• Title/Summary/Keyword: B-SiC

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cDNA Cloning and Developmental Expression of Hemolin in Bombyx mandarina

  • Kang Min Uk;Kim Kyung-A;Lee Jin Sung;Kim Nam Soon;Kang Seok-Woo;Nho Si-kab
    • International Journal of Industrial Entomology and Biomaterials
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    • v.10 no.2
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    • pp.101-106
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    • 2005
  • In this study, we describe the Bombyx mandarina hemolin cDNA. A sequence analysis of cDNA revealed a single open reading frame (ORF) of 1233 nucleotides. The deduced 410 amino acid sequence of B. mandarina hemolin contains 4 imunoglobulin (Ig) C-2 type domains. B. mandarina hemolin cDNA showed the highest sequence homology to known those of B. mori. The developmental profile in terms of expression level of hemolin mRNA was determined in the absence of a bacterial challenge. Hemolin mRNA was detected only in mid-gut, but not in hemocytes, fat body, testis, and silkglands. Hemolin mRNA in mid-gut was not detected until the spinning stage of the last instar larva, however, lit dramatically increased at the beginning of spinning and gradually decreased until pupal stage.

Changes in Biston robustum and Camellia japonica distributions, according to climate change predictions in South Korea

  • Kim, Tae Guen;Han, Yong-Gu;Jeong, Jong Chul;Kim, Youngjin;Kwon, Ohseok;Cho, Youngho
    • Journal of Ecology and Environment
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    • v.38 no.3
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    • pp.327-334
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    • 2015
  • We investigated the current and potential spatial distributions and habitable areas of Biston robustum and Camellia japonica in South Korea in order to provide useful data for the conservation of C. japonica and minimize the damage caused by B. robustum. It was predicted that, by 2070, although B. robustum would be widely distributed throughout the Korean Peninsula, except for the western and eastern coastal areas, it would be narrowly distributed along the Sokcho-si and Goseong-gun coastlines in Gangwon Province. C. japonica is currently located along the southern coastline but its critical habitable area is predicted to gradually disappear by 2070. Assessment of the potential distribution probabilities of B. robustum and C. japonica revealed that the area under the curve (AUC) values were 0.995 and 0.991, respectively, which indicate high precision and applicability of the model. Major factors influencing the potential distribution of B. robustum included precipitation of wettest quarter and annual precipitation (BIO16 and BIO12), whereas annual mean temperature and mean temperature of wettest quarter (BIO1 and BIO8) were important variables for explaining C. japonica distribution. Overlapping areas of B. robustum and C. japonica were $11,782km^2$, $5447km^2$, and $870km^2$ for the current, 2050-predicted, and 2070-predicted conditions, respectively, clearly showing a dramatic decrease in area. Although it is predicted that B. robustum would cause continuous damage to C. japonica in the southern part of the Korean Peninsula, such impacts might diminish over time and become negligible in the future.

Influence of Substrate Temperature of SCT Thin Film by RF Sputtering Method (RF 스퍼터링법에 의한 SCT 박막의 기판온도 영향)

  • Oh, Y.C.;Kim, J.S.;Cho, C.N.;Shin, C.G.;Song, M.J.;So, B.M.;Choi, W.S.;Kim, C.H.;Lee, J.U.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.718-721
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    • 2004
  • The $(Sr_{0.9}Ca_{0.1})TiO_3$(SCT) thin films are deposited on Pt-coated electrode$(Pt/TiN/SiO_2/Si)$ using RF sputtering method at various substrate temperature. The optimum conditions of RF power and $Ar/O_2$ ratio were 140[W] and 80/20, respectively. Deposition rate of SCT thin films was about $18.75[{\AA}/min]$. The crystallinity of SCT thin films were increased with increase of substrate temperature in the temperature range of $100\sim500[^{\circ}C]$. The dielectric constant of SCT thin films were increased with the increase of substrate temperature, and changed almost linearly in temperature ranges of $-80\sim+190[^{\circ}C]$. The current-voltage characteristics of SCT thin films showed the increasing leakage current as the substrate temperature increases.

