• 제목/요약/키워드: Carbon thin film

검색결과 493건 처리시간 0.025초

Laser Ablated Carbon Thin Film from Carbon Nanotubes and Their Property Studies

  • Sharon, Maheshwar;Rusop, M.;Soga, T.;Afre, Rakesh A.
    • Carbon letters
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    • 제9권1호
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    • pp.17-22
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    • 2008
  • A carbon nanotube (CNT) of diameter ~20 nm has been synthesized by spray pyrolysis of turpentine oil using Ni/Fe catalyst. Pellet of CNTs has been used as a target to produce semiconducting carbon thin film of band gap 1.4 eV. Presence of oxygen pressure in the pulse laser deposition (PLD) chamber helped to control the $sp^3/sp^2$ ratio to achieve the desired band gap. Results are discussed with the help of Raman spectra, SEM TEM micrographs and optical measurements suggest that semiconducting carbon thin film deposited by PLD technique has retained its nanotubes structure except that its diameter has increased from 20 nm to 150 nm.

Effect of Soft-annealing on the Properties of CIGSe Thin Films Prepared from Solution Precursors

  • Sung, Shi-Joon;Park, Mi Sun;Kim, Dae-Hwan;Kang, Jin-Kyu
    • Bulletin of the Korean Chemical Society
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    • 제34권5호
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    • pp.1473-1476
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    • 2013
  • Solution-based deposition of $CuIn_xGa_{1-x}Se_2$ (CIGSe) thin films is well known non-vacuum process for the fabrication of CIGSe solar cells. However, due to the usage of organic chemicals in the preparation of CIG precursor solutions, the crystallization of the polycrystalline CIGSe and the performance of CIGSe thin film solar cells were significantly affected by the carbon residues from the organic chemicals. In this work, we have tried to eliminate the carbon residues in the CIG precursor thin films efficiently by using soft-annealing process. By adjusting soft-annealing temperature, it is possible to control the amount of carbon residues in CIG precursor thin films. The reduction of the carbon residues in CIG precursors by high temperature soft-annealing improves the grain size and morphology of polycrystalline CIGSe thin films, which are also closely related with the electrical properties of CIGSe thin film solar cells.

저주파수(450 KHz) PECVD에 의한 Diamondlike Carbon박막의 특성 (Characteristics of Diamondike Carbon thin Films by Low Discharging Frequency(450KHz) PECVD)

  • 김한주;주승기
    • 한국재료학회지
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    • 제4권2호
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    • pp.227-232
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    • 1994
  • 450KHz 저주파수로 플라즈마 화학증착법을 이용하여 Diamondlike carbon박막을 제작하고 optical band gap, 미소경도, 내부응력 등의 물성에 대하여 13.56MHz의 전원을 사용했을 때보다 optical band gap이 감소하였으며 FT-IR및 CHN분석결과 박막 내의 C-H결합농도와 총 수소의 함량이 크게 감소하는 것으로 밝혀졌다. 또한 저주파수로 DLC 박막을 형성하는 경우 미소경도의 희생없이 내부응력을 크게 줄일 수 있어 기판과의 접착성이 향상될 것으로 기대되었다.

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Preparation of a Semi-Conductive Thin Film Sensor for Measuring Occlusal Force

  • Yu, Siwon;Kim, Nari;Lee, Youngjin
    • 센서학회지
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    • 제24권2호
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    • pp.88-92
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    • 2015
  • In order to study the semi-conductive characteristics of carbon black-filled ethylene-propylene-diene monomer (EPDM) composite film, which is used for measuring occlusal force, composite samples with volume ratios of carbon black to EPDM ranging from 30% to 70% were prepared. The process of making a composite film consists of two steps, which involve the preparation of a slurry composition and the fabrication of a thin film using solution casting and a lamination process. To prepare the slurry composition, we dispersed carbon black nanoparticles into an organic solvent before mixing with an EPDM solution in toluene. The mechanical and electrical properties of the resulting carbon black-filled EPDM film were then investigated, and the results showed that the electrical resistance of a film decreases with the increase in the carbon black content. Furthermore, improved elastic recovery was observed after cross-linking the EPDM.

