• Title/Summary/Keyword: Chemical Vapor

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Adsorption Characteristics of Toluene Vapor According to Pore Size Distribution of Activated Carbon (활성탄의 세공분포에 따른 Toluene Vapor의 흡착특성)

  • Lee Song-Woo;Kwon Jun-Ho;Kang Jeong-Hwa;Na Young-Soo;An Chang-Doeuk;Yoon Young-Sam;Song Seung-Koo
    • Journal of Environmental Science International
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    • v.15 no.7
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    • pp.695-699
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    • 2006
  • This study is to investigate the relationship between pore structures of activated carbons and adsorption characteristics of toluene vapor using dynamic adsorption method. The surface areas of below $10{\AA}$ in the pore diameter of activated carbons used in this experiment were in the range of 72 -93 % of total cumulative surface area and the toluene vapor equilibrium adsorption capacities were in the range of 350 - 390mg/g. Activated carbons having larger toluene adsorption capacity than the compared activated carbons had relatively pores in the pore diameter range of $7-10{\AA}$. Linear relationship between equilibrium adsorption capacity and cumulative sur- face area was in the diameter range of over $7{\AA}$. It was thought that toluene vapor was relatively well adsorbed on surfaces of pores of over $7{\AA}$.

Development of the Natural Gas Burner for Modified Chemical Deposition Processes (화학증착용 천연가스버너 개발)

  • You, Hyun-Seok;Lee, Joong-Seong;Han, Jeong-Ok;Choi, Dong-Soo
    • 한국연소학회:학술대회논문집
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    • 2001.06a
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    • pp.75-81
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    • 2001
  • MCVD(modified chemical vapor deposition) used in making optical-fiber currently utilizes the hydrogen-oxygen burner as a energy supply source. To improve the productivity and to reduce the manufacturing cost of optical-fiber, a natural gas-oxygen burner has been developed. The manufacturing processes of optical-fiber consist of vapor deposition, collapse and drawing processes. Among these processes, the vapor deposition and the collapse processes are important in terms of improving the productivity and saving the production cost. The vapor deposition and collapse processes are performed by combustion heat and flame force supplied by a burner. So the flame force of the burner used in these processes is required to have an optimal and consistent value in order to allow uniform heating and collapse of quartz tube. In this regard, the momentum ratio of natural gas and oxygen has been optimally determined by modification of a burner and the inlet flow pass also has been modified.

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Effect of Carrier Gas on the Microstructure and Magnetic Properties of Co Nanoparticles Synthesized by Chemical Vapor Condensation (화학기상응축공정(Chemical Vapor Condensation)으로 제조된 Co 나노분말의 미세구조 및 자기적 성질에 미치는 운송기체의 영향)

  • ;X. L. Dong
    • Journal of Powder Materials
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    • v.11 no.1
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    • pp.16-21
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    • 2004
  • The nano-sized Co particles were successfully synthesized by chemical vapor condensation (CVC) process using the precursor of cobalt carbonyl ($Co_2(CO)_8$). The influence of carrier gases on the microstructure and magnetic properties of nanoparticles was investigated by means of XRD, TEM, XPS and VSM. The Co nano-particles with different phases and shapes were synthesized with a change of carrier gas : long string morphologies with coexistence of fcc and hcp structure in Ar carrier gas condition; finer Co core in a mass of cobalt oxide with only fcc structure in He; rod type cobalt oxide phase in Ar+6vol%$O_2$. The saturation magnetization and coercivity was lower in Co nanoparticles synthesized in He carrier gas, due to their finer size.

High indium incorporation in the growth of InGaAs on (100) GaAs by precursor alternating metalorganic chemical vapor deposition (Precursor alternating metalorganic chemical vapor deposition에 의한 (100) GaAs 기판위로의 InGaAs 성장시의 높은 indium 유입)

  • 정동근
    • Journal of the Korean Vacuum Society
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    • v.5 no.4
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    • pp.354-358
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    • 1996
  • High indium incorporation was observed in InGaAs growth by precursor alternating metalorganic chemical vapor deposition (PAMOCVD). A possible mechanism of high indium incorporation into the crystal in PAMOCVD was proposed by considering the decomposition products of gallium and indium precursors, and thus the different adsorption behavior of the decomposed precursor molecules.

