• 제목/요약/키워드: CF(Color Filter)

검색결과 12건 처리시간 0.022초

Color Filter Pattern Generation by Screen Printing

  • Choi, Yong-Jung;Lee, Taik-Min;Nam, Soo-Yong;Kim, Yong-Sung;Na, Dae-Yup;You, Choon-Woo;Shin, Dong-Youn;Kim, Kwang-Young;Jung, Kwang-Il
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.380-383
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    • 2007
  • In this research, we present color filter which is patterned by screen printing method. Analysis of screen printing process, screen printing system, experiment for uniform printing in large area, characteristics of screen printed CF are investigated .In spite of limitation of precision, screen printed color filter is very cost- effective in respect of manufacturing facility and ink usage.

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Covered Microlens Structure for Quad Color Filter Array of CMOS Image Sensor

  • Jae-Hyeok Hwang;Yunkyung Kim
    • Current Optics and Photonics
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    • 제7권5호
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    • pp.485-495
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    • 2023
  • The pixel size in high-resolution complementary metal-oxide-semiconductor (CMOS) image sensors continues to shrink due to chip size limitations. However, the pixel pitch's miniaturization causes deterioration of optical performance. As one solution, a quad color filter (CF) array with pixel binning has been developed to enhance sensitivity. For high sensitivity, the microlens structure also needs to be optimized as the CF arrays change. In this paper, the covered microlens, which consist of four microlenses covered by one large microlens, are proposed for the quad CF array in the backside illumination pixel structure. To evaluate the optical performance, the suggested microlens structure was simulated from 0.5 ㎛ to 1.0 ㎛ pixels at the center and edge of the sensors. Moreover, all pixel structures were compared with and without in-pixel deep trench isolation (DTI), which works to distribute incident light uniformly into each photodiode. The suggested structure was evaluated with an optical simulation using the finite-difference time-domain method for numerical analysis of the optical characteristics. Compared to the conventional microlens, the suggested microlens show 29.1% and 33.9% maximum enhancement of sensitivity at the center and edge of the sensor, respectively. Therefore, the covered microlens demonstrated the highly sensitive image sensor with a quad CF array.

A Study on CF IZO Application

  • 박재익;김동환;김승율;김태곤;박준용
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2008년도 제35회 하계학술대회 초록집
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    • pp.276-276
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    • 2008
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Micro LED 제작을 위한 Color Filter용 잉크젯 공정 적색, 녹색 형광체 잉크 연구 (Fabrication of Red and Green Phosphor Ink for the Micro LED Color Filter Using Ink-Jet Process)

  • 김보중;유시홍;양효실;문영부;윤창번
    • 한국전기전자재료학회논문지
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    • 제36권5호
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    • pp.494-499
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    • 2023
  • In this paper, in order to apply the CF (color filter) type of the micro light emitting device (Micro LED) display method, a study on the manufacturing process of red and green phosphor inks for the inkjet process was conducted. The blue light-emitting KSF and LuAG phosphors were respectively used to control the phosphor particle size to about 1㎛, and a phosphor ink was prepared by synthesizing with a low-viscosity solution (IPA/Eg). A chemical dispersion method was applied to selectively control the dispersion characteristics in the manufacture of phosphor inks, and in particular, phosphor inks with a dispersant applied a dispersant secured stable dispersion characteristic compared to phosphor inks without a dispersion process. Therefore, it seems possible to manufacture CF for Micro LED through an inkjet process capable of controlling the dispersion characteristics of phosphor ink.

고색재현성 CCFL을 사용한 LCD에서의 색재현성 개선에 관한 평가 (The Effect of Color Reproduction Properties at TFT-LCD Using High Color Reproduction CCFL)

  • 한정민;배경운;김연호;임영진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 춘계학술대회 논문집 디스플레이 광소자분야
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    • pp.165-168
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    • 2003
  • 최근 TV 대응 LCD 제품의 본격적인 양산과 더불어 LCD TV 의 색재현성에 대한 해결과제가 큰 문제로 대두되고 있으며, CRT 급 색재현성의 확보는 LCD TV 의 고급화를 위한 또 하나의 개발 방향이 되고 있다. 그러나, CF(Color Filter)만을 이용한 색재현성의 개선은 근본적으로 한계를 가지고 있으며, 패널 투과율의 저하로 이어져 또다시 고휘도 사양의 BL(Back Light)에 대한 요구가 발생하고 있다. 따라서 본 연구에서는 CF(Color Filter)만에 의한 색재현성의 개선이 아닌 BL 광원 자체의 스펙트럼 최적화를 통해서 CRT 급 색재현성의 확보를 통한 고부가가치 상품개발의 가능성을 제시하고자 하였다. 구체적으로, 램프형광체의 RED 와 Green-Blue 영역에서의 Intensity 향상을 통해서 기존의 CCFL(Cold Cathode Fluorescent Lamp)과는 다른 특성을 광원에 부가하여, 기본의 LCD 패널을 그대로 이용한 경우에도 색재현성을 약 11% 개선하였다.

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The effect of ink adhesion on color filter glass substrates by different plasma treatment

  • Chen, Ko-Shao;Hsu, Sheng-Hsiang;Lo, Yu-Cheng;Liu, Pei-Yu;Wang, Jiun-Ming;Li, Huai-An
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.882-885
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    • 2007
  • This study discussed the effect of ink adhesion on color filter glass after different kinds of plasma treatment. From contact angle analysis, we could get different ink adhesion results after HMDSZ, $O_2$, IPA, and $CF_4$ plasma treatment. Substrates after PFMCH plasma treatment have good surface hydrophobic property, and contact angle raise from $<10^{\circ}\;to\;50^{\circ}$.

