• Nuclear Medicine and Molecular Imaging
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• v.41 no.3
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• pp.241-246
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• 2007

Purpose: $[^{11}C]6-OH-BTA-1$ ([N-methyl-$^{11}C$]2-(4'-methylaminophenyl)-6-hydroxybenzothiazole, 1), a -amyloid imaging agent for the diagnosis of Alzheimer's disease in PET, can be labeled with higher yield by a simple loop method. During the synthesis of $[^{11}C]1$, we found the formation of by-products in various solvents, e.g., methylethylketone (MEK), cyclohexanone (CHO), diethylketone (DEK), and dimethylformamide (DMF). Materials and Methods: In Automated radiosynthesis module, 1 mg of 4-aminophenyl-6-hydroxybenzothiazole (4) in 100 l of each solvent was reacted with $[^{11}C]methyl$ triflate in HPLC loop at room temperature (RT). The reaction mixture was separated by semi-preparative HPLC. Aliquots eluted at 14.4, 16.3 and 17.6 min were collected and analyzed by analytical HPLC and LC/MS spectrometer. Results: The labeling efficiencies of $[^{11}C]1$ were $86.0{\pm}5.5%$, $59.7{\pm}2.4%$, $29.9{\pm}1.8%$, and $7.6{\pm}0.5%$ in MEK, CHO, DEK and DMF, respectively. The LC/MS spectra of three products eluted at 14.4, 16.3 and 17.6 mins showed m/z peaks at 257.3 (M+1), 257.3 (M+1) and 271.3 (M+1), respectively, indicating their structures as 1, 2-(4'-aminophenyl)-6-methoxybenzothiazole (2) and by-product (3), respectively. Ratios of labeling efficiencies for the three products $([^{11}C]1:[^{11}C]2:[^{11}C]3)$ were $86.0{\pm}5.5%:5.0{\pm}3.4%:1.5{\pm}1.3%$ in MEK, $59.7{\pm}2.4%:4.7{\pm}3.2%:1.3{\pm}0.5%$ in CHO, $9.9{\pm}1.8%:2.0{\pm}0.7%:0.3{\pm}0.1%$ in DEK and $7.6{\pm}0.5%:0.0%:0.0%$ in DMF, respectively. Conclusion: The labeling efficiency of $[^{11}C]1$ was the highest when MEK was used as a reaction solvent. As results of mass spectrometry, 1 and 2 were conformed. 3 was presumed.

• Proceedings of the International Microelectronics And Packaging Society Conference
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• 2001.11a
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• pp.230-234
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• 2001

본 연구에서는 Alumina(A1$_2$O$_3$) based Slurry를 이용하여 CU CMP를 할 때 첨가제의 영향을 Removal rate와 Etch rate 측면에서 조사하였다. 각각의 첨가제의 종류와 조성의 변화에 따라 Polishing에 미치는 영향을 연구하였다. Cu의 Removal rate는 Etch rate와 달리 Organic acid의 종류에 직접적으로 영향을 받는다. Citric acid는 높은 Removal rate와 슬러리 내에서 안정성이 가장 좋은 결과를 보이고 있다. Citric acid의 농도가 증가하면 증가할수록 Removal rate는 증가하였다. BTA의 농도에 따라서 Cu의 Removal rate와 Etch rate의 감소를 확인할 수 있다. EDTA의 농도에 따라서는 증가함을 볼 수 있다.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.33 no.10
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• pp.1023-1028
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• 2009

Cleaning is required following CMP (chemical mechanical planarization) to remove particles. The minimization of particle residue is required with each successive technology generation, and the cleaning of wafers becomes more complicated. In copper damascene process for interconnection structure, it utilizes 2-step CMP consists of Cu and barrier CMP. Such a 2-steps CMP process leaves a lot of abrasive particles on the wafer surface, cleaning is required to remove abrasive particles. In this study, the chemical mechanical cleaning(CMC) is performed various conditions as a cleaning process. The CMC process combined mechanical cleaning by friction between a wafer and a pad and chemical cleaning by CMC solution consists of tetramethyl ammonium hydroxide (TMAH) / benzotriazole (BTA). This paper studies the removal of abrasive on the Cu wafer and the cleaning efficiency of CMC process.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 1993.04b
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• pp.76-80
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• 1993

