Improvement of Breakdown Voltage Characteristics in 4H-SiC Schottky Barrier Diode by $B^+$ Ion Implantation
($B^+$ 이온주입을 이용한 4H-SiC Schottky Barrier Diode 소자의 항복전압 향상 특성에 관한 연구)
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- Proceedings of the Materials Research Society of Korea Conference
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- 1998.11a
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- pp.28-28
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- 1998