• Title/Summary/Keyword: Cathodic current process

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Tribological Behavior of Multilayered WC-Ti1-xAlxN Coatings Deposited by Cathodic Arc Deposition Process on High Speed Steel

  • Kim, Jung Gu;Hwang, Woon Suk
    • Corrosion Science and Technology
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    • v.5 no.2
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    • pp.52-61
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    • 2006
  • Recently, much of the current development in surface modification engineering are focused on multilayered coatings. Multilayered coatings have the potential to improve the tribological properties. Four different multilayered coatings were deposited on AISI D2 steel. The prepared samples are designed as $WC-Ti_{0.6}Al_{0.4}N$, $WC-Ti_{0.53}Al_{0.47}N$, $WC-Ti_{0.5}Al_{0.5}N$ and $WC-Ti_{0.43}Al_{0.57}N$. The multilayered coatings were investigated with respect to coating surface and cross-sectional morphology, roughness, adhesion, hardness, porosity and tribological behavior. Especially, wear tests of four multilayered coatings were performed by using a ball-on-disc configuration with a linear sliding speed of 0.017 m/sec, 5.38 N load. The tests were carried out at room temperature in air by employing AISI 52100 steel ball ($H_R=66$) having a diameter of 10 mm. The surface morphology, and topography of the wear scars of samples and balls have been determined by using scanning electron spectroscopy (SEM). Results have showed an improved wear resistance of the $WC-Ti_{1-x}Al_xN$ coatings with increasing of Al concentration. $WC-Ti_{0.43}Al_{0.57}N$ coating with the lower surface roughness and porosity with good adhesion enhanced wear resistance.

Properties on the Calcareous Deposit Films Formed in Submerged Zone and Tidal Zone of Steel Pipe by Cathodic Current Process (음극전류 프로세스에 의해 강관 해중부 및 간만대 부위에 형성된 석회질 피막의 특성 분석)

  • Park, Jun-Mu;Gang, Jae-Uk;Hwang, Seong-Hwa;Gang, Jun;Lee, Myeong-Hun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2015.11a
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    • pp.351-351
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    • 2015
  • 음극방식법은 피방식체에 외부전원을 인가하거나 보다 활성 금속을 전기적으로 연결하여 피방식체를 일정 전위까지 음극분극 되도록 하여 부식을 억제하는 방법이다. 해수 중 음극방식을 실시할 경우 생성되는 석회질 피막(Calcareous deposit)은 소요전류밀도 감소로 인한 희생양극의 수명연장 및 물리적 방호벽 역할을 한다. 그러나 일반적인 석회질 피막은 세라믹과 같은 화합물로써 밀착력이 매우 약하며, 적지 않은 피막 형성 시간이 소요된다. 따라서 본 연구에서는 해수 중 음극전류 프로세스를 응용하여 실제 강관의 해중부 및 간만대 영역까지 석회질 피막을 균일-치밀하게 형성시키기 위한 최적의 조건을 찾고자 하였다. 각 조건별로 제작된 석회질 피막은 SEM, EDS 및 XRD를 통해 막의 모폴로지, 조성원소 및 결정 구조를 분석하였으며, 이를 바탕으로 희생양극 종류(Al, Zn) 및 1, 3, $5mA/m^2$의 전류밀도 조건에서 부위-기간별 형성된 석회질 피막의 메커니즘을 해명하였다. 또한 밀착성과 내식특성을 평가하기 위해 테이핑 테스트, 침지-자연전위 거동을 분석 및 평가하였다.

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Polarization Behaviors of SnCu Pb-Free Solder Depending on the P, Ni, Addition (SnCu계 무연솔더의 Ni, P 첨가에 따른 분극거동)

  • Hong Won Sik;Kim Whee Sung;Park Sung Hun;Kim Kwang-Bae
    • Korean Journal of Materials Research
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    • v.15 no.8
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    • pp.528-535
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    • 2005
  • It is inclined to increase that use of hazardous substances such as lead(Pb), mercury (Hg), cadmium(Cd) etc. are prohibited in the electronics according to environmental friendly policies of an advanced nation for protecting environment of earth. As this reasons, many researches for ensuring the reliability were proceeding in Pb free soldering process. n the flux remains on the PCB(printed circuit board) in the soldering process or the electronics exposed to corrosive environment, it becomes the reasons of breakdown or malfunction of the electronics caused by corrosion. Therefore in this studies we researched the polarization and Tafel properties of Sn40Pb and SnCu system solders based on the electrochemical theory. The experimental polarization curves were measured in distilled ionized water and 1 mole $3.5 wt\%$ NaCl electrolyte of $40^{\circ}C$, pH 7.5. Ag/AgCl and graphite were utilized by reference and counter electrodes, respectively. To observe the electrochemical reaction, polarization test was conducted from -250mV to +250mV. From the polarization curves composed of anodic and cathodic curves, we obtained Tafel slop, reversible electrode potential(Ecorr) and exchange current density((cow). In these results, we compared the corrosion rate of SnPb and SnCu solders.

