• 한국전기전자재료학회논문지
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• 제22권3호
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• pp.248-251
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• 2009

We have investigated the effect of the quality of 1.3 um distributed feed back laser diode (DFB-LD) on the design of anti-reflection (AR) coatings. Optimal condition of AR coating to prevent internal feedback from both facets and reduce the reflection-induced intensity noise of laser diode was simulated with Macleod Simulator. Coating materials used in this work were ${Ti_3}{O_5}$ and $SiO_2$, of which design thickness were 105 nm and 165 nm, respectively. AR coating films were deposited by Ion-Assisted Deposition system. The electrical and optical properties of 1.3 um laser diode were characterized by Bar tester and Chip tester. Threshold current and slop-efficiency of DFB-LD were 27.56 mA 0.302 W/A. Far field pattern and wavelength of DFB-LD were $22.3^{\circ}(Horizontal){\times}24.4^{\circ}$ (Vertical), 1313.8 nm, respectively.

• Transactions on Electrical and Electronic Materials
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• 제15권3호
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• pp.159-163
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• 2014

More accurate CD (Critical Dimension) control is required for the nanometer-scaled devices. However, since the reflectivity between substrate and PR (Photoresist) becomes higher, the CD (Critical Dimension) swing curve was intensified. The higher reflectivity also causes PR notching due to the pattern of sub-layer. For this device requirement, it was optimized for the thickness, refractive index(n) and absorption coefficient(k) in the bottom anti-reflective coating(BARC; SiON) and photoresist with the minimum reflectivity. The computational simulated conditions, which were determined with the thickness of 33 nm, n of 1.89 and k of 0.369 as the optimum condition, were successfully applied to the experiments with no standing wave for the 0.13um-device. At this condition, the lowest reflectivity was 0.44%. This optimum condition for BARC SiON film was applied to the process for 0.13um-device. The optimum SiON film as BARC to PR and sub-layer could be formed with the accurate CD control and no standing waver for the nanometer-scaled semiconductor manufacturing process.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2011년도 춘계학술대회 초록집
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• pp.104.2-104.2
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• 2011

세계적으로 환경오염이 심각해짐에 따라 친환경적으로 에너지를 생산하는 기술이 주목받고 있다. 그 중에서도 태양광을 이용하여 전력을 생산하는 태양광 태양전지의 경우 원리가 간단하고 에너지원의 수급이 용이하다는 장점으로 인하여 많은 연구가 진행되고 있다. 그러나 태양광 태양전지의 경우, 태양전지 기판에서의 반사로 인하여 발전 효율이 낮아는 문제점이 있다. 이를 해결하기 위해 텍스처링 공정을 통해 태양전지 기판에서의 반사를 줄이고 태양전지의 효율을 증가시키는 방법이 이용되고 있다. 본 연구에서는 나노 돌기를 가진 저반사 패턴을 이용하여 태양전지용 실리콘 기판을 제작함으로써, 태양전지 기판에서의 반사를 줄이고자 하였다. 나노 돌기를 가진 저반사 패턴이 형성 된 태양전지용 실리콘 기판을 제작하기 위해 ICP 장비를 이용한 $Cl_2$ 플라즈마 식각공정을 진행하였다. 먼저 Au agglomeration 기술을 이용하여 Au nano particle을 실리콘 기판 위에 형성 후, 이를 식각 마스크로 이용하여 ICP 식각을 진행하였다. 이어서 나노 돌기가 형성 된 실리콘 기판 위에 $Cl_2$ 플라즈마에 내식각성이 우수한 레지스트를 이용하여, 나노 임프린트 리소그래피 기술을 통해 저반사 패턴을 형성하였다. 이 방법으로 형성 된 저반사 패턴을 식각 마스크로 사용하여 앞의 공정과 동일한 조건으로 실리콘 기판을 식각하였다. 최종적으로 agglomerated Au particle과 $Cl_2$ 플라즈마에 내식각성이 우수한 레지스트를 이용하여 나노 돌기를 가진 저반사 패턴이 형성된 실리콘 기판을 제작하였다.