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Synthesis of Uniformly Doped Ge Nanowires with Carbon Sheath

  • Kim, Tae-Heon;;Choe, Sun-Hyeong;Seo, Yeong-Min;Lee, Jong-Cheol;Hwang, Dong-Hun;Kim, Dae-Won;Choe, Yun-Jeong;Hwang, Seong-U;Hwang, Dong-Mok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.289-289
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    • 2013
  • While there are plenty of studies on synthesizing semiconducting germanium nanowires (Ge NWs) by vapor-liquid-solid (VLS) process, it is difficult to inject dopants into them with uniform dopants distribution due to vapor-solid (VS) deposition. In particular, as precursors and dopants such as germane ($GeH_4$), phosphine ($PH_3$) or diborane ($B_2H_6$) incorporate through sidewall of nanowire, it is hard to obtain the structural and electrical uniformity of Ge NWs. Moreover, the drastic tapered structure of Ge NWs is observed when it is synthesized at high temperature over $400^{\circ}C$ because of excessive VS deposition. In 2006, Emanuel Tutuc et al. demonstrated Ge NW pn junction using p-type shell as depleted layer. However, it could not be prevented from undesirable VS deposition and it still kept the tapered structures of Ge NWs as a result. Herein, we adopt $C_2H_2$ gas in order to passivate Ge NWs with carbon sheath, which makes the entire Ge NWs uniform at even higher temperature over $450^{\circ}C$. We can also synthesize non-tapered and uniformly doped Ge NWs, restricting incorporation of excess germanium on the surface. The Ge NWs with carbon sheath are grown via VLS process on a $Si/SiO_2$ substrate coated 2 nm Au film. Thin Au film is thermally evaporated on a $Si/SiO_2$ substrate. The NW is grown flowing $GeH_4$, HCl, $C_2H_2$ and PH3 for n-type, $B_2H_6$ for p-type at a total pressure of 15 Torr and temperatures of $480{\sim}500^{\circ}C$. Scanning electron microscopy (SEM) reveals clear surface of the Ge NWs synthesized at $500^{\circ}C$. Raman spectroscopy peaked at about ~300 $cm^{-1}$ indicates it is comprised of single crystalline germanium in the core of Ge NWs and it is proved to be covered by thin amorphous carbon by two peaks of 1330 $cm^{-1}$ (D-band) and 1590 $cm^{-1}$ (G-band). Furthermore, the electrical performances of Ge NWs doped with boron and phosphorus are measured by field effect transistor (FET) and they shows typical curves of p-type and n-type FET. It is expected to have general potentials for development of logic devices and solar cells using p-type and n-type Ge NWs with carbon sheath.

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Color Evolution and Phase Transformation of α-FeOOH@SiO2 and β-FeOOH@SiO2 pigments (SiO2가 코팅된 α-FeOOH와 β-FeOOH의 상전이를 통한 SiO2가 코팅된 α-Fe2O3의 색상 연구)

  • Yu, Ri;Choi, Kyoon;Pee, Jae-Hwan;Kim, YooJin
    • Journal of Powder Materials
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    • v.20 no.3
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    • pp.210-214
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    • 2013
  • This manuscript reports on compared color evolution about phase transformation of ${\alpha}-FeOOH@SiO_2$ and ${\beta}-FeOOH@SiO_2$ pigments. Prepared ${\alpha}$-FeOOH and ${\beta}$-FeOOH were coated with silica for enhancing thermal properties and coloration of both samples. To study phase and color of ${\alpha}$-FeOOH and ${\beta}$-FeOOH, we prepared nano sized iron oxide hydroxide pigments which were coated with $SiO_2$ using tetraethylorthosilicate and cetyltrimethyl-ammonium bromide as a surface modifier. The silica-coated both samples were calcined at high temperatures (300, 700 and $1000^{\circ}C$) and characterized by scanning electron microscopy, CIE $L^*a^*b^*$ color parameter measurements, transmission electron microscopy and UV-vis spectroscopy. The yellow ${\alpha}$-FeOOH and ${\beta}$-FeOOH was transformed to ${\alpha}-Fe_2O_3$ with red, brown at 300, $700^{\circ}C$, respectively.

