• 대한전기학회:학술대회논문집
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• 대한전기학회 2000년도 추계학술대회 논문집 학회본부 C
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• pp.467-469
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• 2000

We give pressure stimulation into organic thin films and then manufacture a device under the accumulation condition that the state surface pressure is 20[mN/m]. LB layers of Arac. acid deposited by LB method were deposited onto Y-type silicon wafer as x, y, z-type film. In processing of a device manufacture, we can see the process is good from the change of a surface pressure for organic thin films and transfer ratio of area per molecule. The structure of manufactured device is Au/arachidic acid/Al, the number of accumulated layers Also, we then examined of the MIM device by means of I-V. The I-V characteristic of the device is measured from 0 to +2[V].

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 추계학술대회 논문집
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• pp.287-290
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• 2000

We give pressure stimulation into organic thin films and then manufacture a device under the accumulation condition that the state surface pressure is 20[mN/m]. LB layers of Arac. acid deposited by LB method were deposited onto y-type silicon wafer as x, y, z-type film. In processing of a device manufacture, we can see the process is good from the change of a surface pressure for organic thin films and transfer ratio of area per molecule. The structure of manufactured device is Au/arachidic acid/Al, the number of accumulated layers. Also, we then examined of the MIM device by means of I-V. The I-V characteristic of the device is measured from 0 to +2[V].

• Journal of Electrochemical Science and Technology
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• 제4권4호
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• pp.140-145
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• 2013

This study describes the electrodeposition of $Cu_2Se$ thin films with a two-step approach that is based on the initial modification of polycrystalline Au electrode with a selenium overlayer followed by a cathodic stripping of the layer as $Se^{2-}$ in a 1 M lactic acid electrolyte containing $Cu^{2+}$ ions. For this two-step approach to be effective, the $Cu^{2+}$ reduction potential should be shifted to more negative potentials passed potentials for the reduction of Se to $Se^{2-}$. This was accomplished by the complexation of $Cu^{2+}$ ions with lactic acid. The resultant $Cu_2Se$ films were characterized by linear sweep voltammetry combined with electrochemical quartz crystal microgravimetry, UV-vis absorption spectrometry and Raman spectroscopy. Photoelectrochemical experiments revealed that $Cu_2Se$ synthesized thus, behaved as a p-type semiconductor.

• 대한전자공학회논문지TE
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• 제42권1호
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• pp.7-12
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• 2005

유한요소해석 프로그램인 ANSYS를 이용하여 수정진동자의 진동 및 주파수특성을 해석하였다. 수정진동자의 직경을 고정하고 두께를 변화시키면서 주파수특성을 조사하였다. 전극박막을 금, 은, 알루미늄으로 적층하였을 경우, 금속의 종류에 따른 공진주파수를 구하였다. 그 결과 유한요소법을 이용하여 수정진동자의 최적조건을 예측할 수 있었다. 또 수정편 두께가 0.2mm 보다 작은 영역에서의 주공진주파수는 8.102 MHz이상의 고주파를 얻을 수 있는 것을 확인하였다. 전극박막으로 사용한 금속의 종류에 따른 수정진동자의 주공진주파수 변화를 조사한 결과, 금이나 은에 비해 알루미늄이 우수한 주파수특성을 나타내었다.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2003년도 춘계학술발표강연 및 논문개요집
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• pp.126-126
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• 2003

유기트랜지스터에 관한 연구는 1980년 이후부터 시작되었으나 근래에 들어 전 세계적으로 본격적인 연구가 진행되고 있다. 제작공정이 간단하고 비용이 저렴하며 충격에 의해 깨지지 않고 구부리거나 접을 수 있는 전자 회로 기판이 미래의 산업에 필수적인 요소가 될 것으로 예상되고 있으며 이러한 요구를 충족시킬 수 있는 유기트랜지스터의 개발은 아주 중요한 연구분야로 대두되고 있다. 본 연구에서는 표면처리에 따른 contact angle, I-V 특성곡선, 표면 morphology 등의 결과로부터 dry cleaning 한 것이 wet cleaning한 것보다 왜 좋은지를 논하고자 한다. 먼저 N-type SiO$_2$ 기판을 이용하여 back면의 oxide층을 제거한 후, back gate용으로 사용하기 위하여 sputtering장치로 Au/Cr을 증차하였다. 그리고 기판에 앞면을 photolithography 공정을 이용하여 Au/Cr를 1000$\AA$ 증착 하여 source-, drain-eldctrode를 제조하였다. 그리고 SiO$_2$ 기판의 표면처리를 달리하여 그 위에 유기박막을 증착하여 특성을 비교하였다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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• pp.1457-1460
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• 2007

