• 제목/요약/키워드: Bismuth film

검색결과 81건 처리시간 0.025초

Photocatalytic study of Zinc Oxide with bismuth doping prepared by spray pyrolysis

  • Lin, Tzu-Yang;Hsu, Yu-Ting;Lan, Wen-How;Huang, Chien-Jung;Chen, Lung-Chien;Huang, Yu-Hsuan;Lin, Jia-Ching;Chang, Kuo-Jen;Lin, Wen-Jen;Huang, Kai-Feng
    • Advances in nano research
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    • 제3권3호
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    • pp.123-131
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    • 2015
  • The unintentionally doped and bismuth (Bi) doped zinc oxide (ZnO) films were prepared by spray pyrolysis at $450^{\circ}C$ with zinc acetate and bismuth nitrate precursor. The n-type conduction with concentration $6.13{\times}10^{16}cm^{-3}$ can be observed for the unintentionally doped ZnO. With the increasing of bismuth nitrate concentration in precursor, the p-type conduction can be observed. The p-type concentration $4.44{\times}10^{17}cm^{-3}$ can be achieved for the film with the Bi/Zn atomic ratio 5% in the precursor. The photoluminescence spectroscopy with HeCd laser light source was studied for films with different Bi doping. The photocatalytic activity for the unintentionally doped and Bi-doped ZnO films was studied through the photodegradation of Congo red under UV light illumination. The effects of different Bi contents on photocatalytic activity are studied and discussed. Results show that appropriate Bi doping in ZnO can increase photocatalytic activity.

Boron Detection Technique in Silicon Thin Film Using Dynamic Time of Flight Secondary Ion Mass Spectrometry

  • Hossion, M. Abul;Arora, Brij M.
    • Mass Spectrometry Letters
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    • 제12권1호
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    • pp.26-30
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    • 2021
  • The impurity concentration is a crucial parameter for semiconductor thin films. Evaluating the impurity distribution in silicon thin film is another challenge. In this study, we have investigated the doping concentration of boron in silicon thin film using time of flight secondary ion mass spectrometry in dynamic mode of operation. Boron doped silicon film was grown on i) p-type silicon wafer and ii) borosilicate glass using hot wire chemical vapor deposition technique for possible applications in optoelectronic devices. Using well-tuned SIMS measurement recipe, we have detected the boron counts 101~104 along with the silicon matrix element. The secondary ion beam sputtering area, sputtering duration and mass analyser analysing duration were used as key variables for the tuning of the recipe. The quantitative analysis of counts to concentration conversion was done following standard relative sensitivity factor. The concentration of boron in silicon was determined 1017~1021 atoms/㎤. The technique will be useful for evaluating distributions of various dopants (arsenic, phosphorous, bismuth etc.) in silicon thin film efficiently.

솔-젤법을 이용한 Bismuth Layered Structure를 가진 강유전성 박막의 제조 및 특성평가에 관한 연구 (The preparation and Characterization of Bismuth Layered Ferroelectric Thin Films by Sol-Gel Process)

  • 주진경;송석표;김병호
    • 한국세라믹학회지
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    • 제35권9호
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    • pp.945-952
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    • 1998
  • Ferroelectric Sr0.8Bi2.4Ta2O9 stock solutions were prepared by MOD(Metaloganic Decompostion) process. The phase transformation for the layered perovskite of the SBT thin films by changing RTA(Rapid her-mal Annealing) temperatuer from 700$^{\circ}C$to 780$^{\circ}C$ were observed using XRD and SEM. Layered perovskite phase began to appear above 740$^{\circ}C$ and then SBT thin films were annealed at 800$^{\circ}C$ for 1hr for its com-plete crystallization. The specimens showed well shaped hysteresis curves without post annealing that car-ried out after deposition of Pt top electrode. The SBT thin films showed the asymmetric ferroelectric pro-perties. It was confirmed that the properties were caused by interface effect to SBT and electrode by leak-age current density measurement and asymmetric properties reduced by post annealing. At post annealing temperature of 800$^{\circ}C$ remanant polarization values (2Pr) were 6.7 9 ${\mu}$C/cm2 and those of leakage current densities were 3.73${\times}$10-7 1.32${\times}$10-6 A/cm2 at 3, 5V respectively. Also bismuth bonding types of SBT thin film surface were observed by XPS.

