• Title/Summary/Keyword: Buffer material

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A Prediction of Thermal Conductivity for Compacted Bentonite Buffer in the High-level Radioactive Waste Repository (고준위폐기물 처분시설의 압축 벤토나이트 완충재의 열전도도 추정)

  • Yoon, Seok;Lee, Min-Soo;Kim, Geon-Young;Lee, Seung-Rae;Kim, Min-Jun
    • Journal of the Korean Geotechnical Society
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    • v.33 no.7
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    • pp.55-64
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    • 2017
  • A geological repository has been considered one of the most adequate options for the disposal of high-level radioactive waste. A geological repository will be constructed in a host rock at a depth of 500~1,000 meters below the ground surface. The geological repository system consists of a disposal canister with packed spent fuel, buffer material, backfill material, and intact rock. The buffer is very important to assure the disposal safety of high-level radioactive waste. It can restrain the release of radionuclide and protect the canister from the inflow of groundwater. High temperature in a disposal canister is released into the surrounding buffer material, and thus the thermal transfer behavior of the buffer material is very important to analyze the entire disposal safety. Therefore, this paper presents a thermal conductivity prediction model for the Kyungju compacted bentonite buffer material which is the only bentonite produced in Korea. Thermal conductivity of Kyungju bentonite was measured using a hot wire method according to various water contents and dry densities. With 39 data obtained by the hot wire method, a regression model to predict the thermal conductivity of Kyungju bentonite was suggested.

Characterization of Al-Doped ZnO Thin Film Grown on Buffer Layer with RF Magnetron Sputtering Method (버퍼 층을 이용한 RF 마그네트론 스퍼터 방법에 의한 Al:ZnO 박막의 성장)

  • No, Young-Soo;Park, Dong-Hee;Kim, Tae-Whan;Choi, Ji-Won;Choi, Won-Kook
    • Journal of the Korean Vacuum Society
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    • v.18 no.3
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    • pp.213-220
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    • 2009
  • The optimal condition of low temperature deposition of transparent conductive Al-doped zinc oxide (AZO) films is studied by RF magnetron sputtering method. To achieve enhanced-electrical property and good crystallites quality, we tried to deposit on glass using a two-step growth process. This process was to deposit AZO buffer layer with optimal growth condition on glass in-situ state. The AZO film grown at rf 120 W on buffer layer prepared at RF $50{\sim}60\;W$ shows the electrical resistivity $3.9{\times}10^{-4}{\Omega}cm$, Carrier concentration $1.22{\times}10^{21}/cm^3$, and mobility $9.9\;cm^2/Vs$ in these results, The crystallinity of AZO film on buffer layer was similar to that of AZO film on glass with no buffer later but the electrical properties of the AZO film were 30% improved than that of the AZO film with no buffer layer. Therefore, the cause of enhanced electrical properties was explained to be dependent on degree of crystallization and on buffer layer's compressive stress by variation of $Ar^+$ ion impinging energy.

Release proporties of ovalbumin from alginate microspheres prepared using the nozzle in spray dryer system

  • Park, Jeong-Eun;Lee, Chang-Moon;Park, Hee-Jung;Kim, Gwang-Yun;Rhee, Joon-Haeng;Lee, Ki-Young
    • 한국생물공학회:학술대회논문집
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    • 2005.04a
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    • pp.570-573
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    • 2005
  • The spray method was chiefly used to prepare alginate microspheres. Additionally due to formation at mild conditions, the alginate microspheres were coated with chitosan. The particle size of alginate microspheres increased when the sodium alginate increased. Release pattern of OVA in alginate microspheres was evaluated at PBS buffer(pH 7.4) and HCl buffer(pH 1.2). Release rate of OVA from chitosan/alginate microsphere was also lower than that with the concentration of alginate in the microspheres, the amount of OVA released from alginate microspheres increased from alginate micorsphere. Therefore, the alginate microspheres can be prepared by spray rozzle for a protein drug delivery. OVA release from the alginate microspheres was controlled by a coating with chitosan.