• 한국생산제조학회지
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• 제18권6호
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• pp.697-701
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• 2009

A simple method for the fabrication of porous nano-master for the anti-reflection effect on the transparent substrates is presented. In the conventional fabrication methods for antireflective surface, coating method using materials with low refractive index has usually been used. However, it is required to have a high cost and long processing time for mass production. In this paper, we developed a porous nano-master with anti-reflective surface for the molding stamper of the injection mold, hot embossing and UV imprinting by using the aluminum anodizing process. Through two-step anodizing and etching processes, a porous nano-master with anti-reflective surface was fabricated at the large area. Pattern size Pore diameter and inter-pore distance are about 130nm and 200nm, respectively. In order to replicate anti-reflective structure, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master.

• 한국전기전자재료학회논문지
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• 제30권12호
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• pp.800-805
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• 2017

Randomly patterned and wet chemical etching processes were used to treat anti-glare of display cover glasses. The surface and optical properties of grain size and surface morphology controlled by randomly patterned etching and wet chemical solution etching were investigated. The surface morphology and roughness of the etched samples were examined using a spectrophotometer and a portable surface roughness (Ra) measuring instrument, respectively. The gloss caused by reflection from the glass surface was measured at $60^{\circ}$ using a gloss meter. The surface of the sample etched by the doctor-blade process was more uniform than that obtained from a screen pattern etching process at gel state etching process of the first step. The surface roughness obtained from the randomly patterned etching process depended greatly on the mesh size, which in turn affected the grain size and pattern formation. The surface morphology and gloss obtained by the etching process in the second step depended primarily on the mesh size of the gel state etching process of the first step. In our experimental range, the gloss increased on decreasing the grain size at a lower mesh size for the first step process and for longer reaction times for the second step process.

• 한국전자파학회논문지
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• 제24권1호
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• pp.98-105
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• 2013

본 논문에서는 초광대역 벽 투과 레이더를 이용한 벽 내부 진단에 대한 유한차분 시간영역(finite-difference time-domain, FDTD) 시뮬레이션과 데이터 처리 기술에 대한 연구를 소개한다. 본 연구에서는 2차원 FDTD 기법을 이용하여 실제 측정과 유사한 조건으로 시뮬레이션을 수행하기 위해 우선 전파의 감쇄, 투과 특성, 해상도 등을 고려하여 0.3~7 GHz의 초광대역을 갖는 반대 극성 비발디 안테나(anti-podal vivaldi antenna)를 설계/제작하였다. 다음으로 제작된 안테나의 방사 패턴을 측정한 후 이것을 FDTD 시뮬레이션의 소스로 사용하여 콘크리트 벽 경계면과 벽 내부의 금속으로부터 반사된 데이터를 얻었다. 다음으로 이 데이터를 처리하고 레이더 영상을 생성하여 벽 내부를 관찰하였다. FDTD 시뮬레이션에서는 일반적으로 사용되고 있는 등방성 점 소스와 다항식으로 측정된 방사 패턴을 근사화하여 소스로 적용한 2가지 경우에 대해 비교하였으며, 그 결과, 안테나 패턴을 적용했을 경우 등방성 점 소스를 사용한 경우에 비해 최대 약 2.5 dB 높은 신호 대 잡음비를 얻을 수 있었다.

• 한국정밀공학회지
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• 제28권12호
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• pp.1419-1424
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• 2011

Nanoimprint lithography is a next generation lithography technology, which enables to fabricate nano to micron-scale patterns through simple and low cost process. Nanoimprint lithography has been applied in various industry fields such as light emitting diodes, solar cells and display. Functional patterns, including anti-reflection moth-eye pattern, photonic crystal pattern, fabricated by nanoimprint lithography are used to improve overall efficiency of devices in that fields. For these reasons, in this study, sub-micron-scaled functional patterns were directly fabricated on Si and glass substrates by thermal imprinting process using ZnO nano-particles dispersion resin. Through the thermal imprinting process, arrays of sub-micron-scaled pillar and hole patterns were successfully fabricated on the Si and glass substrates. And then, the topography, components and optical property of the imprinted ZnO nano-particles/resin patterns are characterized by Scanning Electron Microscope, Energy-dispersive X-ray spectroscopy and UV-vis spectrometer, respectively.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2004년도 춘계학술대회
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• pp.978-982
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• 2004

