• 제목/요약/키워드: C:N:P

검색결과 7,869건 처리시간 0.032초

A NOTE ON REPRESENTATION NUMBERS OF QUADRATIC FORMS MODULO PRIME POWERS

  • Ran Xiong
    • 대한수학회보
    • /
    • 제61권4호
    • /
    • pp.907-915
    • /
    • 2024
  • Let f be an integral quadratic form in k variables, F the Gram matrix corresponding to a ℤ-basis of ℤk. For r ∈ F-1k, a rational number n with f(r) ≡ n mod ℤ and a positive integer c, set Nf(n, r; c) := #{x ∈ ℤk/cℤk : f(x + r) ≡ n mod c}. Siegel showed that for each prime p, there is a number w depending on r and n such that Nf(n, r; pν+1) = pk-1Nf(n, r; pν) holds for every integer ν > w and gave a rough estimation on the upper bound for such w. In this short note, we give a more explicit estimation on this bound than Siegel's.

ON THE INDEFINITE POSITIVE QUADRIC ℚ+n-2

  • Hong, Seong-Kowan
    • East Asian mathematical journal
    • /
    • 제32권1호
    • /
    • pp.93-100
    • /
    • 2016
  • The generalized Gaussian image of a spacelike surface in $L^n$ lies in the indefinite positive quadric ${\mathbb{Q}}_+^{n-2}$ in the open submanifold ${\mathbb{C}}P_+^{n-1}$ of the complex projective space ${\mathbb{C}}P^{n-1}$. The purpose of this paper is to find out detailed information about ${\mathbb{Q}}_+^{n-2}{\subset}{\mathbb{C}}P_+^{n-1}$.

고압하에서 염화벤질의 가용매분해반응에 대한 속도론적 연구 (A Kinetic Study on the Solvolysis of Benzyl Chloride under High Pressure)

  • 권오천;경진범
    • 대한화학회지
    • /
    • 제31권3호
    • /
    • pp.207-214
    • /
    • 1987
  • 염화벤질의 가용매분해반응에 대한 속도를 $1{\sim}1600bar$ 압력범위까지 변화시켜 가면서 온도 30 및 $40^{\circ}C$에서 측정하였다. In k대 압력의 실험결과는 압력에 따라 이차함수형으로 변화하였으며, 이로부터 활성화부피(${\Delta}V^{\neq}$)와 활성화 압축율(${\Delta}{\beta}^{\neq}$)의 값을 얻었다. In k를 용매파라미터($Q_w$) 및 ln $C_w$의 함수로 도시한 결과 이들 사이의 관계는 본 연구의 반응이 $S_N$1메카니즘으로 진행됨을 나타내었다. 이 전에 연구된 결과들과 비교한 결과 ${\mid}{{\Delta}V_0}^{\neq}{\mid}$와 n 값의 증가 순은 각각 p-Cl>p-H>p-$CH_3\;와\;p-$CH_3>p-H>p-Cl$이었다. 이로부터 $p-CH_3$ 치환체는 $S_N1(1)$ 성격이 강하며, 반면 p-Cl는 ${S_N}1(2)$ 성격이 나타남을 알았다.

  • PDF

낮은 접촉저항을 갖는 Ni/Si/Ni n형 4H-SiC의 오옴성 접합 (Low Resistivity Ohmic Ni/Si/Ni Contacts to N-Type 4H-SiC)

  • 김창교;양성준;조남인;유홍진
    • 대한전기학회논문지:전기물성ㆍ응용부문C
    • /
    • 제53권10호
    • /
    • pp.495-499
    • /
    • 2004
  • Characteristics of ohmic Ni/Si/Ni contacts to n-type 4H-SiC are investigated systematically. The ohmic contacts were formed by annealing Ni/Si/Ni sputtered sequentially The annealings were performed at 950℃ using RTP in vacuum ambient and N₂ ambient, respectively. The specific contact resistivity(p/sub c/), sheet resistance(R/sub s/), contact resistance (R/sub c/) transfer length(L/sub T/) were calculated from resistance(R/sub T/) versus contact spacing(d) measurements obtained from TLM(transmission line method) structure. While the resulting measurement values of sample annealed at vacuum ambient were p/sub c/ = 3.8×10/sup -5/Ω㎠, R/sub c/ = 4.9 Ω and R/sub T/ = 9.8 Ω, those of sample annealed at N₂ ambient were p/sub c/ = 2.29×10/sup -4/Ω㎠, R/sub c/ = 12.9 Ω and R/sub T/ = 25.8 Ω. The physical properties of contacts were examined using XRD 3nd AES. The results showed that nickel silicide was formed on SiC and Ni was migrated into SiC. This result indicates that Ni/Si/Ni ohmic contact would be useful in high performance electronic devices.

