• Journal of Information Display
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• 제7권3호
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• pp.13-18
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• 2006

Currently, the flexible organic light emitting devices (OLEDs) are investigated. They are very vulnerable to moisture, and thus have been found to show some problems. Thus, an effective barrier layer is needed to protect from moisture in air. We deposited thin films with magnesium oxide (MgO) and silicon oxide $(SiO_{2})$ compounds mixed at various mixture ratios on flexible polyether sulfone (PES) substrates by an electron-beam evaporator to investigate their applizability for transparent barrier applications. In this study, we found that as the MgO fraction increased, thin films comprised of MgO and $(SiO_{2})$ compounds became more amorphous and their surface morphologies become smoother and denser. In addition, zirconium oxide $(ZrO_{2})$ was added to the above-mentioned compound mixtures. $ZrO_{2}$ made thin mixture films more amorphous and made the surface morphology denser and more uniform. The water vapor transmission rates (WVTRs) of the whole films decreased rapidly. The best WVTR was obtained by depositing thin films of Mg-Si-Zr-O compound among the whole thin films. As the thin mixture films became more amorphous, and the surface morphology become denser and more uniform, the WVTRs decreased. Therefore, the thin mixture films became more suitable for flexible OLED applications as transparent passivation layers against moisture in air.

• 한국포장학회지
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• 제25권1호
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• pp.1-10
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• 2019

이번 연구에서는 식품 포장재로 많이 활용하고 있는 산소 고차단성 필름 두 종류의 환경 영향을 평가하는 것이었다. Table 4의 경우 환경 영향 모델에 따라 계산된 Traditional film과 New film의 각 환경 영향 범주 별 비교 값 및 이러한 차이를 보인 가장 영향력 있는 공정을 설명하였다.

• 멤브레인
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• 제27권2호
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• pp.154-166
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• 2017

식품 포장, 전자 기기 등에 활용되고 있는 고분자 기반 기체 차단성 필름은 경량성, 낮은 제조 원가, 높은 가공성으로 인하여 많은 주목을 받고 있다. 특히 전자기기에 활용되기 위하여, 기체 차단 필름은 매우 높은 수준의 기체 차단성을 요구받고 있다. 하지만 현재 수준의 고분자 기반 기체 차단 필름은 다른 소재와 비교하여 상대적으로 높은 수준의 기체 투과유량을 보이고 있다. 따라서 기존의 고분자 필름이 가지고 있는 장점을 유지하면서 더 높은 수준의 기체 차단성을 부여하기 위한 요구가 증대되고 있다. 최근 그래핀 소재는 기체 차단을 위한 2차원 소재로서 각광받고 있다. 그러나 그래핀 소재의 낮은 가공성과 어려운 대면적화 문제 때문에 산화그래핀이 그 대안으로서 떠오르고 있다. 산화그래핀은 높은 종횡비를 가지는 2차원 층상구조의 그래핀에 산소관능기를 함유한 형태로서, 수용성 혹은 극성 용매에 잘 분산되는 성질을 가지며, 따라서 대량 생산에 용이한 특성을 가지고 있다. 본 연구에서는, 산화그래핀이 함유된 폴리이미드 나노복합막을 제조하였다. 폴리이미드는 현재 널리 이용되고 있는 기체 차단성 고분자 중의 하나로서 높은 기계적 강도, 열적 안정성 및 내화학성을 가지고 있다. 본 연구를 통하여 산화그래핀이 함유된 폴리이미드 나노복합막이 기체 차단성을 가지고 있음을 확인하였다. 더 나아가, Triton X-100이나 sodium deoxycholate (SDC) 등의 계면활성제를 나노복합막에 도입함으로써 산화그래핀의 고분자 매트릭스 내에서의 분산성을 향상시켜 기체 차단성을 높이고자 하였다. 그 결과로서, Triton X-100이 도입된 나노복합막이 예상치와 유사한, 향상된 기체 차단성을 보임을 확인하였다. 본 연구를 기반으로 고분자 기반 나노복합막의 기체 차단성 분야로의 활용성이 증대될 것으로 기대한다.

