Etching Mechanism of $YMnO_3$ Thin Films in High Density $CF_4$ /Ar Plasma
($CF_4$ /Ar 가스 플라즈마를 이용한 $YMnO_3$ 박막의 식각 반응연구)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.14 no.12
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- pp.959-964
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- 2001