• Proceedings of the KIEE Conference
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• 1997.07d
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• pp.1205-1209
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• 1997

When the short fault current is flowed into a fuse, the notch of element is melted, and burnbacked by arc plasma, which caused by the voltage of fuse at both ends. The cutoff ability of fuse is heavily influenced by the degree of burnback. In this paper, we investigated the amount of burnback to the applied voltage di/dt variation, As a result, we confirmed that the amount of burnback is proportional to the variation of the applied voltage.

• Proceedings of the KIEE Conference
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• 2000.07c
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• pp.1717-1719
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• 2000

DLC films are deposited by using an FCVA deposition system with a mirror-type magnetic field configuration. Permanent magnets and: magnetic yokes around the cathode have been observed to enhance the mobility of arc spots on the cathode and the stability of arc plasma, Effects of reactor pressures and substrate biases on structural properties of DLC films deposited are investigated. The results show that the highest $sp^{3}/sp^{2}$ fraction is obtained when the films are deposited at a pressure of $3{\times}10^4$ Torr and a bias voltage of - 50 V. The variation of the structural properties due to thermal stress up to 500$^{\circ}C$ is also examined.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.478-478
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• 2010

대기압 플라즈마 공정은 진공 플라즈마 공정에 비해 장치의 경제성 및 규모면에서 많은 장점을 갖고 있어 대기압 공정에 대한 연구가 필요하다. 본 연구는 대기압 DC Arc Plasmatron을 이용하여 기체의 유량, 전류, plasmatron과 Si wafer 간의 거리를 변화시켜 이에 대한 Si wafer에 식각률(etching rate)을 확인하고 최적화 하였다. Ar은 2000sccm, $CF_4$는 50, 100sccm, 그리고 $O_2$는 0~1000sccm의 유량에 변화를 주었고 전류는 50A, 70A에서 식각하였다. 분석을 위해 Si wafer를 SEM(scanning electron microscope) 측정을 하였고, 그 결과 전류는 70A에서 기체 유량은 $CF_4$는 100sccm, $O_2$는 500sccm 일 때 식각률이 높게 나타났다. 그리고 전류와 유량을 위와 같은 조건에서 Plasmatron과 Si wafer 간의 거리를 5mm~15mm 변화를 주었을 때 Si wafer에 식각률을 측정해 본 결과 거리가 5mm일 때 식각률이 가장 높음을 확인 할 수 있었다. 아울러 거리를 변화시켰을 때가 유량이나 전압을 변화시킨 것 보다 식각률의 변화가 큰 경향을 보임을 알 수 있었다.

• Journal of the Korean institute of surface engineering
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• v.31 no.6
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• pp.334-344
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• 1998

Yew coating pmccss t.o form a surface layer ol CrN phasc on mild steel (A81 1020!, AlSI Hi3, 1Cr-0.5Mo steel (ASTM A213 and Nickrl-base superalloy (Inconel 718) was developed. Surlaces of various alloys t,n.ateii by chromizing for the formation ol Cr diffusion layer was subsequently trcaled by plasma nitriding in order t.o form the hard CrS coating layer on the surfaces. This duplex plasma surface tri-atments of chromizing and plasma nitriding have induced a lormation of a duplex-lrcated surfacr hyer of approximat~ls 70-80 $\mu\textrm{m}$thickncss with a iargcly improved microiiardnrss up to approxiniateW 1500Hv(50gf). The main cause for the lage improvment in the surface hardncss is altribilted to [.he fact that CrN and $Fe_xN$ phases are created successfully by ccliromizins and plasma nilriding treatment. High tenipera1,urc wear resislance of the duplex-treated mild steel and HI3 steels at $600^{\circ}C$ was examined. Comparing the duplex-treated specimens with the specimens treated only by chromizing, the rcsults shovmi that, thc wear volume of the duplex-treated mild skcl and 1113 stcel aSt.er a wear test, at $600^{\circ}C$ were reduced hy a Iactor of 8 and 3, respectively. Characteristics of the CrS phase by duplrx treatment were compared with $CrN_x$,/TEX> film by ion plating and the wear behaviors of CrN film lormed by two different nroccsses arc nea.riy identical.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.198-198
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• 2011

