• 제목/요약/키워드: Argon plasma

검색결과 320건 처리시간 0.03초

Effect of HF and Plasma Treated Glass Surface on Vapor Phase-Polymerized Poly(3,4-ethylenedioxythiophene) Thin Film : Part II

  • Lee, Joonwoo;Kim, Sungsoo
    • 통합자연과학논문집
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    • 제6권4호
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    • pp.215-219
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    • 2013
  • In this study, in order to investigate how consecutive treatments of glass surface with HF acid and water vapor/Ar plasma affect the quality of 3-aminopropyltriethoxysilane self-assembled monolayer (APS-SAM), poly(3,4-ethylenedioxythiophene) (PEDOT) thin films were vapor phase-polymerized immediately after spin coating of FeCl3 and poly-urethane diol-mixed oxidant solution on the monolayer surfaces prepared at various treatment conditions. For the film characterization, various poweful tools were used, e.g., FE-SEM, an optical microscope, four point probe, and a contact angle analyzer. The characterization revealed that a well prepared APS-SAM on a glass surface treated with water vapor/Ar plasma is very useful for uniform coating of FeCl3 and DUDO mixed oxidant solution, regardless of HF treatment. On the other hand, a bare glass surface without APS-SAM but treated with HF and water vapor/Ar plasma generally led to a very poor oxidant film. As a result, PEDOT films vapor phase-polymerized on APS-SAM surfaces are far superior to those on bare glass surfaces in the quality and electrical characteristics aspects.

아르곤 상압플라즈마를 이용한 CNT 코팅 공정 기술 개발 (Development of CNT Coating Process using Argon Atmospheric Plasma)

  • 김경보;이종필;김무진
    • 산업융합연구
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    • 제20권10호
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    • pp.33-38
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    • 2022
  • 본 논문에서는 용액 기반의 탄소나노튜브(CNT: Carbon Nano-tube)를 전자기기의 전도성 소재로 사용하기 위하여 쉽고 빠르게 형성하는 방법에 대해 연구하였다. 이를 위해 스핀 코팅 방법 및 아르곤 상압플라즈마 공정을 적용하여 글라스 위에 CNT 박막 코팅을 진행하였다. 코팅 횟수에 따른 전기적, 물리적 특성 변화를 관찰하기 위하여 1회부터 5회까지 동일한 방법으로 형성된 샘플을 제작하였고, 각 샘플에 대해 표면 형상, 반사도, 투과도, 흡수율 및 표면 저항을 측정하였다. 현미경을 이용하여 관찰했을 때 횟수가 늘어날 때 글라스 상에 검은 형상이 더 잘 관찰되며, 특히 스핀코팅에 의해 가운데 영역이 더 검게 관찰되는 것을 알 수 있다. 코팅 수가 증가함에 따라 측정 파장의 전 영역에서 투과도는 감소, 반사도 및 흡수율은 증가하였다. 또한, 파장이 감소함에 따라 투과율은 감소, 반사도 및 흡수율은 증가한다. 전기적인 특성의 경우, 2번 코팅했을 때 전도도가 상당히 향상됨을 확인할 수 있었으며, 추가 코팅에 의해서 전도도 감소가 관찰되지만, 큰 변화를 보이지는 않았다. 결론적으로 CNT를 투명전극으로 대체하기 위해서는 반사도 및 전기전도도를 함께 고려하여 코팅 횟수를 고려해야 하며, 2회가 최적임을 알 수 있다.

저압 및 대기압 플라즈마 처리를 통한 폴리카보네이트의 접촉각 변화특성 비교 (Effects of Low Pressure and Atmospheric Pressure Plasma Treatment on Contact Angle of Polycarbonate Surface)

