• 한국의상디자인학회지
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• 제11권1호
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• pp.43-51
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• 2009

The cotton, wool, cotton/wool blended(80:20) and tencel fabrics were treated with low temperature oxygen or argon plasma, enzymes(cellulase or protease), or oxygen plasma-enzyme and examined for their weight loss and conditions for treatment for the environment friendly finishing. In the plasma treatment argon gas had better effect on the weight loss than oxygen gas did and the weight loss of all the fabrics was increased as increasing discharge power and discharge time. The weight loss of cotton, wool, cotton/wool blended(80:20) fabrics decreased in a large measure after 1 hr but that of tencel didn't decrease after 1 hr. In case of cellulose fibers oxygen gas plasma induced chemical functional groups on the surface of substrate more than argon gas plasma did so the weight loss of wool was larger than that of cotton, tencel fabrics in oxygen plasma-enzyme treatment. The weight loss of cotton and tencel fabrics decreased the initial stage because oxygen plasma pre-treatment caused cross linking as well as etching effect but argon plasma pre-treatment didn't. The plasma pre-treatment cleared the way for enzyme treatment on the whole but oxygen plasma pre-treatment bear in hand the increase of weight loss more or less because of the cross linking on the surface of cellulose fibers. The appropriate conditions for plasma treatment was 10-1Torr, 40W for 30minutes and for cellulase treatment were enzyme concentration of $3g/{\ell}$, pH 5, $60^{\circ}C$ for 1hr and for protease treatment were enzyme concentration of $4g/{\ell}$ pH 8, $60^{\circ}C$ for 1hr.

• 센서학회지
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• 제9권6호
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• pp.424-429
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• 2000

실리콘 고무 멤브레인(membrane)에 실리콘 빔(beam)들이 삽입된 형태의 저차압센서를 개발하였다. 제작된 저차압센서는 실리콘 고무(silicone rubber)를 멤브레인으로 사용함으로써 열악한 환경에서도 다양한 응용분야에 적용 가능하도록 하였다. 실리론 고무 멤브레인을 사용한 압저항형 저차압센서는 선택적으로 도핑(doping)된 (100) n/n+/n 웨이퍼 상에 다공질 마이크로머시넝(micro-machining) 기술을 이용하여 제작되었다. 제조된 센서의 감도(sensitivity)는 $0.66{\mu}V/mmHg$이고, 0.1% 이하의 비선형성(non-linearity)을 보였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.147-147
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• 2011

High crystalline nonpolar a-plane (11-20) nitride light emitting diodes (LEDs) have been fabricated on r-plane (1-102) sapphire substrates by metalorganic chemical-vapor deposition (MOCVD). The multi-quantum wells (MQWs) active region is consists of 4 periods the nonpolar a-plane InGaN/GaN(a-InGaN/GaN) on a high quality a-plane GaN (a-GaN) template grown by using the multibuffer layer technique. The full widths at half maximum (FWHMs) of x-ray rocking curve (XRC) obtained from phiscan of the specimen that was grown up to nonpolar a-plane GaN LED layers with double crystal x-ray diffraction. The FWHM values were decreased down to 477 arc sec for $0^{\circ}$ and 505 arc sec for $-90^{\circ}$, respectively. After fabricating a conventional lateral LED chip which size was $300{\times}600{\mu}m^2$, we measured the optical output power by on-wafer measurements. N-electrode was made with Cr/Au contact, and ITO on p-GaN was formed with Ohmic contact using Ni/Au followed by inductively coupled plasma etching for mesa isolation. The optical output power of 1.08 mW was obtained at drive current of 20 mA with the peak emission wavelength of 502 nm.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.143-144
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• 2011

