• Title/Summary/Keyword: Ar Gas

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A Study on the Etching Characteristics of $YMnO_3$ Thin Films in High Density $Cl_2$/Ar Plasma (고밀도 $Cl_2$/Ar 플라즈마를 이용한 $YMnO_3$ 박막의 식각 특성에 관한 연구)

  • 민병준;김창일;장의구
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.11a
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    • pp.21-24
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    • 2000
  • Ferroelectric YMnO$_3$ thin films are excellent dielectric materials for high integrated ferroelectric random access memory (FRAM) with metal-ferroelectric-silicon field effect transistor (MFSFET) structure. In this study, YMnO$_3$ thin films were etched with C1$_2$/Ar gas chemistries in inductively coupled plasma (ICP). The maximum etch rate of YMnO$_3$ thin films is 285 $\AA$/min under C1$_2$/Ar of 10/0, 600 W/-200 V and 15 mTorr. The selectivities of YMnO$_3$ over CeO$_2$ and $Y_2$O$_3$ are 2.85, 1.72, respectively. The results of x-ray photoelectron spectroscopy (XPS) reflect that Y is removed dominantly by chemical reaction between Y and Cl, while Mn is removed more effective by Ar ion bombardment than chemical reaction. The results of secondary ion mass spectrometer (SIMS) were equal to these of XPS. The etch profile of the etched YMnO$_3$ film is approximately 65$^{\circ}$and free of residues at the sidewall.

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Carbon Plume Modeling Assisted by Ar Plasmas (Ar 플라즈마 상태에서 운동하는 탄소 입자 모델링)

  • So, Soon-Youl;Lee, Jin;Chung, Hae-Deok;Yeo, In-Seon
    • Proceedings of the KIEE Conference
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    • 2005.07c
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    • pp.2163-2165
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    • 2005
  • A pulsed laser ablation deposition (PLAD) technique has been used for producing fine particle as well as thin film at relatively low substrate temperatures. However, in order to manufacture and evaluate such materials in detail, motions of plume particles generated by laser ablation have to be understood and interactions between the particles by ablation and gas plasma have to be clarified. Therefore, this paper was focused on the understanding of plume motion in laser ablation assisted by Ar plasma at 50(mTorr). Two-dimensional hybrid model consisting of fluid and particle models was developed and three kinds of plume particles which are carbon atom (C), ion $(C^+)$ and electron were considered in the calculation of particle method It was obtained that ablated $C^+$ was electrically captured in Ar plasmas by strong electric field (E). The difference between motions of the ablated electrons and $C^+$ made E strong and the collisional processes active.

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Kinetic Study on the Low-lying Excited States of Ga Atoms in Ar

  • Kuntack Lee;Ju Seon Goo;Ja Kang Ku
    • Bulletin of the Korean Chemical Society
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    • v.15 no.8
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    • pp.663-669
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    • 1994
  • Decay kinetics of Ga(5s), Ga(5p) and Ga(4d) atoms in Ar were studied by laser induced fluorescence technique. Theground state gallium atoms in the gas phase were generated by pulsed dc discharge of trimethyl gallium and argon mixtures. Both pulsed discharge and YAG-DYE laser system were controlled by a dual channel pulse generator and the delay time between the end of discharge and laser pulses was set 3.0-6.0 ms. The Ga(5s) and Ga(4d) atoms were generated by single photon excitation from the ground state Ga atoms and radiative lifetimes as well as the total quenching rate constants in Ar were obtained from the pressure dependence of the fluorescence decay rates. The Ga(5p) atoms were populated by a two-photon excitation method and the cascade fluorescence from Ga(5s) atoms were analyzed to extract quenching rate constant of Ga(5p) atoms by Ar in addition to radiative lifetimes of Ga(5p) state. The magnitudes of the quenching rate constants by Ar for the low-lying excited states of Ga atoms are 1.6-3$ {\times}10^{-11}cm^3$ molecul$e^{-1}s^{-1}$, which are much larger than those for alkali, alkaline earth and Group 12 metals. Based on the measured rate constants, kinetic simulations were done to assign state-to-state rate constants.

