• 정보저장시스템학회논문집
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• 제6권2호
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• pp.68-73
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• 2010

The interest in acquiring high efficiency solar cells has been steadily increasing due to various advantages such as low-cost installation, pollution free and everlasting energy generation. In order to raise the cell efficiency, there has been a lot of effort to develop effective anti-reflection coatings. In this work, the main objective was to investigate the effects of particle size and annealing temperature of silica anti-reflection coatings to maximize the cell efficiency as well as reliability. It was shown that the light transmittance could be increased by a few percent over a certain range of wavelength using the silica coating. Also, the tribological properties of the coating could be improved through the annealing process, which led to better reliability of the coating.

• Current Photovoltaic Research
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• 제8권1호
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• pp.1-5
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• 2020

The most important factor in enhancing the performance of an optical device is to minimize reflection and increasing transmittance of light for a broad wavelength range. The choice of appropriate coating material is crucial in decreasing reflection losses at the substrate. The purpose of this review is to highlight anti-reflection coating (ARC) materials that can be applied to silicon solar cell and glass substrate for minimizing reflection losses. The optical and electrical behavior of ARC on a substrate is highly dependent on thickness and refractive index (RI) of ARC films that are being deposited on it. The coating techniques and performance of single and multi-layered ARC films after coated on a substrate in a wide range of wavelength spectrum will be studied in the paper.

• 한국재료학회지
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• 제24권12호
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• pp.689-693
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• 2014

Anti-reflection coating films have used to increase the transmittance of displays and enhance the efficiency of solar cells. Hydrophobic anti-reflection coating films were fabricated on a glass substrate by sol-gel method. To fabricate an anti-reflection film with a high transmittance, poly ethylene glycol (PEG) was added to tetraethyl orthosilicate (TEOS) solution. The content of PEG was changed from 1 to 4 wt% in order to control the morphology, thickness, and refractive index of the $SiO_2$ thin films. The reflectance and transmittance of both sides of the coated thin film fabricated with PEG 4 wt% solution were 0.3% and 99.4% at 500 nm wavelength. The refractive index and thickness of the thin film were n = 1.29 and d = 105 nm. Fluoro alkyl silane (FAS) was used for hydrophobic treatment on the surface of the anti-reflection thin film. The contact angle was increased from $13.2^{\circ}$ to $113.7^{\circ}$ after hydrophobic treatment.

• 한국표면공학회지
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• 제40권3호
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• pp.138-143
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• 2007

The effects of texturing and anti-reflection coating on the reflection properties of multi-crystalline silicon solar cell have been investigated. The chemical solutions of alkaline and acidic etching solutions were used for texturing at the surface of multi-crystalline Si wafer. Experiments were performed with various temperature and time conditions in order to determine the optimized etching condition. Alkaline etching solution was found inadequate to the texturing of multi-crystalline Si due to its high reflectance of about 25%. The reflectance of Si wafer texturing with acidic etching solution showed a very low reflectance about 10%, which was attributed to the formation of homogeneous. Also, deposition of ITO anti-reflection coating reduced the reflectance of multi-crystalline si etched with acidic solution($HF+HNO_3$) to 2.6%.

• 한국진공학회지
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• 제19권5호
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• pp.341-346
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• 2010

