• 제목/요약/키워드: Bismuth film

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Bi 고온 초전도 박막의 부착 공정 (Sticking processing of Bi high $T_c$ superconducting thin films)

  • 천민우;김태곤;박용필
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 춘계학술대회 논문집
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    • pp.94-97
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    • 2005
  • Bismuth high Tc superconducting thin films are fabricated via a co-deposition process by an ion beam sputtering with an ultra low growth rate, and sticking processing of the respective elements are evaluated. The sticking processing of bismuth element in bismuth high Tc superconducting thin film formation was observed to show a unique temperature dependence; it was almost a constant value of 0.49 below about $730^{\circ}C$ and decreased linearly over about $730^{\circ}C$. This temperature dependence can be elucidated from the evaporation and sublimation rates of bismuth oxide, $Bi_2O_3$, from the film surface. It is considered that the liquid phase of the bismuth oxide plays an important role in the bismuth phase formation in the co-deposition process.

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RF 마그네트론 스퍼터링을 이용한 Bismuth 박막의 제조와 그 전기적 특성 연구 (Preparation of Bismuth Thin Films by RF Magnetron Sputtering and Study on Their Electrical Transport Properties)

  • 김동호;이건환
    • 한국표면공학회지
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    • 제38권1호
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    • pp.7-13
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    • 2005
  • Bismuth thin films were prepared on glass substrate with RF magnetron sputtering and effects of substrate temperature on surface morphology and their electrical transport properties were investigated. Grain growth of bismuth after nucleation and the onset of coalescense of grains at 393 K were observed with field emission secondary electron microscopy. Continuous thin films could not be obtained above 473 K because of grain segregation and island formation. Hall effect measurements showed that substrate heating yields the decrease of carrier density and the increase of mobility. Resistivity of bismuth film has its minimum (about 0.7 x 10/sup -3/ Ωcm) in range of 403~433 K. Annealing of bismuth films deposited at room temperature was carried out in a radiation furnace with flowing hydrogen gas. The change of resistivity was not significant due to cancellation of the decrease of carrier density and the increase of mobility. The abrupt change of electrical properties of film annealed above 523 K was found to be caused by partial oxidation of bismuth layer in x-ray diffraction analysis.

MOCVD $Bi_4Ti_3O_{12}$ 박막의 실리콘 위에서의 증착기구 및 유기 금속원료의 펄스주입법에 의한 박막 특성 개선 (Deposition mechanism of $Bi_4Ti_3O_{12}$ films on Si by MOCVD and property improvement by pulse injection method)

  • 이석규;김준형;최두현;황민욱;엄명윤;김윤해;김진용;김형준
    • 한국진공학회지
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    • 제9권4호
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    • pp.373-378
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    • 2000
  • 실리콘 기판 위에서 $TiO_2$$Bi_2O_3$의 박막 성장은 반응속도론 측면에서 커다란 차이를 보였지만, $Bi_4Ti_3O_{12}$(BIT) 박막의 성장은 주로 $TiO_2$ 성장 거동에 의해 지배를 받았다. 그 결과 BIT 박막은 bismuth가 부족한 조성을 가지게 되었다. 박막 내에 부족한 bismuth의 양을 보충해줌으로써 이러한 문제점을 해결하고자 펄스 주입 유기 금속 화학 기상 증착(MOCVD) 방법을 사용하였다. 이러한 펄스 주입법에 의해 bismuth의 양은 증가하였고 또한, 박막의 깊이 방향으로의 조성이 균일해졌고 $Bi_4Ti_3O_{12}$과 Si사이의 계면이 향상되었다. 게다가, $Bi_4Ti_3O_{12}$ 박막의 결정성은 크게 향상되었고 누설 전류 밀도는 연속 주입법에 비해 1/2에서 1/3정도 낮아졌다. 시계 방향의 C-V 이력 곡선이 관찰되었고 이로 인해 펄스 주입법에 의해 증착된 $Bi_4Ti_3O_{12}$ 박막은 강유전성에 의해 스위칭이 됨을 알 수 있었다.

