• 제목/요약/키워드: Chromium plating

검색결과 107건 처리시간 0.026초

Removal of Chromium by Activated Carbon Fibers Plated with Copper Metal

  • Park, Soo-Jin;Jung, Woo-Young
    • Carbon letters
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    • 제2권1호
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    • pp.15-21
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    • 2001
  • In this work, activated carbon fibers (ACFs) were plated with copper metal using electroless plating method and the effects of surface properties and pore structures on chromium adsorption properties were investigated. Surface properties of ACFs have been characterized using pH and acid/base values. BET data with $N_2$ adsorption were used to obtain the structural parameters of ACFs. The electroless copper plating did significantly lead to a decrease in the surface acidity or to an increase in the surface basicity of ACFs. However, all of the samples possessed a well-developed micropore. The adsorption capacity of Cr(III) for the electroless Cu-plated ACFs was higher than that of the as-received, whereas the adsorption capacity of Cr(VI) for the former was lower than that of the latter. The adsorption rate constants ($K_1$, $K_2$, and $K_3$) were also evaluated from chromium adsorption isotherms. It was found that $K_1$ constant for Cr(III) adsorption depended largely on surface basicity. The increase of Cr(III) adsorption and the decrease of Cr(VI) adsorption were attributed to the formation of metal oxides on ACFs, resulting in increasing the surface basicity.

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크롬계 이중도금층 제조 및 특성평가 (Fabrication of Chromium-based Double Layered Deposit)

  • 박상언;김동수;김만;장도연;권식철
    • 연구논문집
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    • 통권31호
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    • pp.127-133
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    • 2001
  • In chromium electrodeposition, crack is inevitably accompanied by chromium layer. Behavior of crack formation and crack density were different from the plating conditions such as current density, temperature, waveform of applied current and so on. And cracks have an influence on the corrosion resistance of chromium deposit, because corrosion occurs through the network of cracks between deposit and substrate. Therefore, many researches have been achieved in order to remove the cracks in chromium deposit. Formation of double layers, Cr/Cr and Ni/Cr were investigated to increase corrosion resistance of chromium deposit in this study. As pretreatment prior to outer chromium coating, acid pickling and current control method were examined. Cracks in cross-section of each sample were observed with SEM and CASS(Copper modified acetic acid salt spray) test was performed to evaluate corrosion resistance. It was found that corrosion resistance of Cr/Cr and Ni/Cr double layers were superior to Cr or Ni single layer from the results of CASS test.

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크롬 전착층의 표면광택에 미치는 펄스도금의 영향 (The Effects of Pulse Current on the Surface Appearance of Chromium Plating)

  • 한성호;권식철;여운관
    • 한국표면공학회지
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    • 제14권4호
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    • pp.215-220
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    • 1981
  • The surface appearance of chromium electrodeposit was studied by employing a pulse curr-ent plating in self-regulating high speed (SRHS) bath containing 20 g/$\ell$, K2SiF6 7.5 g/$\ell$ SrSO4 and 250 g/$\ell$ CrO3. As the pulse frequency increased, the surface appearance changed suddenly from bright a-ppearance in a direct current plating condition to gray one in the range of pulse frequency less than about 20KHz. However the bright appearance is recovered as the pulse frequen-cy exceeded 20 KHz. This phenomena seemed to be related with the preferred orientation of electrodeposits, considering the relationship between the preferred orientation of elect-rodeposits and surface appearance in a SRHS bath. Direct current plating was also applied to both Sargent and SRHS bath and investigat-ion on surface appearance was extended to the high current density of 400 A/dm2. In a Sa-rgent bath, the increase in bath temperature was necessary for bright appearance as the current density was increased within 150 A/dm2, but bright region was shown in the cons-tant temperature of 70-75$^{\circ}C$ above the current density of 150A/dm2. On the other hand, two regions of surface brightness was found in a SRHS bath. One is region in the low temperature less than 25$^{\circ}C$ and the other in the moderate temperature range from 55$^{\circ}C$ to 65$^{\circ}C$.

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도금업체 공정별 근로자의 총크롬 및 6가 크롬 노출 평가 (Worker Exposure Assessment on Airborne Total Chromium and Hexavalent Chromium by Process in Electroplating Factories)

  • 이광용;김부욱;신용철
    • 한국산업보건학회지
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    • 제25권1호
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    • pp.89-94
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    • 2015
  • Objectives: The objective of this study was to determine characteristics of workers' exposures to airborne total and hexavalent chromium by job title in electroplating processes. Methods: Total Cr was determined through a modified method based on NIOSH Method 7024. Airborne hexavalent Cr, Cr(VI), was sampled and extracted according to NIOSH Method 7600 and analyzed at 520 nm using an ion chromatograph/visible detector. Results: The geometric mean(GM) of total Cr concentrations from all factories was $11.2{\mu}g/m^3$(GSD=4.9). The GM of Cr(VI) concentrations from all factories was $2.84{\mu}g/m$ (GSD=5.2), and the concentrations among factories were significantly different (p<0.05). The Cr(VI) levels were lower than total Cr levels. Total Cr exposure levels were highest among buffing workers ($21.6{\mu}g/m^3$), but Cr(VI) levels were highest among plating workers($4.15{\mu}g/m^3$). The concentrations of Cr(VI) and total Cr from plating tasks was highly correlated(r=0.91). Conclusions: In the electroplating industry, plating workers were mainly exposed to Cr(VI), but others were not. Oxidation-reduction states of Cr and job titles should be considered in the exposure or risk assessments of chrome electroplating factories.