Tafel Characteristics by Electrochemical Reaction of SnAgCu Pb-Free Solder (SnAgCu계 무연솔더의 전기화학적 반응에 따른 타펠 특성)

  • Hong Won Sik;Kim Kwang-Bae
    • Korean Journal of Materials Research
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    • v.15 no.8
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    • pp.536-542
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    • 2005
  • Recently European Council(EU) published the RoHS(restriction of the use of certain hazardous substances in electrical and electronic equipment) which is prohibit the use of Pb, Hg, Cd, $Cr^{+6}$, PBB or PBDE in the electrical and electronic equipments. So EU member States shall ensure that, from 1 July 2006, new electrical and electronic equipment put on the market does not contain 6 hazardous substances. The one of the most important in electronics manufacturing process is soldering. Soldering process use the chemical substances which are applied in fluxing and cleaning processes and it can generate the malfunction of electronics caused by corrosion in the fields conditions. Therefore this study researched on the polarization and Tafel properties of Sn40Pb and Sn3.0Ag0.5Cu(SAC) solder based on the electrochemical theory. We prepared SnPb specimens which was aged in $150^{\circ}C,\;180^{\circ}C$ for 15 minutes ana Sn3.0Ag0.5Cu specimens that was aged in $180^{\circ}C,\;220^{\circ}C$ for 10 minutes. Experimental polarization curves were measured in distilled ionized water and $3.5 wt\%$, 1 mole NaCl electrolyte of $40^{\circ}C$, pH 7.5. Ag/AgCl and graphite were utilized by reference and counter electrode, respectively. To observe the electrochemical reaction, polarization test was conducted from -250 mV to +250 mV. From the polarization curves that were composed of anodic and cathodic curves, we obtained Tafel slop, reversible electrode potential(Ecorr) and exchange current density(Icorr). In these results, corrosion rate for two specimen were compared Sn3.0Ag0.5Cu with SnPb solders

The Effect of Barrel Vibration Intensity to the Plating Thickness Distribution

  • Lee, Jun-Ho;Roselle D. Llido
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 1999.10a
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    • pp.15-15
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    • 1999
  • In chip plating, several parameters must be taken into consideration. Current density, solution concentration, pH, solution temperature, components volume, chip and media ratio, barrel geometrical shape were most likely found to have an effect to the process yields. The 3 types of barrels utilized in chip plating industry are the conventional rotating barrel. vibrational barrel (vibarrel), and the centrifugal type. Conventional rotating barrel is a close type and is commonly used. The components inside the barrel are circulated by the barrel's rotation at a horizontal axis. Process yield has known to have higher thickness deviation. The vibrational barrel is an open type which offers a wide exposure to electrolyte resulting to a stable thickness deviation. It rotates in a vertical axis coupled with multi-vibration action to facilitate mixed up and easy transportation of components, The centrifugal barrel has its plated work centrifugally compacted against the cathode ring for superior electrical contact with simultaneous rotary motion. This experiment has determined the effect of barrel vibration intensity to the plating thickness distribution. The procedures carried out in the experiment involved the overall plating process., cleaning, rinse, Nickel plating, Tin-Lead plating. Plating time was adjusted to meet the required specification. All other parameters were maintained constant. Two trials were performed to confirm the consistency of the result. The thickness data of the experiment conducted showed that the average mean value obtained from higher vibrational intensity is nearer to the standard mean. The distribution curve shown has a narrower specification limits and it has a reduced variation around the target value, Generally, intensity control in vi-barrel facilitates mixed up and easy transportation of components, However, it is desirable to maintain an optimum vibration intensity to prevent solution intrusion into the chips' internal electrode. A cathodic reaction can occur in the interface of the external and internal electrode. $2HD{\;}+{\;}e{\;}{\rightarrow}20H{\;}+{\;}H_2$ Hydrogen can penetrate into the body and create pressure which can cause cracks. At high intensity, the chip's motion becomes stronger, its contact between each other is delayed and so plating action is being controlled. However, the strong impact created by its collision can damage the external electrode's structure thereby resulting to bad plating condition. 1 lot of chip was divided into two equal partion. Each portion was loaded to the same barrel one after the other. Nickel plating and tin-lead plating was performed in the same station. Portion A maintained the normal barrel vibration intensity and portion B vibration intensity was increased two steps higher. All other parameters, current, solution condition were maintained constant. Generally, plating method find procedures were carried out in a best way to maintained the best plating condition. After plating, samples were taken out from each portion. molded and polished. Plating thickness was investigated for both. To check consistency of results. 2nd trial was done now using different lot of another characteristics.