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Influence of Annealing Temperature on Structural and Thermoelectrical Properties of Bismuth-Telluride-Selenide Ternary Compound Thin Film

  • Kim, Youngmoon;Choi, Hyejin;Kim, Taehyeon;Cho, Mann-Ho
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.304.2-304.2
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    • 2014
  • Chalcogenides (Te,Se) and pnictogens(Bi,Sb) materials have been widely investigated as thermoelectric materials. Especially, Bi2Te3 (Bismuth telluride) compound thermoelectric materials in thin film and nanowires are known to have the highest thermoelectric figure of merit ZT at room temperature. Currently, the thermoelectric material research is mostly driven in two directions: (1) enhancing the Seebeck coefficient, electrical conductivity using quantum confinement effects and (2) decreasing thermal conductivity using phonon scattering effect. Herein we demonstrated influence of annealing temperature on structural and thermoelectrical properties of Bismuth-telluride-selenide ternary compound thin film. Te-rich Bismuth-telluride-selenide ternary compound thin film prepared co-deposited by thermal evaporation techniques. After annealing treatment, co-deposited thin film was transformed amorphous phase to Bi2Te3-Bi2Te2Se1 polycrystalline thin film. In the experiment, to investigate the structural and thermoelectric characteristics of Bi2Te3-i2Te2Se1 films, we measured Rutherford Backscattering spectrometry (RBS), X-ray diffraction (XRD), Raman spectroscopy, Scanning eletron microscopy (SEM), Transmission electron microscopy (TEM), Seebeck coefficient measurement and Hall measurement. After annealing treatment, electrical conductivity and Seebeck coefficient was increased by defect states dominated by selenium vacant sites. These charged selenium vacancies behave as electron donors, resulting in carrier concentration was increased. Moreover, Thermal conductivity was significantly decreased because phonon scattering was enhanced through the grain boundary in Bi2Te3-Bi2Te2Se1 polycrystalline compound. As a result, The enhancement of thermoelectric figure-of-merit could be obtained by optimal annealing treatment.

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Fabrication and Characteristics Study of $n-Bi_2O_3$/n-Si Heterojunction

  • Ismail, Raid A.
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제6권2호
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    • pp.119-123
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    • 2006
  • This work presents the fabrication and characteristics of $Bi_2O_3/Si$ heterojunction prepared by rapid thermal oxidation technique without any postdeposition annealing condition. The bismuth trioxide film was deposited onto monocrystalline Si and glass substrates by rapid thermal oxidation of bismuth film with aid of halogen lamp at $500^{\circ}C/\;45$ s in static air. The structural, optical and electrical properties of $Bi_2O_3$ film were investigated and compared with other published results. The structural investigation showed that the grown films are polycrystalline and multiphase (${\alpha}-Bi_2O_3$ and ${\beta}-Bi_2O_3$). Optical properties revealed that these films having direct optical band gap of 2.55 eV at 300 K with high transparency in visible and NIR regions. Dark and illuminated I-V, CV, and spectral responsivity of $Bi_2O_3/Si$ heterojunction were investigated and discussed.

As, Sb, Bi, Pb가 조동의 부동태에 미치는 영향 (Effect of Arsenic, Antimony, Bismuth and Lead on Passivation Behavior of Copper Anode)

  • 안승천;이상문;김용환;정원섭;정우창
    • 한국표면공학회지
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    • 제39권5호
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    • pp.215-222
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    • 2006
  • The passivity behavior of copper anode containing impurities in copper sulfate solution for electrorefining process was studied at several different levels of impurities such as As, Sb, Bi and Pb. The passivity behavior was investigated by electrochemical techniques (galvanostatic, potentiodynamic and cyclic voltammetry tests) and surface analysis (optical microscopy, electron probe microanalysis, scanning electron microscopy). The results were that arsenic, antimony inhibited passivation and bismuth accelerated it and lead containing anode showed different passivity behavior from above anodes. The improved passivity characteristics could be explained by decrease in oxygen content in passivity film which resulted from a reaction among the impurities, oxygen and copper in the anode. The SEM image revealed that arsenic or antimony containing anode exhibited a porous passivity film and bismuth containing anode showed the compact passivity film and lead containing anode had loose passivity film on anode.

친환경 비스무스 필름 전극을 이용한 중금속 분석 최적조건 도출 및 현장 적용성 평가 (Evaluation of Field Application and Optimum Operational Condition for Heavy Metals Analysis Using Environment-Friendly Bismuth Film Electrode)