We present high aspect ratio 100nm-scale nickel stamper using e-beam lithography process and Cr/Qz mask for the injection molding process of nano grating patterns. Conventional photolithography blank mask (CrON/Cr/Qz) consists of quartz substrate, Cr layer of UV protection and CrON of anti-reflection layer. We have used Cr/Qz blank mask without anti-reflection layer of CrON which is non-conductive material and ebeam lithography process in order to simplify the nickel electroplating process. In nickel electroplating process, we have used Cr layer of UV protection as seed layer of nickel electroplating. Fabrication conditions of photolithography mask using e-beam lithography are optimized with respect to CrON/Cr/Qz blank mask. In this paper, we have optimized e-beam lithography process using Cr/Qz blank mask and fabricated nickel stamper using Cr seed layer. CrON/Cr/Qz blank mask and Cr/Qz blank mask require optimal e-beam dosage of $10.0{\mu}C/cm^2$ and $8.5{\mu}C/cm^2$, respectively. Finally, we have fabricated $116nm{\pm}6nm-width$ and $240nm{\pm}20nm-height$ nickel grating stamper for the injection molding pattern.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2018년도 춘계학술대회 논문집
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• pp.89-89
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• 2018

스마트 폰이나 내비게이션, 태블릿 PC, TV 등 디스플레이 소자가 휴대 가능해지고 고급화되면서 빛 반사로 인한 눈부심, 시인성 저하 등에 대한 문제가 제기되고 있다. 디스플레이의 반사방지를 위해 방현성(anti-glare) 및 반사방지(anti-reflection) 특성의 코팅이나 기능성 필름에 대한 연구 개발이 이루어지고 있다. 특히 반사방지 기능 부여를 위해 나방눈(moth-eye) 구조를 모방하여 표면 나노 구조 형상화에 대한 연구가 활발히 진행되고 있지만, 나노 임프린팅 및 리소그라피 공정을 통한 패턴 공정은 마스크나 몰드를 필요하고 대면적 제작에 어려움이 있다. 본 연구에서는 폭 300 mm급 롤투롤 이온빔 표면처리를 통해 나노 구조 몰드 필름을 제작하였고, 이형용 수지를 이용한 표면 구조 전사를 통해 모스 아이 구조와 같은 나노 구조 패턴이 전사되는 것을 확인하였다. 나노 구조가 전사된 필름에 대한 투과도 관찰 결과, 전체 투과도 91% 이상으로 투과도가 약 3% 향상되고 반사도는 저하되는 결과를 확인하였다. 롤투롤 장비를 이용하여 대면적 필름 제작이 가능한 것을 확인하였고, 나노패턴의 구조 형성 및 반사방지 기능에 대한 신뢰성 검토를 통해서 양산화 가능할 것이라 전망된다.

• 복식문화연구
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• 제9권1호
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• pp.111-126
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• 2001

This study concentrates on the relationship between the early 20th century italian artists and their works in the field of clothing design. They advocated the creation of art for life and introduced a new type of work of art which I will call 'experimental clothing for art'. The experimental clothing for art showed its dynamic characteristics in the field s of line and form, color, pattern, and material. The Italian artists made simple and functionalistic dresses, using asymmetric, geometric cuts. in pattern making. They employed dynamic patterns in textile design and favored brilliant colors which they debunked as storage and traditional. With regard to material, they used unusual materials such as metal, net, wire, and paper and inexpensive materials. To investigations of the visual expression of experimental clothing for art in Italy have led us to the internal expressions which are avant-garde, dynamic & speed, functionality & popularity, ephemeral & transformable, and warlike. As a result of the reflection of the times and the artists's will and roles the experimental clothing for art in Italy implicated contemporary clothing in the early twentieth century and it was only laboratory art that underwent various experiments in canvas but a model of efforts for the at of living, which was anti-traditional. It offered a new future and created a new environment. It is left for future research how the experimental clothing for art developed in countries other than Italian.