• 제목/요약/키워드: Anodizing oxidation

검색결과 72건 처리시간 0.049초

플라즈마 전해 산화 표면처리 된 Al6061 소재의 광학적 특성연구 (A Study of Optical properties of Al6061 By plasma electrolytic oxidation surface treatment)

  • 유재인;윤주식;윤재곤;최순돈;유재용;장호경;김기홍
    • 한국레이저가공학회지
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    • 제17권2호
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    • pp.1-4
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    • 2014
  • With the PEO(Plasma electrolytic oxidation) surface treatment, the oxide film of aluminum alloy is growing in a short time. The reflectance measurement to find the oxygen atoms in the oxide could be investigated. In order to form a thicker oxide film, the PEO surface treatment should be uniformly controlled in processing time.

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알루미늄 합금의 플라즈마전해산화 처리 기술 (Plasma Electrolytic Oxidation Treatment of Al Alloys)

  • 문성모;김주석
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2016년도 추계학술대회 논문집
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    • pp.115.2-115.2
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    • 2016
  • Al alloys are being used widely for automobile, aerospace and mechanical components because of their high strength ratio to weight. However, still they suffer from abrasion or corrosion owing to insufficient resistances to friction or mechanical impact and chemical attack. Plasma electrolytic oxidation (PEO) method is one of the promising surface treatment methods for Al alloys which can render better hardness than aluminum anodic oxide (AAO) films prepared by conventional anodizing method in acidic solutions. In this presentation, some basic nature of PEO film formation and growth process on Al alloys will be presented based on the experimental results obtained and discussed in view of dielectric breakdown and reformation and the role of various anions in film breakdown and reformation of PEO films.

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저전압 PEO 양극산화 공정을 위한 Ti 전처리 조건의 최적화 연구 (Optimization of Pretreatment Conditions for Ti Surface in the Low Voltage PEO Anodization Process)

  • 하동흔;최진섭
    • 한국표면공학회지
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    • 제50권6호
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    • pp.439-446
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    • 2017
  • Plasma electrolyte oxidation (PEO) is a kind of anodization, in which a very high voltage or current is applied to a metal substrate in various electrolytes, allowing distinctly thick thickness of the oxide film with outstanding film properties, such as a good corrosion resistance, mechanical strength, thermal stability, and excellent adhesion to a substrate. Herein, we tried to find the optimal pretreatment conditions among commercially available solutions in order to produce PEO anodizing at relatively low voltage. We characterized the surface morphologies of the sample by scanning electron microscope (SEM), atomic force microscopy (AFM), and investigated color parameters of the pretreated surface of Ti by spectrophotometer.

음극 산화 법에 의한 산화 탄탈의 제조 (The Fabrication of Ta Oxide by Anodizing Method)

  • 허창우
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2006년도 춘계종합학술대회
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    • pp.873-877
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    • 2006
  • [ $Ta_2O_5$ ] 절연막을 제조하기 위하여 ANODE OXIDATION 공정을 수립하였다. Electrolyte에서의 전압강하는 정전류 모드에서 예상되는 전압의 변화에는 영향을 주지 않지만, 정전압 모드에서 전류의 변화에 영향을 주는 것으로 나타났다. 전해질에서의 전압 강하가 음극산화 전압과 같은 값을 갖는 경우, 전류는$Ta_2O_5$/전해질 계면에서의 전압강하가 증가함에 따라 logarithmic한 형태로 변화하는 것으로 나타났다. 음극 $Ta_2O_5$ 절연막 제조공정에 있어서 전해질에서의 전압 강하는 정전류 모드에서 두께의 손실을 발생시키지만, 정전압 모드에서 다시 복원되기 때문에, 최종 두께는 음극산화 전압에 비례하는 것으로 나타났다. 음극 $Ta_2O_5$ 절연막의 전기적 특성을 조사한 결과, 항복전압은 Electrolyte의 농도와 Anodization Current에 반비례하는 것으로 나타났다. 절연막의 두께가 $1500\AA$일 때 Breakdown Voltage는 350volt. 유전상수는 29로 측정되었다.

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ANALYSIS OF THE ANODIC OXIDATION OF SINGLE CRYSTALLINE SILICON IN ETHYLEN GLYCOL SOLUTION

  • Yuga, Masamitsu;Takeuchi, Manabu
    • 한국표면공학회지
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    • 제32권3호
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    • pp.235-238
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    • 1999
  • Silicon dioxide films were prepared by anodizing silicon wafers in an ethylene $glycol+HNO_3(0.04{\;}N)$ at 20 to $70^{\circ}C$. The voltage between silicon anode and platinum cathode was measured during this process. Under the constant current electrolysis, the voltage increased with oxide film growth. The transition time at which the voltage reached the predetermined value depended on the temperature of the electrolyte. After the time of electrolysis reached the transition time, the anodization was changed the constant voltage mode. The depth profile of oxide film/Si substrate was confirmed by XPS analysis to study the influence of the electrolyte temperature on the anodization. Usually, the oxide-silicon peaks disappear in the silicon substrate, however, this peak was not small at $45^{\circ}C$ in this region.