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The Evaluation of Electrolytic Nitrate Removal Efficiency of TiO2 Nanotube Plate (TiO2 nanotube plate의 질산성질소 전기분해 효율 평가)

  • Kim, Da Eun;Lee, Yongho;Han, Heeju;Choi, Hyo yeon;Pak, Daewon
    • Journal of the Korean Applied Science and Technology
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    • v.35 no.3
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    • pp.612-621
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    • 2018
  • In this study, $TiO_2$ nanotube plate and metal electrodes(Copper, Nickel, Stainless Steel, Aluminum, Tin, Titanium) were compared on cathodic reduction of nitrate ($NO_3{^-}-N$) during electrolysis. The electrochemical characteristics were compared based on electrochemical impedance spectroscopy (EIS). The surface morphology was obtained using scanning electron microscopy (SEM) method. Brunauer-Emmett-Teller (BET) method was implemented for the specific surface area analysis of the cathodes. To study kinetics, 90 minute batch electrolysis of nitrate solution was performed for each cathodes. In conclusion, under the condition of relatively low ($0.04 A\;cm^{-2}$) current density, $TiO_2$ nanotube plate showed no surface corrosion during the electrolysis, and the reaction rate was measured the highest in the kinetic analysis.

Electrochemical Studies of Light Lantanide Complexes (Part 1) (가벼운 란탄족 원소 착물의 전기화학적 연구 (제 1 보))

  • Kang Sam-Woo;Park Chong-Min;Chang Choo-Hawn;Do Lee-Mi;Suh Moo-Yul
    • Journal of the Korean Chemical Society
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    • v.37 no.1
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    • pp.83-91
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    • 1993
  • The eletrochemical behavior of light lanthanide complexes has been investigated by several electrochemical techniques in alkaline solutions. The composition of the complexes was determined by spectrophotometric method to be 1 : 1 and reduction mechanism was two steps 1 electron transfer reaction. The half wave potential of first peak depended on pH and cathodic current showed remarkably adsorptive properties. The results of DC and CV investigation demonstrated the quise-reversible nature of the electron transfer. The anion radical formed after first one electron reduction process, dimerizes to form dimer. The apparent irreversible behavior of the second wave is a result of the existence of a fast protonation following the second electron transfer. An exhaustive electrolysis was carried out at controlled potential of -1.80 V, deep blue color of the solution became progressively weaker, and then the solution became colorless solution. The final product of an exhaustive electrolysis is electro-inactive. The appearance of four steps may be explained by the fact the reduction of Ln-OCP elucidated ECEC mechanism.

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Electrochemical Behavior of Light Lanthanide Ions in Nonaqueous Solution, Flow Injection Determination and Photochemical Characterization of Eight Coordinated Chelates of Heavy Metal Ions (Part I) Electrochemical Behavior of Light Lanthanide Ions in Nonaqueous Solution (물아닌용매에서 가벼운 란탄족 이온의 전기화학적 거동, 흐름주입에 의한 정량 및 중금속이온의 킬레이트형 8-배위 착물의 광화학적 특성 (제 1 보) 물아닌용매에서 가벼운 란탄족이온의 전기화학적 거동)

  • Kang, Sam-Woo;Pak, Chong-Min;Do, Lee-Mi;Song, Myoung-Kyu;Kim, Il-Kwang
    • Analytical Science and Technology
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    • v.7 no.3
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    • pp.361-369
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    • 1994
  • Voltammetric behavior of some light lanthanide ions($La^{3+}$, $Pr^{3+}$, $Nd^{3+}$, $Sm^{3+}$ and $Eu^{3+}$) in acetonitrile(AN) and dimethylformamide(DMF) has been investigated by direct current, differential pulse polarography and cyclic voltammetry. The reduction of $La^{3+}$, $Pr^{3+}$ and $Nd^{3+}$ in 0.1M TEAP proceeded directly to the metallic state through three-electron charge transfer of irreversible process where as $Sm^{3+}$ and $Eu^{3+}$ proceeded by charge transfer of two steps. As the results of the cyclic voltammetric investigation, the first step reduction of $Sm^{3+}$ and $Eu^{3+}$ were a quasireversible reaction, the second step reductions were an irreversible reaction. The cathodic peak currents of the differential pulse polarogram showed adsorptive properties at lower sweep rates and high concentrations of these metal ions. The peak potenital was shifted to a negative petential and the peak current decreased with the increase of percentage of water in AN. On the other hand, the peak potential was shifted to a positive potential and the peak current decreased with an increased percentage of water in DMF.