• 한국포장학회지
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• 제23권2호
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• pp.67-74
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• 2017

In this work, the effects of nano $TiO_2$ on functionality and stability of low density polyethylene (LDPE) composite films were investigated for food packaging application. LDPE-nano $TiO_2$ composite films were prepared with various $TiO_2$ contents (0, 0.5, 1.0, 3.0 and 5.0wt%) by melt-extrusion and their basic properties such as crystallinity, chemical bonds and surface morphology were examined by XRD, FTIR and SEM. Ultraviolet (UV) light barrier property of as-prepared LDPE-nano $TiO_2$ composite films was also studied and the presence of nano $TiO_2$ resulted in significant improvement of UV light barrier compared to the pure LDPE film. To evaluate influence of nano $TiO_2$ on LDPE properties required as packaging material, thermal, mechanical, gas barrier and optical properties of LDPE-nano $TiO_2$ composite films were characterized with various analytical techniques including TGA, UTM, OTR, WVTR and UV-vis spectroscopy. As a result, except optical property of LDPE, no significant effects were found in other properties. Opacity of pure LDPE was greatly increased with increasing concentration of nano $TiO_2$.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.236-236
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• 2011

Silicon oxynitride (SiON) was deposited for gas barrier film on polyethylene terephthalate (PET) using octamethylycyclodisiloxane (Si4O4C8H24, OMCTS) precursor by plasma enhanced chemical vapor deposition (PECVD) at low temperature. The ion flux and substrate temperature were measured by oscilloscope and thermometer. The chemical bonding structure and barrier property of films were characterized by Fourier transform infrared (FT-IR) spectroscopy and the water vapor transmission rate (WVTR), respectively. The deposition rate of films increases with RF bias and nitrogen dilution due to increase of dissociated precursor and nitrogen ion incident to the substrate. In addition, we confirmed that the increase of nitrogen dilution and RF bias reduced WVTR of films. Because, on the basis of FT-IR analysis, the increase of the nitrogen gas flow rate and RF bias caused the increase of the C=N stretching vibration resulting in the decrease of macro and nano defects.

• 한국축산식품학회지
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• 제37권5호
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• pp.635-645
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• 2017

In this study, effect of transglutaminase (TGase) addition on physical, water barrier, optical and mechanical properties of mechanically deboned chicken meat protein (MDCM-P) films was investigated. When TGase was added to the films, the thickness increased, but the solubility decreased. Films treated with TGase exhibited higher water vapor permeability than control film (p<0.05). When TGase concentration increased, the $L^*$ values of films decreased, but $a^*$ and $b^*$ values increased. All films showed very good barrier properties against UV light. The highest tensile strength was obtained in MDCM-P films containing 3% TGase (p<0.05). The elongation at break values increased with the TGase concentration increasing from 1 to 3%, but decreased at higher enzyme concentration (p<0.05). The addition of TGase altered molecular organization and intermolecular interaction in the film matrix. TGase treated films showed smoother and ordered surface structure and homogeneous and compact microstructure. The results indicated that TGase use can be an effective approach in improving the solubility and mechanical properties of MDCM-P films.

• 한국포장학회지
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• 제20권2호
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• pp.41-49
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• 2014

