• Title/Summary/Keyword: Bottom current

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The verification of the application of grouting in the bottom protection work of sea dikes in the field (그라우팅을 통한 방조제 바닥보호공 차수공법 현장 적용성 검증)

  • Lee, So-Yeal;Choi, Sae-Kyung;Jeong, Il-Han
    • Proceedings of the Korean Geotechical Society Conference
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    • 2010.09a
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    • pp.29-39
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    • 2010
  • By understanding the construction process of sea dikes and the current state of the thickness and speed of fluid in the bottom layer protection work of final closure gaps, a construction method applicable for the blocking of bottom layer work will be selected. The three construction methods selected will be tested in site through various methods, and the reinforcement of bottom layer protection and impervious effect will be verified. The verification results are as follows: 1) The overall riprap layer were 0.5~1.0m thicker than planned so that the grouting depth and grout input amount increased 2) The applied construction methods permeability of riprap layers were improved from $\alpha{\times}10^{-2}cm/s$ before the construction to $\alpha{\times}10^{-4}cm/s$ after construction. 3) The results of core extraction in order to grossly verify the hardening time and durability allowed the identification of grout injection effect. The amount of filling of the injection was difficult to judge because the slime in many areas made the reading of borehole photography difficult.

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The Change of Beach Processes at the Coastal Zone with the Impact of Tide (조석(潮汐)의 영향(影響)이 있는 연안(沿岸)해역(海域)에서의 해안과정(海岸過程)의 변화(變化))

  • Kim, Sang-Ho;Lee, Joong-Woo
    • Proceedings of the Korea Committee for Ocean Resources and Engineering Conference
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    • 2002.05a
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    • pp.257-262
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    • 2002
  • Numerical model introduced in this study combines wave refraction-diffraction, breaking, bottom friction, lateral mixing, and critical shear stress and three sub-models for simulating waves, currents, and bottom change were briefly discussed. Simulations of beach processes and harbor sedimentation were also described at the coast neighboring Bangpo Harbor, Anmyundo, Chungnam, where the area has suffered from accumulation of drifting sand in a small fishing harbor with a wide tidal range. We also made model test for the case of a narrow tidal range at Nakdong river's estuary area to understand the effect of water level variation on the littoral drift. Simulations are conducted in terms of incident wave direction and tidal level. Characteristics of wave transformation, nearshore current, sediment transport, and bottom change are shown and analyzed. We found from the simulation that the tidal level impact to the sediment transport is very important and we should apply the numerical model with different water level to analyze sediment transport mechanism correctly. Although the model study gave reasonable description of beach processes and harbor sedimentation mechanism, it is necessary to collect lots of field observation data, including waves, tides and bottom materials, etc. for better prediction.

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Geophysical and Sedimentological Characteristics of Lomilik Seamount, West Pacific (서태평양 Lomilik 해저산 퇴적환경 특성)

  • Lee, Hyun-Bok;Oh, Jae-Kyung;Park, Cheong-Kee;Chi, Sang-Bum;Kim, Jong-Uk;Moon, Jai-Woon;Nam, Sang-Heon
    • Ocean and Polar Research
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    • v.26 no.2
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    • pp.207-218
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    • 2004
  • Lomilik Seamount in the west Pacific was seismically surveyed and photographed to illuminate the bottom topography, the condition of manganese crust, and the characteristics of sedimentary environment. Lomilik Seamount has a NW-SE elongated bottom topography with steep slopes in the NESW direction part. Even though the steep slopes of the seamount are devoid of deposits, the summit area and gentle slope of the seamount are covered with thick deposits. The seismic data indicate that Lomilik Seamount is a flat-topped and step-faulted guyot of volcanic origin. Deep-sea camera photographs show that much of the seafloor is rippled in symmetrical and asymmetrical patterns. The traces of biological activity were distinct on gentle seafloor suggesting the low-energy bottom conditions. Some photographs also show outcrops encrusted with manganese crusts. Sedimentary environments in the Lomilik Seamount appear have been governed by regional morphology and strong bottom current.

