaning module instead of during post ex-situ wet cleaning. Therefore, post-CMP in-situ cleaning optimization and cleaning efficiency improvement play a pivotal role in post-CMP defect control. CMP in-situ cleaning module normally consists of megasonic and brush scrubber processes. And there has been an increasing effort for the optimization of cleaning chemistry and brush scrubber cleaning in the CMP cleaning module. Although there have been many studies conducted on improving particle removal efficiency by brush cleaning, these studies do not consider the effects of brush contamination. Depending on the process condition and brush condition, brush cross contamination effects significantly influence post-CMP cleaning defects. This study investigates brush cross contamination effects in the CMP in-situ cleaning module by conducting experiments using 300mm tetraethyl orthosilicate (TEOS) blanket wafers. This study also explores brush pre-treatment in the CMP tool and proposes recipe effects, and critical process parameters for optimized CMP in-situ cleaning process through experimental results.

차량 운전자의 공기오염물질 잠재적 노출 및 차량용 공기청정기에 의한 제어 (Potential Exposure to Air Pollutants for Driver and Its Control Using Commercial Air Cleaning Device Inside Vehicle)

  • 김대원;김문현;양원호
    • 한국환경보건학회지
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    • 제30권5호
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    • pp.481-486
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    • 2004
  • Vehicle occupant exposure to air pollutants has been a subject of concern in recent years because of higher levels of air pollutants inside gasoline or diesel-using vehicle, comparing to the surrounding atmosphere. Contrary to previous studies, fuel of vehicles operated in this study was liquefied petroleum gas (LPG). This study examined the potential exposure and removal efficiency of selected volatile organic compounds (VOCs), nitrogen dioxide ($NO_2$) and respirable suspended particle (RSP) by commercial air cleaning device inside vehicle under different ventilation conditions. Vehicle concentrations inside of benzene, toluene, m,p-xylene, $NO_2$ and RSP were lower under the low ventilation condition. This was indicated that outdoor air pollutants could affect the vehicle air quality inside in case metropolitan cities such as Daegu. The urban vehicle concentrations inside of benzene, toluene, m,p-xylene, $NO_2$ and RSP with air cleaning device were higher than those without air cleaning device. This means that the use of air cleaning device equipped with activated carbon filter, which was used in this study, in the interior of vehicles could be expected to reduce the vehicle occupants exposure to air pollutants effectively. In batch type reactor of laboratory scale, removal efficiencies of air cleaning device used were $97.0\%,\;95.7\%,\;94.6\%\;and\;85.5\%$ respectively in benzene, toluene, m,p-xylene and $NO_2$.

지하역사 덕트 청소로봇 기술동향 및 개발 (Development of a Duct Cleaning Robot and Technology Trends for Subway Stations)

  • 정우태;박덕신
    • 한국철도학회:학술대회논문집
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    • 한국철도학회 2011년도 정기총회 및 추계학술대회 논문집
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    • pp.1335-1341
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    • 2011
  • Conserving clean air and removing contaminants and particular matters accumulated in the ventilation system of the subway stations are key issue for green railway environment. There is no national guideline or industrial regulations to sustain clean duct and ventilation system, which requires rapid reformation of cleaning procedure and system. In fact, accumulated various particular matters and dusts can occur secondary air contamination and become a primary health harm factor for subway passengers. This study investigates various duct cleaning technologies and trends. In additon, effective cleaning method with an automated robot device is proposed. In particular, current dust cleaning technologies and duct cleaning robots are analyzed based on their functions and feasibilities. The proposed design of automated device is expected to save the operating cost of subway HVAC system and sustain clean air environment.

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유리창 외부 부착형 청소장치의 비상상황 시나리오 도출 (Emergency Scenarios of Rail-mounted Window Cleaning System)

  • 김균태;전영훈
    • 한국건축시공학회:학술대회논문집
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    • 한국건축시공학회 2019년도 춘계 학술논문 발표대회
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    • pp.244-245
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    • 2019
  • Recently, a variety of window cleaning devices have been developed. There are, however, few cases of anticipated problems and countermeasures that may arise after these devices are installed. Therefore, in this study, the emergency condition was derived and the emergency scenario was derived for the rail-mounted cleaning device. Emergency scenarios and countermeasures derived from this study will be used for continuous improvement and supplementation of cleaning devices through prototyping and testing.

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건축물에 설치된 태양광발전설비를 위한 세척장치의 편익-비용 분석 (An Benefit-cost Analysis of the Cleaning Device for Photovoltaic Power Generation Systems in Buildings)

  • 김재엽;원종성
    • 한국건축시공학회지
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    • 제16권6호
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    • pp.587-594
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    • 2016
  • 본 연구에서는 개발 중인 초음파 기술을 적용한 태양광발전설비 세척 장치의 경제성 분석을 위하여 AHP 편익-비용을 분석하였다. 초음파 기술을 적용한 태양광발전설비 세척장치와 유사한 특성을 가지며, 국내에서 널리 사용되고 있는 태양광발전설비 세척 장치를 비교 대상으로 선정하여 상대적인 편익-비용 분석 값을 비교하였다. 두 비교 대상의 편익, 비용을 정량적, 정성적으로 분석하기 위하여 각각의 측면의 상위계층과 하위평가항목을 도출하고, 하위 평가항목에 대한 평가기준을 도출하였다. 도출된 평가기준을 기반으로 15인의 전문가 인터뷰를 수행함으로써 두 비교 대상의 편익, 비용 가중치를 계산하였다. 분석 결과, 초음파를 사용한 태양광발전설비의 편익-비용 분석 값은 1이상으로 비용대비 이익이 더 높을 것으로 예상되었고, 비교 대상의 편익-비용 분석 값보다 약 1.6배 높았다. 이는 경제적인 측면에서 초음파를 적용한 태양광발전설비 세척 장치의 개발 가치가 있다는 것은 의미한다.

전리수를 이용한 반도체 세정 공정 (Electrolyzed Water Cleaning for Semiconductor Manufacturing)

  • 류근걸;김우혁;이윤배;이종권
    • 반도체디스플레이기술학회지
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    • 제2권3호
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    • pp.1-6
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    • 2003
  • In the rapid changes of the semiconductor manufacturing technologies for early 21st century, it may be safely said that a kernel of terms is the size increase of Si wafer and the size decrease of semiconductor devices. As the size of Si wafers increases and semiconductor device is miniaturized, the units of cleaning processes increase. A present cleaning technology is based upon RCA cleaning which consumes vast chemicals and ultra pure water (UPW) and is the high temperature process. Therefore, this technology gives rise to environmental issue. To resolve this matter, candidates of advanced cleaning processes have been studied. One of them is to apply the electrolyzed water. In this work, electrolyzed water cleaning was compared with various chemical cleaning, using Si wafer surfaces by changing cleaning temperature and cleaning time, and especially, concentrating upon the contact angle. It was observed that contact angle on surface treated with Electrolyzed water cleaning was $4.4^{\circ}$ without RCA cleaning. Amine series additive of high pKa (negative logarithm of the acidity constant) was used to observe the property changes of cathode water.

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