Plasma Aided Process As Alternative to Hard Chromium Electroplating

  • Kwon, Sik-Chol;Lee, K.H.;Kim, J.K.;Kim, M.;Lee, G.H.;Nam, K.S.;Kim, D.;Chang, D.Y.
    • 한국표면공학회지
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    • 제36권1호
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    • pp.48-58
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    • 2003
  • This paper will present an overview of toxicity of hexavalent chromium as well as effort for its replacement by a wide spectrum of alternative materials and technologies. Cr-based materials such as trivalent electrodeposit will be one of strong candidates for hard chromium by surface modification of its surface hardness. Ni-base alloy deposits has proved its application in specific mold for glass. HVOF has been studied in aircraft and military sector. There are still under way of development for commercially available alternatives. To date, no single coating has been identified as universal process as comparable to conventional hard chromium electroplating.

흐름계를 이용한 크롬도금 용액의 Cr(Ⅲ)와 Cr(Ⅵ)의 분광학적 동시 분석 방법 (Simultaneous Spectrophotometric Determination of Cr(Ⅲ) and Cr(Ⅳ) in Chromium Plating Solution via Flow-Through Analysis)

  • 김선관;남학현;소재춘;이원;차근식;한상현
    • 대한화학회지
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    • 제39권2호
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    • pp.87-93
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    • 1995
  • 크롬도금 용액에 공존하고 있는 Cr(III)와 Cr(VI)의 양을 자외선/가시광선 분광기에 장착한 흐름계 장치를 이용하여 시료당 5분 이내에 두 가지 물질의 양을 동시에 분석하는 방법을 개발하였다. Cr(III)와 Cr(VI)는 각각 580 nm와 440 nm에서 0.05 g/L와 0.005 g/L 이상의 범위에서 Beer-Lambert 법칙에 따르는 특성 ${\lambda}_{max}$를 나타내며, 이 파장들에서의 흡광도는 pH<4의 조건에서는 pH변화에 거의 영향을 받지 않았다. 따라서 일반적으로 크롬의 농도가 수 g/L인 후처리 크롬 도금조의 용액을 흐름계의 장치에서 pH=1의 황산 용액으로 묽힌 후, 자외선/가시광선 분광기로 측정하면 Cr(III)와 Cr(VI)의 양 및 총 크롬의 양을 기존의 산화-환원 적정 방법(최소 40분/sample)보다 간편하고 신속정확하게 동시 정량할 수 있었다. 이 장치는 설치 및 사용이 간단하고, 설치 비용이 저렴하므로 많은 도금 산업 현장에서 용이하게 응용할 수 있다.

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3가 크롬 박막 내의 극미세 결함 측정을 위한 중성자 소각 산란법의 적용 (Application of Small Angle Neutron Scattering to Determine Nano-size Cracks in Trivlent Chromium Layers)

  • 최용
    • 한국표면공학회지
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    • 제37권3호
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    • pp.175-178
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    • 2004
  • The size and number of nano-size defects of thin trivalent chrome layers were determined by small angle neutron scattering (SANS) without breaking the thin chrome layers. Most of defect size of the trivalent chromium prepared in this test conditions is in the range of about 40nm. The number of nano-size defects less than about 40nm of the trivalent chromium layer increases with plating voltage at constant current density From this study, SANS is proved as one of useful techniques to evaluate nano-size defects of thin film layer.

경질용 3가 크롬전착에 미치는 전해조건의 영향 (Effect of Electrolysis Conditions on Hard Chromium Deposition from Trivalent Chromium Bath)

  • 김대영;박상언;김만;권식철;최주원;최용
    • 한국표면공학회지
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    • 제36권2호
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    • pp.155-160
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    • 2003
  • The effect of the temperature, current density and deposit time on hard chromium deposition in trivalent chromium bath was investigated. Cathode current efficiency increased with increasing current density. Increasing bath temperature from $20^{\circ}C$ to $50^{\circ}C$, chromium deposits were produced in higher current density and the maximum current efficiency was increased. At the plating conditions of $40^{\circ}C$, $30A/dm\m^2$, the deposition thickness increased in proportion to increasing electrolysis time The rate is$ 90\mu\textrm{m}$/hrs. for 2 hours. Microhardness of chromium deposits increased with increasing bath temperature and decreasing current density, and it was constant with electrolysis time. All of bath conditions, microstructure of chromium deposits has nodular structure with some cracking pattern and nodule size increased with increasing deposit thickness.