단분산 결정질 실리콘 나노입자 (<10 nm)는 양자점 효과로 인한 선택적 파장 흡수가 가능하므로 태양전지 분야에 응용 가능성이 크다. 특히 입경의 크기가 작아지면 부피대비 표면적이 넓어지기 때문에 태양빛 흡수 면적이 증가한다. 따라서 입자의 크기는 태양전지에서 효율을 결정하는 중요한 요소 중 하나이다. 이러한 이유에서 plasma arc synthesis, laser ablation, pyrolysis 그리고 PECVD (Plasma Enhanced Chemical Vapor Deposition) 등이 실리콘 나노입자를 합성하는데 연구되어 왔으며, 특히 PECVD는 입자 생성과 동시에 균일한 증착이 이루어질 수 있기 때문에 태양전지 제작 시 공정 효율을 높일 수 있다. PECVD를 이용한 나노입자 합성에서 입경을 제어하는데 중요한 전구물질은 Ar과 SiH4가스이다. Ar 가스는 ICP (Inductively Coupled Plasma) 챔버 내부에 가해준 전력을 통해 가속됨으로써 분해되어 Ar plasma가 생성된다. 이는 공급되는 SiH4가스를 분해시켜 핵생성을 유도하고, 그 주위로 성장시킴으로써 실리콘 나노입자가 합성된다. 이때 중요한 변수 중 하나는 핵생성과 입자성장시간의 조절을 통한 입경제어 이다. 또한 공급되는 가스의 유량은 입자가 생성될 때 필요한 화학적 구성비를 결정하므로 입경에 중요한 요소가 된다. 마지막으로 공정압력은 챔버내부의 plasma 구성 요소들의 평균 자유 행로를 결정하여 SiH4가 분해되어 입자가 생성되는 속도와 양을 제어한다. PECVD를 이용한 실리콘 나노입자 형성의 주요 변수는 RF pulse, 가스(Ar, SiH4, H2)의 유량, Plasma power, 공정압력 등이 있다. 본 연구에서는 RF (Radio Frequency) PECVD방법을 이용하여 실리콘 나노입자를 만드는데 필요한 여러 변수들을 제어함으로써 이에 따른 입경분포 차이를 연구하였다. 또한 SEM (Scanning Electron Microscopy)과 SMPS (Scanning Mobility Particle Sizer)를 이용하여 각 변수에 따라 생성된 나노입자의 입경과 농도를 분석하였다. 이 중 plasma power에 따른 입경분포 측정 결과 600W에서 합성된 실리콘 나노입자가 상당히 단분산 된 형태로 나타남을 확인할 수 있었고 향후 다른 변수의 제어, 특히 DC bias 전압과 열을 가함으로써 나노입자의 결정성을 확인하는 추가 연구를 통해 태양전지 제작에 응용 할 수 있을 것으로 예상된다.

• Restorative Dentistry and Endodontics
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• v.27 no.6
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• pp.561-568
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• 2002

Purpose of this research is estimating polymerization depth of different source of light. XL 3000 for halo-gen light, Apollo 95E for plasma arc light and Easy cure for LED light source were used in this study. Different shade (B1 & A3) resin composites (Esthet-X, Dentsply, U.S.A.) were used to measure depth of cure. 1, 2, and 3 mm thick samples were light cured for three seconds, six seconds or 10 seconds with Apollo 95E and they were light cured with XL-3000 and Easy cure for 10 seconds, 20 seconds, or 40 seconds. Vicker's hardness test carried out after store samples for 24 hours in distilled water. Results were as following. 1. Curing time increases from al1 source of lights, oui$.$ing depth increased(p<0.05). 2. Depth (that except 1mm group and 2mm group which lighten to halogen source of light) deepens in all groups, Vickers hardness decreased(p<0.05). 3. Vicker's hardness of A3 shade composite was lower in all depths more than B1 shade composites in group that do polymerization for 10 seconds and 20 seconds using halogen source of light(p<0.05), but group that do polymerization lot 40 seconds did not show difference(p>0.05). 4. Groups that do polymerization using Plasma arc and LED source of light did not show Vicker's hardness difference according to color at surface and 1mm depth(p>0.05), but showed difference according to color at 2mm and 3mm depth(p<0.05). The results showed that Apollo 95E need more polymerization times than manufacturer's recommendation (3 seconds), and Easy cure need polymerization time of XL-3000 at least.