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Electrochemical Characteristic on Lithium Intercalation into the Interface between Organic Electrolyte and Amorphous WO3 Thin Film Prepared by e-beam Evaporation Method (e-beam 증발법으로 제조된 비정질 WO3박막과 전해질 계면으로 삽입되는 리튬의 층간 반응에 관한 전기화학적 특성)

  • Min, Byoung-Chul;Sohn, Tae-Won;Ju, Jeh-Beck
    • Applied Chemistry for Engineering
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    • v.8 no.6
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    • pp.1022-1028
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    • 1997
  • This work was performed to study the characteristics of electrochemical intercalation reactions occurring at the interface between the organic electrolyte and tungsten trioxide thin film (thickness of $4000{\AA}$) prepared by e-beam evaporation method as cathodically coloring oxide with regard to the electrochromism by the intercalating reactions of the lithium cation in the 1M $LiClO_4/PC$ organic solution. The characteristics of electrochemical intercalation reactions were investigated by various DC electrochemical methods such as cathodic Tafel polarization test, multiple and the single sweep cyclic voltammetry and the coulomety titrations method. The surfaces of thin films were observed with the patterns of X ray diffraction after the coloring and bleaching reactions. In comparison with the previous results that $WO_3$ thin film intersely detached from the surface of electrode when the hydrogen cation was intercalated into $WO_3$ thin film in the o.1N $H_2SO_4$ aqueous solution, the intercalation reaction of lithium cation into $WO_3$ thin film in the 1M $LiClO_4/PC$ organic solution was shown that the stable bleaching and coloration was appeared within 1.0V of the applied overpotential. When the overpotential of electrochromic reaction for lithium cation in the 1M $LiClO_4/PC$ organic solution had been applied up to 1.5V, the accumulation phenomenon of lithium in amorphous $WO_3$ thin film layer occurred because the inserted lithium into amorphous $WO_3$ thin layer for coloring process was not fully removed from the thin layer to the electrolyte during bleaching process. It was found that there is a limitation of applied overpotential for coloring process by the reduction of the current densities of bleaching and coloration after few number of coloring and bleaching cycles.

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Electrochemical Characteristic on Hydrogen Intercalation into the Interface between Electrolyte of the 0.1N H2SO4and Amorphous Tungsten Oxides Thin Film Fabricated by Sol-Gel Method (졸-겔법으로 제조된 비정질의 텅스텐 산화물 박막과 황산 전해질 계면에서 일어나는 수소의 층간 반응에 대한 전기화학적 특성)

  • Kang, Tae-Hyuk;Min, Byoung-Chul;Ju, Jeh-Beck;Sohn, Tae-Won;Cho, Won-Il
    • Applied Chemistry for Engineering
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    • v.7 no.6
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    • pp.1078-1086
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    • 1996
  • The peroxo-polytungstic acid was formed by the direct reaction of tungsten powder with the hydrogen peroxide solution. Peroxo-polytungstic powder were prepared by rotary evaporator using the fabricated on to ITO coated glass as substrate by dip-coating method using $2g/10mL(W-IPA/H_2O)$ sol solution. A substrate was dipped into the sol solution and after a meniscus had settled, the substrate was withdrawn at a constant rate of the 3mm/sec. Thicker layer could be built up by repeated dipping/post-treatment 15 times cycles. The layers dried at the temperature of $65{\sim}70^{\circ}C$ during the withdrawn process, and then tungsten oxides thin film was formed by final heating treatment at the temperature of $230{\sim}240^{\circ}C$ for 30min. A linear rotation between the thickness of thin film and the number of dipping/post-treatment cycles for tungsten oxides thin films made by dip-coating was found. The thickness of thin film had $60{\AA}$ after one dipping. From the patterns of XRD, the structure of tungsten oxides thin film identified as amorphous one and from the photographs of SEM, the defects and the moderate cracks were observed on the tungsten oxides thin film, but the homogeneous surface of thin films were mostly appeared. The electrochemical characteristic of the $ITO/WO_3$ thin film electrode were confirmed by the cyclic voltammetry and the cathodic Tafel polaization method. The coloring bleaching processes were clearly repeated up to several hundreds cycles by multiple cyclic voltammetry, but the dissolved phenomenon of thin film revealed in $H_2SO_4$ solution was observed due to the decrease of the current densities. The diffusion coefficient was calculated from irreversible Randles-Sevick equation from the data obtained by the cyclic voltammetry with various scan rates.

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