Phase formation and microstructural characteristics of ytterbium silicates coatings fabricated by plasma spraying with Ar/He gas compositions for environmental barrier coating applications (플라즈마용사로 증착된 환경차폐코팅 이터븀 실리케이트의 Ar/He 가스 조성에 따른 상형성 및 미세구조 특성)

  • Choi, Jae-Hyeong;Kim, Seongwon;Kim, Ji-Yoo;Moon, Hung Soo
    • Journal of the Korean institute of surface engineering
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    • v.55 no.6
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    • pp.376-382
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    • 2022
  • Yb2Si2O7 has a coefficient of thermal expansion similar to that of the base material of SiC and has excellent corrosion resistance in a high-temperature oxidizing atmosphere including water vapor, so it is being studied as one of the materials for environmental barrier coatings (EBCs). In this study, Yb2Si2O7 powder granule is deposited using atmospheric plasma spraying (APS) with different Ar/He ratios. Phase formation and microstructural characteristics are investigated with the coated specimens. In the coating layer, the crystallinity decreased, and the amorphous content increased from an increase in the ratio of Ar. In addition, the various types of particles involved by local volatilization of Si according to the Ar/He ratios were identified.

The Effect of Ambient Gas Density on the Development of Impinging Diesel Spray (분무실 밀도 변화가 충돌 디젤분무 특성에 미치는 영향)

  • Kim, J.H.;Lee, B.S.;Koo, J.Y.
    • Journal of ILASS-Korea
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    • v.4 no.2
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    • pp.40-46
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    • 1999
  • Experimental investigation of unsteady impinging diesel spray on the flat plate have been carried out using high speed camera and Malvern system. The density ratios of ambient gas to diesel fuel were varied using $N_2$ and Ar gas in the case of 14.9, 21.2, 28.4, 35.1, 40.4, and 50.1. With the increase of gas density ratio, the radial penetration is decreased due to the resistance of the ambient gas. With the increase of the gas density ratio and the distance between nozzle tip and flat plate, the height of spray is increased due to the entrance and circulation. With the increase of gas density ratio, SMD is decreased on the nearby position at the center of flat plate, but SMD is increased on the far position. As the distance between nozzle tip and flat plate is increased, SMD is always decreased.

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Application to Gas Sensors by Electron Emission from Carbon Nanotube Emitters (탄소나노튜브 전극으로부터 전계방출을 이용한 가스센서의 응용)

  • Kim Seong-Jeen
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.5
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    • pp.405-410
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    • 2006
  • We fabricated gas sensors using carbon nanotubes (CNTs) as electron emitters for the purpose of detecting inert gases. By using the silicon-glass anodic bonding and glass patterning technologies with the typical Si process, we improved the compactness of the sensors and the reliability in process. The proposed sensor, based on, an electrical discharge theory known as Paschen's law in principle, works by figuring the variation of the discharge current depending on gas concentration. In the experiment, the initial breakdown characteristics were measured for air and Ar as a function of gas pressure. As the result, even though it should be realized that there are many other factors which have an effect on the breakdown of a gap, the sensors led to similar result as predicted by Paschen's law, and they showed a possibility as gas sensors which enable to detect the gas density ranged to the vacuum pressure from 1 to $10^{-3}$ Torr.

Analysis of Gases in Nuclear Fuel Rod by Quadrupole Mass Spectrometry (Quadrupole Mass Spectrometry를 이용한 핵연료봉내 기체분석)

  • Kim, Seung-Soo;Kang, Moon-Ja;Park, Soon-Dal;Park, Yong-Joon;Joe, Kih-Soo
    • Analytical Science and Technology
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    • v.12 no.2
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    • pp.94-98
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    • 1999
  • An analysis method of components and isotopic compositions of low pressure gases from nuclear fuel rod using quadrupole mass spectrometer was studied. The calibration curves of each gas in pure and mixtures of He, $N_2$, $O_2$, Ar, Kr and Xe were obtained as a function of pressure and concentration, respectively. Effect of molecular leak, located between sample chamber and analyser chamber, on the sensitivites was also studied. The results suggested that samples could be analysed accurately at the same analytical condition as that of synthetic gas mixture. The difference of sensitivities among isotopes of Kr and Xe was not observed in the range of measured pressure.