Sintering Behavior and Microwave Dielectric Propel1ies of Mg-Si-O Ceramics with Glass Frit for LTCC Substrate (Glass firt 첨가에 따른 저온 동시소성 기판용 Mg-Si-O계 세라믹스의 소결거동 및 마이크로파 유전특성)

  • Cho, Jung-Hwan;Yeo, Dong-Hun;Shin, Hyo-Soon;Kim, Jong-Hee;Nahm, Sahn
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.310-310
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    • 2007
  • Mg-Si-O계 세라믹스에 glass frit 조성을 첨가하여 저온에서의 소결 특성 및 마이크로파 유전 특성을 연구하였다. 기존의 Mg-Si-O계 세라믹스는 우수한 유전특성을 가지고 있으나 높은 소결온도로 인하여 LTCC용 기판 소재로 적용이 어려웠다. 본 연구에서는 MgO, $SiO_2$를 이용하여 $Mg_2SiO_4$을 합성한 후, $B_2O_3-ZnO-Na_2O-SiO_2-Al_2O_3$계 glass 조성을 20~40wt%로 첨가하여 소결온도를 감소시켜 LTCC 기판 소재로서의 적용성을 고찰하였다. glass frit 함량이 증가함에 따라 밀도($g/cm^3$) 및 유전율(${\varepsilon}_r$)은 증가하였고 품질계수($Qxf_0$)값은 감소하였다. glass frit 함량이 40wt%일때 $900^{\circ}C$에서 1시간 소결한 소결체의 유전톡성은 유전율 (${\varepsilon}_4$) = 6.5. 품질계수 ($Qxf_0$) = 4,000(GHz), 온도계수 $(\tau_t)\;=\;{\pm}\;10ppm/^{\circ}C$로 우수한 특성을 확인하였다.

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Authigenic Phillipsite in Deep-sea Manganese Nodules from the Clarion-Clipperton Fracture Zones, NE Equatorial Pacific (적도 북동 태평양, 클라리온-클리퍼톤 균열대에서 산출되는 망간단괴내의 자생 필립사이트)

  • Lee, Chan Hee;Lee, Sung-Rock
    • Economic and Environmental Geology
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    • v.29 no.4
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    • pp.421-428
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    • 1996
  • The occurrence, optical property, chemical composition, crystal structure and formation environments of the phillipsite within deep-sea manganese nodules were systematically investigated in this study. Phillipsite in manganese nodules occurs in nucleus of nodules along with consolidated bottom sediments, weathered volcanic debris, and interstitial grains in the each layer of manganese encrusts. Phillipsite is predominantly pseudomorphs of volcanic shards, and occurs as white to pale yellow in color lath-shaped and equant crystals. These show aggregations of prismatic, blocky, and bladed of 2 to $20{\mu}m$ long, and 2 to $5{\mu}m$ thick. The simplified average chemical formula of phillipsite is $({Ca_{0.1}Mg_{0.3}Na_{1.1}K_{1.5}})_3{(Fe_{0.3}Al_{4.2}Si_{11.8})O_{32}{\cdot}10H_2O}$ with a very siliceous and alkalic. The $Si/(Al+Fe^{+3})$ ratio is 2.37 to 2.78 and alkalis greatly exceed the divalent exchangeable cations, and Na/K ratio is 0.59 to 0.81. The phillipsite is monoclinic ($P2_l/m$) with the unit-cell parameters, $a=10.005{\AA}$, $b=14.129{\AA}$, $c=8.686{\AA}$, ${\beta}=124.35^{\circ}$, and $V=1013.6{\AA}^3$. Phillipsites in manganese nodules formed apparently authigenically at a temperature less than $10^{\circ}C$, and they crystallized at a pressure of less than 0.7 kb, and pH of about 8 in deep-sea environments.

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A Study on the Carbothermic Reduction and Refining of V, Ta and B Oxides by Ar/Ar-H2 Plasma (Ar/Ar-H2 플라즈마에 의한 V, Ta, B 산화물의 탄소용융환원 및 정련)

