• Journal of the Korean Ceramic Society
• /
• v.40 no.12
• /
• pp.1202-1207
• /
• 2003

Using a recently developed Hybric Plasma-Particle Accelerating Impact Deposition (HP-PAID) process, synthesis of nanostructured silicon coatings has been investigated by injecting vapor-phase TEOS (tetraethosysilane, (C$_2$H$\_$5/O)$_4$Si) into an Ar hybrid plasma. The plasma jet with reactants was expanded through nozzle into a deposition chamber, with the pressure dropping from 700 to 10 torr. Ultrafine particles accelerated in the free jet downstream of the nozzle, deposited by an inertial impaction onto a temperature controlled substrate. By using this process, nanostructured amorphous silicon coatings with grain size smaller than 10 nm could be synthesized. These samples were annealed in an Ar and crystallized at 900$^{\circ}C$ for 30 min. TEM analysis showed that the annealed coatings were also composed of nanoparticles smaller than 10 nm, which showed a good consistency that the average grain size of 7 nm was also estimated from a peak shift of 2.39 cm$\^$-1/ and Full Width at Half Maximum (FWHM) 5.92 cm$\^$-1/ of Raman analysis. The noteworthy is that a strong PL peak at 398 nm was also obtained for this sample, which indicates that the deposited coatings also contained 3∼4 nm nanostructured grains.

• Journal of the Korean Ceramic Society
• /
• v.41 no.7
• /
• pp.518-527
• /
• 2004

In this study, SiC whiskers were grown in porous alumina substrate in order to enhance the filtering efficiency, performance, and durability by controlling pore morphology. This experiment was performed by Chemical Vapor Infiltration (CVI) in order to obtain the whiskers on the inside of pores as well as on the surface of porous the A1$_2$O$_3$ substrate. The deposition behavior was changed remarkably with the deposition position, temperature, and input gas ratio. First, the mean diameter of whisker was decreased as the position of observation moved into the inside of substrate due to the reactant gas depletion effect'. Second, the deposition temperature caused the changes of the deposition type such as debris, whiskers and films and the change in morphology affect the various properties. When SiC films were deposited. the gas permeability and the specific surface area decreased. However, the whisker showed the opposite result. The whiskers increase not only the specific surface area and minimizing pressure drop but also mechanical strength. Therefore it is expected that the porous alumina body which deposited the SiC whisker is the promising material for the filter trapping the particles.

• Korean Journal of Materials Research
• /
• v.6 no.7
• /
• pp.723-732
• /
• 1996

Cu films were deposited by chemical wapor deposition on the as-received substrates (TiN/Si) and three kinds of Cu-seeded substrates (Cu/TiN/Si) which had seeding layer in the thick ness of 5 ${\AA}$ and 130 ${\AA}$ coated by ICB(Ionized Cluster Beam) method. The effect of Cu seeding layers on the growth rate, crystallinity, grain size uniformity and film adhesion strength of final CVD-Cu films was investigated by scanning eletron microscopy(SEM), X-ray diffractometry and scratch test. The growth rate was found to incresase somewhat in the case of ICB-seeding. The XRD patterns of the Cu films on the as-received substrate and ICB Cu-seeded substrates exhibited the diffraction peaks corresponding to FCC phase, but the peak intensity ratio($I_{111}/I_{200}$) of Cu films deposited on the ICB Cu-seeded substrates increased compared with that of Cu films on the as-received substrate. The resistivity of final Cu film on 40 ${\AA}$ seeded substrate was observed as the lowest value, 2.42 $\mu\Omega\cdot$cm compared with other Cu films. In adhesion test, as the seeding thickness increased from zero to 130 ${\AA}$, the adhesion strength increased from 21N to 27N.

• Journal of the Korean Ceramic Society
• /
• v.39 no.8
• /
• pp.801-806
• /
• 2002

The decomposition and/or conversion of carbon dioxide to carbon have been studied using oxygen-deficient ferrites for the reduction of $CO_2$ emission to the atmosphere. In this work, the homogeneous precipitation method using urea decomposition was employed to induce in situ precipitation of Ni ferrite($Ni_{0.4}Fe_{2.6}O_4$) on the porous ceramic fiber support (50 mm diameter${\times}$10 mm thickness). Effects of ferrite loading conditions on the CO2 decomposition efficiency were discussed in this paper. Removal of residual chloride ions and urea by solvent exchange from the porous media after ferrite deposition apparently helps to form spinel ferrite, but does not increase the efficiency of $CO_2$ decomposition. Porous ceramic fiber composites containing 20 wt% (1g) ferrite samples showed 100% efficiency for $CO_2$decomposition during the first three minutes, but the efficiency decreased rapidly after the elapsed time of ten minutes. The characteristic reduction time for the $CO_2$ decomposition efficiency was estimated as about 3∼7 min.

• Journal of the Korean Ceramic Society
• /
• v.50 no.1
• /
• pp.50-56
• /
• 2013

Phosphorescent materials coated with titanium dioxide were fabricated and photocatalytic reactions between these materials and VOCs gases were examined. A thin film (approx. 100 nm) of nanosized $TiO_2$ was deposited on the $Sr_4Al_{14}O_{25}$ : $Eu^{2+}$, $Dy^{3+}$, $Ag^+$ phosphor using low-pressure chemical vapor deposition (LPCVD). The characteristics of the photocatalytic reaction were examined in terms of the decomposition of benzene gas using a gas chromatography (GC) system under ultraviolet (${\lambda}$ = 365 nm) and visible light (${\lambda}$ > 420 nm) irradiation. $TiO_2$-coated $Sr_4Al_{14}O_{25}$ : $Eu^{2+}$, $Dy^{3+}$, $Ag^+$ phosphor showed different photocatalytic behavior compared with pure $TiO_2$. $TiO_2$-coated phosphorescent materials showed a much faster photocatalytic decomposition of benzene gas under visible irradiation compared to the pure $TiO_2$ for which the result was practically negligible. This suggests that the extension of the absorption wavelength to visible light occurred through energy band bending by a heterojunction at the interface of the $Sr_4Al_{14}O_{25}-TiO_2$ composite. Also, the $Sr_4Al_{14}O_{25}-TiO_2$ composite showed the photocatalytic decomposition of benzene in darkness due to the photon light emitted from the $Sr_4Al_{14}O_{25}$ phosphors.

