• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2007.11a
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• pp.2-2
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• 2007

• Carbon letters
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• v.2 no.1
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• pp.15-21
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• 2001

In this work, activated carbon fibers (ACFs) were plated with copper metal using electroless plating method and the effects of surface properties and pore structures on chromium adsorption properties were investigated. Surface properties of ACFs have been characterized using pH and acid/base values. BET data with $N_2$ adsorption were used to obtain the structural parameters of ACFs. The electroless copper plating did significantly lead to a decrease in the surface acidity or to an increase in the surface basicity of ACFs. However, all of the samples possessed a well-developed micropore. The adsorption capacity of Cr(III) for the electroless Cu-plated ACFs was higher than that of the as-received, whereas the adsorption capacity of Cr(VI) for the former was lower than that of the latter. The adsorption rate constants ($K_1$, $K_2$, and $K_3$) were also evaluated from chromium adsorption isotherms. It was found that $K_1$ constant for Cr(III) adsorption depended largely on surface basicity. The increase of Cr(III) adsorption and the decrease of Cr(VI) adsorption were attributed to the formation of metal oxides on ACFs, resulting in increasing the surface basicity.

• 연구논문집
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• s.31
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• pp.127-133
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• 2001

In chromium electrodeposition, crack is inevitably accompanied by chromium layer. Behavior of crack formation and crack density were different from the plating conditions such as current density, temperature, waveform of applied current and so on. And cracks have an influence on the corrosion resistance of chromium deposit, because corrosion occurs through the network of cracks between deposit and substrate. Therefore, many researches have been achieved in order to remove the cracks in chromium deposit. Formation of double layers, Cr/Cr and Ni/Cr were investigated to increase corrosion resistance of chromium deposit in this study. As pretreatment prior to outer chromium coating, acid pickling and current control method were examined. Cracks in cross-section of each sample were observed with SEM and CASS(Copper modified acetic acid salt spray) test was performed to evaluate corrosion resistance. It was found that corrosion resistance of Cr/Cr and Ni/Cr double layers were superior to Cr or Ni single layer from the results of CASS test.

• Journal of the Korean institute of surface engineering
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• v.14 no.4
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• pp.215-220
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• 1981

The surface appearance of chromium electrodeposit was studied by employing a pulse curr-ent plating in self-regulating high speed (SRHS) bath containing 20 g/$\ell$, K2SiF6 7.5 g/$\ell$ SrSO4 and 250 g/$\ell$ CrO3. As the pulse frequency increased, the surface appearance changed suddenly from bright a-ppearance in a direct current plating condition to gray one in the range of pulse frequency less than about 20KHz. However the bright appearance is recovered as the pulse frequen-cy exceeded 20 KHz. This phenomena seemed to be related with the preferred orientation of electrodeposits, considering the relationship between the preferred orientation of elect-rodeposits and surface appearance in a SRHS bath. Direct current plating was also applied to both Sargent and SRHS bath and investigat-ion on surface appearance was extended to the high current density of 400 A/dm2. In a Sa-rgent bath, the increase in bath temperature was necessary for bright appearance as the current density was increased within 150 A/dm2, but bright region was shown in the cons-tant temperature of 70-75$^{\circ}C$ above the current density of 150A/dm2. On the other hand, two regions of surface brightness was found in a SRHS bath. One is region in the low temperature less than 25$^{\circ}C$ and the other in the moderate temperature range from 55$^{\circ}C$ to 65$^{\circ}C$.

• Journal of Korean Society of Occupational and Environmental Hygiene
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• v.25 no.1
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• pp.89-94
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• 2015