종별 동체 유리아미노산 (Free Amino Acid Composition of Tap Root in Panax species)

  • Lee, Mee-Kyoung;Park, Hoon
    • Journal of Ginseng Research
    • /
    • 제20권3호
    • /
    • pp.291-298
    • /
    • 1996
  • Free amino acid (FAA) compositions in the central part (pith-xylem : P-X) and the outer part (phloem-cortex : P-C) of root were investigated for P ginseng (P.g), p. quinque-folium (P.q) an, B P nutoginsen (P.n) by an amino acid analyzer. Total free amlno acids content (TFAA) was highest in p.맥 and lowest in p.n. The TFAA of P-Xs were higher than those of P-Cs in these Panax species except p.n. The higher the TFAA in P-X, the higher the ratio of TFAA in P-X to that in P-C. Seven- teen free amino acids and ammonia were identified, and four unknown peaks appeared before the usual amino acids eluted. The total aspartic acid equivalent of these unknown peaks was corresponded to 77% of known TFAA in P-C of p.n, 17% in P. n, and 7% in p.q. The pattern of unknown peaks of p.g was different from p.q and similar to P.n. In all samples six major amino acids and ammonia accounted for 90~95% of TFAA. Arginine was comprised from 29% (P.n) to 43% (P.g) by amole as amino acid and from 50 to 71% by amole as nitrogen (N amole) in TFAA. Ammonia was the second abundant one by amole and the third by Npmole. Histidine was the second by Npmole. Praline was one of major FAA in p.q. Pattern similarity of FAA composition (excluding Arg and Am) by simple correlation was closer between P-C of p.g and P-X of p.q than between both P-Xs and quite different between the P-X of p.g and that of p.n. The pattern similarities of major FAA percent abundance excluding Arg and Am were significant only between P-X and P-C of the same species. Arginine content (amole) had positive correlation (r=0.859, p=0.05) with Arg/Am among species. Ammonia content was higher than arginine in p.n. Tryptophan content was greatest in p.n among species and higher than lysine only in p.n. The ratios of TFAA to N(W/W) were in the range of 3.89~4.14 for TFAA and 3.61~3.92 for TFAA plus ammonia.

  • PDF

THE EFFECT OF NITROGEN ON THE MICROSTRUCTURE AND THE CORROSION RESISTANCE OF Fe-Hf-C-N THIN FILMS

  • Choi, J.O.;Han, S.H.;Kim, H.J.;Kang, I.K.
    • 한국자기학회지
    • /
    • 제5권5호
    • /
    • pp.641-644
    • /
    • 1995
  • We have studied the effect of the nitrogen on the microstructure, thermomagnetic properties and corrosion resistance of Fe-Hf-C-N nanocrystalline thin films with high permeability and high saturation magnetization. These films were fabricated by reactive sputtering in $Ar+N_{2}$ plasma using an rf magnetron sputtering apparatus. As $P_{N2}$ increases, the microstructure changes from amorphous to crystalline $\alpha$-Fe phase and again returns to amorphous one. Spin wave stiffness constant increases with $P_{N2}$ until 5% $P_{N2}$, and then decreases with the further increase. This trend corresponds well with that of the microstructure with increasing $P_{N2}$. The Fe-Hf-C-N films with over 3% $P_{N2}$ show higher corrosion resistance than the N-free Fe-Hf-C films. The Fe-Hf-C-N films are considered to have high potentials for the head core materials suitable for high density recording systems, owing to their excellent soft magnetic properties and corrosion resistance.

