• Title/Summary/Keyword: Ceramic substrate

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Fabrication and Characterization of Hybrid NTC Thermistor Films with Conducting Oxide Particles by an Aerosol-Deposition Process (상온 분사 공정에 의한 산화물전도 입자 복합 하이브리드 NTC 서미스터 필름의 제작 및 특성)

  • Kang, Ju-Eun;Ryu, Jungho;Choi, Jong-Jin;Yoon, Woon-Ha;Kim, Jong-Woo;Ahn, Cheol-Woo;Choi, Joon Hwan;Park, Dong-Soo;Kim, Yang-Do
    • Journal of the Korean Ceramic Society
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    • v.50 no.1
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    • pp.63-69
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    • 2013
  • Negative-temperature coefficient (NTC) thermistors based on nickel manganite spinel ($NiMn_2O_4$) are widely used for many applications, such as sensors and temperature compensators, due to their good thermistor characteristics and stabilities. However, to achieve thermistors with a high NTC B constant, which is an important figure of merit pertaining to the degree of temperature sensitivity, the activation energy should be high such that high resistivity at ambient temperatures results. To obtain a high B constant and low resistivity, Al and Si modified spinel structured $Ni_{0.6}Si_{0.2}Al_{0.6}Mn_{1.6}O_4$ hybrid thick films with the conducting metal oxide of $LaNiO_3$ were fabricated on a glass substrate by aerosol deposition at room temperature (RT). The NTC-$LaNiO_3$ hybrid thick films showed resistivity as low as < $100k{\Omega}\;cm$ at $90^{\circ}C$, which is one or two orders of magnitude lower than that of the monolithic NTC films, while retaining a high B constant of $NiMn_2O_4$ of over 5500 K when 20 wt% $LaNiO_3$ was added without a post-thermal treatment. These phenomena are explained by the percolation threshold mechanism.

Minimization of Recombination Losses in 3D Nanostructured TiO2 Coated with Few Layered g-C3N4 for Extended Photo-response

  • Kang, Suhee;Pawar, Rajendra C.;Park, Tae Joon;Kim, Jin Geum;Ahn, Sung-Hoon;Lee, Caroline Sunyong
    • Journal of the Korean Ceramic Society
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    • v.53 no.4
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    • pp.393-399
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    • 2016
  • We have successfully fabricated 3D (3-dimensional) nanostructures of $TiO_2$ coated with a $g-C_3N_4$ layer via hydrothermal and sintering methods to enhance photoelectrochemical (PEC) performance. Due to the coupling of $TiO_2$ and $g-C_3N_4$, the nanostructures exhibited good performance as the higher conduction band of $g-C_3N_4$, which can be combined with $TiO_2$. To fabricate 3D nanostructures of $g-C_3N_4/TiO_2$, $TiO_2$ was first grown as a double layer structure on FTO (Fluorine-doped tin oxide) substrate at $150^{\circ}C$ for 3 h. After this, the $g-C_3N_4$ layer was coated on the $TiO_2$ film at $520^{\circ}C$ for 4 h. As-prepared samples were varied according to loading of melamine powder, with values of loading of 0.25 g, 0.5 g, 0.75 g, and 1 g. From SEM and TEM analysis, it was possible to clearly observe the 3D sample morphologies. From the PEC measurement, 0.5 g of $g-C_3N_4/TiO_2$ film was found to exhibit the highest current density of $0.12mA/cm^2$, along with a long-term stability of 5 h. Compared to the pristine $TiO_2$, and to the 0.25 g, 0.75 g, and 1 g $g-C_3N_4/TiO_2$ films, the 0.5 g of $g-C_3N_4/TiO_2$ sample was coated with a thin $g-C_3N_4$ layer that caused separation of the electrons and the holes; this led to a decreasing recombination. This unique structure can be used in photoelectrochemical applications.