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강유전체 $(Bi,Nd)_4Ti_3O_{12}$ 박막의 결정 구조와 분극 특성 (Crystal Structure and Polarization Properties of Ferroelectric Nd-Substituted $Bi_4Ti_3O_{12}$ Thin Films Prepared by MOCVD)

  • 강동균;박원태;김병호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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    • pp.135-136
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    • 2006
  • Bismuth titanate ($Bi_4Ti_3O_{12}$, BIT) thin film has been studied intensively in the past decade due to its large remanent polarization, low crystallization temperature, and high Curie temperature. Substitution of various trivalent rare-earth cations (such as $La^{3+}$, $Nd^{3+}$, $Sm^{3+}$ and $Pr^{3+}$) in the BIT structure is known to improve its ferroelectric properties, such as remanent polarization and fatigue characteristics. Among them, neodymuim-substituted bismuth titanate, ((Bi, Nd)$_4Ti_3O_{12}$, BNT) has been receiving much attention due to its larger ferroelectricity. In this study, Ferroelectric $Bi_{3.3}Nd_{0.7}Ti_3O_{12}$ thin films were successfully fabricated by liquid delivery MOCVD process onto Pt(111)/Ti/$SiO_2$/Si(l00) substrates. Fabricated polycrystailine BNT thin films were found to be random orientations, which were confirmed by X-ray diffraction and scanning electron microscope analyses. The remanent polarization of these films increased with increase in annealing temperature. And the film also demonstrated fatigue-free behavior up to $10^{11}$ read/write switching cycles. These results indicate that the randomly oriented BNT thin film is a promising candidate among ferroelectric materials useful for lead-free nonvolatile ferroelectric random access memory applications.

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Temperature Dependence of Galvanomagnetic Properties in Thin Bi Film

  • Nam, S.W.
    • Journal of Magnetics
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    • 제4권4호
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    • pp.111-114
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    • 1999
  • Numerical calculation for temperature dependence of galvanomagnetic properties of thin bismuth films is pursued. The quasi-two dimensional system is treated in the perturbation formalism of previous study, where realistic screened potential due to impurity is assumed to be the only scattering channel. The potential is separated into pure two dimensional part and the remaining presumed perturbation part. Relaxation time and mobilities for both electron and hole are evaluated, then temperature dependence of the Hall coefficient and magnetoresistance is obtained. The broad minimum of magnetoresistnace is manifested, and the interpretation under the kinetic theory is made. Thickness dependence of the quantities are also shown, which are in good agreement with the expected quantum size effect.

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RF 마그네트론 스퍼터링을 이용한 Bismuth Telluride 박막의 제조와 그 열전 특성 연구 (Preparation of Bismuth Telluride Thin Films using RF magnetron sputtering and Study on Their Thermoelectric Properties)

