Characteristics of Aluminum Oxide Films Grown by Atomic Layer Deposition from TMA and $H_2O$ Precursors
(원자층 증착법을 이용한 알루미늄 옥사이드 특성 연구)
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- Proceedings of the Korean Ceranic Society Conference
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- 2003.10a
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- pp.199.2-199
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- 2003