  • PDF

$[Ph_3P(OH)]^+[ $N_3$^-$의 분리 및 구조 (Isolation and Structure of $[Ph_3P(OH)]^+[ $N_3$]^-$)

  • Beom Jun Lee;Won Seok Han;Soon Won Lee
    • 한국결정학회지
    • /
    • 제12권3호
    • /
    • pp.141-144
    • /
    • 2001
  • Na[Ga(N₃)₄]와 PPh₃의 반응으로부터 이온성 화합물 [Ph₃P(OH)]/sup +/[N₃]/sup -/ (1)이 분리되었다. 화합물1의 구조가 분광학적 방법(¹H-NMR, /sup 13/C{¹H-NMR, IR) 및 X-ray 회절법으로 규명되었다. 화합물1의 결정학 자료 : 사방정계 공간군 P2₁2₁2₁, a = 10.491(4)Å, b=11.603(5)Å, c=13.149(5)Å, Z=4, R(wR₂)=0.0547(0.0978).

  • PDF

$P^+N, P^+NN^+$ 접합형 실리콘 태양전지의 제작 및 특성 (Fabrication and Characteristics of $P^+N$ and $P^+NN^+$ Junction Silicon Solar Cell)

  • 이대우;이종덕;김기원
    • 대한전자공학회논문지
    • /
    • 제20권1호
    • /
    • pp.22-26
    • /
    • 1983
  • 열확산(thermal diffusion)법을 이용하여 면적이 3.36㎠인 P+N 전지와 P+NN+ 전지를 제작하였다. 100mW/㎠의 인공 조명에서 측정한 결과 940℃에서 15분 보론확산(boron Predeposition)을 하고, 800℃에서 20분 열처리(annealing)하여 제작한 P+N전지는 전면적(수광면적) 변환 효율이 13.4%(14.7%)이었다. 뒷면을 1050℃에서 인(Phosphorus)을 확산한 후, 앞면을 940℃에서 15분 보론 확산하고, 800℃에서 50분 열처리하여 만든 P+NN+전지의 전면적(수광면적) 변환 효율은 14.3%(15.6%)이었다. 뒷면의 인 확산으로 게더링(gettering) 작용과 BSF 효과에 의해서 P+NN+ 전지가 P+N전지보다 캐리어 수명이 약 2∼3배 증가되었다. 그리고 효율 개선을 위해 AR로팅, Ag전기도금, 미세한 그리드 패턴, 앞면 불순물 주입량 조절 등을 행하였다.

  • PDF

노말헥산올과 파라자일렌 혼합물의 최소자연발화온도 측정 및 예측 (Measurement and Prediction of Autoignition Temperature of n-Hexanol+p-Xylene Mixture)

  • 하동명
    • 에너지공학
    • /
    • 제25권1호
    • /
    • pp.48-55
    • /
    • 2016
  • 최소자연발화온도는 가연성물질이 주위의 열에 의해 스스로 발화하는 최저온도이다. 최소자연발화온도는 유기혼합물중 가연성 액체혼합물의 안전한 취급을 위해서 중요한 지표가 된다. 본 연구에서는 ASTM E659 장치를 이용하여 가연성 혼합물인 n-hexanol+p-xylene 계의 최소자연발화온도를 측정하였다. 2성분계를 구성하는 순수물질인 n-hexanol과 p-xylene의 최소자연발화온도는 각 각 $275^{\circ}C$, $557^{\circ}C$로 측정되었다. 그리고 측정된 n-hexanol+p-xylene 계의 최소자연발화온도는 제시된 식에 의한 예측값과 적은 평균절대오차에서 일치하였다.

노말부탄올과 파라자일렌 혼합물의 최소자연발화온도 측정 및 예측 (Measurement and Prediction of Autoignition Temperature of n-Butanol+p-Xylene Mixture)

  • 하동명
    • 한국가스학회지
    • /
    • 제20권5호
    • /
    • pp.1-8
    • /
    • 2016
  • 최소자연발화온도는 가연성물질이 주위의 열에 의해 스스로 발화하는 최저온도이다. 최소자연발화온도는 유기혼합물중 가연성 액체혼합물의 안전한 취급을 위해서 중요한 지표가 된다. 본 연구에서는 ASTM E659 장치를 이용하여 가연성 혼합물인 n-butanol+p-xylene 혼합물의 최소자연발화온도를 측정하였다. 2성분계를 구성하는 순수물질인 n-butanol과 p-xylene의 최소자연발화온도는 각 각 $340^{\circ}C$, $557^{\circ}C$로 측정되었다. 그리고 측정된 n-butanol+p-xylene 혼합물의 최소자연발화온도는 제시된 식에 의한 예측값과 적은 평균절대오차에서 일치하였다.