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$CeO_2$ Single Buffer Deposition on RABiTS for SmBCO Coated Conductor

  • Kim, T.H.;Kim, H.S.;Ha, H.S.;Yang, J.S.;Lee, N.J.;Ha, D.W.;Oh, S.S.;Song, K.J.;Jung, Y.H.;Pa, K.C.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.180-181
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    • 2006
  • As a rule, high temperature superconducting coated conductors have multi-layered buffers consisting of seed, diffusion barrier and cap layers. Multi-buffer layer deposition requires longer fabrication time. This is one of main reasons which increases fabrication cost Thus, single buffer layer deposition seems to be important for practical coated conductor process. In this study, a single layered buffer deposition of $CeO_2$ for low cost coated conductors has been tried using thermal evaporation technique 100nm-thick $CeO_2$ layers deposited by thermal evaporation were found to act as a diffusion layer. $0.4{\mu}m$-thick SmBCO superconducting layers were deposited by thermal co-evaporation on the $CeO_2$ buffered Ni-W substrate. Critical current of 118A/$cm^2$ was obtained for the SmBCO coated conductors.

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The effects of buffer layer using $\alpha$-septithiophene on the organic light emitting diode (유기 전기 발광 소자에서 $\alpha$-septithiophene을 이용한 buffer layer의 영향)

  • Yi, Ki-Wook;Lim, Sung-Taek;Shin, Dong-Myung;Park, Jong-Wook;Park, Ho-Cheol
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.04b
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    • pp.53-56
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    • 2002
  • The effect of $\alpha$-septithiophene (${\alpha}-7T$) layers on the organic light emitting diode(OLED) was studied. The ${\alpha}-7T$ was used for a buffer layer in OLED. Hole injection was investigated and improved emission efficiency. The OLEDs structure can be described as indium tin oxide(ITO)/ buffer layer / hole transporting layer / emitting layer / electron transporting layer / LiF / Al. The hole transporting layer were composed of N,N-diphenyl-N,N-di(3-methylphenyl)-1,1-biphenyl-4,4-diamine(TPD), and N,N-di(naphthalene-1-ly)-N,N-diphenyl-benzidine( ${\alpha}$-NPD). The emitting layer, and electron transporting layer consist of tris(8-hydroxyquinolinato) aluminum($Alq_3$). All organic layer were deposited at a background pressure of less than $10^{-6}$ torr using ultra high vacuum (UHV) system. The ${\alpha}-7T$ layer can substitute the hole blocking layer, and improve hole injection properties.

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Effect of 3C-SiC buffer layer on the characteristics of AlN films supttered on Si Substrates (3C-SiC 버퍼층이 Si 기판위에 스퍼터링된 AlN 막의 특성에 미치는 영향)

  • Ryu, Kyeong-Il;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.04b
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    • pp.3-6
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    • 2009
  • Aluminum nitride (AIN) thin films were deposited on a polycrystalline 3C-SiC intermediate layer by a pulsed reactive magnetron sputtering system. Characteristics of the AIN/SiC heterostructures were investigated by field emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM), X-ray diffraction (XRD), and Fourier transform infrared spectroscopy (FT-IR). The columnar structure of AIN thin films was observed by FE-SEM. The surface roughness of AlN films on the 3C-SiC buffer layer was measured using AFM. The XRD pattern of AlN films on SiC buffer layers was highly oriented at (002). Full width at half maximum (FWHM) of the rocking curve near (002) reflections was $1.3^{\circ}$. The infrared absorbance spectrum indicated that the residual stress of AIN thin films grown on SiC buffer layers was nearly negligible. The 3C-SiC intermediate layers are promising for the realization of nitride based electronic and mechanical devices.