다구찌 실험계획법을 이용한 탄소코팅 초박막의 마찰특성 (Friction Properties of Carbon Coated Ultra-thin Film using Taguchi Experimental Design)

  • 안준양;김대은;최진용;신경호
    • 한국정밀공학회지
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    • 제20권4호
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    • pp.143-150
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    • 2003
  • Frictional properties of ultra-thin carbon coatings on silicon wafer were investigated based on Taguchi experimental design method. Sensitivity analysis was performed with normal load, relative humidity, deposition process, and coating thickness as the variables. It was found that despite low thickness, the carbon coating resulted in relatively low friction coefficient. Also, the frictional behavior was affected significantly by humidity and normal load.

Diamond-Like-Carbon 박막표면에 UV 배향법을 이용한 액정 배향 효과 (Liquid Crystal Alignment Effects by UV Alignment Method on a Diamond-Like-Carbon Thin Film Surface)

  • 조용민;황정연;한은주;백승권;서대식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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    • pp.526-529
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    • 2002
  • We studied the nematic liquid crystal (NLC) aligning capabilities by the UV alignment method on a diamond like carbon (DLC) thin film surface. A good LC alignment by UV exposure on the DLC thin film surface at $200\AA$ of layer thickness was achieved. Also, a good LC alignment by the UV alignment method on the DLC thin film surface was observed at annealing temperature of $180^{\circ}C$. However, the alignment defect of the NLC was observed above annealing temperature of $200^{\circ}C$. Consequently, the good thermal stability of LC alignment by the UV alignment method on the DLC thin film surface can be achieved.

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NDLC 박막을 이용한 네마틱 액정의 고프리틸트 제어 (Control of High Pretilt Angle in NLC using a NDLC Thin Film)

  • 박창준;황정연;서대식;안한진;김경찬;백홍구
    • 한국전기전자재료학회논문지
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    • 제17권7호
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    • pp.760-763
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    • 2004
  • We studied the nematic liquid crystaL(NLC) aligning capabilities using the new alignment material of a nitrogenated diamond-like carbon(NDLC) thin film. The NDLC thin film exhibits high electrical resistivity and thermal conductivity that are similar to the properties shown by diamond-like carbon (DLC) thin films. The diamond-like properties and nondiamond-like bonding make NDLC an attractive candidate for applications. A high pretilt angle of about 9.9$^{\circ}$ by ion beam(IB) exposure on the NDLC thin film surface was measured. A good LC alignment is achieved by the IB alignment method on the NDLC thin films surface at annealing temperature of 200 $^{\circ}C$. The alignment defect of the NLC was observed above annealing temperature of 250 $^{\circ}C$. Consequently, the high pretilt angle and the good LC alignment by the IB alignment method on the NDLC thin film surface can be achieved.

펄스 레이저 애블레이션이 결합된 고전압 방전 플라즈마 장치를 이용한 유전성 질화탄소 박막의 합성 (Formation of dielectric carbon nitride thin films using a pulsed laser ablation combined with high voltage discharge plasma)

  • 김종일
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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    • pp.208-211
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    • 2003
  • The dielectric carbon nitride thin films were deposited onto Si(100) using a pulsed laser ablation of pure graphite target combined with a high voltage discharge plasma in nitrogen gas atmosphere. We can be calculated dielectric constant, ${\varepsilon}_s$, with a capacitance Sobering bridge method. We reported to investigate the influence of the laser ablation of graphite target and DC high voltage source for the plasma. The properties of the deposited carbon nitride thin films were influenced by the high voltage source during the film growth. Deposition rate of carbon nitride films were found to increase drastically with the increase of high voltage source. Infrared absorption clearly shows the existence of C=N bonds and $C{\equiv}N$ bonds. The carbon nitride thin films were observed crystalline phase, as confirmed by x-ray diffraction data.

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