  • 김동호;이건환
    • 한국진공학회지
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    • 제14권4호
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    • pp.215-221
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    • 2005
  • 비스무스와 텔루리움 타겟을 co-sputtering하여 열전특성을 지닌 비스무스 텔루라이드($Bi_2Te_3$) 박막을 제조하고, 증착온도에 따른 표면형상, 결정성, 그리고 전기적 특성의 변화를 조사하였다. 표면온도가 $290^{\circ}C$ 이상일 때, 박막의 표면에서 육각형상의 결정이 뚜렷이 관찰되었으며, X선 회절분석을 통하여 높은 증착온도에서 박막의 주된 구성물질이 rhombohedral 구조의 $Bi_2Te_3$ 결정상에서 hexagonal 구조의 BiTe 결정상으로 변하는 것을 확인하였다. 높은 증착온도에서 제조된 박막의 조성이 $Bi_2Te_3$의 화학양론비에서 벗어남으로 구조적 변화와 함께 전기적 특성도 변한다는 사실을 알 수 있었다. 제조된 비스무스 텔루라이드 박막의 열전특성을 파악하기 위해 제벡계수(Seebeck coefficient)를 측정하였다. 모든 시편이 n타입의 열전박막임을 확인하였으며, 증착온도 약 $225^{\circ}C$에서 열전특성의 최적값 (제벡계수: -55 $\mu$V/$K^{2}$, 열전성능인자: $3\times10^{-4}$ W/$k^{2}$m)이 얻어졌다. 그 이상의 온도에서 나타나는 열전 특성의 저하는 텔루리움의 증발에 따른 $Bi_{2}$$Te_{3}$ 열전박막의 텔루리움 함량 부족과 그에 따른 BiTe 결정상의 발생으로 이해된다.

High Crystalline Epitaxial Bi2Se3 Film on Metal and Semiconductor Substrates

  • 전정흠;장원준;윤종건;강세종
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.302-302
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    • 2011
  • The binary chalcogenide semiconductor Bi2Se3 is at the center of intensive research on a new state of matter known as topological insulators. It has Dirac point in their band structures with robust surface states that are protected against external perturbations by strong spin-orbit coupling with broken inversion symmetry. Such unique band configurations were confirmed by recent angle-resolved photoelectron emission spectroscopy experiments with an unwanted n-type doping effect, showing a Fermi level shift of about 0.3 eV caused by atomic defects such as Se vacancies. Since the number of defects can be reduced using the molecular beam epitaxy (MBE) method. We have prepared the Bi2Se3 film on noble metal Au(111) and semiconductor Si(111) substrates by MBE method. To characterize the film, we have introduced several surface sensitive techniques including x-ray photoemission electron spectroscopy (XPS) and micro Raman spectroscopy. Also, crystallinity of the film has been confirmed by x-ray diffraction (XRD). Using home-built scanning tunneling microscope, we observed the atomic structure of quintuple layered Bi2Se3 film on Au(111).

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양극벗김전위법 비스무스막 유리탄소전극을 이용한 표준 쌀 분말 내 카드뮴과 납 측정 (Using a Bismuth-film Glassy Carbon Electrode Based on Anodic Stripping Voltammetry to Determine Cadmium and Lead in a Standard Rice Flour)

  • 김학진;손동욱;모창연;한재웅;김기영;박상원;엄애선
    • Journal of Biosystems Engineering
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    • 제34권5호
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    • pp.377-381
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    • 2009
  • Excessive presence of heavy metals in environment may contaminate plants and fruits grown in that area. Rapid on-site monitoring of heavy metals can provide useful information to efficiently characterize heavy metal-contaminated sites and minimize the exposure of the contaminated food crops to humans. This study reports on the evaluation of a bismuth-coated glassy carbon electrode for simultaneous determination of cadmium (Cd) and lead (Pb) in a NIST-SRM 1568a rice flour by anodic stripping voltammetry (ASV). The use of a supporting electrolyte 0.1 M $HNO_3$ at a dilution ratio (sample pretreated with acid digestion in a microwave oven: supporting electrolyte) of 1:1 provided well-defined, sharp and separate peaks for Cd and Pb ions, thereby resulting in strongly linear relationships between Cd and Pb concentrations and peak currents measured with the electrode ($R^2\;=\;0.97$, 0.99 for Cd and Pb, respectively). The validation test results for spiked standard solutions with different concentrations of Cd and Pb gave acceptable predictability for both spiked Cd and Pb ions with mean prediction errors of 6 to 30%. However, the applicability of the electrode to the real rice flour sample was limited by the fact that Cd concentrations spiked in the rice flour sample were overly estimated with relatively high variations even though Pb ion could be quantitatively measured with the electrode.