최근 광전자 분야에서는 미래 에너지 자원에 대한 관심과 함께 GaN 기반 발광다이오드에 대한 연구가 활발히 진행되고 있다. 특히 InGaN/GaN 양자 우물 구조는 푸른색, 녹색 발광다이오드 구현에 있어 우수한 물질적 특성을 가지고 있다고 알려져 있다. 하지만 우수한 물질적 특성에도 불구하고 고인듐 고품위 막질 성장의 어려움으로 인해 높은 효율의 녹색 발광다이오드 구현하는 것은 여전히 어려운 실정이다. 이를 극복하기 위한 대안 중에 하나인 선택 영역 박막성장법(Selective Area Growth)은 마스크 패터닝을 통해 열린 영역에서만 박막을 성장하는 방법으로써 인듐 함량을 향상 시킬 수 있는 방법으로 주목 받고 있다. 선택 영역 박막 성장법을 이용하여 GaN를 성장하기 위해 그림 1의 공정을 통하여 n-GaN층 위에 SiO2 마스크를 포토리소그라피와 Reactive Ion Etching (RIE)를 이용한 건식 식각 공정을 통해 형성한 후 Metal Organic Chemical Vapor Deposition (MOCVD) 장비를 이용하여 선택적으로 에피를 성장하였다. 성장된 마이크로 피라미드 발광다이오드 구조는 n-GaN 피라미드 구조위에 양자우물 및 p-GaN을 성장함으로써 p-GaN/MQW/n-GaN 구조를 갖는다. 이렇게 생성된 피라미드 구조의 에피를 이용하여 발광다이오드를 제작한 후 그에 대한 전기적, 광학적 특성을 측정하였다. 2인치 웨이퍼의 중심을 원점 좌표인 (0,0)으로 설정하였을 때 2인치 웨이퍼에서 좌표에 해당하는 위치에서의 Photoluminescence (PL) 측정한 결과 일반적인 구조의 발광다이오드의 경우 첨두치가 441~451nm인데 반해 피라미드 구조의 발광다이오드의 경우 첨두치가 558nm~563nm 임을 알 수 있었다. 이를 통해 피라미드 구조 발광다이오드의 경우 일반적인 구조의 발광다이오드에 비해 인듐의 함유량을 증가시킬 수 있다는 것을 알 수 있다. 본 논문에서는 선택 영역 박막 성장법을 이용하여 마이크로 피라미드 InGaN/GaN 양자 우물 구조 구현과 광 전기적 특성에 대해 더 자세히 논의 하도록 하겠다.

• 한국재료학회지
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• 제14권12호
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• pp.835-839
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• 2004

The diamond thin films was deposited on Si(100) substrate by Hot Filament Chemical Vapor Deposition (HFCVD) method using supplied the $CH_{3}OH/H_{2}O$ mixtured gas with excess H_{2} gas. The role of hydrogen ion as the growth mechanism of the diamond deposit was examined and compared the $CH_{3}OH/H_{2}O$ with the $CH_4/H_2$. Pressures in the range of $1.1\sim290{\times}10^2$ Pa were applied and using $3.4\sim4.4$ kw power. It was investigated by Scanning Electron Microscopy(SEM) and Raman spectroscopy The H ion was etching the graphite and restrained from $sp^3\;to\;sp^2$. But excess $H_2$ gas was not helped diamond deposit using $CH_{3}OH/H_{2}O$ mixtured gas. It was shown that the role of hydrogen ion of deposited diamond films using $CH_{3}OH/H_{2}O$ was different from $CH_4/H_2$.

• 한국자기학회지
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• 제19권6호
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• pp.191-196
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• 2009

비대칭 거대 자기임피던스 효과를 보이는 자기장 열처리된 CoFeSiB 비정질 리본에서 자기 바이어스 현상을 MOKE 방법을 이용하여 연구하였다. 열처리 과정에서 리본의 양 표면에 형성된 경자성 결정층이 내부 연자성 비정질 상의 자화특성에 미치는 영향을 조사하기 위해 열처리 후 화학적 에칭에 의해 한쪽 및 양쪽 표면의 결정층을 깎아낸 시편들을 준비하고 각 시편에 대해 비정질 상의 자화곡선을 MOKE 방법으로 측정하였다. 열처리 과정에서 표면에 형성된 경자성층이 내부의 비정질 연자성 상에 바이어스 자기장을 작용하고 있다는 것과 바이어스 자기장의 방향이 경자성층의 자화방향에 반대 방향임을 자기이력곡선의 이동을 통해 확인하였다.

• Corrosion Science and Technology
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• 제2권3호
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• pp.117-126
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• 2003

Due to excellent corrosion resistance and mechanical properties, austenitic stainless steel is widely used as the material for chemical plants. nuclear power plants, and food processing facilities. But, the zone affected by heat in the range of 400 to $800^{\circ}C$ during welding loses corrosion resistance and tensile strength since Cr-carbide precipitation like $Cr_{23}C_6$ forms at the grain boundary and thereby takes place the intergranular corrosion. In this study, AISI 304 stainless steel with the added Nb of 0.3 to 0.7 wt% was solutionized at $1050^{\circ}C$ and sensitized at $650^{\circ}C$. Specimen was welded by MIG. The phase and the microstructure of the specimens were examined by an optical microscope, a scanning electron microscope, and a x-ray diffractometer. The corrosion characteristics of specimens were tested by electrolytic etching and by double loop electrochemical potentiokinetic reactivation method(EPR) in the mixed solution of 0.5M $H_2SO_4$ + 0.01M KSCN. The melting zone had dendritic structure constituted of austenitic phase and $\delta$-ferrite phase. Cr carbide at the matrix did not appear, as Nb content increased. At the grain boundaries of the heat affected zone, the precipitates decreased and the twins appeared. The hardness increased, as Nb content increased. The hardness was highest in the order of the heat affected zone>melted zone>matrix. According to EPR curve, as the Nb content decreased, the reactivation current density(Ir) and the activation current density(la) were highest in the order of the melted zone

