• Journal of applied mathematics & informatics
• /
• 제31권1_2호
• /
• pp.99-110
• /
• 2013

In this article, sensitivity analysis of atmospheric dispersion model RIMPUFF is considered. Uncertain parameters are taken to be triangular fuzzy numbers, and sensitivity analysis is carried out by using the Hartley-like measure. Codes for evaluating membership function using the Vertex method and the Hartley-like measure are prepared using Matlab.

• 한국전산구조공학회:학술대회논문집
• /
• 한국전산구조공학회 2011년도 정기 학술대회
• /
• pp.388-391
• /
• 2011

이 논문에서는 인도의 BARC에서 가압중수형 격납건물의 선형탄성 거동 및 균열의 발생형상과 극한내압 평가를 위해서 건설한 1/4 축소모델 격납건물에 대하여 실험한 결과와 유한요소 해석에 의한 결과를 비교 분석하였다. 유한요소 해석은 상용프로그램인 ABAQUS를 이용하였고 각각의 구조재료에 대한 수치 해석모델을 작성하여 내압해석을 수행하였다.

• Journal of Biosystems Engineering
• /
• 제41권4호
• /
• pp.396-407
• /
• 2016

Background: Although hyperspectral imaging was originally introduced for military, remote sensing, and astrophysics applications, the use of analytical hyperspectral imaging techniques has been expanded to include monitoring of agricultural crops and commodities due to the broad range and highly specific and sensitive spectral information that can be acquired. Combining hyperspectral imaging with remote sensing expands the range of targets that can be analyzed. Results: Hyperspectral imaging technology can rapidly provide data suitable for monitoring a wide range of plant conditions such as plant stress, nitrogen status, infections, maturity index, and weed discrimination very rapidly, and its use in remote sensing allows for fast spatial coverage. Conclusions: This paper reviews current research on and potential applications of hyperspectral imaging and remote sensing for outdoor field monitoring of agricultural crops. The instrumentation and the fundamental concepts and approaches of hyperspectral imaging and remote sensing for agriculture are presented, along with more recent developments in agricultural monitoring applications. Also discussed are the challenges and limitations of outdoor applications of hyperspectral imaging technology such as illumination conditions and variations due to leaf and plant orientation.

• 대한핵의학회지
• /
• 제29권3호
• /
• pp.307-312
• /
• 1995

기관지 폐색은 임상적으로 진단이 어려운 경우가 있는데 특히 대엽 이하나 소엽 기관지에 폐색이 일어날 경우엔 그 변화가 미미하기 때문에 더욱 그러하다. 저자들은 여러가지 원인에 의해 기관지 폐색과 협착을 일으킨 8예에서 연무흡입 폐환기스캔을 시행하여 폐환기스캔 소견을 분석하였고 진단적 유용성을 알아보고자 하였다. 8예중 7예는 기관지 폐색이었고 1예는 기관지 협착이었다. 연무흡입 폐환기스캔은 $^{99m}Tc$-phytate를 BARC nebulizer를 이용하여 시행하였다. 스캔 소견을 단순 흉부X선, 기관지조영술, CT, 그리고 기관지경 소견과 비교하였다. 전예에서 특징적으로 기관지 폐색 또는 협착 근위부에 짧고 약간 확장된 기관지 분절에 강한 연무침착 소견을 보였다. 또한 원위부에서는 폐실질의 환기결손 소견을 보였다. 이러한 소견은 기관지 폐색과 협착의 감수적이고 특이한 소견이며, 연두흡입 폐환기스캔은 특히 폐색부가 대엽 이하나 소엽 기관지일 경우에 더욱 유용할 것으로 생각된다.

• Wind and Structures
• /
• 제34권1호
• /
• pp.115-125
• /
• 2022

The high-Reynolds number flow around a rectangular cylinder, having streamwise to crossflow length ratio equal to 5 is analyzed in the present paper. The flow is characterized by shear-layer separation from the upstream edges. Vortical structures of different size form from the roll-up of these shear layers, move downstream and interact with the classical vortex shedding further downstream in the wake. The corresponding mean flow is characterized by a recirculation region along the lateral surface of the cylinder, ending by mean flow reattachment close to the trailing edge. The mean flow features on the cylinder side have been shown to be highly sensitive to set-up parameters both in numerical simulations and in experiments. The results of 21 Large Eddy Simulations (LES) are analyzed herein to highlight the impact of the lateral mean recirculation characteristics on the near-wake flow features and on some bulk quantities. The considered simulations have been carried out at Reynolds number Re=DU_∞/ν=40 000, being D the crossflow dimension, U_∞ the freestream velocity and ν the kinematic viscosity of air; the flow is set to have zero angle of attack. Some simulations are carried out with sharp edges (Mariotti et al. 2017), others with different values of the rounding of the upstream edges (Rocchio et al. 2020) and an additional LES is carried out to match the value of the roundness of the upstream edges in the experiments in Pasqualetto et al. (2022). The dimensions of the mean recirculation zone vary considerably in these simulations, allowing us to single out meaningful trends. The streamwise length of the lateral mean recirculation and the streamwise distance from the upstream edge of its center are the parameters controlling the considered quantities. The wake width increases linearly with these parameters, while the vortex-shedding non-dimensional frequency shows a linear decrease. The drag coefficient also linearly decreases with increasing the recirculation length and this is due to a reduction of the suctions on the base. However, the overall variation of C_D is small. Finally, a significant, and once again linear, increase of the fluctuations of the lift coefficient is found for increasing the mean recirculation streamwise length.