본 논문에서는 반응성 스퍼터링(Reactive Sputtering) 공정으로 $Si_xO_y$ 박막과 $Si_xN_y$ 박막을 4층 구조로 적층하고 400~700 [nm]의 가시광 영역에서 빛의 반사를 줄이기 위한 반사방지 코팅(Anti-Reflection Coating)으로의 응용 가능성을 조사하였다. 스퍼터링 타겟으로 6 [inch] 직경의 Si 단결정을 사용하였고, 반응성 스퍼터링 가스는 $Si_xO_y$ 박막 증착에서 Ar과 $O_2$를, $Si_xN_y$ 박막 증착에서는 Ar과 $N_2$를 사용하였으며, 스퍼터링 파워로는 DC pulse를 사용하였다. 1,900 [W] DC pulse power에서 Ar:$O_2$=70:13 [sccm]의 반응성 스퍼터링으로 2.3 [nm/sec]의 증착률과 1.50의 굴절률을 보이는 $Si_xO_y$ 박막을 제작하였고, Ar:$N_2$=70:15 [sccm]의 반응성 스퍼터링으로 1.8 [nm/sec]의 증착률과 1.94의 굴절률을 보이는 $Si_xN_y$ 박막을 제작하였다. 이 두 종류의 박막을 이용해서 시뮬레이션을 통해 4층 구조의 반사방지 코팅 구조를 설계한 후, 설계결과에 따라 각 박막의 두께를 순차적으로 변화시켜 증착하였다. 4층 구조 $Si_xO_y-Si_xN_y$의 반사도 측정 결과 550 [nm] 대역에서 1.7 [%]의 반사와 400 [nm]와 650 [nm] 영역에서 1 [%]의 반사를 보였으며, 가시광 영역에서 성공적인 "W" 형태의 반사방지 코팅 특성을 보였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 춘계학술대회 논문집 센서 박막재료연구회 및 광주 전남지부
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• pp.80-81
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• 2008

In this paper, we have designed the Anti-Reflection (AR) coating for 850, 1310 nm(multi type) and 1310, 1550 nm(multi type) wavelength ranges on the ferrule facet of special optical connector. The reflectance of the AR coated ferrule facet is designed under 5% for 850, 1310 nm(multi type) and 1310, 1550 nm (multi type). The average return loss of the AR coated ferrule facet is 47.1 dB.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2009년도 춘계학술대회 논문집
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• pp.919-920
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• 2009

• 한국표면공학회지
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• 제50권6호
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• pp.480-485
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• 2017

Soft mold imprinting method that uses nanostructured polymer mold was investigated for anti-reflection film fabrication. The nanostructured soft mold was polyethylene terephthalate(PET) irradiated by oxygen ion beams. The collisional energy transfer between oxygen ion and the polymer surface induced cross-linking and scission reactions, resulting in self-organized nanostructures with regular patterns of the wavenumber of $5{\mu}m^{-1}$. Post processes including ultra-violet curable resin coating and delamination fabricated anti-reflection films. The imprinted resin surface also showed the consistent wavenumber, $5{\mu}m^{-1}$. Pristine PET, oxygen ion beam treated PET, and imprinted replica sample showed total transmittance of 91.04, 93.25, and 93.57-93.88%, respectively.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.322-322
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• 2010

Recently, anti-reflective films (AR) are one of the most studied parts of a solar cell since these films improve the efficiency of photovoltaic devices. Also, anti-reflection films on the textured silicon solar cells reduce the amount of reflection of the incident light, which improves the device performance due to light trapping of incident light into the cell. Therefore, we preformed two step processes to get textured Si (100) substrate in this experiment. Pyramid size of textured silicon had approximately $2{\sim}9\;{\mu}m$. A well-textured silicon surface can lower the reflectance to 10%. For more reduced reflection, TiO2 anti-reflection films on the textured silicon were deposited at $600^{\circ}C$ using titanium tetra-isopropoxide (TTIP) as a precursor by metal-organic chemical vapor deposition (MOCVD), and the deposited TiO2 layers were then treated by annealing for 2 h in air at 600 and $1000^{\circ}C$, respectively. In this process, the treated samples by annealing showed anatase and rutile phases, respectively. The thickness of TiO2 films was about $75{\pm}5\;nm$. The reflectance at specific wavelength can be reduced to 3% in optimum layer.

• 한국재료학회지
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• 제28권12호
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• pp.714-718
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• 2018

Anti-reflection thin films are fabricated on glass substrates using the screen printing method. Tetra ethyl silicate(TEOS) and methyl tri methoxy silane(MTMS) are used as starting materials and buthyl carbitol acetate(BCA) and buthyl cellusolve(BC) are mixed to improve the viscosity of the solution. Anti-reflection thin films are fabricated according to the number of the screen mesh and the characteristics improve as the mesh size increases. The transmittance and reflectance of the coated thin film using 325 mesh are about 94 % and 0.43 % in the visible wavelength. The thickness and refractive index of the AR thin film are 107 nm and n = 1.26, respectively.