Electrical Properties of Sputtered Gallium-doped Zinc Oxide Films Deposited Using Ne, Ar, or Kr Gas (Ne, Ar, Kr 가스를 사용하여 제작한 스퍼터 Gallium 도프 ZnO 박막의 전기적 특성)

  • Song, Pung-Keun;Ryu, Bong-Ki;Kim, Kwang-Ho
    • Journal of the Korean Ceramic Society
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    • v.39 no.10
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    • pp.935-942
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    • 2002
  • Gallium-doped ZnO (GZO) films were deposited on soda-lime glass substrate without heating using Ne, Ar, or Kr gas. Electrical properties of GZO films deposited at various total gas pressures were investigated for the film positions corresponding to the erosion region (region B) and outside the erosion region (region A) of the target. Region B showed high resistivity, which was attributed to the decrease in carrier density and Hall mobility, compared to region A. GZO films deposited using Ne gas showed the degradation in resistivity and crystallinity, whereas, GZO films deposited using Kr gas showed the improvement in resistivity and crystallinity. This degradation in film properties could be attributed to the film damage caused by the bombardment of high-energy particles. Especially, the energies of recoiled neutral atoms ($Ne^0,\;Ar^0,\;Kr^0$) calculated by Monte Carlo simulation corresponded to experimental results.

Studies on Improved Carbon Cathode Performance in High Rate $Li/SOCl_2$ Cell (고율 방전용 $Li/SOCl_2$ 전지의 카본 양극 개선에 관한 연구)

  • 최정자;조성백;박희숙
    • Journal of the Korean Ceramic Society
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    • v.34 no.3
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    • pp.225-232
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    • 1997
  • The performance characteristics of high rate discharge LiSOCl2 cells are highly affected by carbon cathode. During the cell discharge, SOCl2 reduction takes place at the porous carbon cathode, resulting in the precipitation of reaction products, mainly LiCl, within the pores of the substrate. This leads to eventual passivation of the cathode surface and resulting cell failure. To improve the cathode performance, we ex-amined discharge reactions of cathodes (half-cell, 50 mA/$\textrm{cm}^2$ constant current) with various surface density and thickness. The carbon cathode with the optimum capacity for our application is surface density 0.04 g/$\textrm{cm}^2$ and thickness 1.4mm carbon. The carbon cathode with surface density 0.04g/$\textrm{cm}^2$ and thickness 1.4 mm exhibits decreased polarization, increased discharge duration time and capacity (Ah/$\textrm{cm}^2$) as compared with that with surface density 0.04g/$\textrm{cm}^2$ and thickness 0.8mm. The porosities analyses on the two carbon cathodes show that total pore volume of the carbon cathode with thickness 1.4 mm is larger than that with thickness 0.8mm. The increased volume of mesopores (0.05$\mu$m~0.5$\mu$m) and macropores(>0.5$\mu$m) is ob-served with the carbon cathode with thickness 1.4mm as compared with that with thickness 0.8mm, which can be related with the observed capacity increase. We observed LiCl crystals, cubic crystallites and fused, plate-like aggregates, and some elemental S as discharge products by EDS and XRD.

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Amorphous Lithium Lanthanum Titanate Solid Electrolyte Grown on LiCoO2 Cathode by Pulsed Laser Deposition for All-Solid-State Lithium Thin Film Microbattery (전고상 리튬 박막 전지 구현을 위해 펄스 레이저 증착법으로 LiCoO2 정극위에 성장시킨 비정질 (Li, La)TiO3고체 전해질의 특성)

  • 안준구;윤순길
    • Journal of the Korean Ceramic Society
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    • v.41 no.8
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    • pp.593-598
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    • 2004
  • To make the all-solid-state lithium thin film battery having less than 1 fm in thickness, LiCoO$_2$ thin films were deposited on Pt/TiO$_2$/SiO$_2$/Si substrate as a function of Li/Co mole ratio and the deposition temperature by Pulsed Laser Deposition (PLD). Especially, LiCoO$_2$ thin films deposited at 50$0^{\circ}C$ with target of Li/Co=1.2 mole ratio show an initial discharge capacity of 53 $\mu$Ah/cm$^2$-$\mu$m and capacity retention of 67.6%. The microstructural and electrochemical properies of (Li, La)TiO3 thin films grown on LiCoO$_2$Pt/TiO$_2$/SiO$_2$/Si structures by Pulsed Laser Deposition (PLD) were investigated at various deposition temperatures. The thin films grown at 10$0^{\circ}C$ show an initial discharge capacity of approximately 51 $\mu$Ah/cm$^2$-$\mu$m and moreover show excellent discharge capacity retention of 90% after 100 cycles. An amorphous (Li, La)TiO$_3$ solid electrolyte is possible for application to solid electrolyte for all-solid-state lithium thin film battery below 1 $\mu$m.

