• Transactions on Electrical and Electronic Materials
• /
• v.16 no.6
• /
• pp.346-350
• /
• 2015

In this study, we carried out an investigation of the etch characteristics of TiO₂ thin films and the selectivity of TiO₂ to SiO₂ in adaptive coupled C1₂/Ar plasma. The maximum etch rate of the TiO₂ thin film was 136±5 nm/min at a gas mixing ratio of C1₂/Ar (75%:25%). The X-ray photoelectron spectroscopy (XPS) analysis showed the efficient destruction of oxide bonds by the ion bombardment as well as the accumulation of low volatile reaction products on the etched surface.

• The Transactions of the Korean Institute of Electrical Engineers
• /
• v.32 no.7
• /
• pp.227-233
• /
• 1983

Noticing that action of gaseous phase in insulating oil concerns to the discharging characteristics, I investigated the smalness pressure effects on quantity of the partial discharge and discharging pulse frequency. Tests are carried out between the niddle points in insulating oil at pressure being changed by gradual charge of inert gas Ar. At pressure as low as of 0.1-0.5 torr pulse frequency and maximum partial discharge reach peak while at pressure haigher than 20 torr no pulse is observed. The fact that pulse frequency has peak value at certain presure, which is changed either by charging Ar or by adding oil, implies that the action of gaseous phase depends on pressure. Test results are that partial discharge pulse are governed by pressure of Ar-charged oil, and less partial discharge pulses correspond to smaller bubbles whereas more partial descharge pulses correspond to larger bubbles.

• Journal of the Speleological Society of Korea
• /
• no.82
• /
• pp.1-4
• /
• 2007

In this paper, the etching of Au films using photoresist masks on Si substrates was investigated using a capacitively coupled plasma etch reactor. The advantages of plasma etch techniques over current methods for Au metalization include the ability to simplify the metalization process flow with respect to resist lift-off schemes, and the ability to cleanly remove etched material without sidewall redeposition, as is seen in ion milling. The etch properties were measured for different gas mixing ratios of CF4/Ar, and chamber pressures while the other conditions were fixed. According to statistical design of experiment (DOE), etching process of Au films was characterized and also 20 samples were fabricated followed by measuring etch rate, selectivity and etch profile. There is a chemical reaction between CF4 and Au. Au- F is hard to remove from the surface because of its high melting point. The etching products can be sputtered by Ar ion bombardment.

• Proceedings of the KIEE Conference
• /
• 1989.07a
• /
• pp.426-428
• /
• 1989

As a first phase of plasma study intended for semiconductor processing research, we have studied the discharge phenomena. In particular, we have obtained a specific formula for the breakdown voltage as a function of the neutral state pressure of reactive gases. Our experimental results with H2,O2,Ar,CF4 seem ro verify this formula. In addition we find the voltage levels for various gases in the descending order of CF4>O2=Ar>H2 in high pressure region, while H2>CF4>O2>Ar in low pressure region. When H2 and CF4 were mixed, we observe the overall voltage dominated by the gas with lower breakdown volotage.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2010.06a
• /
• pp.340-340
• /
• 2010

본 연구에서는 유도결합형 플라즈마(ICP)를 이용하여, HBr/Ar 가스의 조성비 변화에 따른 Pb(Zr,Ti)$O_3$ 박막에 대한 식각특성을 연구 하였다. PZT박막의 식각속도와 Oxide($SiO_2$), Photo resister(PR)에 대한 식각선택비를 추출하였으며, 식각 메카니즘을 규명하기 위하여 optical emission spectroscopy(OES)와 double Langmuir prove(DLP) 이용하여 라디칼 특성변화와 이온 전류밀도(Ion current density)를 측정하였다.

• Proceedings of the KIEE Conference
• /
• 2004.07e
• /
• pp.37-40
• /
• 2004

Electron swarm parameters in pure $CF_4$ and mixtures of $CF_4$ and Ar, have been analyzed over a range of the reduced electric field strength between 0.1 and 350[Td] by the two-term approximation of the Boltzmann equation(BEq.) method and the Monte Carlo simulation(MCS) The results of the Boltzmann equation and the Monte Carlo simulation have been compared with the data presented by several workers. The deduced transport coefficients for electrons agree reasonably well with the experimental and simulation data obtained by Nakamura and Hayashi. The energy distribution function of electrons in $CF_4$-Ar mixtures shows the Maxwellian distribution for energy. That is, f(${\varepsilon}$) has the symmetrical shape whose axis of symmetry is a most probably energy

• Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
• /
• 1999.11a
• /
• pp.58-63
• /
• 1999

In order to analyze the discharge-pumped KrF excimer laser, computer simulation code is developed. On the other hand, the electron velocity distribution in a discharge plasma, measured by the Thomson scattering method, showed the Maxwellian, while the code predicted non-Maxwellian. This disagreement was solved by introducing the electron-electron collision into the simulation code. We also developed a simulation code on the CO2 laser-heated plasma in high-pressure Ar gas, and estimated the formation process of Ar2 excimer. The code predicted the possibility of the Ar2 laser action at 126 nm.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 1999.05a
• /
• pp.387-390
• /
• 1999

Electron swarm parameterdthe drift velocity and longitudinal diffusion coefficienthn $SiH_4-Ar$ mixtures containing 0.5% and 5% monosilane were measured using over the range of E/N from 0.01 to 300 Td at room temperature. Electron swarm parameters in argon were drastically changed by adding a small amount of monosilane. The electron drift velocity in both mixtures showed unusual behaviour against E/N. It had negative slope in the medium range of E/N, yet the slope was not smooth but contained a small hump. The longitudinal diffusion coefficient also showed a corresponding feature in its dependence on E/N. A two-tern approximation of the Boltzmann equation analysis and Monte Carlo simulation have been used to study electron transport coefficients.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.16 no.4
• /
• pp.286-291
• /
• 2003

(Pb,Sr)TiO$_3$(PST) thin films have attracted great interest as new dielectric materials of capacitors for Gbit dynamic random access memories. In this study, inductively coupled CF$_4$/Ar plasma was used to etch PST thin films. The maximum etch rate of PST thin films was 740 $\AA$/min at a CF$_4$(20 %)/Ar(80 %) 9as mixing ratio, an RF power of 800 W, a DC bias voltage of -200 V, a total gas flow of 20 sccm, and a chamber pressure of 15 mTorr. To clarify the etching mechanism, the residue on the surface of the etched PST thin films was investigated by X-ray photoelectron spectroscopy. It was found that Pb was mainly removed by physically assisted chemical etching. Sputter etching was effective in the etching of Sr than the chemical reaction of F with Sr, while Ti can almost removed by chemical reaction.

• Proceedings of the KIEE Conference
• /
• 1994.11a
• /
• pp.243-245
• /
• 1994

We synthesized the conducting diamond-like carbon films using plasma-enhanced chemical vapor deposition and analysized its characteristics. We obtained the metal-containing diamond-like carbon films using $CH_4$, Ar gas and aluminum target. We observed the changes of electrical conductivity, microhardness and surface morphology according to $Ar/CH_4$ ratio, substrate bias and target bias. As the target bias and $Ar/CH_4$ ratio increase and the substrate bias decreases, the electrical conductivity and surface roughness increase. The increase of hardness involves decrease of the electrical conductivity. Metal-containing amorphous hydrogenated carbon films show improved adhesion on metal substrates compared to pure diamond-like carbon films and better electrical conductivity.