This study illustrates the synthesis of gelatin based zinc oxide nanoparticle (ZnONPs) incorporated nanocomposite films using different concentrations of ZnONPs. The ZnONPs were oval in shape and the size ranged from 100- 200 nm. The nanocomposite films were characterized by UV-visible, FE-SEM, FT-IR, and XRD. The concentrations of ZnONPs greatly influenced the properties of nanocomposite films. The absorption peaks around 360 nm increased with the increasing concentrations of ZnONPs. The surface color of film did not change while transmittance at 280 nm was greatly reduced with increase in the concentration of ZnONPs. FTIR spectra showed the interaction of ZnONPs with gelatin. XRD data demonstrated the crystalline nature of ZnONPs. The thermostability, char content, water contact angle, water vapor permeability, moisture content, and elongation at break of nanocomposite films increased, whereas, tensile strength and modulus decreased with increase in the concentrations of ZnONPs. The gelatin/ZnONPs nanocomposite films showed profound antibacterial activity against both Gram-positive and Gram-negative food-borne pathogenic bacteria. The gelatin/$ZnONP^{1.5}$ nanocomposite film showed the best UV barrier and antimicrobial properties among the tested-films, which indicated a high potential for use as an active food packaging films with environmentally-friendly nature.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.66-66
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• 2008

Most of the properties of ITO films depend on their substrate nature, deposition techniques and ITO film composition. For the display panel application, it is normally deposited on the glass substrate which has high strain point (>575 degree) and must be deposited at a temperature higher than $250^{\circ}C$ and then annealed at a temperature higher than $300^{\circ}C$ in order to high optical transmittance in the visible region, low reactivity and chemical duration. But the high strain point glass (HSPG) used as FPDs is blocking popularization of large sizes FPDs because it is more expensive than a soda lime glass (SLG). If the SLG could be used as substrate for FPDs, then diffusion of Na ion from the substrate occurs into the ITO films during annealing or heat treatment on manufacturing process and it affects the properties. Therefore proper care should be followed to minimize Na ion diffusion. In this study, we investigate the electrical, optical and structural properties of ITO films deposited on the SLG and the Asahi glass(PD200) substrate by rf magnetron sputtering using a ceramic target ($In_2O_3:SnO_2$, 90:10wt.%). These films were annealed in $N_2$ and air atmosphere at $400^{\circ}C$ for 20min, 1hr, and 2hrs. ITO films deposited on the SLG show a high electrical resistivity and structural defect as compared with those deposited on the PD200 due to the Na ion from the SLG on diffuse to the ITO film by annealing. However these properties can be improved by introducing a barrier layer of $SiO_2$ or $Al_2O_3$ between ITO film and the SLG substrate. The characteristics of films were examined by the 4-point probe, FE-SEM, UV-VIS spectrometer, and X-ray diffraction. SIMS analysis confirmed that barrier layer inhibited Na ion diffusion from the SLG.

• 전자공학회논문지A
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• 제31A권10호
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• pp.108-113
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• 1994

The characteristics of the oxidation prevention layers for the copper metallization were investigated. The thin films such as Cr, TiN and Al were used as the oxidation prevention layers for copper. Ultra thin aluminum films were found to prevent the oxidation of copper up to the highest oxidation annealing temperature among the barrier layers examined in this study. It was found that oxygen did not diffuse into copper through aluminum films because of the aluminum oxide layer formed on the aluminum surface and the ultra thin aluminum film could be a good oxidation barrier layer for the copper metallization.

• Applied Microscopy
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• 제24권4호
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• pp.132-144
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• 1994

The application of TEM in investigating the evolution of microstructure during solid phase crystallization of the amorphous Si, $Si_{1-x}Ge_x,\;and\;Si_{1-x}Ge_x/Si$ films deposited on $SiO_2$ substrate, in identifying the failure mechanism of the TiN barrier layer in the Cu-metallization scheme, and in comparing the microstructure of the as-deposited Cu-Cr and Cu-Ti alloy films are discussed. First, it is identified that the evolution of microstructure in Si and $Si_{1-x}Ge_x$ alloy films strongly depends on the concentration of Ge in the film. Second, the failure mechanism of the TiN diffusion barrier in the Cu-metallization is the migration of the Cu into the Si substrate, which results in the formation of a dislocation along the Si {111} plane and precipitates (presumably $Cu_{3}Si$) around the dislocation. Finally, the microstructure of the as-deposited Cu-Cr and Cu-Ti alloy films is also quite different in these two cases. From these several cases, we demonstrate that the information which we obtained using TEM is critical in understanding the behavior of materials.