• Title/Summary/Keyword: Amorphous materials

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Production and Properties of Amorphous TiCuNi Powders by Mechanical Alloying and Spark Plasma Sintering

  • Kim, J.C.;Kang, E.H.;Kwon, Y.S.;Kim, J.S.;Chang, Si-Young
    • Journal of Powder Materials
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    • v.17 no.1
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    • pp.36-43
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    • 2010
  • In present work, amorphous TiCuNi powders were fabricated by mechanical alloying process. Amorphization and crystallization behaviors of the TiCuNi powders during high-energy ball milling and subsequent microstructure changes were studied by X-ray diffraction and transmission electron microscope. TEM samples were prepared by the focused ion beam technique. The morphology of powders prepared with different milling times was observed by field-emission scanning electron microscope and optical microscope. The powders developed a fine, layered, homogeneous structure with milling times. The crystallization behavior showed that glass transition, $T_g$, onset crystallization, $T_x$, and super cooled liquid range ${\Delta}T=T_x-T_g$ were 628, 755 and 127K, respectively. The as-prepared amorphous TiCuNi powders were consolidated by spark plasma sintering process. Full densified TiCuNi samples were successfully produced by the spark plasma sintering process. Crystallization of the MA powders happened during sintering at 733K.

The Study on the Characteristic of Phase Transition in Differential Thickness of Se1Sb2Se2 Thin Films

  • Lee Jae-Min;Yang Sung-Jun;Shin Kyung;Chung Hong-Bay
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.6
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    • pp.241-243
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    • 2004
  • The phase transition between amorphous and crystalline states in chalcogenide semiconductor films can be controlled by electrical or pulsed laser beam; hence some chalcogenide semiconductor films can be applied to electrically write/erase nonvolatile memory devices, where the low conductive amorphous state and the high conductive crystalline state are assigned to binary states. In this letter, the characteristics of phase transition in differential chalcogenide thin film are investigated. Al was used for the electrode as the thickness of 100, 300, 500 nm, respectively.

Alternating Magnetic Field Crystallization of Amorphous Si Films

  • Kang, K.H.;Park, S.H.;Lee, S.J.;Nam, S.E.;Kim, H.J.
    • Journal of Information Display
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    • v.4 no.1
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    • pp.34-37
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    • 2003
  • We investigate the solid phase crystallization of amorphous Si films on glass substrates under alternating magnetic field induction. The kinetics of crystallization are found to be greatly enhanced by alternating magnetic field. While complete crystallization takes heat treatment of more than 14 hours at 570$^{\circ}C$, it can be reduced by applying the megnetic field to 20 minutes. It is assumed that the enhancement of crystallization is associated with an electromotive force voltage generated by alternating magnetic field. This electric field applied in the amorphous Si may possibly be the reason for acceleration of the atomic mobility of crystallization through the modification of atomic potentials

The Study on Characteristic of Phase Transition in differential Chalcogenide Thin Films ($Se_1Sb_2Te_2$ 칼코게나이드 박막의 두께에 따른 상변화 특성 연구)

  • Lee, Jae-Min;Yang, Sung-Jun;Shin, Kyung;Chung, Hong-Bay;Kim, Young-Hae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.340-343
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    • 2004
  • The phase transition between amorphous and crystalline states in chalcogenide semiconductor films can controlled by electric pulses or pulsed laser hem: hence some chalcogenide semiconductor films can be applied to electrically write/erase nonvolatile memory devices, where the low conductive amorphous state and the high conductive crystalline state are assigned to binary states. This letters researched into the characteristic of phase change transition in differential Chalcogenide thin films materials. The electrode used Al and experimented on 100nm, 300nm, 500nm respectively.

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Characterization of Atomic Structure in Rapidly Solidified Amorphous Silicon (급냉응고된 비정질 실리콘 분말의 원자구조에 관한 연구)

  • Kim, Yeon-Ok
    • Korean Journal of Materials Research
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    • v.4 no.6
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    • pp.644-650
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    • 1994
  • The submicron powders of high-purity silicon have been produced by Electrohydrodynamic Atomization. Field-emission scanning transmission electron microscopy(STEM) is used to determine the microstructure and solidification phase. .Then it is found that the droplets less than 60nm diameter are solidified as the amorphous phase. A useful and accessible characterization of atomic arrangements in amorphous solids can be given in terms of a radial distribution function. According to experimental determinations of the radial distribution function for amorphous silicon, its similarity to the crystalline structure at small radial distances indicates that the basic tetrahedral arrangement found in the diamond cubic structure of silicon must be maintained in the amorphous structure.