Growth of ZnO Film by an Ultrasonic Pyrolysis (초음파 열분해법를 이용한 ZnO 성장)

  • Kim, Gil-Young;Jung, Yeon-Sik;Byun, Dong-Jin;Choi, Won-Kook
    • Journal of the Korean Ceramic Society
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    • v.42 no.4
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    • pp.245-250
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    • 2005
  • ZnO was deposited on sapphire single crystal substrate by an ultrasonic pyrolysis of Zinc Acetate Dehydrate (ZAH) with carrying Ar gas. Through Thermogravimetry-Differential Scanning Calorimetry(TG-DSC), zinc acetate dihydrate was identified to be dissolved into ZnO above $380^{\circ}C$. ZnO deposited at $380-700^{\circ}C$ showed polycrystalline structures with ZnO (101) and ZnO (002) diffraction peaks like bulk ZnO in XRD, and from which c-axis strain ${\Sigma}Z=0.2\%$ and compressive biaxial stress$\sigma=-0.907\;GPa$ was obtained for the ZnO deposited $400^{\circ}C$. Scanning electron microscope revealed that microstructures of the ZnO were dependent on the deposition temperature. ZnO grown below temperature $600^{\circ}C$ were aggregate consisting of zinc acetate and ZnO particles shaped with nanoblades. On the other hand the grain of the ZnO deposited at $700^{\circ}C$ showed a distorted hexagonal shape and was composed of many ultrafine ZnO powers of 10-25 nm in size. The formation of these ulrafine nm scale ZnO powers was explained by the model of random nucleation mechanism. The optical property of the ZnO was analyzed by the photoluminescence (PL) measurement.

Crystal Structure and Physical Property of Tetragonal-like Epitaxial Bismuth Ferrites Film

  • Nam, Joong-Hee;Biegalski, Michael;Christen, Hans M.;Kim, Byung-Ik
    • Proceedings of the Korean Magnestics Society Conference
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    • 2011.06a
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    • pp.7-8
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    • 2011
  • Basically, the lattice mismatch between film and substrate can make those BiFeO3(BFO) films distorted with strain structure. BFO phase can be stabilized on LaAlO3(LAO) represents the example of a multiferroic with giant axial ratio. Its crystal structure is not strictly tetragonal, but tetragonal with a slight monoclinic distortion and related to the rotation of the oxygen octahedra. In this study, we show that phases with a tetragonal-like epitaxial BFO films can indeed be ferroelectric and also can be stabilized via epitaxial growth onto LAO. Recent reports on epitaxial BFO films show that the crystal structure changes from nearly rhombohedral ("R-like") to nearly tetragonal("T-like") at strains exceeding approximately -4.5%, with the "T-like" structure being characterized by a highly enhanced c/a ratio. While both the "R-like" and the "T-like" phases are monoclinic, our detailed x-ray diffraction results reveal asymmetry change from MA and MC type, respectively. By applying additional strain or by modifying the unit cell volume of the film by substituting Ba for Bi, the monoclinic distortion in the "T-like" MC phase is reduced, i.e. the system approaches a true tetragonal symmetry. There are two different M-H loops for $Bi_{1-x}Ba_xFeO_{3-{\delta}}$(BBFO) and BFO films on SrTiO3(STO) & LAO substrates. Along with the ferroelectric characterization, these magnetic data indicate that the BFO phase stabilized on LAO represents the first example of a multiferroic with giant axial ratio. However, there is a significant difference between this phase and other predicted ferroelectrics with a giant axial ratio: its crystal structure is not strictly tetragonal, but tetragonal with a slight monoclinic distortion. Therefore, in going from bulk to highly-strained films, a phase sequence of rhombohedral(R)-to-monoclinic ["R-like" MA-to-monoclinic, "T-like" MC-to-tetragonal (T)] is observed. This sequence is otherwise seen only near morphotropic phase boundaries in lead-based solid-solution perovskites (i.e. near a compositionally induced phase instability), where it can be controlled by electric field, temperature, or composition. Our results show that this evolution can occur in a lead-free, stoichiometric material and can be induced by stress alone. Those major results are summarized as follows ; 1) Ba-doping increases the unit cell volume, 2) BBFO on LAO can be fully strained up to x=0.08 as a strain limit (Fig. 1), 3) P(E) & M(H) properties can be tuned by the variation of composition, strain, and film thickness.