  • Chung, Yong-Sug;Park, Byung-Sam;Hong, Jin-Seok;Bae, Jung-Chan;Kim, Moon-Chul;Baik, Hong-Koo
    • Journal of Hydrogen and New Energy
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    • v.7 no.1
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    • pp.81-92
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    • 1996
  • The Ar/Ar-$H_2$ plasma method was applied to reduce oxides and refine metals of V, Ta and B. In addition, the high temperature chemical reaction in Ar plasma and of the refining reaction in the Ar-(20%)$H_2$ plasma were analyzed. The crude V of 96wt% purity was obtained at the ratio of $C/V_{2}O_{5}=4.50$ by the Ar plasma reduction grade and the maximum reduction was obtained at $C/V_{2}O_{5}=4.50$ due to the $O_{2}$ loss from the thermal decomposition of vanadium oxide. In the Ar-(20%)$H_2$ plasma refining, the metallic V of 99.2wt% was produced at the ratio of $C/V_{2}O_{5}=4.40$. It was considered that a main refining reaction resulted from the chemical reaction between the residual carbon and residual oxygen. The metallic Ta of 99.8wt% was obtained at the ratio of $C/Ta_{2}O_{5}=5.10$ in a Ar plasma reduction and the Oz loss from the thermal decomposition of tantalum pentoxide did not take place. The deoxidation reaction was more significant than the decarburization reaction in the Ar-(20%)$H_2$ plasma refining and the metallic Ta of 99.9wt% was produced within the range of $C/Ta_{2}O_{5}$ ratio of 4.50 to 5.10. The Vickers hardness of Ta in the above mentioned range was about 220Hv due to the decrease in a residual oxygen by the deoxidation reaction. On the other hand, C is no suitable agent for the reduction of $B_{2}O_{3}$ by the Ar and Ar-$H_2$ plasma. But Fe-B-Si alloy was produced with the reduction of $B_{2}O_{3}$ in the melt when Fe, C, $B_{2}O_{3}$, and ferroboron mixtures were melted by the high frequency induction melting.

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Study on Low Temperature Formation of Ferroelectric $Sr_{0.9}4$Bi_{2.1}$$Ta_2$$O_9$ Thin Films by Sol-Gel Process and Rapid Thermal Annealing (솔-젤법 및 급속열처리에 의한 $Sr_{0.9}4$Bi_{2.1}$$Ta_2$$O_9$ 박막의 저온형성에 관한 연구)

  • 장현호;송석표;김병호
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.4
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    • pp.312-317
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    • 2000
  • Ferroelectric S $r_{0.9}$/B $i_{2.1}$/T $a_{2}$/ $O_{9}$ solutions were synthesized using sol-gel process in which strontinum ethoxide bismuth ethoxide trantalum ethoxide were used a s startring materials. SBT thin films were coated on Pt/Ti/ $SiO_2$/Si substrates by spin-coating. rapid thermal annealing (RTA) was used to promote crystallization. Thin films were annealed at $700^{\circ}C$ for 1 hr in an oxygen atmosphere. This temperature is about 10$0^{\circ}C$ lower than the usual annealing temperature for SBT thin films. Pt top-electrode was deposited by sputtering and thin films were post-annealed at $700^{\circ}C$ for 30 min. to enhance electrical properties. As the RTA temperature increased the higher 2 $P_{r}$ values were obtained. At RTA temperature being 78$0^{\circ}C$ remanent polarization of S $r_{0.9}$/B $i_{2.1}$/T $a_{2}$/ $O_{9}$ thin film was 7.73 $\mu$C/cm $_2$ and the leakage current density was 1.14$\times$10$^{-7}$ A/c $m^2$ at 3 V. As RTA temperature increased the breakdown voltage was decreased. It is considered that the low-field breadown is caused by the rough surface of SBT films and forming bismuth metal in SBT thin films.films.lms.

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Micro Forming of Bulk Metallic Glass using the Deformation Behavior in the Supercooled Liquid Region (과냉각 액체 영역에서의 변형거동을 이용한 벌크 비정질 합금의 미세성형 기술 개발)

  • 홍경태;옥명렬;서진유
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2003.10a
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    • pp.93-96
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    • 2003
  • Recently, various bulk metallic glasses (BMG's) haying good mechanical and chemical properties were developed. BMG's can easily be deformed in the supercooled liquid region, via viscous flow mechanism. In our previous work, we evaluated the deformation behavior and some other basic properties of Z $r_{41.2}$ $Ti_{13.8}$C $u_{12.5}$N $i_{10}$B $e_{22.5}$ alloy. In this study, we investigated the micro forming of Z $r_{41.2}$ $Ti_{13.8}$C $u_{12.5}$N $i_{10}$B $e_{22.5}$ alloy. The process condition was chosen based on the viscosity data from TMA, and superalloy and Si wafer with micro patterns on the surface were used as forming die. The alloy showed good replication of the patterns. However, some stripe patterns, resembling scratches, appeared on the deformed alloy surface. These scratches can be reduced or eliminated by polishing before forming.ing.ore forming.ing.

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