  • 김소연;양용운;전숙례
    • 대한환경공학회지
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    • 제33권2호
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    • pp.137-142
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    • 2011
  • 본 연구는 실험실 조건에서 비스무스 필름 전극(Bismuth film Electrode)을 사용한 양극산화벗김분석법(Anodic Stripping Voltammetry)에서 비스무스의 첨가 농도와 적정 전해질을 선택하여 최적 조건을 산출하고 최적조건을 기반으로 현장에서 중금속 모니터링 가능 여부를 확인하고자하였다. 비스무스(Bi)와 혼합중금속(Pb, Cd, Zn) 실험을 통해 정확한 중금속의 측정을 위해서는 측정하고자 하는 중금속보다 1:1 이상의 비스무스가 첨가되어야 하는 것으로 나타났다. 전해질 테스트에서는 0.1 M acetate buffer (pH 4.5), 0.1 M chloroacetate buffer (pH 2.0), 0.1 M HCl (pH 2.0), 0.1 M $HNO_3$ (pH 2.0) 중 0.1 M acetate buffer가 비스무스 필름전극을 이용한 중금속 분석에 적용 가능한 것으로 나타났다. 현장 적용시, 중금속 표준용액 100 ppb 첨가 테스트 결과 Pb은 36~45 ppb, Cd는 84~91 ppb, Zn은 90~98 ppb가 측정되었다. 첨가한 중금속보다 낮은 농도로 중금속이 측정되는 것은 현장수 매질 효과에 의한 것으로 파악되었으며, 추후 현장수 매질과 중금속 측정의 상관관계에 대한 연구가 진행될 예정이다.

Fabrication of Bismuth- and Aluminum-Substituted Dysprosium Iron Garnet Films for Magneto-Optic Recording by Pyrolysis and Their Magnetic and Magneto-Optic Properties

  • Cho, Jae-Kyong
    • The Korean Journal of Ceramics
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    • 제1권2호
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    • pp.91-95
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    • 1995
  • Polycrystalline bismuth- and aluminum- substituted dysporsium and yttrium iron garnet (Bi2R3-xAlyFe5-yO12, R=Dy or Y, $0\leqx\leq3, \; 0\leqy\leq3$) films have been prepared by pyrolysis. The crystallization temperatures, the solubility limit of bismuth ions into the garnet phase, and magnetic and magneto-optic properties of the films have been investigated as a function of bismuth and aluminum concentration. It was found that the crystallization temperatures as a function of bismuth and aluminum concentration. It was found that the crystallization temperatures of these films rapidly decreased as bismuth concentration. It was found that the crystallization temperatures of these films rapidly decreased as bismuth concentration (x) increased up to x=1.5 and then remained temperatures of these films rapidly decreased as bismuth concentration (x) increased up to x=1.5 and then remained unchanged at x>1.5, whereas, showed no changes as aluminum concentration (y) increased up to y=1.0 and then gradually increased at y>1.0. The solubility limit of bismuth ions was x=1.8 when y=0 but increased to x=2.3 when y=1.0. It was demonstrated that the magnetic and magneto-optic properties of the dysprosium iron garnet films could be tailored by bismuth and aluminum substitution suitable for magneto-optic recording as follows. The saturation magnetization and coercivity data obtained for the films indicated that the film composition at which the magnetic compensation temperature became room temperature was y=1.2 when x=1.0. Near this composition the coercivity and the squareness of the magnetic hysteresis loop of the films were several kOe and unit, respectively. The Curie temperatures of the films increased with the increase of x but decreaed with the increase of y, and was 150-$250^{\circ}C$ when x=1.0 and y=0.6-1.4. The Faraday rotation at 633 nm of the films increased as x increased but decreased as y increased, and was 1 deg/$\mu\textrm{m}$ when x=1.0 and y=1.0. Based on the data obtained, the appropriate film composition for magneto-optic recording was estimated as near x=1.0 and y=1.0 or $BiDy_2AlFe_4O_{12}$.

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SIMS 분석조건이 Bismuth Titanate 박막의 깊이방향 조성 해석에 미치는 영향 (Effect of Surface Charging on the SIMS Depth Profile of Bismuth Titanate Thin Film)

  • 김재남;이상업;권혁대;신광수;전웅;박병옥;조상희
    • 분석과학
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    • 제14권6호
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    • pp.486-493
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    • 2001
  • 본 연구는 SIMS를 이용한 bismuth titanate 박막의 깊이방향 분석에 있어서 mesh grid를 사용한 경우와 사용하지 않은 경우, offset voltage를 사용한 경우와 사용하지 않은 경우 등 분석조건에 따른 charging effect 그리고 검출한계의 특성을 검토하고자 하였다. 결과에 따르면 -40 V의 offset voltage를 사용하였을 경우는 charging effect의 감소는 물론 검출한계도 낮출 수 있었으나 mesh grid를 사용하였을 경우에는 charging effect는 다소 줄일 수 있었으나 반면 검출 한계는 오히려 높아졌다. O- 일차이온을 적용한 경우는 -40 V의 offset voltage를 사용하였을 때와 동일한 효과를 얻을 수 있었다.

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