Objectives: The objective of this study was to determine characteristics of workers' exposures to airborne total and hexavalent chromium by job title in electroplating processes. Methods: Total Cr was determined through a modified method based on NIOSH Method 7024. Airborne hexavalent Cr, Cr(VI), was sampled and extracted according to NIOSH Method 7600 and analyzed at 520 nm using an ion chromatograph/visible detector. Results: The geometric mean(GM) of total Cr concentrations from all factories was $11.2{\mu}g/m^3$(GSD=4.9). The GM of Cr(VI) concentrations from all factories was $2.84{\mu}g/m$ (GSD=5.2), and the concentrations among factories were significantly different (p<0.05). The Cr(VI) levels were lower than total Cr levels. Total Cr exposure levels were highest among buffing workers ($21.6{\mu}g/m^3$), but Cr(VI) levels were highest among plating workers($4.15{\mu}g/m^3$). The concentrations of Cr(VI) and total Cr from plating tasks was highly correlated(r=0.91). Conclusions: In the electroplating industry, plating workers were mainly exposed to Cr(VI), but others were not. Oxidation-reduction states of Cr and job titles should be considered in the exposure or risk assessments of chrome electroplating factories.

• Journal of the Korean institute of surface engineering
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• v.5 no.3
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• pp.95-96
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• 1972

• Journal of the Korean institute of surface engineering
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• v.36 no.1
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• pp.48-58
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• 2003

This paper will present an overview of toxicity of hexavalent chromium as well as effort for its replacement by a wide spectrum of alternative materials and technologies. Cr-based materials such as trivalent electrodeposit will be one of strong candidates for hard chromium by surface modification of its surface hardness. Ni-base alloy deposits has proved its application in specific mold for glass. HVOF has been studied in aircraft and military sector. There are still under way of development for commercially available alternatives. To date, no single coating has been identified as universal process as comparable to conventional hard chromium electroplating.

• Journal of the Korean Chemical Society
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• v.39 no.2
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• pp.87-93
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• 1995

The amount of Cr(Ⅲ) and Cr(Ⅵ) in a chromium plating solution could be determined simultaneously within five minutes using UV/VIS spectrophotometer coupled with a flow-through analysis(FTA) setup. The λmax's at 580 nm and 440 nm which correspond to Cr(Ⅲ) and Cr(Ⅵ), respectively, well obey the Beer-Lambert law in the range over 0.05 g/L for Cr(Ⅲ) and 0.005 g/L for Cr(Ⅵ). when the pH of the sample is less than 4.0, the absorption extinction coefficients of those peaks are not much dependent on the proton concentration. The amount of Cr(Ⅲ) and Cr(Ⅵ), and the total chromium in post treatment chromium plating solution, which normally has few g/L of Cr concentration, could be easily measured using UV/VIS spectrophotometry after the sample had been diluted with sulfuric acid of pH=1.0 in the flow-through analysis setup; this method is far more convenient and faster than the common redox titration (which requires at least 40 min/sample) method, while the accuracy of the method is highly comparable to conventional titrimetric method. Since the implementation of an PTA-UV/VIS setup in any plating industry is cost effective and easy to operate, the analytic method described in this paper may be applied directly for in situ analysis of plating solutions.

• Journal of the Korean institute of surface engineering
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• v.37 no.3
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• pp.175-178
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• 2004

The size and number of nano-size defects of thin trivalent chrome layers were determined by small angle neutron scattering (SANS) without breaking the thin chrome layers. Most of defect size of the trivalent chromium prepared in this test conditions is in the range of about 40nm. The number of nano-size defects less than about 40nm of the trivalent chromium layer increases with plating voltage at constant current density From this study, SANS is proved as one of useful techniques to evaluate nano-size defects of thin film layer.

• Journal of the Korean institute of surface engineering
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• v.36 no.2
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• pp.155-160
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• 2003

The effect of the temperature, current density and deposit time on hard chromium deposition in trivalent chromium bath was investigated. Cathode current efficiency increased with increasing current density. Increasing bath temperature from $20^{\circ}C$ to $50^{\circ}C$, chromium deposits were produced in higher current density and the maximum current efficiency was increased. At the plating conditions of $40^{\circ}C$, $30A/dm\m^2$, the deposition thickness increased in proportion to increasing electrolysis time The rate is$ 90\mu\textrm{m}$/hrs. for 2 hours. Microhardness of chromium deposits increased with increasing bath temperature and decreasing current density, and it was constant with electrolysis time. All of bath conditions, microstructure of chromium deposits has nodular structure with some cracking pattern and nodule size increased with increasing deposit thickness.