• Title/Summary/Keyword: Bias angle

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No-bias-bend pi cell using the rubbed polyimide mixture

  • Kim, Dae-Hyeon;Park, Hong-Gyu;Kim, Yeong-Hwan;Kim, Byeong-Yong;Ok, Cheol-Ho;Han, Jeong-Min;Seo, Dae-Sik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.186-186
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    • 2009
  • Most liquid crystal display modes, including the twisted nematic (TN) $mode^1$, the in-plane switching (IPS) $mode^2$, the fringe field switching (FFS) $mode^3$, and the vertically aligned (VA) $mode^4$ are based on either a horizontal or a vertical alignment. However, for some applications, such as no-bias-bend (NBB) pi cell or bistable bend-splay display, an intermediate pretilt angle is essential$^5$. NBB pi cells have been a focus of interest because of their fast response time; however, the reliable control of the intermediate pretilt angle of liquid crystals that is required for the fabrication of NBB pi cells is challenging. The controllable pre-tilt angle of liquid crystals was investigated using a blend of horizontal and vertical polyimide prepared by a rubbing method. Various pretilt angles in the range from 0^{\circ}$ to 90^{\circ}$ were achieved as a function of the vertical polyimide content. We observed uniform liquid crystal alignment on the rubbing-treated blended polyimide layer. A NBB pi cell with an intermediate pretilt angle of 47.8^{\circ}$ was manufactured. This cell had no initial bias voltage and a low threshold voltage, which indicates that it has low power consumption. In addition, the response time of the NBB pi cell was rapid.

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A Study on Easing contraction made by different angles(Part II) -About variations of sleeve cap curve lines- (재단각도 변화에 따른 오그림에 관한 연구 (제 2보) -소매산높이에 따른 각도변화를 중심으로-)

  • 이명희
    • Journal of the Korean Society of Clothing and Textiles
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    • v.23 no.3
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    • pp.353-360
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    • 1999
  • An investigation made of the variations of angle of bias on the top of the sleeve cap curve line and calculated easing contraction ratio by capheights(A ; a,h$\times$5,/6) B: A, H/4 +4cm C:A.H/3 D: A.H/ 4+3cm E:AH/4+2cm, F: A,H/4+1cm, G: A,H/4, H:A,H/6, I:A,H/8) and the efects of easing contraction on the cap curve lines of sleeve A, D, G by easing stitch density with the gathering foot: sewing condition-lockstitch industrial machine stitch density(N1.0 ; 38stitches/3cm N1.5: 26stitches/3cm, N2.0 ; 19stitches/3cm, N2.5 ; 14stitches/ 3cm) The results obtained were as follows; 1) The variations of the angle of bias on the top of the sleeve cap curve line by cap heights can be done according to the angle balance (front; $\alpha$-$\beta$ back ; $\alpha$'- $\beta$') between the angle (front ;$\alpha$, $\beta$, back ; $\alpha$'- $\beta$') of bias of the two base-lines. 2) The higher cap height the more higher the calculated easing contraction ratio. 3) The lower the stitch density the higher easing contraction ratio. 4) The effects of easing contraction was that sleeve G was more than sleeve A, D.

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Bias Extension and Biaxial Tests for Carbon Dry Fabrics (탄소섬유 건직물의 일방향 편향 인장실험과 이축 인장실험)

  • 장승환;전성식
    • Proceedings of the Korean Society For Composite Materials Conference
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    • 2003.10a
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    • pp.99-102
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    • 2003
  • This paper aims to observe the micro-mechanical behaviour of tow geometry during deformation of dry woven carbon-fiber fabric. With the increment of shear angle fabric experiences 'lock-up'phenomenon. In this paper, deformation of micro-mechanical parameters such as tow interval, change in tow amplitude and wavelength are investigated. To observe the micro-deformation of the fabric structure, appropriate specimens from bias extension and biaxial tests are sectioned and observed under the microscope. It was found that different loading conditions cause geometric deferences in the tow architecture.

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A Study on the Marking Efficiency of A-line Skirt (A-line Skirt의 Marking 효율에 관한 연구)

  • Uh Mi-Kyung
    • Journal of the Korea Fashion and Costume Design Association
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    • v.8 no.1
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    • pp.69-79
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    • 2006
  • The purpose of this study is to find the proper width of fabric which can bring high efficiency on productivity. We focus on the marking method by comparing and analyzing the marking efficiency of A-line skirt. This study employs 4 criteria to mark the A-line skirt, which are cutting method, angle, width, and direction, respectively. There can be 2 different cutting methods(fold pattern and add seam pattern at the front and back center line), and 2 different angles(warp angle and bias angle). Also, width of the fabric can be classified into 2 groups(110cm, 150cm), and marking direction can be grouped into 2(one direction marker and one direction per each size marker). These 4 criteria make 16($2^*2^*2^*2$) cases for this study. Main findings are follows. First, the skirt with folded at the center line had higher efficiency rate than the skirt with add seam at the center line. Second, the skirt with the 150cm width has higher efficiency rate than that of 110cm. Third, fixing the warp angle has higher efficiency rate than that of fixing the bias angle at the front and back center line. Finally, one direction per each size marker has much higher efficiency than the one direction marker.