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Al-Si 합금의 양극산화거동 및 규소화합물 제어 (Anodizing Behavior and Silicides Control in Al-Si Alloy System)

  • 박종문;김주석;김재권;김수림;박노진;오명훈
    • 열처리공학회지
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    • 제31권1호
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    • pp.6-11
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    • 2018
  • The anodic oxidation behavior of Si-containing aluminum alloy for diecasting was investigated. Especially, the property changes during anodization both on aluminum 1050 and 9 weight percentage silicon containing aluminum (Al-9Si) alloys were analyzed by the static current test. In order to fabricate a uniform anodic oxidation film by effect of Al-Si compound, nitric acid containing hydrofluoric acid had been used as a desmutter for aluminum alloy after alkaline etching. It was found that the level of voltage of Al-9Si alloy during the static current test was almost as double as higher than aluminum 1050 through anodization. By adding hydrofluoric acid in the nitric acid electrolyte, the silicon compound on the surface was removed, and the optimum amount of added hydrofluoric acid could be derived. It was also observed that the size of silicon compound formed on the surface could be refined by heat treatment at $500^{\circ}C$ and followed water quenching.

티타늄 음극기지의 양극산화 전해질 농도에 따른 구리전착층 표면 및 전기적 특성에 미치는 효과 (The Effect of Various Electrolyte Concentrations on Surface and Electrical Characteristic of the Copper Deposition Layer at Anodizing of Titanium Anode)

  • 이만형;박은광;우태규;박일송;윤영민;설경원
    • 대한금속재료학회지
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    • 제46권11호
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    • pp.747-754
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    • 2008
  • Recently, the requirement for the ultra thin copper foil increases with smaller and miniaturized electronic components. Therefore, it is important to examine the surface state of substrate depending on the processing parameter during the anodic oxidation. This study investigated the effect of the various electrolyte concentrations on anodizing of titanium anode prior to copper electrodeposition. Different surface morphology of anodized titanium was obtained at different electrolytic concentration 0.5 M to 3.0 M. In addition, the effect that the surfaces and the electrical characteristics on the electrodeposited copper layer was observed. In this study, surface anodized in the group containing 0.5M $H_2SO_4$ shows more uniform copper crystals with low surface roughness. the surface roughness and sheet resistance for 0.5M $H_2SO_4$ group were $1.353{\mu}m$ and $0.104m{\Omega}/sq$, respectively.

양극산화법에 의한 광촉매용 $TiO_2$제조 및 특성 (Preparation and Photocatalytic Characteristics of $TiO_2$ by Anodic Oxidation Process)

  • 장재명;김성갑;오한준;이종호;지충수
    • 한국재료학회지
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    • 제11권1호
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    • pp.61-66
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    • 2001
  • 양극산화법을 이용하여 광촉매 특성을 나타내는 $TiO_2$ 피막을 제조하고 염료의 분해반응을 통하여 광분해 효율을 조사하였다 양극산화법에 의해 제조된 산화피막은 모두 광촉매 분해특성이 있었으며 양극산화의 조건에 따라서 $TiO_2$ 피막의 성장거동과 피막 형태에 차이가 나타났다. 황산용액에서 양극산화된 $TiO_2$ 피막은 불규칙적 인 입자모양으로 anatase와 rutile이 혼합된 조직이었으며, 인산이 첨가된 혼합용액에서 형성된 $TiO_2$는 anatase로 셀 모양의 피막형태로 생성되었다. 광촉매 특성에 적합한 양극산화의 인가 전압은 180V인 것으로 나타났다.

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티타늄 금속 표면 양극산화장치 개발 (Development of Titanium Metal Surface Anodizing Equipment)

  • 양근호;민병운
    • 한국전자통신학회논문지
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    • 제8권9호
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    • pp.1307-1312
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    • 2013
  • 본 논문에서는 알칼리성 또는 산성을 띠는 특정 용액 내에서 전기분해 원리를 이용하여 금속 표면을 산화시켜 절연피막을 형성하는 장치를 개발한다. 기존에는 주로 양극에만 펄스 형태로 전압을 인가하는 단극성(unipolar) 방식이지만 본 논문에서는 H-브리지를 이용하여 양극에 양(+)전압과 음(-)전압을 번갈아 가면서 전압을 공급하는 양극성(bipolar) 장치를 제작하였으며, 금속 시편의 특성에 맞는 다양한 전기적인 조건을 가지고 산화피막을 형성할 수 있는 장치를 개발하였다. 공급전류 가변은 PWM 변조를 이용하였으며, (+)와 (-)의 극성변화는 H-브리지를 이용하여 양극성 펄스전압을 공급할 수 있도록 하였다. 그 결과로써 단극성보다 균일한 기공을 갖는 피막이 형성되었다.

Titanium 양극산화시 TiO2 의 형상 및 특성에 미치는 전해질의 영향 (Influence of Electrolyte on the Shape and Characteristics of TiO2 during Anodic Oxidation of Titanium)

  • 최예지;정찬영
    • Corrosion Science and Technology
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    • 제22권3호
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    • pp.193-200
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    • 2023
  • Titanium alloy (grade-4) is commonly used in industrial and medical applications. To improve its corrosion resistance and biocompatibility for medical use, it is necessary to form a titanium oxide film. In this study, the morphology of the oxide film formed by anodizing Ti-grade 4 using different electrolytes was analyzed. Wetting properties before and after surface modification with SAM coating were also observed. Electrolytes used were categorized as A, B, and C. Electrolyte A consisted of 0.3 M oxalic acid and ethylene glycol. Electrolyte B consisted of 0.1 M NH4F and 0.1 M H2O in ethylene glycol. Electrolyte C consisted of 0.07 M NH4F and 1 M H2O in ethylene glycol. Samples B and C exhibited a porous structure, while sample A formed a thickest oxide film with a droplet-like structure. AFM analysis and contact angle measurements showed that sample A with the highest roughness exhibited the best hydrophilicity. After surface modification with SAM coating, it displayed superior hydrophobicity. Despite having the thickest oxide film, sample A showed the lowest insulation resistance due to its irregular structure. On the other hand, sample C with a thick and regular porous oxide film demonstrated the highest insulation resistance.