• Journal of the korean academy of Pediatric Dentistry
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• v.30 no.2
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• pp.245-253
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• 2003

The degree of conversion of cross-linked polymer has great importance in determining the physical and mechanical properties, and biocompatibility. Therefore, this study examined the comparison of light-cured composite resin polymerization of various light-curing systems composed of plasma arc, halogen, LED curing units and pluse-delay curing with FTIR. From this experiment, The following results were obtained : 1. From FTIR, the degree of conversion(DC) of composite resin was 34.52-49.31%, DC of composite resin used in Flipo was $39.36{\pm}1.22%$, CrediII $45.64{\pm}1.34%$, XL3000 $43.48{\pm}1.34%$, VIP(mode 4) $44.31{\pm}0.72%$, LUXOMAX $49.31{\pm}2.37%$, Elipar Freelight $44.51{\pm}0.62%$ and $34.52{\pm}0.85%$ in pulse-delay curing. 2. The degree of conversion of composite resin in each light-curing unit was highest DC of the LUXOMAX system, lowest DC of the pulse-delay curing. 3. Compared with other curing system, Flipo, LUXOMAX, and pulse-delay curing were significant difference(p<0.05). 4. In same curing method group, the differences of each light-curing unit were no significace in halogen(conventional) curing method(p>0.05), but significance in plasma arc curing and LED curing method(p<0.05).

• Journal of the korean academy of Pediatric Dentistry
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• v.31 no.2
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• pp.273-279
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• 2004

Recently, newly developed single high-intensity LED curing lights for composite resins are claimed to have a higher intensity than previous LED curing lights and to results in optimal properties and short curing time. The purpose of this study was to determine the curing effectiveness of the curing units and to evaluate the relationship between the degree of polymerization and distance from curing light tip end to resin surface. One composite resin was tested(Filtek Z250). Thin film specimens were cured with a LED curing unit(Elipar Freelight 2, 10s), Plasma Arc curing unit(Flipo, 6s), Halogen curing light(XL3000, 20s) at four curing light tip to the resin surface(0mm, 2mm, 4mm, 6mm). Degree of conversion of composite resins were determined by a Fourier Transform Infrared Spectrometer(FTIR). From the present study, the following results were obtained. 1. In all curing units, relative light intensity was significantly decreased according to the increase of distance of light tip to the resin surface(p<0.05). LED curing units showed a higher percentile decrease in intensity than other curing units. 2. In all curing units, degree of conversion was decreased as increase of the distance but no statistically significant difference(p>0.05) except between 4mm and 6mm(p<0.05). 3. When comparing degree of conversion of light curing units at each distance(0mm, 2mm, 4mm, 6mm), LED curing light had a higher degree of conversion than plasma arc and halogen curing lights at 0, 2, 4mm(p<0.05). At 6mm, there was a no significant difference among the curing units(p>0.05).

• Journal of the korean academy of Pediatric Dentistry
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• v.34 no.1
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• pp.81-90
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• 2007

The purpose of this study was to assess the effect of light-tip distance on the shear bond strength of a visible light-cured glass ionomer cement(Fuji Ortho LC ; GC, Japan) cured with three different light curing units : a halogen light(Elipar Trilight ; 3M ESPE, Seefeld, Germany), a Light Emitting Diode (LED, Elipar Freelight2 ; 3M ESPE, Seefeld, Germany) and a plasma arc light (Flipo ; LOKKI, France). 1. When used at a distance of 0mm from the bracket, the three light curing units showed no statistically different shear bond strengths. At distance of 3 and 6mm, no significant differences were found between the halogen and plasma arc lights, but both had significantly higher shear bond strengths than the LED light. 2. The halogen light and plasma arc light showed that no significant differences in bond strength were found among the three distances. Using the LED light, a greater light-tip distance produced significantly lower shear bond strengths.

• Journal of the korean academy of Pediatric Dentistry
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• v.45 no.1
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• pp.82-89
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• 2018

In a photodynamic therapy, the difference of antibacterial capacity was compared according to the type of source of light when the same quantity of energy is irradiated. After S. mutans is formed in planktonic state and biofilm state, erythrosine diluted to $40{\mu}M$ was treated for 3 minutes, and as the type of light source, Halogen, LED, and Plasma arc were used, which were irradiated for 30 seconds, 15 seconds and 9.5 seconds, respectively. After the completion of the experiment, CFU of each experiment arm was measured to compare the photodynamic therapeutic effects according to each condition. The CFU of each experiment arm had no statistically significant difference. Under the same quantity of energy, the photodynamic therapeutic effect can be said to be the same regardless of types of light source, which is a useful result in the clinical field with various light irradiators.