• Journal of the Korean Electrochemical Society
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• v.18 no.3
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• pp.95-101
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• 2015

In this article, we report the fabrication of Li-rich oxide nanoparticles for Li-ion batteries. Li-rich oxides are promising cathode materials because their capacity is much higher than commercial cathode materials. However, they have several disadvantages such as low rate capability due to their low ionic and electronic conductivity. This study focuses on the fabrication of nanoparticles to enhance the rate capability of Li-rich oxide. Two types of surfactants were introduced to disperse the particles and form the nano-sized particles. The Li-rich oxide nanoparticles showed improved rate capability than pristine sample.

• Proceedings of the Materials Research Society of Korea Conference
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• 2001.11a
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• pp.83-83
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• 2001

• Journal of the Korean Ceramic Society
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• v.56 no.3
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• pp.233-255
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• 2019

Thermal batteries are reserve batteries with molten salts as an electrolyte, which activates at high temperature. Due to their excellent reliability, long shelf life, and mechanical robustness, thermal batteries are used in military applications. A high-performance cathode for thermal batteries should be considered in terms of its high capacity, high voltage, and high thermal stability. Research progress on cathode materials from the recent decade is reviewed in this article. The major directions of research were surface modification, compounding of existing materials, fabrication of thin film cathode, and development of new materials. In order to develop a high-performance cathode, a proper combination of these research directions is required while considering mass production and cost.

• 한국전기화학회:학술대회논문집
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• 2004.04a
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• pp.61-61
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• 2004

• New & Renewable Energy
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• v.4 no.1
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• pp.11-18
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• 2008

In-situ lithiated NiO has been manufactured as a conventional cathode material of molten carbonate fuel cell (MCFC), however this material has a weakness for commercialization of MCFC because NiO is spontaneously dissolved into the electrolyte under MCFC operating conditions, resulting in short circuit between cathode and anode. In this research, therefore, $Co(OH)_2$-coated Ni powder was prepared by precipitation method with controlling pH at low temperature and atmospheric pressure. Modified cathode was fabricated by a conventional tape casting method and sintered at 700$^{\circ}C$ in a $H_2/N_2$ atmosphere, Based on characterization result, Pore size distribution and porosity was suitable for the cathode of MCFC. According to the result of dissolution, Ni solubility of modified cathode was 33% lower than that of conventional cathode. In addition, modified electrode showed a good performance from the single cell operation.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.53 no.2
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• pp.62-66
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• 2004

This paper investigated the characteristics of a newly developed high density hollow cathode plasma (HCP) system and its application for the etching of silicon wafers. We used SF$_{6}$ and $O_2$ gases in the HCP dry etch process. Silicon etch rate of $0.5\mu\textrm{m}$/min was achieved with $SF_6$$O_2$plasma conditions having a total gas pressure of 50mTorr, and RF power of 100 W. This paper presents surface etching characteristics on a crystalline silicon wafer and large area cast type multicrystlline silicon wafer. The results of this experiment can be used for various display systems such as thin film growth and etching for TFT-LCDs, emitter tip formations for FEDs, and bright plasma discharge for PDP applications.s.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.4
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• pp.373-378
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• 2006

We report on plasma damage free-sputtering technologies for organic light emitting diodes (OLEDs), organic thin film transistor (OTFT) and flexible displays by using a box cathode sputtering (BCS) method. Specially designed BCS system has two facing targets generating high magnetic fields ideally entering and leaving the targets, perpendicularly. This target geometry allows the formation of high-density plasma between targets and enables us to realize plasma damage free sputtering on organic layer without protection layer against plasma. The OLED with Al cathode prepared by BCS shows electrical and optical characteristics comparable to OLED with thermally evaporated Mg-Ag cathode. It was found that OLED with Al cathode layer prepared by BCS has much lower leakage current density ($1{\times}10^{-5}\;mA/cm^2$ at -6 V) than that $(1{\times}10^{-2}{\sim}-10^0\;mA/cm^2)$ of OLED prepared by conventional DC sputtering system. This indicates that BCS technique is a promising electrode deposition method for substituting conventional thermal evaporation and DC/RF sputtering in fabrication process of organic based optoelectronics.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.53-54
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• 2005

We report on plasma damage free-sputtering technologies for organic light emitting diodes (OLEDs), organic thin rim transistor (OTFT) and flexible displays by using a box cathode sputtering (BCS) method. Specially designed BCS system has two facing targets generating high magnetic fields ideally entering and leaving the targets, perpendicularly. This target geometry allows the formation of high-density plasma between targets and enables us to realize plasma damage free sputtering on organic layer without protection layer against plasma. The OLED with top cathode prepared by BCS shows electrical and optical characteristics comparable to OLED with thermally evaporated Mg-Ag cathode. It was found that TOLED with ITO or IZO top cathode layer prepared by BCS has much lower leakage current density ($1\times10^{-5}$ mA/cm2 at -6V) than that ($1\times10^{-1}\sim10^{\circ}mA/cm^2$)of OLED prepared by conventional DC sputtering system. This indicates that BCS technique is a promising electrode deposition method for substituting conventional thermal evaporation and dc/rf sputtering in fabrication process of organic based optoelectronics.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.05a
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• pp.634-637
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• 1999

The amorphous vanadium oxide as a cathode material is very preferable for fabricating high performance micro-battery. The amorphous vanadium oxide cathode is preferred over the crystalline form because three times more lithium ions can be inserted into the amorphous cathode, thus making a battery that has a higher capacity. The electrochemical properties of sputtered films are strongly dependent on the oxygen partial pressure in the sputtering gas. The effect of different oxygen partial pressure on the electrochemical properties of vanadium oxide thin films formed by r.f. reactive sputtering deposition were investigated. The stoichiometry of the as-deposited films were investigated by Auger electro spectroscopy. X-ray diffraction and atomic force microscopy measurements were carried out to investigate structural properties and surface morphology, respectively. For high oxygen partial pressure(>30% ), the films were polycrystalline V$_2$O$_{5}$ while an amorphous vanadium oxide was obtained at the lower oxygen partial pressure(< 15%). Half-cell tests were conducted to investigate the electrochemical properties of the vanadium oxide film cathode. The cell capacity was about 60 $\mu$ Ah/$\textrm{cm}^2$ m after 200 cycle when oxygen partial pressure was 20%. These results suggested that the capacity of the thin film battery based on vanadium oxide cathode was strongly depends on crystallinity.y.

• Proceedings of the KIEE Conference
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• 1999.07d
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• pp.1544-1546
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• 1999

The fabrication process for ceramic fuel cell with a large electrode area was investigated. A cofired cell of two layer, electrolyte/anode, yielded a power of $200mW/cm^2$. Its performance loss was mainly due to iR drop in the anode side. The performance of the cofired of three layer. cathode/electrolyte/ anode, was much lower than that of two layer, which resulted from the large iR drop and overvoltage at the cathode side. Also a flat cell with a large area of $7.7{\times}10.8cm^2$ was fabricated successfully and tested using ceramic and metallic interconnectors. The large cell with metallic interconnectror showed a good performance of 0.6 V, 4.5 A.