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http://dx.doi.org/10.4191/kcers.2019.56.3.08

Development of Highly Conductive and Corrosion-Resistant Cr-Diamond-like Carbon Films  

Ko, Minjung (Department of Materials and Chemical Engineering, Hanyang University)
Jun, Yee Sle (Department of Materials and Chemical Engineering, Hanyang University)
Lee, Na Rae (Department of Materials and Chemical Engineering, Hanyang University)
Kang, Suhee (Department of Materials and Chemical Engineering, Hanyang University)
Moon, Kyoung Il (Heat Treatment Group, Korea Institute of Industrial Technology)
Lee, Caroline Sunyong (Department of Materials and Chemical Engineering, Hanyang University)
Publication Information
Abstract
Cr-diamond-like carbon (Cr-DLC) films were deposited using a hybrid method involving both physical vapor deposition and plasma-enhanced chemical vapor deposition. DLC sputtering was carried out using argon and acetylene gases. With an increase in the DC power, the Cr content increased from 14.7 to 29.7 at%. The Cr-C bond appeared when the Cr content was 17.6 at% or more. At a Cr content of 17.6 at%, the films showed an electrical conductivity of > 363 S/cm. The current density was 9.12 × 10-2 ㎂/㎠, and the corrosion potential was 0.240 V. Therefore, a Cr content of 17.6 at% was found to be optimum for the deposition of the Cr-DLC thin films. The Cr-DLC thin films developed in this study showed high conductivity and corrosion resistance, and hence, are suitable for applications in separators.
Keywords
Electrical conductivity; Corrosion resistance; Cr-Diamond-like carbon film; Physical vapor deposition; Plasma-enhanced chemical vapor deposition;
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