Electrodic properties of PZT thin films growed on Ru/$RuO_2$ bottom eletrode (Ru/$RuO_2$ 하부전극에 성장한 PZT 박막의 전기적 특성 연구)

  • Choi, Jang-Hyun;Kang, Hyun-Il;Kim, Eung-Kwon;Park, Young;Song, Joon-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.05c
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    • pp.58-62
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    • 2002
  • Pb($Zr_{0.52}Ti_{0.48}$)$O_3$ (PZT) thin films deposited on the Pt/Ti and Ru/$RuO_2$ bottom electrode by rf magnetron sputtering methode. Ru/$RuO_2$ bottom electrode deposited on the p-type wafer as Ru thickness by in-situ process. Our results show that all PZT films indicated perovskite polycrystalline structure with perferred orientation (110) and no pyrochlore phase is observed. A well-fabricated $RuO_2$/PZT/Ru(100nm)/$RUO_2$ capacitor showed a leakage current density in the order of $2.13{\times}10^{-7}A/cm^2$ as 100 kV/cm, a remanent polarization of 7.20 ${\mu}C/cm^2$, and a coercive field of 58.37 kV/cm. The results show that the new Ru/$RuO_2$ bottom electrodes are expected to reduce the degradation ferroelectric fatigue and excellent ferroelectric properties.

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Electrical Properties of SiGe HBTs designed with Bottom Collector and Single Metal Layer Structures (Bottom 컬렉터와 단일 금속층 구조로 설계된 SiGe HBT의 전기적 특성)

  • Choi, A-Ram;Choi, Sang-Sik;Kim, Jun-Sik;Yoon, Seok-Nam;Kim, Sang-Hoon;Shim, Kyu-Hwan
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.8
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    • pp.661-665
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    • 2007
  • This paper presents the electrical properties of SiGe HBTs designed with bottom collector and single metal layer structure for RF power amplifier. Base layer was formed with graded-SiGe/Si structures and the collector place to the bottom of the device. Bottom collector and single metal layer structures could significantly simplify the fabrication process. We studied about the influence of SiGe base thickness, number of emitter fingers and temperature dependence $(<200^{\circ}C)$ on electrical properties. The feasible application in $1{\sim}2GHz$ frequency from measured data $BV_{CEO}{\sim}10V,\;f_T{\sim}14GHz,\;{\beta}{\simeq}110,\;NF{\sim}1dB$ using packaged SiGe HBTs. We will discuss the temperature dependent current flow through the e-b, b-c junctions to understand stability and performance of the device.

Structure and Electrical Properties of SiGe HBTs Designed with Bottom Collector and Single Metal Contact (Bottom Collector와 단일 금속층 구조로 설계된 SiGe HBT의 전기적 특성)

  • Choi, A.R.;Choi, S.S.;Yun, S.N.;Kim, S.H.;Seo, H.K.;Shim, K.H.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.187-187
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    • 2007
  • This paper presents the electrical properties of SiGe HBTs designed with bottom collector and single metal layer structure for RF power amplifier. Base layer was formed with graded-SiGe/Si structures and the collector place to the bottom of the device. Bottom collector and single metal layer structures could significantly simplify the fabrication process. We studied about the influence of SiGe base thickness, number of emitter fingers and temperature dependence (< $200^{\circ}C$) on electrical properties. The feasible application in 1~2GHz frequency from measured data $BV_{CEO}$ ~10V, $f_r$~14 GHz, ${\beta\simeq}110$, NF~1 dB using packaged SiGe HBTs. We will discuss the temperature dependent current flow through the e-b, b-c junctions to understand stability and performance of the device.