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Composite and Spark Plasma Sintering of the Atomized Fe Amorphous Powders and Wire-exploded Cu Nanopowder in Liquid (가스분무 Fe계 비정질 분말과 유체 내 전기선 폭발에 의한 나노 Cu 분말의 복합화와 방전플라즈마 소결)

  • Kim, Jin-Chun;Goo, Wang-Heo;Yoo, Joo-Sik
    • Journal of Powder Materials
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    • v.15 no.4
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    • pp.285-291
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    • 2008
  • Fe based ($Fe_{68.2}C_{5.9}Si_{3.5}B_{6.7}P_{9.6}Cr_{2.1}Mo_{2.0}Al_{2.0}$) amorphous powder were produced by a gas atomization process, and then ductile Cu powder fabricated by the electric explosion of wire(EEW) were mixed in the liquid (methanol) consecutively. The Fe-based amorphous - nanometallic Cu composite powders were compacted by a spark plasma sintering (SPS) processes. The nano-sized Cu powders of ${\sim}\;nm$200 produced by EEW in the methanol were mixed and well coated with the atomized Fe amorphous powders through the simple drying process on the hot plate. The relative density of the compacts obtained by the SPS showed over 98% and its hardness was also found to reach over 1100 Hv.

A study on amorphous-amorphous phase transition of As-Se-S-Ge thin films (As-Se-S-Ge계 박막의 비정질-비정질 상변환 연구)

  • Lee, S.J.;Lee, Y.J.;Chang, H.B.;Kim, J.B.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1992.11a
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    • pp.73-76
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    • 1992
  • The amorphous phase of bulk and thin film in the As-Se-S-Ge system was observed by X-ray diffraction. Thermal analysis using DSC, DTA and TGA method has been used for the determination of the glass transition temperature, Tg. The glass transition temperature, Tg for the composition were $238^{\circ}C$ in $As_{40}Se_{15}S_{35}Ge_{10}$ and $231^{\circ}C$ in $AS_{40}Se_{25}S_{25}Ge_{10}$ and $As_{40}Se_{50}Ge_{10}$. The phase seperation of continuous phase and dispersive phase was observed by the optical texture of the polarizing microscope. Also, the glass transition temperature of the thin film was near $200^{\circ}C$. As the results of SEM-EDS analysis, the phase transition of the films by thermal treatment and light illumination was the amorphous to amorphous.

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Crystallization behavior of W35Fe43C22 amorphous alloy powders (W35Fe43C22 비정질 합금분말의 결정화 거동)

  • Kwon, Young Jun;Yoo, Jung Sun;Park, Soo Keun;Lee, Keun Hyo;Cho, Ki Sub
    • Journal of the Korean Society for Heat Treatment
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    • v.31 no.4
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    • pp.165-170
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    • 2018
  • W, Fe, and carbon powders were mechanical alloyed to produce $W_{35}Fe_{43}C_{22}$ ternary alloy powders containing nanocrystal W embedded within amorphous matrix. When the powder samples were heated to the primary crystallization temperature of $735^{\circ}C$, most parts of their amorphous region were fully crystallized to [W,Fe]-rich $M_6C$ carbides. Interestingly, a little portion of the carbides changes to stoichiometric line compounds ($M_{12}C$ and $W_6Fe_7$) and a solution phase (Fe-rich bcc), and remaining parts of the crystallites were amorphized again. The resulting microstructure was retained even by cyclic heating between room temperature of $1,200^{\circ}C$, and thus we found that the amorphous structure can be irreversibly formed at above glass transition temperature.

P-type Electrical Characteristics of the Amorphous La2NiO4+δ Thin Films

  • Hop, Dang-Hoang;Lee, Jung-A;Heo, Young-Woo;Kim, Jeong-Joo;Lee, Joon-Hyung
    • Journal of the Korean institute of surface engineering
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    • v.51 no.4
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    • pp.231-236
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    • 2018
  • We report p-type electrical characteristics of the amorphous $La_2NiO_{4+{\delta}}$ thin films which were sputtered on the glass substrates using an RF sputtering system. As-deposited thin films at room temperature and $300^{\circ}C$ were amorphous in nature. Post-annealing of the thin film samples over $400^{\circ}C$ resulted in the nano-crystallization of the $La_2NiO_{4+{\delta}}$. The electrical properties of the films were much dependent on the oxygen partial pressure, temperature of the post-annealing and sputtering ambient. The as-deposited samples at room temperature show a hole concentration of $7.82{\times}10^{13}cm^{-3}$, and it could be increased as high as $3.51{\times}10^{22}cm^{-3}$ when the films were post-annealed in an oxygen atmosphere at $500^{\circ}C$. Such p-type conductivity behavior of the $La_2NiO_{4+{\delta}}$ films suggests that the amorphous and nano-crystallized $La_2NiO_{4+{\delta}}$ films have potential for the application as p-type semiconductive or conductive materials at low temperatures where material diffusion is limited.