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The Study of Low Temperature $\muC-Si/CaF_2$/glass Film Growth using Buffer layer (Buffer layer 를 이용한 저온 $\muC-Si/CaF_2$/glass 박막성장연구)

  • 김도영;안병재;임동건;이준신
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.05a
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    • pp.589-592
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    • 1999
  • This paper describes direct $\mu$C-Si/CaF$_2$/glass thin film growth by RPCVD system in a low temperature for thin film transistor (TFT), photovoltaic devices. and sensor applications. Experimental factors in a low temperature direct $\mu$ c-Si film growth are presented in terms of deposition parameters: SiH$_4$/H$_2$ ratio, chamber total pressure, substrate temperature, rf power, and CaF$_2$ buffer layer. The structural and electrical properties of the deposited films were studied by means of Raman spectroscopy, I-V, L-I-V, X-ray diffraction analysis and SEM. we obtain a crystalline volume fraction of 61%, preferential growth of (111) and (220) direction, and photosensitivity of 124. We achieved the improvement of crystallinity and electrical property by using the buffer layers of CaF$_2$ film.

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Fabrication of YBCO superconducting film with $CeO_{2}/BaTiO_{3}$double buffer layer ($CeO_{2}/BaTiO_{3}$ 이중완충막을 이용한 YBCO 박막 제작)

  • 김성민;이상렬
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.790-793
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    • 2000
  • We have fabricated good quality superconducting YBa$_2$Cu$_3$$O_{7-x}$(YBCO) thin films on Hastelloy(Ni-Cr-Mo alloys) metallic substrates with CeO$_2$and BaTiO$_3$buffer layers in-situ by pulsed laser deposition in a multi-target processing chamber. YBCO film with CeO$_2$ single buffer layer shows T$_{c}$ of 71.64 K and the grain size less than 0.1 ${\mu}{\textrm}{m}$. When BaTiO$_3$is used as a single buffer layer, the grain size of YBCO is observed to be larger than that of YBCO/CeO$_2$by 200 times and the transition temperature of the film is enhanced to be about 84 K. CeO$_2$/BaTiO$_3$double buffer layer has been adopted to enhance the superconducting properties, which results in the enhancement of the critical temperature and the critical current density to be about 85 K and 8.4 $\times$ 10$^4$ A/cm$^2$ at 77 K, respectively mainly due to the enlargement of the grain size of YBCO film.ilm.

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Study on CeO2 Single Buffer on RABiTS for SmBCO coated Conductor (SmBCO 초전도 층착을 위한 RABiTS상의 CeO2 단일 버퍼 연구)

  • Kim, Tae-Hyung;Kim, Ho-Sup;Lee, Nam-Jin;Ha, Hong-Soo;Ko, Rock-Kil;Ha, Dong-Woo;Song, Kyu-Jeong;Oh, Sang-Soo;Park, Kyung-Chae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.6
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    • pp.546-549
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    • 2007
  • As a rule, high temperature superconducting coated conductors have multi-layered buffers consisting of seed, diffusion barrier and cap layers. Multi-buffer layer deposition requires longer fabrication time. This is one of main reasons which increases fabrication cost. Thus, single buffer layer deposition seems to be important for practical coated conductor process. In this study, a single layered buffer deposition of $CeO_2$ for low cost coated conductors has been tried using thermal evaporation technique. 100 nm-thick $CeO_2$ layers deposited by thermal evaporation were found to act as a diffusion layer. $1\;{\mu}m-thick$ SmBCO superconducting layers were deposited by thermal co-evaporation on the $CeO_2$ buffered Ni-5%W substrate. Critical current of 90 A/cm was obtained for the SmBCO coated conductors.

Effect of the MgO buffer layer for MFIS structure using the BLT thin film (BLT 박막을 이용한 MFIS 구조에서 MgO buffer layer의 영향)

  • Lee, Jung-Mi;Kim, Kyoung-Tae;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.23-26
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    • 2003
  • The BLT thin film and MgO buffer layer were fabricated using a metalorganic decomposition method and the DC sputtering technique. The MgO thin film was deposited as a buffer layer on $SiO_2/Si$ and BLT thin films were used as a ferroelectric layer. The electrical of the MFIS structure were investigated by varying the MgO layer thickness. TEM showsno interdiffusion and reaction that suppressed by using the MgO film as abuffer layer. The width of the memory window in the C-Y curves for the MFIS structure decreased with increasing thickness of the MgO layer Leakage current density decreased by about three orders of magnitude after using MgO buffer layer. The results show that the BLT and MgO-based MFIS structure is suitable for non-volatile memory FETs with large memory window.

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