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The Properties Characterization of ZnO Thin Film Grown by RF Sputtering (RF스퍼터링법으로 제작한 ZnO박막의 특성평가)

  • Jung, S.M.;Chong, K.C.;Choi, Y.S.;Kim, D.Y.;Kim, C.S.;Yi, Jun-Sin
    • Proceedings of the KIEE Conference
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    • 1997.07d
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    • pp.1433-1435
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    • 1997
  • ZnO shows the properties of wide conductivity variation, high optical transmittance, and excellent piezoelectricity. Using these properties of ZnO, the material applications were extended to sensors, SAW filters, solar cells, and display devices. This paper investigated transmittance influencing factors for thin film ZnO grown by RF magnetron sputtering. The growth rate and structural investigation were carried out in conjunction with optical transmittance characteristics of thin film ZnO. The glass substrate temperature of $175^{\circ}C$ exhibited a preferential crystallization along (002) orientation. Transmittance of ZnO film deposited at the substrate temperature of $175^{\circ}C$ showed higher than 92%. An active sputter gas was investigated with a variation of $O_2$ partial pressure from 0 to 10% in an Ar atmosphere. ZnO film grown in 100% Ar gas shows that a reduced transmittance of 82% at the short wavelengths and decreased resistivity value. As the partial pressure of $O_2$ gas increased, the optical transmittance was increased above 90% at the short wavelengths, however, resistivity was drastically increased to higher than $10^4{\Omega}$-cm.

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Characteristics of AlN Dielectric Layer for Metal PCB as a Function of Nitrogen Partial Pressure Using RF-Magnetron Sputtering Method (RF-Magnetron Sputtering 방법을 이용해 질소분압비에 따른 금속 PCB용 AlN 절연막의 특성)

  • Kim, Hwa-Min;Park, Jeong-Sik;Kim, Dong-Young;Bae, Kang;Sohn, Sun-Young
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.10
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    • pp.759-762
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    • 2010
  • In this investigation, the effects of $N_2/(Ar+N_2)$ gas partial pressure on the structural, electrical, and thermal properties of AlN dielectric layers prepared on aluminum substrates using RF-magnetron sputtering method were analyzed. Among the films, the AlN dielectric film deposited under $N_2/(Ar+N_2)$ gas partial pressure of 75% exhibit the highest AlN (002) preferred orientation, which was grain size of about 15.32 nm and very dense structure. We suggest the possibilities of it's application as a dielectric layer for metal PCB because the AlN films prepared at optimized gas partial pressure can improving the insulating property, the thermal conductivity, and thermal diffusivity of the films.

The effects of primary gas physical properties on the performance of annular injection type supersonic ejector (주유동 기체의 물리적 특성이 환형 분사 초음속 이젝터의 성능에 미치는 영향)

  • Jin, Jung-Kun;Kim, Se-Hoon;Park, Geun-Hong;Kwon, Se-Jin
    • Journal of the Korean Society for Aeronautical & Space Sciences
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    • v.33 no.12
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    • pp.68-75
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    • 2005
  • The effects of the physical properties of primary flow on the performance of a supersonic ejector were investigated. Axisymmetric annular injection type supersonic ejector was used for the study of the effects of molecular weight and the specific heat at constant pressure on the ejection performance. Test gases include; air, $CO_{2}$, Ar, $C_{3}H_{8}$, and $CCl_{2}F_{2}$ for different values of gas properties. As the molecular weight and CP of the primary gas increase, the secondary flow pressure increases at the same primary stagnation pressure and this behavior results from the combined effects of molar specific heat or specific heat ratio.