• Title/Summary/Keyword: CVD method

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Process Control for the Synthesis of Ultrafine Si3N4-SiC Powders by the Hybrid Plasma Processing (Hybrid Plasma Processing에 의한 Si3N4-SiC계 미립자의 합성과정 제어)

  • ;吉田禮
    • Journal of the Korean Ceramic Society
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    • v.29 no.9
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    • pp.681-688
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    • 1992
  • Ultrafine Si3N4 and Si3N4+SiC mixed powders were synthesized through thermal plasma chemical vapor deposition(CVD) using a hybrid plasma, which was characterized by the supersposition of a radio-frequency plasma and arc jet. The reactant SiCl4 was injected into an arc jet and completely decomposed in a hybrid plasma, and the second reactant CH4 and/or NH3 mixed with H2 were injected into the tail flame through double stage ring slits. In the case of ultrafine Si3N4 powder synthesis, reaction efficiency increased significantly by double stage injection compared to single stage one, although crystallizing behaviors depended upon injection speed of reactive quenching gas (NH3+N2) and injection method. For the preparation of Si2N4+SiC mixed powders, N/C composition ratio could be controlled by regulating the injection speed of NH3 and/or CH4 reactant and H2 quenching gas mixtures as well as by adjusting the reaction space.

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A Study on Direct Bonding of 3C-SiC Wafers Using PECVD Oxide (CVD 절연막을 이용한 3C-SiC기판의 직접접합에 관한 연구)

  • 정연식;류지구;정귀상
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.164-167
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    • 2002
  • SiC direct bonding technology is very attractive for both SiCOI(SiC-on-insulator) electric devices and SiC-MEMS applications because of its application possibility in harsh environments. This paper presents on pre-bonding according to HF pre-treatment conditions in SiC wafer direct bonding using PECVD oxide. The characteristics of bonded sample were measured under different bonding conditions of HF concentration, and applied pressure. The 3C-SiC epitaxial films grown on Si(100) were characterized by AFM and XPS, respectively. The bonding strength was evaluated by tensile strength method. Components existed in the interlayer were analyzed by using FT-IR. The bond strength depends on the HF pre-treatment condition before pre-bonding (Min : 5.3 kgf/$\textrm{cm}^2$∼Max : 15.5 kgf/$\textrm{cm}^2$).

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Effect of CNT Diameter on Physical Properties of Styrene-Butadiene Rubber Nanocomposites

  • Park, Young-Soo;Huh, Mong-Young;Kang, Sin-Jae;Yun, Seok-Il;Ahn, Kay-Hyeok
    • Carbon letters
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    • v.10 no.4
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    • pp.320-324
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    • 2009
  • We investigated the effect of diameter and content of carbon nanotubes (CNTs) on the physical properties of styrenebutadiene rubber (SBR)/CNTs nanocomposites. CNTs-reinforced SBR nanocomposites were prepared by the melt mixing process. CNTs with different diameters were synthesized by the chemical vapor deposition method (CVD). In this work, the mechanical property and other physical properties of SBR/CNTS nanocomposites were discussed as a function of the content and diameter of CNTs.

Low Temperature Growth of High-Quality Carbon Nanotubes by Local Surface Joule Heating without Heating Damage to Substrate

  • Heo, Sung-Taek;Lee, Dong-Gu
    • Carbon letters
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    • v.10 no.3
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    • pp.230-233
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    • 2009
  • In this study, a low temperature growth of high-quality carbon nanotubes on glass substrate using a local surface heating without heating damage to substrate was tried and characterized. The local joule heating was induced to only Ni/Ti metal film on glass substrate by applying voltage to the film. It was estimated that local surface joule heating method could heat the metal surface locally up to around $1200^{\circ}C$ by voltage control. We could successfully obtain high-quality carbon nanotubes grown at $300^{\circ}C$ by applying 125 V for joule heating as same as carbon nanotubes grown at $900^{\circ}C$.

The Characteristics of $GaAs_{0.35}P_{0.65}$ Epitaxial Layer According to in-situ doping of $NH_3$ gas (In-situ $NH_3$ doping에 따른 $GaAs_{0.35}P_{0.65}$ 에피막의 특성)

  • Lee, Eun-Cheol;Lee, Cheol-Jin
    • Proceedings of the KIEE Conference
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    • 1998.07d
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    • pp.1249-1251
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    • 1998
  • We have studied the properties of $GaAs_{0.35}P_{0.65}$ epitaxial films on the GaP according to doping of $NH_3$ gas using VPE method by CVD. The efficiency of $GaAs_{0.35}P_{0.65}$ epitaxial films found to be greatly enhanced by the according of nitrogen doping. The diodes were fabricated by means of Zn diffusion into vapor grown $GaAs_{0.35}P_{0.65}$ epitaxial films doped with N and Te. The effects of nitrogen doping on carrier density of epitaxial films, PL wavelength and the power out, forward voltage of diodes are discussed. In the end, The effect of electrical and optical properties is influenced by the deep level and deep level density of nitrogen doping.