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Optimization of the Material and Structure of Component Parts for Reducing the Number of Impurity Particles in CVD Process

  • Kim, Won Kyung;Woo, Ram;Roh, Jong Wook
    • Journal of the Korean Ceramic Society
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    • v.56 no.3
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    • pp.277-283
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    • 2019
  • We have examined minimization of the number of impurity particles by replacing the load-lock chamber materials of the chemical vapor deposition equipment through optimization of the pumping method in the deposition chamber. In order to reduce the number of impurity particles in the chamber, the load-lock spacer material was changed from monomer casting nylon to Torlon. Furthermore, we controlled the pumping speed and number of pumping ports, which resulted in a reduction in the impurity particle generation from 2.67% to 0.52%. This study revealed that the selection of the material for the parts of a chemical vapor deposition chamber can minimize particle generation, thereby presenting a method of optimization method of the chemical vapor deposition chamber.

Development of Highly Conductive and Corrosion-Resistant Cr-Diamond-like Carbon Films

  • Ko, Minjung;Jun, Yee Sle;Lee, Na Rae;Kang, Suhee;Moon, Kyoung Il;Lee, Caroline Sunyong
    • Journal of the Korean Ceramic Society
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    • v.56 no.3
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    • pp.317-324
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    • 2019
  • Cr-diamond-like carbon (Cr-DLC) films were deposited using a hybrid method involving both physical vapor deposition and plasma-enhanced chemical vapor deposition. DLC sputtering was carried out using argon and acetylene gases. With an increase in the DC power, the Cr content increased from 14.7 to 29.7 at%. The Cr-C bond appeared when the Cr content was 17.6 at% or more. At a Cr content of 17.6 at%, the films showed an electrical conductivity of > 363 S/cm. The current density was 9.12 × 10-2 ㎂/㎠, and the corrosion potential was 0.240 V. Therefore, a Cr content of 17.6 at% was found to be optimum for the deposition of the Cr-DLC thin films. The Cr-DLC thin films developed in this study showed high conductivity and corrosion resistance, and hence, are suitable for applications in separators.

Incorporation of Titanium into H-ZSM-5 Zeolite via Chemical Vapor Deposition: Effect of Steam Treatment

  • Xu, Cheng-Hua;Jin, Tai-Huan;Jhung, Sung-Hwa;Hwang, Jin-Soo;Chang, Jong-San;Qiu, Fa-Li;Park, Sang-Eon
    • Bulletin of the Korean Chemical Society
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    • v.25 no.5
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    • pp.681-686
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    • 2004
  • Ti-ZSM-5 prepared by secondary synthesis, from the reaction of H-ZSM-5 with vapor phase $TiCl_4$, was characterized with several physicochemical techniques including FT-IR and UV/VIS-DRS. It was found that zeolite structure, surface area and pore volume did not change, and the framework aluminum could not be replaced by titanium atom during the secondary synthesis of Ti-ZSM-5. The incorporation of titanium into the framework might be due to reaction of $TiCl_4$with the silanol groups associated with defects or surface sites. The formation of extra-framework titanium could not be avoided, unless the samples were further treated by water vapor at 550 $^{\circ}C$ or higher temperature. High temperature steam treatment of Ti-ZSM-5 prepared by chemical vapor deposition with $TiCl_4$was efficient to prevent the formation of non-framework titanium species. Ti-ZSM-5 zeolites prepared in this work contained only framework titanium species and exhibited improved catalytic property close to TS-1 prepared by hydrothermal synthesis.

