• 한국표면공학회지
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• 제29권6호
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• pp.816-823
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• 1996

Chlorine containing high density plasmas are widely used to etch various materials in the microelectronic device fabrication. In this study, the characteristics of inductively coupled $Cl_2(O_2/N_2$) plasmas and their effects on the formation of silicon etching have been investigated using a Langmuir probe, quadrupole mass spectrometry(QMS), X-ray photoelectron spectroscopy(XPS), and Scanning Electron Microscopy(SEM). The addition of oxygen for chlorine plasmas reduced ion current densities and chlorine radical densities compared to the nitrogen addition by the recombination of oxygen with chlorine. Also, when silicon is etched in $Cl_2/O_2$ plasmas, etch products recombined with oxygen such as $SiCl_xO_y$ emerged. However, when nitrogen is added to chlorine, etch products recombined with nitrogen or Si-N bondings on the etched silicon surface were not found. All the silicon etch characteristics were dependent on the plasma conditions such as ion density, radical density, etc. As a result sub micron vertical silicon trench etch profiles could be effectively formed using optimized etch conditions for $Cl_2/O_2\; and \;Cl_2/N_2$ gas combinations.

• 대한화학회지
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• 제43권4호
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• pp.430-437
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• 1999

흐름주입 분석법(FIA)에 의한 간접 요오드화 UV 검출법으로 총 잔류염소를 신속하게 정량하는 방법을 연구하였다. FIA장치를 최적화하기 위해 용리액의 pH, 요오드화 이온의 농도, 혼합 및 반응코일의 길이,시료주입량 및 유속, 온도 및 검출파장에 대한 변화를 관찰하였다. pH 8.3에서 하이포아염소산 이온은 요오드화 이온을 선택적으로 산화시키고 자신은 염화이온으로 환원되었다. 방해이온을 제거하기 위한 가리움제로서 에틸렌다이아민이 가장 좋은 효율을 나타내었다. 하이포아염소산 이온의 검정곡선은 0.03-0.3 mg/L의 농도 범위에서 0.999이상의 직선성을 나타내었고, 검출한계는 0.007 mg/L이었다. 이러한 분석조건하에서 몇몇 전주근교 상수중 총 잔류염소의 농도를 정량하였다.

• 한국건설순환자원학회논문집
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• 제11권4호
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• pp.381-390
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• 2023

본 연구에서는 염해를 받은 콘크리트의 역학적 성능 평가를 수행하고, 실험 결과를 바탕으로 염소이온 농도에 따른 압축응력변형률 모델을 제시하였다. 염해를 모사하기 위해 콘크리트 배합 시 CaCl₂ 용액을 첨가하였으며, 염소이온의 농도는 결합재의 중량 대비 0, 1, 2, 4 %가 되도록 하였다. 콘크리트의 최대 압축응력 이후의 응력-변형률 곡선을 조사하기 위해 변위 제어를 통해 압축강도를 측정하였다. 염소이온 농도가 1 %인 경우에는 최대 압축응력이 증가하였으나, 염소이온 농도가 2 % 이상인 경우에는 최대 압축응력이 감소하였다. 최대 압축응력에서의 변형률의 경우 재령 7일의 시편에서는 염소이온 농도에 따른 경향이 나타나지 않았다. 재령 28일의 시편에서는 염소이온 농도가 증가함에 따라 감소하였다. 재령 28일의 최대 압축응력와 변형률의 변화를 이용하여 Popovics model에 기반한 응력-변형률 곡선 모델을 제시하였다. 염소이온의 농도 증가에 따른 역학적 성능 저하의 원인을 조사하기 위해 수화생성물 분석을 수행하였다. 염소이온의 농도가 증가함에 따라 Friedel's salt가 증가하고, portlandite가 감소하는 것을 확인하였다.

• 한국환경보건학회지
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• 제25권3호
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• pp.83-88
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• 1999

This study was carried out to examine the behavior of THM formation in water treated with chlorine dioxide where humic acid was used as THM precursor. THM was not detected in bromide-free water, but formed in water containing bromide. When 10 mg/l of chlorine dioxide was added to water containing 5 mg/l of humic acid and bromide respectively, 20.46 ${\mu}$g/l of THM was formed. It is postulated that chlorine dioxide oxidize bromide to hydrobromous acid, which subsequently reacted with humic acids similar to chlorine reaction. The formation of THM could be reduced at low pH. Among THM formed, CHBr$_3$ was the predominant species in the alkaline solution, while CHCl$_3$ in the acidic solution. A sample pretreated with chlorine dioxide for 24h before addition of chlorine showed a reduction of 75.1% in THM formation, compared with a sample not pretreated with chlorine dioxide and a sample treated by chlorine for 24h prior to addition of chlorine dioxide also showed a reduction of 37.8% in THM formation, compared with a sample not added with chlorine dioxide. It may explain that chlorine dioxide oxidizes directly a fraction of THM.

• 한국펄프종이공학회:학술대회논문집
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• 한국펄프종이공학회 1999년도 춘계학술발표논문집
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• pp.78-83
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• 1999

In this paper the extinction coefficients of molecule chlorine ($Cl_2$), chlorine dioxide (ClO$_2$), hypochlorous acid (HClO), chlorous acid ($HClO_2$$_2$) were determined using a PDA UV-VIS spectrophotometer. Based on these, the concentrations of $Cl_2$, $ClO_2$, and HClO in general chlorine dioxide bleaching liquor can be measured. The concentrations of $Cl_2$, $ClO_2$ and $HClO_2$ produced during the generation of methanol based chlorine dioxide generator can also be determined use the same method. The method was thought to be able to give more information in chlorine dioxide bleaching chemistry if combine its use with titration and ion chromatography.