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The Characteristic of Prepared Electrode Catalyst and MEA using CNF and CNT (CNT 및 CNF를 이용하여 제조된 전극 촉매 및 막 전극 접합체의 특성)

  • 임재욱;최대규;류호진
    • Journal of the Microelectronics and Packaging Society
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    • v.11 no.1
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    • pp.59-64
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    • 2004
  • The performance of fuel cell electrode depends on the characteristics of the catalyst support material. This paper deals with the use of CNF(carbon nanofibre) and CNT(carbon nanotube) as platinum catalyst support. The CNF and CNT were synthesized with catalyst treated by mechanochemical process and were prepared by chemical vapor deposition (CVD) method. The platinum supported on CNF and CNT for polymer electrolyte membrane fuel cell (PEMFC) application. In result, the best I-V characteristic was verified by the prepared MEA(membrane electrode assembly) from twisted CNF that had a diameter of 65 nm.

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Bonding structure of the DLC films deposited by RE-PECVD (RE-PECVD법에 의해 증착된 DLC박막의 결합 특성)

  • 최봉근;신재혁;안종일;심광보
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.14 no.1
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    • pp.27-32
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    • 2004
  • The diamond-like carbon (DLC) films were deposited on the Si (100) wafer by a rf-PECVD method as a function of the mixture rate of methane-hydrogen gas and bias voltage. The bonding structure and mechanical properties of these deposited DLC films were investigated using FT-IR, Raman, and nano-indenter. The deposition rates of DLC films increased with increased flow rate of methane in the gas mixtures and increased bias voltage. The $sp^3/sp^2$ bonding ratio of carbon in thin film and the hardness increased with increasing flow rate of hydrogen in the gas mixtures and increasing bias voltage.

Growth of Carbon Nanotubes on Different Catalytic Substrates (촉매금속(Ni-Cu)의 적층 증착법에 의한 탄소나노튜브의 성장)

  • 배성규;이세종;조성진;이득용
    • Journal of the Korean Ceramic Society
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    • v.41 no.3
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    • pp.247-252
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    • 2004
  • 노튜브의 길이는 급격히 증가하였지만 촉매금속의 적층방법에 따른 탄소나노튜브의 성장 형태는 큰 차이가 없었다. 특히, ICBD 방법에 의해 Ni 촉매금속을 증착한 경우 다른 방법에 비하여 직선적인 탄소나노튜브가 관찰되었다. ^x Carbon nanotubes were grown on SiO$_2$/Si substrates by applying $C_2$H$_2$ gas through chemical vapor deposition process. It was found that carbon nanotubes were grown successfully on the substrates with catalytic films under 20 $\AA$ total thickness. The increase in reaction temperature from 50$0^{\circ}C$ to 80$0^{\circ}C$ resulted in longer carbon nanotube, but there was no clear tendencies with different types of catalytic layers. It was evident that carbon nanotubes became more straight on the substrate with Ni catalytic film produced by ICBD method.

Graphene Synthesis on Pt Substrate using a Chemical Vapor Deposition Method (열화학기상증착법에 의한 백금 기판 위의 그래핀 합성)

  • Lee, Byeong-Joo;Jeong, Goo-Hwan
    • Journal of Industrial Technology
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    • v.35
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    • pp.89-94
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    • 2015
  • Graphene is a carbon-based two dimensional honeycomb lattice with monoatomic thickness and has attracted much attention due to its superior mechanical, electronic, and physical properties. Here, we present a synthesis of high quality graphene on Pt substrate using a chemical vapor deposition (CVD). We optimized synthesis condition with various parameters such as synthesis temperature, time, and cooling rate. Based on the results, we concluded that graphene synthesis is driven by mainly carbon adsorption on surface rather than precipitation of carbon which is dominant in other metal substrate. In addition, Pt substrate can be repeatedly used several times with high quality graphene.

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Electrical Properties of Yarned Carbon Nanotube Fiber Resistors (Yarned CNT Fiber 저항체의 전기적 특성)

  • Lim, Youngtaek;Lee, Sunwoo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.1
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    • pp.59-62
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    • 2017
  • CNT (carbon nanotube) resistors with low resistance and negative TCR (temperature coefficient of resistance) were fabricated with yarned CNT (carbon nanotube) fibers. The CNT fibers were prepared by yarning CNTs grown on the silicone substrate by CVD (chemical vapor deposition) method. The CNT resistors were fabricated by winding CNT fibers on the surface of ceramic rod. Both metal terminals were connected with the CNT fiber wound on the ceramic rod. We measured electrical resistance and thermal stability with the number of CNT fibers wound. The CNT resistor system shows linearly decreased resistance with the number of CNTs wound on the ceramic rod and saturated at 20 strands. The CNT resistor system has negative TCR between $-1,000{\sim}-2,000ppm/^{\circ}C$ and stable frequency properties under 100 kHz.