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http://dx.doi.org/10.4191/KCERS.2002.39.12.1171

A Study on the Characteristics of MgO Thin Films Prepared by Electron Beam  

Lee, Choon-Ho (Department of Materials Engineering, Keimyung University)
Kim, Sun-Il (Department of Materials Engineering, Keimyung University)
Shin, Ho-Shik (Thin Film Devision, Tae Yang Electronics Co., LTD.)
Publication Information
Abstract
The growth characteristics on the MgO thin films prepared by the e-beam evaporation method have been investigated. We observed the film of preferred orientation and surface morphology with various parameters such as substrate temperature, deposition rate on Si(100) and slide glass respectively. Consequently, it was shown that MgO(111) preferred orientation films can be obtained as the deposition rate was increased on Si(100) substrate. MgO(220) peak was found as the substrate temperature was increased. Whereas, in case of slide glass the orientation is changed from (200) to (111) by substrate temperature. Also we investigated the relationship between the film characteristics and the orientation of MgO thin films.
Keywords
E-beam evaporation; Preferred orientation; AC PDP; Slide glass; Si(100);
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Times Cited By KSCI : 1  (Citation Analysis)
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