절삭가공중에서 DRILL가공은 일반기계가공 공정중에 23 .approx. 25% 정도의 비율을 점우하고 있는 중요한 위치의 작업의 하나이고 또한 요구되는 정밀도를 만족하기 어렵고, 높은 생산성이 요구되는 가공법이다. 기계가공의 무인화, 자동화, 고능률화 및 정도향상 이라는 측면에서 더욱 이에 대응할 수 있는 가공방법 즉 공작물, 공구재료, 공구형상 및 절삭조건등에 걸쳐 광범위하게 연구개발 되어 져 가고 있다. 이 작업중 특히 곤란한 것은 깊은 구멍가공(DEEP HOLE DRILL)으로서 깊이/직경의 비가 극히 높은(약 5배이상) 절삭가공 의 경우에는 CHIP의 배출, 절삭날부의 윤활, 공구의 진동등의 문제로 인하여 일반적인 절삭가공 공법으로는 가공이 여려운 경우가 많다. 본 연구는 Solid BTA Drill(Mlti-tip Drill Head with Brazed Tips)에 의하여 가공에요구되는 절삭성 분석과 절삭조건의 변화에 따른 공작물의 가공정도 즉, 가공구멍의 직경의 변화, 표면거칠기. 진원도의 변화상태 및 공구의 마모된 현상에 대하여 실험조사하여 공구에 제한된 수명을 연장하고, 제품에 요구되는 품질수준을 확보하는가에 대하여 본 실험을 통하여 분석하도록 하였다.

• The Transactions of the Korean Institute of Electrical Engineers
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• v.39 no.6
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• pp.568-576
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• 1990

Recently, streaming electrification in forced oil cooled power transformer has been taken up as a serious problem. In this paper, the charging tendency of various insulation oils, such as mineral oil, polybutene and silicone oil has been measured by means of an injection type charging tendency measuring apparatus under various condition. The experimental data of the dependence of the leakage current on flow velocity and temperature of oil can be explained by considering the flow state such as laminar and turbulent flow. The effect of additives on the charging tendency of mineral oil has been investigated. BTA is regarded as the most effective retardant to electrification of oil among the additives chose for this investigation.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1880-1884
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• 2008

Cleaning is required following CMP (chemical mechanical planarization) to remove particles. The minimization of particle residue is required with each successive technology generation, and the cleaning of wafers becomes more complicated. In copper damascene process for interconnection structure, it utilizes 2-steop CMP consists of Cu CMP and barrier CMP. Such a 2-steps CMP process leaves a lot of abrasive particles on the wafer surface, cleaning is required to remove abrasive particles. In this study, the buffing is performed various conditions as a cleaning process. The buffing process combined mechanical cleaning by friction between a wafer and a buffing pad and chemical cleaning by buffing solution consists of tetramethyl ammonium hydroxide (TMAH)/benzotriazole(BTA).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1996.05a
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• pp.158-161
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• 1996

The static charges are generated by streaming electrification phenomena in insulating oil flowing by force for the purpose of cooling at the internal of Ultra-high power transformer. In this thesis, their elimination method was studied. In this paper the effect of Additive on the electric conductivity of Insulating oil is studied. The variation of electric conductivity disappear when Additive is molten in insulating oil BTA(Benzotriazole) appear more variation of electric conductivity than that of SP-S10(Sorbitan mono-stearate). But the variation is not enough to decrease streaming electrification of insulating oil($\sigma$>10$\^$-12/[S/cm]).

• Proceedings of the KIEE Conference
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• 1997.07d
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• pp.1213-1215
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• 1997

In order to investigate the electrical characteristics due to the BTA(Benzotriazole) additive in the transformer, the electrical characteristics of the transformer oils contained benzotriazole as an anti-static agent for streaming electrification is studied by measuring the electric conduction. As a result of the electrical conduction characteristics, it is confirmed that the conduction current of virgin specimen is more higher than that of specimen contained the BT A 10[ppm] over 35[$^{\circ}C$], but that of specimen contained the BT A 10[ppm] over 50[$^{\circ}C$] is increased.

• YAKHAK HOEJI
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• v.32 no.5
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• pp.334-339
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• 1988

AraC-5'-methylthioacetate (araC-MTA, 1) and araC-5'-butylthioacetate (araC-BTA, 2) were prepared and their physical and chemical properties and in vivo antitumor activities were examined. Both compounds were found to have higher partiton coefficients (n-hexanol/water) than their parent araC and to be hydrolyzed to araC within an hour in mouse plasma and ascitic fluid solutions. In in vivo antitumor activity test they showed similar potency to araC, which were assumed due to too quick hydrolyses of them to parent in the body fluid.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.49-50
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• 2006

The studies on Cu CMP have focused on material removal and its mechanisms. Although many studies have been conducted on the mechanism of Cu CMP, a study on uniformity in Cu CMP is still unknown. Since the aim of CMP is global and local planarization, the approach to uniformity in Cu CMP is essential to elucidate the Cu CMP mechanism as well. The main purpose of the experiment reported here was to investigate the roles of slurry components in the formation of the uniformity in Cu CMP. All the results of in this study showed that the uniformity in Cu CMP could be controlled by the contents of slurry components.