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Optimization of the Emission Spectrum of Red Color in Quantum Dot-Organic Light Emitting Diodes

  • Jeong, Byoung-Seong
    • 공업화학
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    • 제32권2호
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    • pp.214-218
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    • 2021
  • We investigated the optimal stacked structure from the perspective of process architecture (PA) through emission spectrum analysis according to the wavelength of quantum dot (QD)-organic light-emitting diodes (OLED). We confirmed that the blue-light leakage through the QD can be minimized by increasing the QD filling density above a critical value in the red QD (R-QD) layer. In addition, when the thickness of red-color filter (R-CF) at the upper part of the R-QD increased to more than 3 ㎛, the leakage of blue light through the R-CF was effectively blocked, and a very sharp emission spectrum in the red wavelength band could be obtained. According to these outstanding results, we expect that the development of QD-OLED displays with very excellent color gamut can be possibly realized.

The Effect of Color Reproduction Properties at TFT-LCD using High Color Reproduction CCFL

  • Han, Jeong-Min;Ok, Chul-Ho;Seo, Dae-Shik
    • Transactions on Electrical and Electronic Materials
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    • 제8권5호
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    • pp.215-217
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    • 2007
  • Recently, color reproduction properties have attracted lots of attention with mass production of LCD especially corresponding to TV application and achievement of color reproduction properties such as CRT have been considered one of technical goals for high quality display. However, revision of the color reproduction properties only with CF(color filter) have fundamental limitations and resultant decrease in the transmittance of panel causes demand on high brightness of BL(Back Light). In this paper, we present such a method in which by optimization of original light spectrum from the BL source will improves the color reproduction properties corresponding to them of the CRT. When the intensity of RED and Green-Blue from ramp is revised densely, the characteristics different from CCFL(Cold Cathode Fluorescent Lamp) used before become added so that about 11 % of the color reproduction properties is improved compare to the existing LCD panel.

Single-pixel Autofocus with Plasmonic Nanostructures

  • Seok, Godeun;Choi, Seunghwan;Kim, Yunkyung
    • Current Optics and Photonics
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    • 제4권5호
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    • pp.428-433
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    • 2020
  • Recently, the on-chip autofocus (AF) function has become essential to the CMOS image sensor. An auto-focus usually operates using phase detection of the photocurrent difference from a pair of AF pixels that have focused or defocused. However, the phase-detection method requires a pair of AF pixels for comparison of readout. Therefore, the pixel variation may reduce AF performance. In this paper, we propose a color-selective AF pixel with a plasmonic nanostructure in a 0.9 μ㎡ pixel. The suggested AF pixel requires one pixel for AF function. The plasmonic nanostructure uses metal-insulator-metal (MIM) stack arrays instead of a color filter (CF). The color filters are formed at the subwavelength, and they transmit the specific wavelength of light according to the stack period and incident angles. For the optical analysis of the pixel, a finite-difference time-domain (FDTD) simulation was conducted. The analysis showed that the MIM stack arrays in the pixels perform as an AF pixel. As the primary metric of AF performance, the resulting AF contrasts are 1.8 for the red pixels, 1.6 for green, and 1.5 blue. Based on the simulation results, we confirmed the autofocusing performance of the MIM stack arrays.

NGC 7790의 UBVI CCD 측광 (UBVI CCD Photometry of NGC 7790)

  • 최동열;김희수;임범두;성환경
    • 한국지구과학회지
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    • 제36권7호
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    • pp.661-673
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    • 2015
  • 우즈베키스탄 Maidanak 천문대 AZT-22 1.5 m 망원경(f/7.74)과 SITe $2000{\times}800$CCD를 사용하여 3개의 ${\delta}$ Cep 변광성 CEa Cas, CEb Cas 및 CF Cas가 있는 중년 산개성단 NGC 7790의 UBVI 측광 관측을 수행하였다. 관측자료는 IRAF/DAOPHOT를 이용하여 PSF 측광을 수행하였으며, V와 I 필터에서 모두 측광된 별의 수는 총 1008개이며, 측광의 한계등급은 $V{\approx}22$등급이다. 대기소광계수 및 측광영점을 결정하기 위하여 천구적도에 있는 여러 표준별과 청색 및 적색 표준별을 다양한 대기투과량에서 관측하였다. 표준별 측광을 통해 대기소광계수 및 측광영점을 결정하고, 성단의 측광자료는 Johnson-Cousins UBVI 표준계로 변환하였다. NGC 7790의 UBVI 색-등급도와 색-색도에서 이 성단의 B와 V 필터에서의 색초과량 [$E(B-V)=0.58{\pm}0.02$], B와 V 필터에서의 선택적 소광량 [$R_V{{\equiv}}A_V/E(B-V)=3.02{\pm}0.09$] 및 거리지수($V_0-M_V=12.65{\pm}0.10$)를 얻었다. H-R도에서 세페이드 변광성의 위치를 고려하여 나이를 결정하였다. 이 과정에서 Padova 연구집단(Bressan et al., 2012)의 등연령곡선(Z=0.019)과 Geneva 연구집단($Ekstr{\ddot{o}}m$ et al., 2012)의 등연령곡선(Z=0.014)을 모두 사용하였고, 그중에서 자전을 고려한 Geneva 연구집단의 진화모형이 관측자료와 잘 일치하여 NGC 7790의 나이로 log $age=8.05{\pm}0.05$ [yr]를 얻었다. 또 NGC 7790내 세페이드 변광성의 절대등급은 세페이드 변광성의 평균 주기-광도 관계에 비해 분산 범위 내에 있기는 하지만 주어진 주기에서 평균적으로 약 0.5등급 정도 밝음을 확인하였다.