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Effects of Bias Voltage and Ion-incident Angle on the Etching of Photoresist in a High-density CHF3 Plasma (고밀도 CHF3 플라즈마에서 바이어스 전압과 이온의 입사각이 Photoresist의 식각에 미치는 영향)

  • Kang, Se-Koo;Min, Jae-Ho;Lee, Jin-Kwan;Moon, Sang Heup
    • Korean Chemical Engineering Research
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    • v.44 no.5
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    • pp.498-504
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    • 2006
  • The etch rates of photoresist (PR) and the etch selectivity of $SiO_2$ to PR in a high density $CHF_3$ plasma were investigated at different ion-incident angles and bias voltages. A Faraday cage was employed for the accurate control of ion-incident angles. The ion energy was controlled by changing bias voltages. The etch rate of $SiO_2$ continuously decreased with ion-incident angles but the etch rate of PR remained constant up to the middle angle region and decreased afterwards. The etch rates of $SiO_2$ normalized to those at $0^{\circ}$ incident angle changed with the ion-incident angle following a cosine(${\theta}$) curve. On the other hand, the normalized etch rates of the PR changed showing a drastic over-cosine shape in the middle angle region. The etch selectivity of $SiO_2$ to PR decreased with an increase in the ion-incident angle because the etch yields of PR were enhanced by physical sputtering in the middle angle region compared to the case of $SiO_2$ etching. The etch selectivity of $SiO_2$ to PR decreased with an increase in the bias voltage at nearly all ion-incident angles.

MICROSCOPIC OBSERVATION OF DRAPED COMPOSITE MATERIALS : Bias Extension and Biaxial Tests (직물 복합재료의 드레이핑 미소 거동 관찰 : 일방향 편향 인장실험과 이축 인장실험)

  • 장승환
    • Composites Research
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    • v.17 no.1
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    • pp.38-46
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    • 2004
  • This paper aims to correlate the micro-mechanical behaviour of tow geometry with applied in-plane forces during deformation of dry woven carbon-fibre fabric. These in-plane forces lead to differences in tow reorganisation during deformation and so changes in the way in which 'lock-up' occurs. In this paper, deformation of micro-mechanical parameters such as tow interval, crimp angle, change in tow amplitude and wavelength are investigated. To observe the micro-deformation of the fabric structure, appropriate specimens from bias extension and biaxial tests are sectioned and observed under the microscope. It was found that different loading conditions cause geometric deferences in the tow architecture. The variation in deformed tow geometry with shear angle is fitted using a simple parametric model.

LC Alignment Effects using a-C:H Thin Film as Working Gas at Bias Condition (바이어스 조건하에서 증착한 a-C:H 박막을 이용한 액정 배향 효과)

  • Jo, Yong-Min;Hwang, Jeoung-Yeon;Park, Chang-Joon;Seo, Dae-Shik;Rho, Soon-Jun;Ahn, Han-Jin;Baik, Hong-Koo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.04a
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    • pp.136-139
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    • 2003
  • We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of a-C:H thin film as working gas at 30W rf bias condition. A high pretilt angle of about $5^{\circ}$ by ion beam(IB) exposure on the a-C:H thin film surface was measured. A good LC alignment by the IB alignment method on the a-C:H thin film surface was observed at annealing temperature of $250^{\circ}C$, and the alignment defect of the NLC was observed above annealing temperature of $300^{\circ}C$. Consequently, the high LC pretilt angle and the good thermal stability of LC alignment by the IB alignment method on the a-C:H thin film surface as working gas at 30W rf bias condition can be achieved.

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Development of the Bias-Cut Dress Pattern Making Method by Applying Fabric Draping Ratio

  • Park, Chan-Ho;Chun, Jong-Suk
    • The Research Journal of the Costume Culture
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    • v.20 no.4
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    • pp.594-603
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    • 2012
  • This study aimed to investigate a bias pattern making method with geometrical approach. The bias-cut dress has soft silhouette of drape in the garment. However, the bias cut dress has problem of satisfying the intended garment size spec. This problem occurs from various sources. The main reason is that the bias-cut fabric tends to stretch on longitudinal direction and to shrink horizontal direction when it was hung on the body. The goal of this study was to develop a bias-cut dress pattern making method satisfying the intended garment size spec. The researchers developed the geometrical method of measuring dimensional change by calculating the compensation ratio of the fabric in true bias direction. The compensation ratio was calculated by applying draping ratio of the fabric. Three types of fabrics were used in the experiment. The warp and weft crossing angle of fabric was ranged from $78^{\circ}$ to $82^{\circ}$. The fabrics stretched longitudinally 6.9~9.9% and shrank horizontally 7.2~11.0%. The compensation ratio of the bias-cut pattern for sample dress was calculated for each fabric type. Two types of experimental bias-cut dress patterns were developed for each fabric. One pattern was made with applying full compensation ratio and the other one made with applying partial ratio of the fabric. Experimental dresses were made with these patterns. The results of the evaluation showed that the bias-cut dress pattern applying the partial compensation ratio was more appropriate than the pattern applying the full compensation ratio.

Characterization of In-plane Shear Behaviors of Woven Fabrics by Bias-extension and Trellis-frame Tests (편향 인장 및 트렐리스 시험에 의한 직물 복합재료의 면내 전단 물성 평가)

  • Lee, Won-Oh;Um, Moon-Kwang;Byun, Joon-Hyung;Cao, Jian
    • Composites Research
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    • v.23 no.5
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    • pp.8-14
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    • 2010
  • Three types of glass woven fabrics (plain, balanced twill, and unbalanced twill) having various sample sizes and aspect ratios were tested using the bias-extension tests. Real-time deformation images, force, and displacement data were collected. For the bias-extension test, the shear angle of the fabrics from the equation based on the crosshead displacement and fabric size was compared with direct manual measurements of the warp and weft angles as well as the optical measurement software. To determine the shear force, an analytical equation was introduced considering the kinematics of the bias-extension test. The obtained shear behaviors were further compared with the results by the trellis-frame test. The optical measurement methods showed that the mathematical method was reasonable before the shear angle of the fabrics reaches $30^{\circ}$ in the bias-extension tests. Also, the bias-extension test gave consistent behaviors with the trellis-frame test only for isotropic and homogeneous fabrics such as balanced plain and twill weaves.