• 제목/요약/키워드: Anodic material

검색결과 229건 처리시간 0.027초

Flexible 기판 위의 전고상 전기변색 소자 제작 (All-solid-state electrochromic devices on flexible substrate)

  • 나윤채;심희상;조인화;성영은
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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    • pp.129-129
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    • 2003
  • 전기변색(electrochromism)은 전기화학적 산화, 환원 과정을 통해 가역적인 광학특성의 변화를 갖는 현상을 말하며, 이를 이용한 전기변색소자(electrochromic device)는 전력 소모가 적고 변색효율이 크다는 장점으로 인해 smart window, display, mirror 등에 응용될 수 있다. 전기변색소자는 구조상 투명 기판, 투명 전도체, 환원 착색 물질 (cathodic coloration material), 산화 착색 물질(anodic coloration material), 그리고 투명 이온 전도체로 구성된다. 일반적으로 투명 기판으로는 열적 안정성이 좋은 유리기판을 사용하여 window에 응용할 수 있는 장점이 있는 반면 다양한 형태를 갖는 소자를 제작하기에는 그 한계가 있다.

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박막 알루미늄을 이용한 규칙적으로 정렬된 나노급 미세기공 어레이 제조기술 개발 (Development of Fabrication Technique of Highly Ordered Nano-sized Pore Arrays using Thin Film Aluminum)

  • 이재홍;김창교
    • 한국전기전자재료학회논문지
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    • 제18권8호
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    • pp.708-713
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    • 2005
  • An alumina membrane with nano-sized pore array by anodic oxidation using the thin film aluminum deposited on silicon wafer was fabricated. It Is important that the sample prepared by metal deposition method has a flat aluminum surface and a good adhesion between the silicon wafer and the thin film aluminum. The oxidation time was controlled by observation of current variation. While the oxalic acid with 0.2 M was used for low voltage anodization under 100 V, the chromic acid with 0.1 M was used for high voltage anodization over 100 V. The nano-sized pores with diameter of $60\~120$ nm was obtained by low voltage anodization of $40\~80$ V and those of $200\~300$ nm was obtained by high voltage anodization of $140\~200$ V. The pore widening process was employed for obtaining the one-channel with flat surface because the pores of the alumina membrane prepared by the fixed voltage method shows the structure of two-channel with rough surface. Finally, the sample was immersed to the phosphoric acid with 0.1 M concentration to etching the barrier layer.

AFM을 이용한 나노 패턴 형성과 크기에 따른 광특성 시뮬레이션 (Simulations of Optical Characteristics according to the Silicon Oxide Pattern Distance Variation using an Atomic Force Microscopy (AFM))

  • 황민영;문경숙;구상모
    • 한국전기전자재료학회논문지
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    • 제23권6호
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    • pp.440-443
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    • 2010
  • We report a top-down approach based on atomic force microscopy (AFM) local anodic oxidation for the fabrication of the nano-pattern field effect transistors (FETs). AFM anodic oxidation is relatively a simple process in atmosphere at room temperature but it still can result in patterns with a high spatial resolution, and compatibility with conventional silicon CMOS process. In this work, we study nano-pattern FETs for various cross-bar distance value D, from ${\sim}0.5\;{\mu}m$ to $1\;{\mu}m$. We compare the optical characteristics of the patterned FETs and of the reference FETs based on both 2-dimensional simulation and experimental results for the wavelength from 100 nm to 900 nm. The simulated the drain current of the nano-patterned FETs shows significantly higher value incident the reference FETs from ${\sim}1.7\;{\times}\;10^{-6}A$ to ${\sim}2.3\;{\times}\;10^{-6}A$ in the infrared range. The fabricated surface texturing of photo-transistors may be applied for high-efficiency photovoltaic devices.

에칭용액의 인산 첨가량에 따른 양극산화 알루미늄 템플레이트의 제작 및 특성 (Fabrication and Characterization of AAO Template with Variation of the Phosphoric Acid Amount of the Etching Solution)

  • 조예원;김용준;여진호;이성갑;김영곤
    • 한국전기전자재료학회논문지
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    • 제27권7호
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    • pp.448-451
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    • 2014
  • Anodic aluminum oxides (AAO) fabricated by the two-step anodizing process have attracted much attention for the fabrication of nano template because of pore structure with high aspect ratio, low cost process and ease of fabrication. AAOs are characterized by a homogeneous morphology of parallel pores that grow perpendicular to the template surface with a narrow distribution of diameter, length and inter-pores spacing, all of which can be easily controlled by suitably choosing of the anodizing parameters such as pH of the electrolyte, anodizing voltage and duration of anodizing. In this study, AAO templates were characterized by X-ray diffraction and field-emission scanning electron microscope (FE-SEM). The dependence of the pore size change according to the amount of addition of phosphoric acid, which was used to remove the initial alumina oxide layer, was not observed.

슈퍼 오스테나이트 스테인리스강의 열화손상에 대한 비파괴적 평가 (An Nondestructive Evaluation of Degraded Damage for Superaustenitic Stainless Steel)

  • 권일현;백승세;;유효선
    • 대한기계학회논문집A
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    • 제26권7호
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    • pp.1332-1339
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    • 2002
  • This research was undertaken to clarify effects of thermal aging on electrochemical and mechanical properties of superaustenitic stainless steel and to detect the material degradation nondestructively. The steel was artificially aged at $300{\sim}650^{\circ}C$ for $240{\sim}10,000h$ and the mechanical properties were investigated at $-196{\sim}650^{\circ}C$ using small punch(SP) test. Also, the change in electrochemical properties caused by effects of thermal aging on superaustenitic stainless steel was investigated using electrochemical anodic polarization test in a KOH electrolyte. Carbides and ${\eta}-phase(Fe_2Mo)$ precipitated in the grain boundaries seem to deteriorate the mechanical properties by decreasing cohesive strength in the grain boundaries and to promote the current density observed in electrochemical polarization curves, The electrochemical and mechanical properties of superaustenitic stainless steel decreased significantly in the specimen aged at $650^{\circ}C$ corresponding to the sensitization temperature for conventional austenitic stainless steels.