To understand the electronic charge transfer from cathode to an ETL in the TEOLED, the pristine $Alq_3$ thin film and the interfaces of both $Alq_3/Ba$ and $Alq_3/Au$ were investigated by using the NEXAFS spectroscopy. The unoccupied energy state of each interface using the NEXAFS Analyses at the C and OK-edges was assigned and charge transfer from Ba to ${\pi}^{\ast}$ of $Alq_3$ was investigated in detail.

• Journal of Ceramic Processing Research
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• 제13권spc2호
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• pp.359-362
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• 2012

We have employed Kelvin force microscopy (KFM) system to measure the potential change of a single SnO2 nanowire which had been synthesized on the Au thin film by a thermal process. By using the KFM probing technique, Rh coated conducting cantilever can approach a single SnO2 nanowire in nano scale and get the potential images with oscillating AC bias between Au electrode and cantilever. Also, during imaging the potential status, we controlled the concentration of oxygen in measuring chamber to change the ionosorption rate. From the results of such experiments, we verified that the surface potential as well as doping type of a single SnO2 nanowire could be changed by oxygen ionosorption.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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• pp.73-74
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• 2006

Ferroelectric thin films have been widely investigated for future nonvolatile memory application. We fabricated the BLT ($(Bi,La)_4Ti_3O_{12}$) films on Si using a STA ($SrTa_2O_6$) buffer layer BLT and STA film were prepared by sol-gel method. Measurement data by XRD and AFM, showed that BLT film and STA films were well crystallized and a good surface morphology. From C-V measurement reward that the Au/BLT/STA/Si structure showed a clockwise hysteresis loop with a memory window of 1.5 V for the bias voltage sweep of ${\pm}5$ V. From results, the Au/BLT/STA/Si structure is useful for FeFETs.

• 한국추진공학회:학술대회논문집
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• 한국추진공학회 2004년도 제22회 춘계학술대회논문집
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• pp.611-616
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• 2004

In this study, microfabrication of a micro-arcjet nozzle with Fifth-harmonic generation Nd：YAG pulses (wavelength 213 nm) and its thrust performance tests were conducted. A micro-arcjet nozzle was machined in a 1.2 mm thick quartz plate. Sizes of the nozzle were 0.44 mm in width of the nozzle exit and constrictor diameter of 0.1 mm. For an anode, a thin film of Au (~100 nm thick) was deposited by DC discharge PVD in vacuum on divergent part of the nozzle. As for a cathode, an Au film was also coated on inner wall surface. In operational tests, a stable discharge was observed for mass flow of 1.0mg/sec, discharge current of 6 ㎃, discharge voltage of 600 V, or 3.6 W input power (specific power of 3.6 MW/kg). In this case, plenum pressure of the discharge chamber was 80 ㎪. With 3.6 W input power, thrust obtained was 1.4 mN giving specific impulse of 138 sec with thrust efficiency of 24 %.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 추계학술대회 논문집
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• pp.65-65
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• 2009

High temperature silicon carbide Schottky diode was fabricated with Au deposited on poly 3C-SiC thin film grown on p-type Si(100) using atmospheric pressure chemical vapor deposition. The charge transport mechanism of the diode was studied in the temperature range of 300 K to 550 K. The forward and reverse bias currents of the diode increase strongly with temperature and diode shows a non-ideal behavior due to the series resistance and the interface states associated with 3C-SiC. The charge transport mechanism is a temperature activated process, in which, the electrons passes over of the low barriers and in turn, diode has a large ideality factor. The charge transport mechanism of the diode was analyzed by a Gaussian distribution of the Schottky barrier heights due to the Schottky barrier inhomogeneities at the metal-semiconductor interface and the mean barrier height and zero-bias standard deviation values for the diode was found to be 1.82 eV and $s_0$=0.233 V, respectively. The interface state density of the diode was determined using conductance-frequency and it was of order of $9.18{\times}10^{10}eV^{-1}cm^{-2}$.