  • 원동수;김태경;이원규
    • 공업화학
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    • 제21권1호
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    • pp.98-103
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    • 2010
  • 저압 플라즈마와 대기압 플라즈마를 사용하여 폴리카보네이트를 처리한 후 표면 개질 효과를 접촉각 측정을 통하여 비교 분석하였다. 플라즈마 처리 전의 폴리카보네이트의 탈이온수의 접촉각은 $82.31^{\circ}$이었으나 플라즈마 처리 후의 최소 접촉각은 산소 분위기의 저압 플라즈마에서 $9.17^{\circ}$의 최소 접촉각을 얻을 수 있었다. 플라즈마 방전 전력과 반응기체의 유량 증가에 따른 접촉각의 변화는 크지 않았으나 지속적으로 감소하는 특성을 보였다. 플라즈마 처리 후 경과시간에 따라 접촉각의 증가 현상을 보여 플라즈마 처리 후 후속 공정은 가급적 빨리 진행하는 것이 표면에너지 증가에 따른 효과를 이용하는데 효율적이다. 표면 화학결합 분석에서 산소분위기의 플라즈마 처리는 표면에 상대적으로 많은 극성 작용기를 형성하였다. 전반적으로 폴리카보네이트의 표면 개질에서 저압 산소플라즈마를 사용하여 처리하는 것이 대기압 플라즈마보다 효과적으로 친수성 표면을 만들 수 있었다.

Surface Modification with Atmospheric Microwave Agron Plasma Jet Assisted with Admixture of H2O2 and Analysis of Plasma Characteristics

  • Won, I.H.;Shin, H.K.;Kwon, H.C.;Kim, H.Y.;Kang, S.K.;Lee, J.K.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.544-545
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    • 2013
  • Recently, low-temperature atmospheric-pressure plasmas have been investigated [1,2] for biomedical applications and surface treatments. Experiments for improving hydrophilicity of stainless steel (SUS 304) plate with atmospheric microwave argon and H2O2 mixture plasma jet [3] were carried out and experimental measurements and plasma simulations were conducted for investigating the characteristics of plasma for the process. After 30 s of low power (under 10 W) and low temperature (under $50^{\circ}C$) plasma treatment, the water contact angle decreased rapidly to around $10^{\circ}$ from $75^{\circ}$ and was maintained under $30^{\circ}$ for a day (24 hours). The surface free energy, calculated from the contact angles, increased. The chemical properties of the surface were examined by X-ray Photoelectron Spectroscopy (XPS) and the surface morphology and roughness were examined by Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM) respectively. The characteristics of plasma sources with several frequencies were investigated by Optical Emission Spectroscopy (OES) measurement and one-dimensional Particle-in-Cell (PIC) simulation and zero-dimensional global simulation [4]. The relation between plasma components and the efficacy of the surface modification were discussed.

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황마섬유 및 황마-폴리프로필렌 복합체의 특성에 미치는 플라즈마 처리영향 (Effects of Plasma Treatment on Mechanical Properties of Jute Fibers and Their Composites with Polypropylene)

  • 허양일;멘사비스마르크;김성진;이홍기;나창운
    • Elastomers and Composites
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    • 제47권4호
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    • pp.310-317
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    • 2012
  • 계면접착력 향상을 위해 실린더형 RF 플라즈마 발생기를 이용하여 Jute fiber의 표면을 아르곤가스로 처리하였고 최적 처리조건을 설정하였다. 플라즈마 강도, 가스압력, 및 처리시간을 변경한 후 이러한 인자들이 황마섬유 표면모폴로지, 섬유 인장강도, 및 폴리프로필렌과의 모델복합체에서 계면접착강도에 미치는 영향을 조사하였다. 플라즈마 처리인자에 따라 황마섬유의 표면은 거칠어졌다. 가스압력의 영향은 처리시간 및 플라즈마 강도의 영향보다 다소 낮게 나타났다. 플라즈마 강도와 시간에 따라 황마섬유의 강도는 약 25% 감소한 반면, 가스압력의 영향은 크게 나타나지 않았다. 계면전단강도 (IFSS)를 기준으로 결정된 최적 플라즈마 처리조건은 처리시간 30 s, 전력 40 W, 가스압력 30 mTorr로 나타났다.