Ti Prepared by ionized physical vapor deposition (I-PVD) and TiN prepared by metal-organic chemical vapor deposition(MOCVD) as underlayers of aluminum TiN (Al 박막의 underlayer로서의 Ionized Physical Vapor Deposition (I-PVD) Ti 또는 I-PVD Ti/Metal-Organic Chemical Vapor Deposition TiN)

  • 이원준;나사균
    • Journal of the Korean Vacuum Society
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    • v.9 no.4
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    • pp.394-399
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    • 2000
  • The effects of the type and thickness of underlayer on the crystallographic texture and the sheet resistance of aluminum thin film were studied. Ti and Ti/TiN were examined as the underlayer of aluminum. Ti and TiN were prepared by ionized physical vapor deposition (I-PVD) metalorganic chemical vapor deposition (MOCVD), respectively. The texture and the sheet resistance of metal thin film stacks were investigated at various thicknesses of Ti or TiN, and the sheet resistance was measured after annealing at $400^{\circ}C$ in an nitrogen ambient. For I-PVD Ti underlayer, the excellent texture of aluminum <111> was obtained even at top of 5 nm of Ti. However, the sheet resistance of the metal stack was greatly increased after annealing due to the interdiffusion and reaction of Al and Ti. MOCVD TiN between Ti and Al could suppress the Al-Ti reaction without severe degradation of aluminum <111> texture. Excellent texture of aluminum was obtained for the MOCVD TiN thinner than 4 nm.

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Research about Chemical-Biological Protection Capability of Selectively Permeable Membrane Materials Based on Polyvinyl Alcohol (폴리비닐알코올 기반 선택투과막 재료의 화생방호성능 연구)

  • Kang, Jae-Sung;Seo, Hyeon-Kwan;Kwon, Tae-Geun;Park, Hyen-Bae;Lee, Hae-Wan
    • Membrane Journal
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    • v.23 no.3
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    • pp.237-244
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    • 2013
  • We fabricated several composite membranes with selectively permeable performance designed to facilitate water vapor transport and resist DMMP vapor permeation. Materials for selective permeable membrane were based on polyvinyl alcohol and functional polymer containing basic functional group. With these materials, we characterized selectively permeable performance to identify next-generation material with chemical-biological protective capability. Results showed that polyvinyl alcohol (PVA)/polyethyleneimine (PEI) materials possessed performance with superior water vapor permeation ($2,200{\sim}2,900g/m^2/day$) and protective capability against DMMP vapor ($47g/m^2/day$).

Synthesis and Characterization of Carbon nanofibers on Co and Cu Catalysts by Chemical Vapor Deposition

  • Park, Eun-Sil;Kim, Jong-Won;Lee, Chang-Seop
    • Bulletin of the Korean Chemical Society
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    • v.35 no.6
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    • pp.1687-1691
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    • 2014
  • This study reports on the synthesis of carbon nanofibers via chemical vapor deposition using Co and Cu as catalysts. In order to investigate the suitability of their catalytic activity for the growth of nanofibers, we prepared catalysts for the synthesis of carbon nanofibers with Cobalt nitrate and Copper nitrate, and found the optimum concentration of each respective catalyst. Then we made them react with Aluminum nitrate and Ammonium Molybdate to form precipitates. The precipitates were dried at a temperature of $110^{\circ}C$ in order to be prepared into catalyst powder. The catalyst was sparsely and thinly spread on a quartz tube boat to grow carbon nanofibers via thermal chemical vapor deposition. The characteristics of the synthesized carbon nanofibers were analyzed through SEM, EDS, XRD, Raman, XPS, and TG/DTA, and the specific surface area was measured via BET. Consequently, the characteristics of the synthesized carbon nanofibers were greatly influenced by the concentration ratio of metal catalysts. In particular, uniform carbon nanofibers of 27 nm in diameter grew when the concentration ratio of Co and Cu was 6:4 at $700^{\circ}C$ of calcination temperature; carbon nanofibers synthesized under such conditions showed the best crystallizability, compared to carbon nanofibers synthesized with metal catalysts under different concentration ratios, and revealed 1.26 high amorphicity as well as $292m^2g^{-1}$ high specific surface area.