• Design & Manufacturing
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• 제14권3호
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• pp.44-49
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• 2020

One of display trends today is development of high pixel density. To get high PPI, a small size of pixel must be developed. RGB pixel is arranged by evaporation process which determines pixel size. Normally, a fine metal mask (FMM; Invar alloy) has been used for evaporation process and it has advantages such as good strength, and low thermal expansion coefficient at low temperature. A FMM has been manufactured by chemical etching which has limitation to controlling the pattern shape and size. One of alternative method for patterning FMM is laser micromachining. Femtosecond laser is normally considered to improve those disadvantages for laser micromachining process due to such short pulse duration. In this paper, a femtosecond laser drilling for thickness of 16 ㎛ FMM is examined. Additionally, we introduce experimental results for controlling taper angle of hole by vibration module adapted in laser system. We used Ti:Sapphire based femtosecond laser with attenuating optics, co-axial illumination, vision system, 3-axis linear stage and vibration module. By controlling vibration amplitude, entrance and exit diameters are controllable. Using vibrating objective lens, we can control taper angle when femtosecond laser hole drilling by moving focusing point. The larger amplitude of vibration we control, the smaller taper angle will be carried out.

• 한국표면공학회지
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• 제46권1호
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• pp.29-35
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• 2013

The effect of DC bias on the growth of nanocrystalline diamond films on silicon substrate by microwave plasma chemical vapor deposition has been studied varying the substrate temperature (400, 500, 600, and $700^{\circ}C$), deposition time (0.5, 1, and 2h), and bias voltage (-50, -100, -150, and -200 V) at the microwave power of 1.2 kW, working pressure of 110 torr, and gas ratio of Ar/1%$CH_4$. In the case of low negative bias voltages (-50 and -100 V), the diamond particles were observed to grow to thin film slower than the case without bias. Applying the moderate DC bias is believed to induce the bombardment of energetic carbon and argon ions on the substrate to result in etching the surfaces of growing diamond particles or film. In the case of higher negative voltages (-150 and -200 V), the growth rate of diamond film increased with the increasing DC bias. Applying the higher DC bias increased the number of nucleation sites, and, subsequently, enhanced the film growth rate. Under the -150 V bias, the height (h) of diamond films exhibited an $h=k{\sqrt{t}}$ relationship with deposition time (t), where the growth rate constant (k) showed an Arrhenius relationship with the activation energy of 7.19 kcal/mol. The rate determining step is believed to be the surface diffusion of activated carbon species, but the more subtle theoretical treatment is required for the more precise interpretation.

• 한국결정성장학회지
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• 제9권5호
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• pp.463-469
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• 1999

$K_3$$Li_2$$Nb_5$$O_{15}$KLN) 단결정을 $K_x$$Li_{1-x}$$NbO_3$의 조성에서 x= 0.04~0.6으로 결정성장방법으로 성장시켰다. 균열이 없는 양질의 결정성장을 위해 c축 및 a축 방향을 택하였고, 단결정 성장을 위한 최적의 조건에 대하여 연구하였다. 성장된 결정은 편광현미경 관찰을 통해 일축성 무늬를 볼수 있었고, X-선 회절실험에서 결정된 격자상수는 a=b=12.500 $\AA$, c=3.996$\AA$이었으며, 1HF : $2HNO_3$ 용액의 부식에서 c축 방향으로 정사각형 및 a축 방향으로 직사각형의 부식상을 볼수 있었다. 광투과율 측정과 온도에 따른 유전상수 측정등을 통해 KLN 결정의 광학적 특성 및 다른 조성을 갖는 시료에서 유전특성을 조사하였다. $420^{\circ}C$에서 상전이 온도를 갖는 결정은 확산상전이(diffuse phase transition) 특성을 갖는 반면 $493^{\circ}C$에서 상전이 온도를 보이는 결정은 날카로운(shap) 유전특성을 나타내었다.