글로우방전을 이용한 액체크로마토그라피 검출기 개발을 위한 기초특성연구 (Fundamental Studies of the Electrical Characteristics of the Glow Discharge for the Development of HPLC Detector)

  • 이현주;김효진
    • 약학회지
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    • 제39권4호
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    • pp.427-432
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    • 1995
  • The plasma oscillation has been observed in an argon pressure between a tungsten anode and cathode consisting of an aqueous conducting solution. The effects of experimental parameters on the electrical characteristics of the glow discharge have been studied. The experimental parameters include the anode-cathode distance, pressure, methanol flow rate, and cathode materials. The glow discharge with liquid cathode and solid anode showed the potential sensitive detector for HPLC

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Microcrystalline Silicon for Thin Film Transistor

  • Milovzorov, D.;Kim, K.B.;Lisachenko, M.;Seo, J.W.;Lee, K.Y.;Chung, H.K.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.1320-1322
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    • 2005
  • Microcrystalline silicon films were deposited on glass substrate by using plasma-enhanced chemical vapor deposition (PECVD) method. The crystalline volume fraction was estimated by means of Raman spectrometer with argon laser as light source. The high hydrogen dilution of silane gas was used for increase in content of crystal silicon phase.

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글로우방전을 이용한 가스크로마토그라프 검출기의 개발 (Glow Discharge as Detector for Gas Chromatography)

  • 김효진;박일영;장성기;김박광;박만기
    • 약학회지
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    • 제37권1호
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    • pp.76-83
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    • 1993
  • The changes in discharge current, emission and/or oscillation frequency of the electric oscillation of a glow discharge are the potential sensitive measure of the concentration of an impurity in the argon plasma supporting gas. A single jet enhanced glow discharge has been interfaced with the gas chromatograph via 1/8" O.D. tube with a heating pad to study the changes in discharge current. To investigate the optimum operating conditions of the glow discharge system as detector for gas chromatography, pressure, gas flow rate, discharge current, distance between the anode and the cathode have been studied.

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고주파 유도방전 플라즈마의 푸로우브법에 의한 계측 (A Measurements of Radio-Frequency Induction Discharge Plasma using probe method)

  • 박성근;박상윤;하장호;박원주;이광식;이동인
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1997년도 하계학술대회 논문집 E
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    • pp.1657-1659
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    • 1997
  • Electron temperature and electron density were measured in a radio-frequency inductively coupled plasma (RFICP) using a probe measurements. Measurement was conducted in an argon discharge for pressures from 10 [mTorr] to 40 [mTorr] and input rf power from 100 [W] to 800 [W], Ar flow rate from 5 [sccm] to 30 [sccm], Spatial distribution electron temperature and electron density were measured for discharge with same aspect ratio (R/L=2). Electron temperature and electron density were discovered depending on both pressure and power, Ar flow rate. Electron density was increased with increasing input power and in creasing pressure, increasing Ar flow rate. Radial distribution of the electron density was peaked in the plasma center. Normal distribution of the electron density was peaked in the center between quartz plate and substrate. From these results, We found out the generation mechanism of Radio-Frequency Inductively Coupled Plasma.

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철강재료 용접에서 보조가스가 레이저플라즈마와 용입특성에 미치는 영향 (Effect of Assist Gas on Laser Induced Plasma and Bead Formation in Welding of Structural Steel by CW Nd:YAG Laser)

  • 김기철;신현준
    • Journal of Welding and Joining
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    • 제20권3호
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    • pp.109-115
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    • 2002
  • In this study high power Nd:YAG laser welding of structural steel was investigated. For the test steel blocks of $50{\times}50{\times}200mm$ were cut and machined, and bead-on-plate weld was made on the machined surface. Argon, nitrogen, helium, dry air or mixed gases were used to find the effect of shielding conditions on the bead formation. Results demonstrated that there were Fe I rich region and Fe II rich region in the laser induced plasma column based on the spectral analysis with S-2000 field spectrometer The Fe I region was located at the root of the column near keyhole opening. On the other hand, Fe II region was found at the middle of the plasma column. In the Nd:YAG laser welding, Fe I region emitted continuum which had peak value at wave length of around 710nm, and Fe II region had the peak at 580nm. In the welding of steel by $CO_2$ laser, however, no continuum was observed. There showed two groups of strong spikes in the $CO_2$ laser welding; the first group was displayed at the wave band of 450-560nm. This spike group emitted stronger intensity of light and sharper peaks than those group at 680-800nm.