• 한국표면공학회:학술대회논문집
• /
• 한국표면공학회 2009년도 춘계학술대회 논문집
• /
• pp.252-253
• /
• 2009

In this study, the deformation and etch characteristics of ArF and EUV photoresists were compared in a dual frequency superimposed capacitively coupled plasma (DFS-CCP) etcher systems using $CF_{4}/O_{2}/Ar$ and $CF_{4}/CHF_{3}/O_{2}/Ar$ mixture gas chemistry which are typically used for BARC open and $Si_{3}N_{4}$ teching chemistry, respectively. Etch rate of the resists tend to increase with low-frequency source power ($P_{LF}$) and high-frequency source ($f_{HF}$). The etch rate of ArF resist was hgither than that of EUV resist.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2011년도 제40회 동계학술대회 초록집
• /
• pp.284-284
• /
• 2011

Recently, the increasing degree of device integration in the fabrication of Si semiconductor devices, etching processes of nano-scale materials and high aspect-ratio (HAR) structures become more important. Due to this reason, etch selectivity control during etching of HAR contact holes and trenches is very important. In this study, The etch selectivity and etch rate of TEOS oxide layer using ACL (amorphous carbon layer) mask are investigated various process parameters in CH2F2/C4F8/O2/Ar plasma during etching TEOS oxide layer using ArF/BARC/SiOx/ACL multilevel resist (MLR) structures. The deformation and etch characteristics of TEOS oxide layer using ACL hard mask was investigated in a dual-frequency superimposed capacitively coupled plasma (DFS-CCP) etcher by different fHF/ fLF combinations by varying the CH2F2/ C4F8 gas flow ratio plasmas. The etch characteristics were measured by on scanning electron microscopy (SEM) And X-ray photoelectron spectroscopy (XPS) analyses and Fourier transform infrared spectroscopy (FT-IR). A process window for very high selective etching of TEOS oxide using ACL mask could be determined by controlling the process parameters and in turn degree of polymerization. Mechanisms for high etch selectivity will discussed in detail.

• Nuclear Engineering and Technology
• /
• 제54권12호
• /
• pp.4422-4430
• /
• 2022

Studying the effects of gamma radiation on the instrumentation and control (I&C) system of a nuclear power plant is critical to the successful and reliable operation of the plant. In the accidental scenario, the adverse environment of ionizing radiation affects the performance of the I&C system and it leads to inaccurate and incomprehensible results. This paper reports the effects of gamma radiation on the AT89C51RD2, a commercial-off-the-shelf 8-bit high-performance flash microcontroller. The microcontroller, selected for the device under test for this study is used in the remote terminal unit for a nuclear power plant. The custom circuits were made to test the microcontroller under different gamma doses using a ⁶⁰Co gamma source in both ex-situ and in-situ modes. The device was exposed to a maximum dose of 1.5 kGy. Under this hostile environment, the performance of the microcontroller was studied in terms of device current and voltage changes. It was observed that the microcontroller device can operate up to a total absorbed dose of approximately 0.6 kGy without any failure or degradation in its performance.

• 한국표면공학회:학술대회논문집
• /
• 한국표면공학회 2009년도 춘계학술대회 논문집
• /
• pp.250-251
• /
• 2009

For the fabrication of a multilevel resist (MLR) based on a very thin amorphous carbon (a-C) layer an $Si_{3}N_{4}$ hard-mask layer, the selective etching of the $Si_{3}N_{4}$ layer using physical-vapor-deposited (PVD) a-C mask was investigated in a dual-frequency superimposed capacitively coupled plasma etcher by varying the following process parameters in $CH_{2}F_{2}/H_{2}/Ar$ plasmas : HF/LF powr ratio ($P_{HF}/P_{LF}$), and $CH_{2}F_{2}$ and $H_2$ flow rates. It was found that infinitely high etch selectivities of the $Si_{3}N_{4}$ layers to the PVD a-C on both the blanket and patterned wafers could be obtained for certain gas flow conditions. The $H_2$ and $CH_{2}F_{2}$ flow ratio was found to play a critical role in determining the process window for infinite $Si_{3}N_{4}$/PVDa-C etch selectivity, due to the change in the degree of polymerization. Etching of ArF PR/BARC/$SiO_x$/PVDa-C/$Si_{3}N_{4}$ MLR structure supported the possibility of using a very thin PVD a-C layer as an etch-mask layer for the $Si_{3}N_{4}$ layer.

• 한국작물학회지
• /
• 제58권3호
• /
• pp.213-219
• /
• 2013

A field study was conducted to understand nitrogen use efficiency of high yielding Japonica rice varieties under three levels of nitrogen fertilizer (90, 150 and 210 kg N $ha^{-1}$) in Iksan, Korea. Two high yielding rice varieties, Boramchan and Deuraechan, and an control variety, Dongjin2, were grown in fine silty paddy. Nitrogen use efficiencies (NUE) were 83.3, 56.3, and 41.2 in 90, 150, and 210 kg N $ha^{-1}$ fertilizer level, respectively. Total nitrogen uptake varied significantly among nitrogen levels and varieties. Variety Dongjin2 showed the highest nitrogen uptake efficiency (NUpE), while Boramchan and Deuraechan showed higher nitrogen utilization efficiency (NUtE). However, Nitrogen harvest index (NHI) was higher in Boramchan (0.58) than Deuraechan (0.57) and Dongjin2 (0.53). Rough rice yield showed linear relationship with total nitrogen uptake ($R^2$=0.72) within the range of nitrogen treatments. Boramchan produced significantly higher rough rice yield (8546 kg $ha^{-1}$) which mainly due to higher number of panicles per $m^2$ compared to Deuraechan (7714 kg $ha^{-1}$). Deuraechan showed higher number of spikelets per panicle, but showed lower yield due to lower number of panicle per $m^2$. Rice varieties showed different nitrogen uptake ability and NUE at different nitrogen level. Plant breeders and agronomist should take advantage of the significant variations and relationships among grain yield, NUpE, and NUE.