Electrochemical Evaluation on Corrosion Resistance of Anti-corrosive Paints

  • Moon, Kyung-Man;Lee, Myung-Hoon;Kim, Yun-Hae
    • Journal of Advanced Marine Engineering and Technology
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    • 제33권3호
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    • pp.387-394
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    • 2009
  • It has been observed that coated steel structures are rapidly deteriorated than designed lifetime due to acid rain caused by air pollution etc.. Therefore improvement of corrosion resistance of anti-corrosive paint is very important in terms of safety and economic point of view. In this study corrosion resistance for five kinds of anti-corrosive paints including acryl, fluorine and epoxy resin series were investigated with electrochemical methods such as corrosion potential, polarization curves, impedance and cyclic voltammogram measurements etc.. There were somewhat good relationships between values measured by electrochemical methods such as corrosion current density obtained by cathodic and anodic polarization curves, value of impedance estimated with AC impedance, and polarization resistance on the cyclic voltammogram, for example, corrosion current density was decreased with increasing of values of impedance and polarization resistance on the cyclic voltammogram. However their relationships between corrosion current density and corrosion potential were not well coincided each other. Consequently it is considered that although a corrosion potential of F101 of fuoric resin series shifted to negative direction than other anti-corrosive paints, its corrosion resistance, indicating on the cathodic and anodic polarization curves, AC impedance curves and cyclic voltammogram, was the most superior to other paints, whereas A100 containing arcylic resin showed a relatively poor corrosion resistance compared to other paints.

GaAs 기판 위에 EDMIn과 TBP로부터 성장되고 양극산화 처리된 InP Schottky Diode (Anodically Oxidized InP Schottky Diodes Grown From EDMIn and TBP on GaAs Substrates)

  • 유충현
    • 한국전기전자재료학회논문지
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    • 제16권6호
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    • pp.471-476
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    • 2003
  • Au/oxide/n-InP Schottky diodes were fabricated from heteroepitaxial InP layers grown on GaAs substrates by the metalorganic vapor phase epitaxy (MOVPE) method from a new combination of source materials: ethyldimethylindium (EDMIn) and tertiarybutylphosphine (TBP). Anodic oxidation technique by using a solution of 10 g of ammonium pentaborate in 100 cc of ethylene glycole as the electrolyte was used to deposit a thin oxide layer. The barrier heights determined from three different techniques, current-voltage (I-V) measurements at room temperature and in the temperature range of 273 K - 373 K, and room temperature capacitance-voltage (C-V) measurements are in good agreement, 0.7 - 0.9 eV which is considerably high as compared to the 0.45 - 0.55 eV in Au/n-InP Schottky diode without a Passivation layer. The ideality factors of 1.1 - 1.3 of the Schottky diodes were also determined from the I-Y characteristics. Deep level transient spectroscopy (DLTS) studies revealed only one shallow electron state at 92.6 meV below the bottom of the conduction band and no deep state in the heteroepitaxial InP layers grown from EDMIn and TBP.

SAXS와 AFM에 의한 HF-용액내 양극 에칭에 의해 제조된 기공성 실리콘의 구조연구 (SAXS and AFM Study on Porous Silicon Prepared by Anodic Etching in HF-based Solution)

  • 김유진;김화중
    • 한국전기전자재료학회논문지
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    • 제17권11호
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    • pp.1218-1223
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    • 2004
  • Porous silicon materials have been shown to have bright prospects for applications in light emitting, solar cell, as well as light- and chemical-sensing devices. In this report, structures of porous silicon prepared by anodic etching in HF-based solution with various etching times were studied in detail by Atomic Force Microscopy and Small Angle X -ray Scattering technique using the high energy beam line at Pohang Light Source in Korea. The results showed the coexistence of the various pores with nanometer and submicrometer scales. For nanameter size pores, the mixed ones with two different shapes were identified: the larger ones in cylindrical shape and the smaller ones in spherical shape. Volume fractions of the cylindrical and the spherical pores were about equal and remained unchanged at all etching times investigated. On the whole uniform values of the specific surface area and of the size parameters of the pores were observed except for the larger specific surface area for the sample with the short etching time. The results implies that etching process causes the inner surfaces to become smoother while new pores are being generated. In all SAXS data at large Q vectors, Porod slope of -4 was observed, which supports the fact that the pores have smooth surfaces.

박막 알루미늄을 이용한 나노미터 크기의 미세기공 형성 (Fabrication of the alumina membrane with nano-sized pore array using the thin film aluminum)

  • 이병욱;이재홍;이의식;김창교
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.120-122
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    • 2005
  • An alumina membrane with nano-sized pore array by anodic oxidation using thin film aluminum deposited on silicon wafer was fabricated. It is important that the sample prepared by metal deposition method has a flat aluminum surface and a good adhesion between the silicon wafer and the thin film aluminum. The oxidation time was controlled by observation of current variation. While the oxalic acid with 0.2M was used for low voltage anodization under 100V, the chromic acid with 0.1M was used for high voltage anodization over 100V. The nano-sized pores with diameter of 60~120nm was obtained by low voltage anodization of 40~90V and those of 200~300nm was obtained by high voltage anodization of 120~160V. Finally, the sample was immersed to the phosphoric acid with 0.1M concentration to etching the barrier layer. The sample will be applied to electronic sensors, field emission display, and template for nano-structure.

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