• Journal of the Korean Ceramic Society
• /
• v.53 no.1
• /
• pp.87-92
• /
• 2016

Due to its stability at high temperature and its layered structure, $Ti_3SiC_2$ MAX phase was considered to the interphase of $SiC_f/SiC$ composite. In this study, $Ti_3SiC_2$ MAX phase powder was deposited on SiC fiber via the electrophoretic deposition (EPD) method. The Zeta potential of the $Ti_3SiC_2$ suspension with and without polyethyleneimine as a dispersant was measured to determine the conditions of the EPD experiments. Using a suspension with 0.03 wt.% ball milled $Ti_3SiC_2$ powder and 0.3 wt.% PEI, $Ti_3SiC_2$ MAX phase was successfully coated on SiC fiber with an EPD voltage of 10 V for 2 h. Most of the coated $Ti_3SiC_2$ powders are composed of spherical particles. Part of the $Ti_3SiC_2$ powders that are platelet shaped are oriented parallel to the SiC fiber surface. From these results we expect that $Ti_3SiC_2$ can be applied to the interphase of $SiC_f/SiC$ composites.

• Journal of the Korean Ceramic Society
• /
• v.45 no.9
• /
• pp.549-555
• /
• 2008

The thermal barrier coating must withstand erosion when subjected to flowing gas and should also maintain good stability and mechanical properties while it must also protect the turbine component from high temperature, hot corrosion, creep, and oxidation during operation. In this study we investigated the influence of subsurface layer, $Al_2O_3$ or NiCrCoAIY bond coat layer, on the indentation damage behavior of YSZ thermal barrier coating layers deposited by electron beam physical vapor deposition (EB-PVD). The bond coat is deposited using different process such as air plasma spray (APS) or spray of high velocity oxygen fuel (HVOF) and the thickness is varied. Hertzian indentation technique is used to induce micro damages on the coated layer. The stress-strain behaviors are characterized by results of the indentation tests.

• Journal of the Korean Ceramic Society
• /
• v.39 no.12
• /
• pp.1171-1176
• /
• 2002

The growth characteristics on the MgO thin films prepared by the e-beam evaporation method have been investigated. We observed the film of preferred orientation and surface morphology with various parameters such as substrate temperature, deposition rate on Si(100) and slide glass respectively. Consequently, it was shown that MgO(111) preferred orientation films can be obtained as the deposition rate was increased on Si(100) substrate. MgO(220) peak was found as the substrate temperature was increased. Whereas, in case of slide glass the orientation is changed from (200) to (111) by substrate temperature. Also we investigated the relationship between the film characteristics and the orientation of MgO thin films.

• Journal of the Korean Ceramic Society
• /
• v.50 no.2
• /
• pp.122-126
• /
• 2013

The surface roughness of the inner and outer surfaces of a tube is an important requirement for nuclear fuel cladding. When an inner SiC clad tube, which is considered as an advanced Pressurized Water Cooled Reactor (PWR) clad with a three-layered structure, is fabricated by Chemical Vapor Deposition (CVD), the surface roughness of the substrate, graphite, is an important process parameter. The surface character of the graphite substrate could directly affect the roughness of the inner surface of SiC deposits, which is in contact with a substrate. To evaluate the effects of the surface roughness changes of a substrate, SiC deposits were fabricated using different types of graphite substrates prepared by the following four polishing paths and heat-treatment for purification: (1) polishing with #220 abrasive paper (PP) without heat treatment (HT), (2) polishing with #220 PP with HT, (3) #2400 PP without HT, (4) polishing with #2400 PP with HT. The average surface roughnesses (Ra) of each deposited SiC layer are 4.273, 6.599, 3.069, and $6.401{\mu}m$, respectively. In the low pressure SiC CVD process with a graphite substrate, the removal of graphite particles on the graphite surface during the purification and the temperature increasing process for CVD seemed to affect the surface roughness of SiC deposits. For the lower surface roughness of the as-deposited interlayer of SiC on the graphite substrate, the fine controlled processing with the completed removal of rough scratches and cleaning at each polishing and heat treating step was important.

• Journal of the Korean Ceramic Society
• /
• v.31 no.12
• /
• pp.1429-1436
• /
• 1994

We have prepared Ba0.5Sr0.5TiO3 thin films on Si substrate without buffer layer. Deposition was carried out by off-axis rf magnetron sputtering method using Ba0.5Sr0.5TiO3 stoichiometric target. The substrate temperature was changed from 40$0^{\circ}C$ to $700^{\circ}C$ during deposition. As the substrate temperature increased, relative intensity of (110) peak increased up to $600^{\circ}C$, however preferred orientation changed from (110) to (h00) beyond $650^{\circ}C$ of substrate temperature. Deposited films showed microstructures with fine grains whose diameters are less than 100 nm, and columnar structure was observed in the cross-sectional SEM micrograph. AES depth profile showed no significant diffusion at the interfacial reaction area. The effective dielectric constant of films showed maximum value at $600^{\circ}C$, and the leakage current increased with increasing substrate temperature, which may be ascribed to the crystallization of amorphous phases at grain boundary.