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Threshold Voltage Roll-off for Bottom Gate Voltage of Asymmetric Double Gate MOSFET (비대칭 이중게이트 MOSFET의 하단게이트 전압에 따른 문턱전압이동현상)

  • Jung, Hakkee
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2014.05a
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    • pp.741-744
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    • 2014
  • This paper has analyzed threshold voltage roll-off for bottom gate voltages of asymmetric double gate(DG) MOSFET. Since the asymmetric DGMOSFET is four terminal device to be able to separately bias for top and bottom gates, the bottom gate voltage influences on threshold voltage. It is, therefore, investigated how the threshold voltage roll-off known as short channel effects is reduced with bottom gate voltage. In the pursuit of this purpose, off-current model is presented in the subthreshold region, and the threshold voltage roll-off is observed for channel length and thickness with a parameter of bottom gate voltage as threshold voltage is defined by top gate voltage that off-currnt is $10^{-7}A/{\mu}m$ per channel width. As a result to observe the threshold voltage roll-off for bottom gate voltage using this model, we know the bottom gate voltage greatly influences on threshold voltage roll-off voltages, especially in the region of short channel length and thickness.

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Changes of Tide Velocity and Direction with Saemangeum Project (새만금사업에 따른 조류속 및 유향 변화(농지조성 및 농어촌정비))

  • 김정균;송기일;최진규
    • Proceedings of the Korean Society of Agricultural Engineers Conference
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    • 2000.10a
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    • pp.66-71
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    • 2000
  • This study was carried out to investigate the changes of tide velocity and sea bottom topology during the construction period of sea dike. The tide velocity and sea bottom depth were measured in Saemangeum area every year, and analyzed and compared to the initial data. The current and future changes of the tide velocity and direction according to the construction of Saemangeum sea dike were presented.

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ZnO Thin Film Transistor Prepared from ALD with an Organic Gate Dielectric

  • Choi, Woon-Seop
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.543-545
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    • 2009
  • With injection-type source delivery system of atomic layer deposition (ALD), bottom-contact and bottom-gate thin-film transistors (TFTs) were fabricated with a poly-4-vinyphenol polymeric dielectric for the first time. The properties of the ZnO TFT were greatly influenced by the device structure and the process conditions. The zinc oxide TFTs exhibited a channel mobility of 0.43 $cm^2$/Vs, a threshold voltage of 0.85 V, a subthreshold slope of 3.30 V/dec, and an on-to-off current ratio of above $10^6$ with solid saturation.

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Effects of Current Density and Organic Additives on via Copper Electroplating for 3D Packaging (3D패키지용 Via 구리충전 시 전류밀도와 유기첨가제의 영향)

  • Choi, Eun-Hey;Lee, Youn-Seoung;Rha, Sa-Kyun
    • Korean Journal of Materials Research
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    • v.22 no.7
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    • pp.374-378
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    • 2012
  • In an effort to overcome the problems which arise when fabricating high-aspect-ratio TSV(through silicon via), we performed experiments involving the void-free Cu filling of a TSV(10~20 ${\mu}m$ in diameter with an aspect ratio of 5~7) by controlling the plating DC current density and the additive SPS concentration. Initially, the copper deposit growth mode in and around the trench and the TSV was estimated by the change in the plating DC current density. According to the variation of the plating current density, the deposition rate during Cu electroplating differed at the top and the bottom of the trench. Specifically, at a current density 2.5 mA/$cm^2$, the deposition rate in the corner of the trench was lower than that at the top and on the bottom sides. From this result, we confirmed that a plating current density 2.5 mA/$cm^2$ is very useful for void-free Cu filling of a TSV. In order to reduce the plating time, we attempted TSV Cu filling by controlling the accelerator SPS concentration at a plating current density of 2.5 mA/$cm^2$. A TSV with a diameter 10 ${\mu}m$ and an aspect ratio of 7 was filled completely with Cu plating material in 90 min at a current density 2.5 mA/$cm^2$ with an addition of SPS at 50 mg/L. Finally, we found that TSV can be filled rapidly with plated Cu without voids by controlling the SPS concentration at the optimized plating current density.