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Preparation of Ferroelectric (YbxY1-x)MnO3 Thin Film by Sol-Gel Method (졸-겔법에 의한 (YbxY1-x)MnO3강유전체 박막제조)

  • 강승구;이기호
    • Journal of the Korean Ceramic Society
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    • v.41 no.2
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    • pp.170-175
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    • 2004
  • The ferroelectric (Y $b_{x}$ $Y_{1-x}$)Mn $O_3$ thin films were fabricated by sol-gel method using Y-acetate, Yb-acetate, and Mn-acetate as raw materials. The stable (Y $b_{x}$ $Y_{1-x}$)Mn $O_3$ precursor solution (sol) was prepared through the reflux process with acetylaceton as a catalyst and coated on Si(100) substrate by spin coating. The heat treatment temperature and, Rw ($H_2O$/alkoxide moi ratio) dependence on crystallinity of thin films were studied. The lowest temperature for obtaining YbMn $O_3$phase and the optimum heat-treatment conditions were proved as at 7$50^{\circ}C$ and 80$0^{\circ}C$, respectively. The hexagonal YbMn $O_3$with c-axis preferred orientation could be obtained at Rw=1 condition. The remanent polarization for the thin films of x=0 or 1 was about 200 nC/㎤ while, for the specimens ot 0< x< 1, were 50∼100 nC/$\textrm{cm}^2$.

Low-temperature Sintering and Microwave Dielectric Properties of BaTi4O9-based Ceramics (BaTi4O9계 세라믹스의 저온소결 및 마이크로파 유전특성)

  • Choi, Young-Jin;Shin, Dong-Soon;Park, Jae-Hwan;Nahm, Sahn;Park, Jae-Gwan
    • Journal of the Korean Ceramic Society
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    • v.40 no.2
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    • pp.172-177
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    • 2003
  • Effect of glass addition on the low-temperature sintering and microwave dielectric properties of $BaTi_4O_9$-based ceramics were studied to develop the materials for the functional substrate of low-temperature co-fired ceramics. When 10 wt% of glass was added, sufficient densification was obtained and the relative density more than 98% was reached at the sintering temperature of$875{\circ}C$. The microwave dielectric properties were k=32, Q*f=9000 GHz, ${ au}_f$=10 ppm/${\circ}C$. As the amount of glass increased, phase decompositions from $BaTi_4O_9;to;BaTi_5O_{11};and;Ba_4Ti_{13}O_{30}$ was observed.

Synthesis of Nanostructured Si Coatings by Hybrid Plasma-Particle Accelerating Impact Deposition (HP-PAID) and their Characterization (하이브리드 플라즈마 입자가속 충격퇴적(Hybrid Plasma - Particle Accelerating Impact Deposition, HP-PAID) 프로세스에 의한 Si 나노구조 코팅층의 제조 및 특성평가)

  • 이형직;권혁병;정해경;장성식;윤상옥;이형복;이홍림
    • Journal of the Korean Ceramic Society
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    • v.40 no.12
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    • pp.1202-1207
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    • 2003
  • Using a recently developed Hybric Plasma-Particle Accelerating Impact Deposition (HP-PAID) process, synthesis of nanostructured silicon coatings has been investigated by injecting vapor-phase TEOS (tetraethosysilane, (C$_2$H$\_$5/O)$_4$Si) into an Ar hybrid plasma. The plasma jet with reactants was expanded through nozzle into a deposition chamber, with the pressure dropping from 700 to 10 torr. Ultrafine particles accelerated in the free jet downstream of the nozzle, deposited by an inertial impaction onto a temperature controlled substrate. By using this process, nanostructured amorphous silicon coatings with grain size smaller than 10 nm could be synthesized. These samples were annealed in an Ar and crystallized at 900$^{\circ}C$ for 30 min. TEM analysis showed that the annealed coatings were also composed of nanoparticles smaller than 10 nm, which showed a good consistency that the average grain size of 7 nm was also estimated from a peak shift of 2.39 cm$\^$-1/ and Full Width at Half Maximum (FWHM) 5.92 cm$\^$-1/ of Raman analysis. The noteworthy is that a strong PL peak at 398 nm was also obtained for this sample, which indicates that the deposited coatings also contained 3∼4 nm nanostructured grains.