• 전자공학회논문지
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• 제50권7호
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• pp.269-274
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• 2013

전해 산성이온수는 알칼리성 이온수에 비해 응용분야가 음용을 목적으로 하는 알칼리이온수와 많이 다르게 이용되고 있으며 ph 농도에 따라 강산성인 경우 잔류염소에 의한 살균 목적의 소독제로 사용되고, 중산성인 경우 세척과 세안으로 사용하고, 약산성인 경우 식재료와 혼합하여 요리에 널리 사용할 수 있다. 이런 산성이온수를 생성하기 위해서는 물을 전기분해 하여 사용하는데 전기분해 하는 과정에서 염소가스와 수산화나트륨 등의 물질로 살균력을 가지며, 전기분해시 +전극 쪽으로 -이온을 띤 염소, 인, 유황 등의 유기물이 모여져 산성이온수를 만든다. 또한 산성수와 알칼리수를 분리하기 위해서 격막을 사용했다. ph 농도변화의 구현방법은 Microprocessor를 이용하여 강산성에서 약산성 사이의 ph 농도를 PWM(pulse width modulation) 제어로 3종류의 PWM 전압을 전해조 전극에 인가하여 PWM제어에 의한 연속적으로 농도가 조절된 산성수가 생성되게 구현하였다.

• 한국생산제조학회지
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• 제21권5호
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• pp.720-725
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• 2012

Sodium hypochlorite is used worldwide as a water disinfectant and in bleaching agent. Sodium hypochlorite applied to water initially undergoes hydrolysis to form free chlorine consisting of hypochlorous acid(HOCl) and hypochlorite ion($OCl^-$). For free chlorine determination, an electrochemical method is simple due to the electroactivity of free chlorine; it measures current and is free of most reagents. Amperometric free chlorine sensor has been developed with gold (Au)-based electrode. The 3-electrode free chlorine sensor whose working and counter electrodes were Pt exhibited excellent response to HClO at +400mV vs. Ag/AgCl/sat. KCl. In addition, the use of a pH error correction algorithm provided a reliable measurement of residual free chlorine in water sample without any pretreatment in the normal pH range(pH 6~8) of municipal water supply. The free chlorine sensor installed in on-line monitoring system could be used to continually monitor the level of residual free chlorine in real samples.

• 한국세라믹학회지
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• 제24권1호
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• pp.77-85
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• 1987

Hardened cement paste is mainly affected by corrosion of sulphate and chlorine ions in sea water. In this investigation, many specimens were made with the cement clinker minerals such as C3S, C3A, C4AF and their mixture according to cement composition added various blending materials. After the specimens were immersed in 4% MgSO4 and MgCl2 solutions, the product of reaction, the microstructure of specimen and Ca+2 ion leached in the solution were studied. The formation of Ca(OH)2 in the specimen of C3S is reduced relatively by adding pozzolanic admixtures. The chlorine ion is easily diffuse into the C3S specimen and produced CaCl2 compound, and it makes the specimen porous by leaching out itself into the solution. The specimen of C3A, C4AF are broken down by expanding reaction of ettringite and gypsum compound produced in the MgSO4 solution. At a later period, the ettringite is transformed into gypsum and 5MgO.2Al2O3·15H2O. The C3A in the MgCl2 solution combines chlorine ion to form Friedel's salt and prevents the diffusion reaction of chlorine ion into the specimen. Granulated slag shows inferior effect on the resistance of the specimen in MgSO4 solution by forming ettringite and gypsum, but good result in MgCl2 solution. Pozzolanic materials, on the whole, offer noticable effect on the resistance of the specimen in both solutions.

• Smart Structures and Systems
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• 제25권3호
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• pp.337-343
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• 2020

In this paper, we focused on the self-healing concrete using new nano-capsules. Three types of nano-capsules with respect to availability, high strength and temperature tolerance are used; type 1 is URF and polyethylene (PE) as shell and nano titanium oxide (TiO₂) as core, type 2 is URF and PE as shell and nano silica oxide (SiO₂) as core, type 3 is PE as shell and nano silica oxide (SiO₂) as core. The concrete samples mixed by nano-capsules with three percents of 0.5, 1 and 1.5. Based on experimental tests and the compressive strength of samples, the URF-PE-SiO₂ is selected for additional tests of compressive strength before and after recovery, ultrasonic test, ion chlorine and water penetration depths. After careful investigation, it is concluded that the optimum value of URF-PE-SiO₂ nano-capsules is 0.5% since leads to higher compressive strength, ultrasonic test, ion chlorine and water penetration depths.

• 상하수도학회지
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• 제18권5호
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• pp.580-587
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• 2004

The objective of this research is to investigate the electrochemical oxidation process for nitrogen removal in wastewater involving chloride ion and nitrogen compounds. The process experiment of electrochemical oxidation was conducted by using the stainless steel tube type reactor and the $Ti/IrO_2$ as anode. Free chlorine production and current efficiency variation for total nitrogen removal was compared depending on whether electrolyte is added, and the nitrogen type distribution under an operating condition. When chloride was added as electrolyte, it was found that production of free chlorine increased and the concentration of the chloride decreased as retention time passed. The concentration of chloride in influent decreased from 1,660 to 1,198 mg/L at the current density of $6.7A/dm^2$, while concentration of free chlorine increased to 132 mg/L. Current efficiency in removal of ammonium nitrogen was increased when chloride was dosed as electrolyte. It was observed that ammonium nitrogen was oxidized to nitrite and nitrate through electrochemical oxidation and that the concentration of total nitrogen in influent was reduced from 22.58 to 4.00 mg/L at the short retention time of 168 seconds through the electrochemical oxidation of nitrogen.