DOI QR코드

DOI QR Code

Effect of HF and Plasma Treated Glass Surface on Vapor Phase-Polymerized Poly(3,4-ethylenedioxythiophene) Thin Film : Part II

  • Lee, Joonwoo (Department of Nano-Polymer Materials Engineering, Pai Chai University) ;
  • Kim, Sungsoo (Department of Nano-Polymer Materials Engineering, Pai Chai University)
  • Received : 2013.11.24
  • Accepted : 2013.12.20
  • Published : 2013.12.30

Abstract

In this study, in order to investigate how consecutive treatments of glass surface with HF acid and water vapor/Ar plasma affect the quality of 3-aminopropyltriethoxysilane self-assembled monolayer (APS-SAM), poly(3,4-ethylenedioxythiophene) (PEDOT) thin films were vapor phase-polymerized immediately after spin coating of FeCl3 and poly-urethane diol-mixed oxidant solution on the monolayer surfaces prepared at various treatment conditions. For the film characterization, various poweful tools were used, e.g., FE-SEM, an optical microscope, four point probe, and a contact angle analyzer. The characterization revealed that a well prepared APS-SAM on a glass surface treated with water vapor/Ar plasma is very useful for uniform coating of FeCl3 and DUDO mixed oxidant solution, regardless of HF treatment. On the other hand, a bare glass surface without APS-SAM but treated with HF and water vapor/Ar plasma generally led to a very poor oxidant film. As a result, PEDOT films vapor phase-polymerized on APS-SAM surfaces are far superior to those on bare glass surfaces in the quality and electrical characteristics aspects.

Keywords

References

  1. K. Kaneto, M. Maxfield, D. P.Nairns, A. G. Mac- Diarmid, and A. J. Heeger, "Electrochemistry of polyacetylene, (CH)x, Characteristics of polyacetylene cathodes", J. Chem. Soc., Faraday Trans. 1, Vol. 78, pp. 3417-3429, 1982. https://doi.org/10.1039/f19827803417
  2. G. Gustafsson, Y. Cao, G. M. Tracy, F. Klavetter, N. Colaneri, and A. J. Heeger, "Flexible light-emitting diodes made from soluble conducting polymers", Nature, Vol. 357, pp. 477-479, 1993.
  3. S. Choi, W. Kim, and S. Kim, "Development of highly conductive poly(3,4-ethylenedioxythiophene) thin film using high quality 3-aminopropyltriethoxysilane self-assembled monolayer", J. Chosun Natural Sci., Vol. 4, pp. 294-297, 2011.
  4. D. M. Knotter, "Etching mechanism of vitreous silicon dioxide in HF-based solutions", J. Am. Chem. Soc., Vol. 122, pp. 4345-4351, 2000. https://doi.org/10.1021/ja993803z